RADIATION DAMAGE IN ROCK-FORMING MINERALS by ROBERT EARL SCOTT B.S., Massachusetts Institute of Technology (1976) SUBMITTED IN PARTIAL FULFILLMENT OF THE REQUIREMENTS FOR THE DEGREE OF MASTER OF SCIENCE at the MASSACHUSETTS INSTITUTE OF TECHNOLOGY May,. 1977 Signature of Author... I............. Department of Earth and Planetary Sciences, May 1-2, Certified . by.......... .. . 1977 .e.*........... Thesis Supervisor Accepted by.. . -.- w..,....r.-.ym... Chairperson, Departmental Committee on Theses J0N 9 1977 wTL ACKNOWLEDGEMENTS My utmost thanks to Dr. Robert L. Huguenin for his suggestion of the topic, invaluable advice, great willingness, continued encouragement and considerable time he gave me. My gratitude to Professor Roger G. Burns for taking me on as one of his advisees during the absence of Professor Thomas B. McCord. Thanks are also due to Professor Robert L. Coble for his comments, suggestions, advice and efforts in providing me with invaluable information. I am very grateful to the Remote Sensing Laboratory for providing me with financial support in the form of research assistantship. My thanks are extended to Ms. Kristine L. Andersen for her advice, enthusiasm and encouragement throughout my studies. Finally, my utmost praise to my dear friends: Gary S. Isaacs, Jean Harrison, Colin Gardinier and Adrian Middleton whose patience, continuous encouragement and great understanding were immeasureable. But my warmest and greatest thanks goes to my father, mother, brother, sisters, my niece Sharon and God, without whom life would have no meaning. To all of the above individuals and to all whom I might have omitted; I offer my sincere thanks. To My cousin, the late Leonard Charles Mosley RADIATION DAMAGE IN ROCK-FORMING MINERALS by ROBERT EARL SCOTT Submitted to the Department of Earth and Planetary Sciences on May 12, 1977, in partial fulfillment of the requirements for the Degree of Master of Science ABSTRACT The apparent absence of metal coatings, produced by solarwind sputtering, on lunar samples indicates that the solar wind does not modify the soils to the extent predicted by laboratory studies. This suggests that the sputtering efficiency of the solar wind is somehow decreased in the lunar enviroment. The model for backward sputtering of metals and oxides has been reviewed. The predicted sputtering yields of metals and oxides in comparison with the experimental yield values turns out to differ by at least a factor of 3 or better. For example, the predicted yield for Cu and Fe at 1.85keV are 0.014 and 0.035, respectively, and the experimental values are 0.03 and 0.009, respectively. The sputtering yields of metals and oxides, obtained from modified theories of sputtering by Sigmund and Kelly, are used in conjunction with the solar wind plasma-lunar surface magnetic field interaction model to estimate the sputtering rates. The predicted order of enrichment of metals in lunar soils is in very good agreement with the order of enrichment determined from ESCA studies of lunar samples. The interaction of the lunar surface magnetic fields with the solar-wind protons has been reviewed. The solar-wind protons are predicted to be completely stood off at the Apollo 16 landing site, and their mean kinetic energies are reduced at other sites. At the Apollo 12 landing site, for example, the protons lose about 30-80% of their nominal (lkeV) incident kinetic energy. The loss in proton energy by interaction with compressed magnetic fields reduces substantially the sputtering efficiency of the solar wind. The unexpected low abundances of metal surface coatings can now possibly be explained. THESIS SUPERVISOR: Roger G. Burns TITLE: Professor of Geochemistry - 5 TABLE OF CONTENTS TITLE PAGE..............................................1 ACKNOWLEDGEMENTS........................................2 ABSTRACT...............................................4 -TABLE OF CONTENTS ...................................... 5 LIST OF FIGURES AND TABLES..............................7 INTRODUCTION...........................................15 I. BACKWARD SPUTTERING OF METALS AND OXIDES BY HYDROGEN IONS ...........................................16 A. Theory of Sputtering............................16 B. Sputtering Yields of Metals for Protons at Normal Incidence...............................26 C. Variation of Sputtering Yield with Angle of Incidence for Metals........................30 D. Velocity Distribution of Sputtered Atoms.......33 E. Sputtering Yields of Oxides for Protons at Normal Incidence............................36 F. Variation of Sputtering Yield with Angle of Incidence for Metal Oxides...................38 G. Velocity Distribution of Sputtered Molecules ...39 II. SPUTTERING EFFECTS ON THE LUNAR SURFACE................41 A. Lunar Magnetic Field...........................41 B. Reduction of the Mean Kinetic Energy of Solar-Wind Protons at the Lunar Surface by Magnetic Field Interaction...................42 C. Fraction of Sputtered Atoms that Escape .................................. 43 from the Moon D. Fraction of Sputtered Molecules that Escape from the Moon...........................45 III. PREFERENTIAL SPUTTERING: METHOD FOR PREDICTING THE ORDER OF ENRICHMENT OF METALS......................46 IV. SUMMARY................................................48 APPENDIX I..............................................51 APPENDIX II.................... ........................ 68 REFERENCES.............................................72 TABLES.................................................74 6 FIGURES ......--.----------------- LIST OF FIGURES AND TABLES I. FIGURES Geometry of Sputtering Calaulation........ o. 1. Factor a in Eq.(25) for protons and deuter on s 2. incident on a heavy targe t .................. ... . 2a. Variation of the sputteri ng yield with angle of incidence for Ar+ ions incident on polycrystalline copper........ 3. Sputtering yields for H+ ions incident on aluminum................. .. .. 4. Sputtering yields for H+ ions incident on .. .. aluminum................. . .. ......... 5. Sputtering yields for H+ ions incident on .. .. calcium.................. 6. Sputtering yields for H+ ions incident on .. .. calcium.................. on Sputtering yields for H+ ions incident on 7. .. .. chromium................. ions.............. 8. Sputtering yields for H+ ions incident on .. .. chromium................. Sputtering yields for H+ 9. copper................... . . . . . 10. Sputtering yields for H+ ions incident on ..... . copper...................... incident on Sputtering yields for H+ ions 11. gold......................... .. cident... .......... 12. Sputtering yields for H+ ions incident on .......... ............. gold......................... Sputtering yields for H+ ions incident on 13. .. . .. iron......................... 14. Sputtering yields for H+ ions incident on ..... iron........................ 15. Sputtering yields for H+ ions incident on ... magnesium.................... Sputtering yields for H+ ions incident on 16. .... magnesium.................... Sputtering yields for 1+ ions incident on 17. manganese.................... .......... 18. Sputtering yields for H+ ions incident on manganese..................... ... Sputtering yields for H+ ions incident on 19. nickel...................... Sputtering yields for H+ ions incident on 20. nickel....................... 21. Sputtering yields for H+ ions .. . .. oxygen....................... 22. Sputtering yields for H+ ions . . . . . . . . oxygen....................... .... 0 18 . 27 34 . 111 . 112 . 113 . 114 . 115 . 116 117 ... 118 119 120 . 121 122 . . 123 124 125 .126 127 . 128 . .129 . 130 ... 23. 24. 25. '26. 27. 28. 29. 30. 31. 32. 33. 34. 35. 36. 37. 38. 39. Sputtering yields for H+ ions incident on ........ potassium......... ............ Sputtering yields for 11+ ions incident on .......... potassium......... on .+ incident ions for yields Sputtering .......... silver............ on incident ions 11+ for Sputtering yields . silver............ Sputtering yields for H ions incident on silicon.....:..... Sputtering yields for H+ ions incident on .. . .. . ........ silicon........... ............. Sputtering yields for H+ ions incident on .......... sodium............ f...... o...s. incide on incident ions .... . ... H+ 9.. ... for .0...... Sputtering yields .......... sodium............ Sputtering yields .......... titanium.......... on ions incident H+ Sputtering yields for .. .... ... .... . . . . . . . titanium.......... for H+ ions incident on .......... Sputtering yields for H+ ions incident on . zinc.............. Sputtering yields zinc.............. .. . . . . . . . .. . . . . . . Variation of the sputtering yield with angle of incidence for H+ ions on aluminum......... Variation of the sputtering yield with angle of incidence for H+ ions on calcium.......... Variation of the sputtering yield with angle of incidence for H+ ions on chromium......... Variation of the sputtering yield with angle' of incidence for H+ ions on copper........... Variation of the sputtering yield with angle of incidence for H+ ions on gold............. Variation of the sputtering yield with angle of incidence for H+ ions on iron............. Variation of the sputtering yield with angle of incidence for H+ ions on magnesium........ Variation of the sputtering yield with angle of incidence for H+ ions on manganese......... ...... Variation of the sputtering yield with angle of incidence for H+ ions on nickel............ Variation of the sputtering yield with angle of incidence for H+ ions on potassium......... ...... Variation of the sputtering yield with angle of incidence for H+ ions on silver............ ...... Variation of the sputtering yield with angle of incidence for H+ ions on sodium............ ...... . 40. . 41. . 42. 43. 44. 45. 45a. o.131 132 133 134 135 . . 136 137 138 139 140 . 141 . . 142 143 . . 145 . 146 . .147 .148 .. 149 150 .151 152 153 154 46. 47. 48. 49. 50. 51. 52. 53. 54. 55. 56. 57. 58. 59. 60. 61. 62. 63. Variation of the sputtering yield with angle of incidence for H+ ions on titanium......... Variation of the sputtering yield with angle of incidence for H+ ions on zinc............. Velocity distribution of ejected atoms for H+ ions incident on aluminum................. Velocity distribution of ejected atoms for H+ ions incident on calcium.................. Velocity distribution of ejected atoms for H+ ions incident on chromium................. Velocity distribution of ejected atoms for H+ ions incident on copper................... Velocity distribution of ejected atoms for H+ ions incident on gold..................... Velocity distribution of ejected atoms for H+ ions incident on iron.................... Velocity distribution of ejected atoms for H+ ions incident on magnesium............... Velocity distribution of ejected atoms for H+ ions incident on manganese............... Velocity distribution of ejected atoms for H+ ions incident on nickel.................. Velocity distribution of ejected atoms for H+ ions incident on potassium............... Velocity distribution of ejected atoms for H+ ions incident on silicon................. Velocity distribution of ejected atoms for H+ ions incident on silver.................. Velocity distribution of ejected atoms for H+ ions incident on sodium.................. Velocity distribution of ejected atoms for H+ ions incident on titanium................ Velocity distribution of ejected atoms for H+ ions incident on zinc.................... Sputtering yields for H1+ ions incident on Al 64. 65. 66. 67. 68. 69. 2 0 3 -'--&--'-& . . . . . . . -*-''''' . . . -. . . . . . . Sputtering yields for H+ ions incident on CaO....................................... Sputtering yields for H+ ions incident on FeO....................................... Sputtering yields for H+ ions incident on '. . .' .' . .' ' ''. . . Fe 20 3 . *---. . ' '' . . Sputtering yields for H+ ions incident on Fe 304 .. .. . . . . . . . . . . . . . . . . .*. . . . . . . . . . . . . -Sputtering yields for 11+ ions incident on MgO....................................... Sputtering yields for H+ ions incident on MnO........................................ ....... 155 ....... 156 ....... 157 158 ....... 159 ....... 160 161 ....... 162 ....... 163 ....... 164 ....... 165 ....... 166 ....... 167 ....... 168 ....... 169 ....... 170 ....... 171 . . '......172 ....... 173 174 . 175 . 176 . ......-- 177 178 . 70. 71. 72. ' 73. 74. 75. 76. 77. 78. 79. 80. 81. 82. 83. 84. 85. 86. II. Sputtering yields for H+ ions incident on TiO............................................. .. Variation of the sputtering yield with angle of incidence for H+ ions on Al 0 o.............. .... Variation of the sputtering yield with angle of incidence for H+ ions on CaO................. Variation of the sputtering yield with angle .of incidence.for H+ ions on FeO................. .... Variation of the sputtering yield with angle of incidence for 11+ ions on Fe 0................ Variation of the sputtering yield with angle of incidence for H+ ions on Fe 0............... .... Variation of the sputtering yield with angle of incidence for H+ ions on MgO.................. .... Variation of the sputtering yield with angle of incidence for H+ ions on MnO................. Variation of the sputtering yield with angle of incidence for H+ ions on TiO ................ . Velocity distribution of ejected molecules for H+ ions incident on A1 2 03------------------- Velocity distribution of ejected molecules for H+ ions incident on CaO.................... .... Velocity distribution of ejected molecules for H+ ions incident on FeO..................... ... Velocity distribution of ejected molecules for H+ ions incident on Fe 2 0 3 ----- . -------------- - --Velocity distribution of ejected molecules for H+ ions incident on Fe 30 4 . . . . . . . . . . . .. . . . . . . Velocity distribution of ejected molecules for H+ ions incident on MgO...................... Velocity distribution of ejected molecules for H+ ions incident on MnO...................... .... Velocity distribution of ejected molecules for H+ ions incident on TiO2 ---------------. ----- . 1 70 180 181 182 183 184 185 186 .187 -188 189 .190 191 . 192 .193 194 .195 TABLES 1. 2. 3. 4. 5. 6. Effective depth of origin of sputtered atoms....... Reduced nuclear stopping cross section sn(E) for Thomas-Fermi interaction....................... Calculated a,2 , E* and U. for various targets...... Averages over the range distribution............... Calculated <AX 2 >/<X> 2 and <Y 2>/<X> 2 for various targets.................................... Calculated E7, V , and E for aluminum .24 .25 .28 .31 .32 Ip p bombarded by H+ ions........................... ..... * 75 and E for calcium 7. Calculated ET' 8. bombarded by H+ ions................................75 Calculated ET Vp, and E for chromium 9. bombarded by H+ ions.................................76 Calculated ET VP , and E for copper 10. 11. 12. 13. 14. V, bombarded by H+ ions................................76 Calculated E , V , and E for gold TP P . . . . . 77 bombarded by H+ ions................. Calculated T, VP, and E for iron P p bombarded by H+ ions................................77 Calculated Y , Vp, and E for manganese bombarded by H+ ions................................78 Calculated E , V , and E for magnesium p p bombarded by H+ ions................................78 Calculated T V , and E for nickel 16. bombarded by H+ ions................................79 Calculated ET, Vp, and E for potassium V Vp p bombarded by H+ ions................................79 Calculated NT'Vp' and Ep for silicon 17. bombarded by H+ ions................................80 Calculated T V , and E for silver 18. bombarded by H+ ions................................80 Calculated ET V , and E for sodium 19. bombarded by H+ ions................................81 Calculated E , Vp, and E for titanium 20. bombarded by H+ ions................................81 Calculated E , V , and E for zinc 20a. bombarded by H+ ions.................................82 Calculated fT' Vp , and E for oxygen 15. 21. 22. 82 bombarded by H+ ions.......................... ........... Sputtering yield of oxides for H+ and H+ ions 83 at normal incidence........................... ....... at H+ ions for oxides of yield Sputtering 83 normal incidence.............................. &........ . 28. Tabulation of the moments <AX 2 >/<X> 2 and <Y 2 >/<X> 2 for oxides................................84 Molecular weight and binding energy of metal oxides........................................85 Calculated ET V , and E for Al203 TP p bombarded by H+ ions................................86 Calculated E , V , and E for CaO TP p . . . . . . 86 bombarded by H+ ions... Calculated E , V , and E for FeO p . . . . . . 87 bombarded by H+ ions............... Calculated ET' Vp, and E for Fe203 . .. .. 29. bombarded by HI+ ions............... ... Calculated ET' Vp, and E for Fe 3 04 bombarded by H+ ions............... Calculated ET' Vp, and E for MgO . . . . 30. bombarded by H+ ions............... Calculated ET' Vp, and E for MnO . . 31. 23. 24. 25. 26. . 27. 32. 33. 34. 35. 36. 37. 38. 39. 40. . .. . 87 . . 88 . . . . . 88 . . . . . . . 89 bombarded by H+ ions............... Calculated ET V , and E for TiO Tp p2 bombarded by H+ ions................................89 Average chemical composition of lunar surface regolith....................................90 Summary of lunar remanent magnetic field............91 The ratio of the solar-wind plasma pressure to total magnetic field pressure....................92 Estimate of the sputtering rates at the lunar surface.......................................93 Calculated F and F for aluminum T p .................. bombarded by H+ ions. 95 Calculated F and F for calcium T p . . -.- - 95 bombarded by H+ ions. Calculated FT and F for chromium T p . . . . . . 96 bombarded by H+ ions. Calculated FT and F for copper . bombarded by H+ ions.................... ............. 96 . . 13 42. Calculated FT and F for gold T pbombarded by H+ ions. Calculated FT and F for iron 43. bombarded by H+ ions. Calculated FT and F for magnesium 41. - -97 .............. . 46. bombarded by H+ ions. Calculated FT and Fp for manganese. bombarded by H+ ions.......................... Calculated F and FP for nickel T bombarded by H+ ions.................. .9.....-....99 Calculated FT and F for potassiu 47. bombarded by H+ ions.... Calculated FT and F for silicon . 48. bombarded by H+ ions.... Calculated FT and F for silver . 49. bombarded by H+ ions.... Calculated FT and F for sodium 50. bombarded by H+ ions.... Calculated FT and F for titanium 44. 45. 52. bombarded by H+ ions. Calculated F and F for zinc P T bombarded by H+ ions. Calculated FT and F for oxygen 53. bombarded by H+ ions............ Calculated FT and F for Al 203 51. 54. 55. 56. . - . -101 101 102 .- . bombarded by H+ ions. Calculated FT Tand F P for CaO ............. bombarded by H+ ions......... Calculated F and F for FeO P T bombarded by H+ ions. Calculated FT and F for Fe 2 0 3 bombarded by H+ ions............ .... -----.-- 102 .... 103 -- - -. 103 - . - - . - - - - -.- - 104 104 . 14 57. Calculated F T and Fp for Fe 304 bombarded by H+ ions. 0. Calculated FT and F for MgO ..... .58. , 59. 60. 61. 62. .... .... 0 - - .. bombarded by H+ ions. Calculated F and F for MnO p T bombarded by'H+ ions. Calculated FT and F for TiO2 105 . .106 bombarded by H+ ions.......................... Sputtering rates at Moon under solar-wind bombardment.................................... Comparison of AHs (M) and AHD (0) for some elements occuring in lunar soils.................. .....0 0109 . . INTRODUCTION For many years the apparent absence of metal coatings, produced by solar-wind sputtering, on the lunar surface has been the subject of controversy. According to Hapke et al. [1975], the lunar fines are enriched in metallic Fe relative to the lunar crystalline rocks. The rocks typically have on the order of 0.1% Fe, while the fines contain about 0.5% Fe, much of which is in the superparamagnetic size range (<l00A). Surfaces of many of the grains in the fines are coated with an amorphous layer about 0.1 pm thick and are enriched in Fe. ing evidence concerning the Fe. However, there is some conflictBoth the fraction of grains con- taining Fe and the degree of Fe enrichment are correlated with the albedo. The fines are deficient in oxygen relative to the crystal- line rocks, although the extent to which this is due to the excess Fe or due to a separate phenomenon is not clear. This suggests that the sputtering efficiency of the solar-wind protons is somehow decreased in the lunar enviroment. In this thesis, sputtering yields of metal/oxide targets by hydrogen ions are computed from modified theories of sputtering by Sigmund [1969] and Kelly [1973], respectively. The interaction of solar-wind plasma with localized surface magnetic fields and their effect on the sputtering efficiency of solar-wind protons near the lunar surface is discussed. The effects of sputtering on thccomposition of lunar surface materials are discussed, and the order of enrichment of metals in lunar surface materials is considered. I. BACKWARD SPUTTERING OF METALS.AND OXIDES BY HYDROGEN IONS In the energy range leV to 2keV, very little experimental data on the sputtering yield, S(atoms/ion), of metals and oxides by hydrogen ions is available. Grplund and Moore [1960] used electromagnetically analyzed ionic beams from a radiofrequency source to study the sputtering yield for hydrogen ions normally incident on Ag atoms at energies from 2 to 12keV. KenKnight and Wehner [1964) obtained sputtering yield data for hydrogen molecular ions normally incident on Be, Al, Ti, V, Fe, Co, Ni, Cu, Zr, Mo, Pd, Ag, Ta, W, Re, Ir, Pt, and Au at 7keV by drilling holes in thin target foils with magnetically separated hydrogen beams (H+ and Ht). Wehner et al. [1964a] obtained yield data for metals (Cu, Fe) at 1.85keV and Oxides (A12 0 3 , TiOl.,, FeO1 ,,, Fe2 03, SiO 2 ) at %7.OkeV with the mass separation method. The results for protons can be inferred from the data provided by KenKnight and Wehner [1964] and Wehner et al. [1964a] since the hydrogen atoms sputter independently. It will be the object of the following section to review a theoretical model for sputtering developed by Sigmund [1969]. We will show that although the theory applies only to ions with masses much greater than that of hygrogen, an approximation can be made that will alleviate this matter. A. Theory of Sputtering According to Sigmund [1969], the sputtering of a metal target by energetic ions or recoil atoms is assumed to result from cas- cades of atomic collisions. The s'puttering is calculated under the assumption of random slowing down in an infinite medium. An intergrodifferential equation for the yield is developed from the general Boltzmann transport equation given by Eq.(l) LGvx ,td sv d x G x ,f, V where v G(xVi0 ~ =magnitude vo N da Yt)d'v~dx of arbitrary velocity vector of an atom in a plane x=O at a time t=O, density of target atoms differential cross section [=da(;, 9', 9") =k(i, V', 9")d 3 v'd 3 V", Eaverage number of atoms moving at time t in layer (x, dx) with velocity (v., d 3 V 0 ), E velocity of atoms in a plane at time t, E velocity of scattered particle, E velocity of recoiling atom, va/v. The sputtering yield for backward sputtering of a metal target with a plane surface at x=O (see fig.1) is then (00 = d0vv (2 G (o,4 V,,t) where the integration over dsv. extends over all v. with negative x components large enough to overcome surface binding forces. Multiplying Eq.(l) by dt and integrating over the interval (O,w) we have V'~~ ~~~ tcc C -( F -x(,v 18 dx v Ion Target atom (@o,dsv0 ) x x=0 t=o Fig. 1. where F Geometry 1969]. of Sputtering calculation. [From Sigmund, Ct = , G x,0,) t=t E(xv 0 Iv., dcvx.E total number of atoms that penetrate the plane x with a velocity (v,d 3 V) during the development of the collision cascade G( ,Jt=o)- b(x)(-1. E one starting particle and G(x,W4,oo) 0 since all starting particles have slowed down below any finite velocity v0 . If we consider only backward sputtering and introduce the function H L,;) =dv with vlFx49 no = vOX/v < 0 = M 2 v2/2 > U(no) H 2 E mass of the metal target atom where U(n0 ) is the surface binding energy that, in general, depends on the direction of ejection, characterized by the direction cosine n o , Eq.(3) takes the following form Introducing the function = l-for OM() >O = 0 for C<O and satisfying the condition E. = M 2 v2/2 > U(no) and n. = vox/vo < 0, Eq.(4) can be rewritten as - b(x) OI-77) e(E-U()))- x N/d ( H~ysi -IyA') -N(x,9") (5 By introducing energy instead of velocity variables, we finally obtain 0() where E', T1', NU do HU,,2)-(xE,,'- xE,2') E" and a" are the energies and directional cosines with respect to the x-axis of the scattered and recoiling particle respectively. The sputter yield is given by S(EI) = H(x=0,E,9). Expanding H in terms of the Legendre polynomials 21 (7 (Pk(nj)) we have H( H(y,E,-) (23+1-) ,(x, E) P(-g (8 20 Multiplying Eq.(6) by P (I) and integrating over all possible fl(n . 0) we find that 6(x) QE ) [), - (x,E)l (2L+0) N [jH(x,%I) 1- d- -yP(co-." where (E) ) H(X, E') (9 Hjq (x, E"l)J (-7)d- G(E-(3)) 2 $' (cos P (10 ) E laboratory scattering angle of scattered atom $"Elaboratory scattering angle of recoiling atom. integrate over all pos- If we multiply Eq.(9) by xn(n=0,1,2,3,-..), sible x, and introduce the moment integral H,"(E) = 0u0 x" HI(x, E) dx (11 we have bao ( -4 ,AM (E) +I-(U+1) -P,(co with i*@o ') H-' E) 0 (E) - Pt(cm, -J (2+1) N~fI #4; C (Hj"( E) (12 CE")] 6t.x) x" dix If we separate elastic from inelastic (electronic) collisions using a method proposed by Li'ndhard et al. [1963], Eq.(12) becomes E. beQ,( E) -n j(2 + ,' (E 1) N -' L (21+ ) N S,(El (E) + (A + do- U , T ) [ H n (E )-P(..s H (E) (1 (13 g(E-T) 0 ' )"(T)'T) S E electronic stopping cross section, d (E,Tr E differential cross section for elastic scattering, (1-T/E) 1/2 + (1-M2/Ml) (T/E) (1-T/E)..../21 cos $' cos $"E (T/Tm)1/2, Tm [4MiM 2 /(MI + M 2 ) 2 ]EE maximum recoil energy, M Emass of ion. where For n=0 Eq.(13) yields d (E,T) . ,(E I - P. tcos 1)i(E -T ) Qt( E) =(21-r )N where it (0.<.m.1) is With assumed that Se(E)=O. (14 HT) do(ET): C.NE~~ T~'~ dT , the following expressions are given for the source terms in Eq. (10) Q.(E) Q,(E) L((I -,/ E) (15a 1 1[-t+ (U, /E)] (15b S(E) = [1 + 2U,/E - QUC) L - (u,/E-)3/Z + NO -= 3 (0./E)a], (15c 3 (15d where we have used the identity U(no) = U./rO. For E<UO, the source term takes on the following value Q0(E) and 0 = 0 andH H(E) '= 0. The following expressions for the leading terms of an asymptotic expansion, in powers of E, of the moment HO(E) is given below. i H' (E) 16a) * V cu,'- -2m 16c) I/M where B( ,i) + E 4 E m -V(-m) -8(1-4 -2/M M) + 38t-m, Z. Zmi + Z - ,cu,) eNc m Beta function = T( ) E Digamma function = d/d (lnF( )) For m=O Eqs.(16a-16d) take the following form (see Appendix I) H' (E) 4 ,E) 4 4-'(1) E (7 (17a E C6 U011 2 ( 7 (17c -(E ) , with where T'(E) C. X. a (T'(l) d/d(V(()), = ivXa 2/2 = 24 = 0.219A. = = 72/6 (18 The moment HO(E) is the leading term at all energies E>>Uo and it has the asymptotic form given by Eq.(17a). is the integral of H0 (x,E) over all x'. The moment HO(E) It determines the number of atoms penetrating a plane at an arbitrary position x with a certain minimum energy when there is a homogeneous isotropic source of recoiling atoms throughout an infinite medium. Since Hi(E) is proportional to E, for elastic scattering, E 23 so that Eq.(17a) takes the form in Eq.(17a) is replaced by v(E), V H (E) (C) (19 N C.U, 8'(0) where v(E)/E is the fraction of the energy that is not lost to ionization during the slowing down process. Using the expression /I. dx F(x, and Eqs. (8,11 and 18), E,-> = v(E) Eq. (19) can be rewritten as 4E 4-V2 ~ t4 cu, E.1) Li0 U' (20 where Ax = 3/4NCO is the expression for the effective depth of origin of sputtered atoms. The effective sputterind depth Ax is given for a few metals and metal oxides in Table 1. The sputtering yield of a metal target for normally incident ions is given by $(E) where S%(E) EIAi-m> C'~'" = A oL N SCE) E - Zr" (21 is the elastic stopping power of the ion, a is the factor that depends only on m and M 2 /Mj and A = (3/47r 2) (1/NCOUO). If the energy of the impinging ion, E, is less than some limiting energy 24 Metal AX(A) Oxide AX(A) Ag Au Ca Cr Cu Fe K Mg Mn Na Ni Si Ti Zn 15.4 3.9 2.1 26.7 5.8 4.8 5.3 48.1 23.9 5.7 42.7 4.7 17.9 9.1 5.8 Al203 CaO Cr 2 03 FeO Fe203 Fe304 MgO MnO TiO 2 10.4 12.4 8.0 7.2 7.9 8.0 11.6 7.7 9.8 Table 1. Effective depth of origin of sputtered atoms. E* = with I' , e 2 Z, 2_ a -. Ma X = 1.309 a = (22 a2 0.219A 0 = Bohr raius = 0.529A = 0.8853(Z 2 3 + Z /3)-1/2 a. a 2 E atomic number of ion E atomic number of metal target atom Z2 the elastic stopping power assumes the following form Sn(E) = CTm. (23 For E>E*, in the elastic collision region, Eq. (23) becomes S, where e = (E)= 4--n Z, 2 e a Ea M /(MI+M 2 )] S,,e (24 [M2E/(M 1 +M 2 )]/EZ 1 Z 2e 2 /a 12] and sn(E) is the universal function tabulated in Table 2. E 0.002 0.004 0.01 0.02 .0.04 0.1 0.2 Table 2. sn(E) E 0.120 0.154 0.211 0.261 0.311 0.372 0.403 0.4 1.0 2.0 4.0 10 20 40 sn(C) 0.405 0.356 0.291 0.214 0.128 0.0813 0.0493 Reduced nuclear stopping cross section sn(E) for Thomas-Fermi interaction. [From Sigmund, 1969]. Utilizing the expressions given by Eqs.(23 and 24), Eq.(21) can be written in its final form, S(E) = (3/4rz) eL T. /U.2 (25 26 S(E) - 04Zc) . 4-n Z, 2 e~za, U. [N\, /(M (25 2 Expression (25) holds only for M 1 > M 2 . ton sputtering Mi << M E> E' tMz)]sn(e) In the case of pro- This implies that expression (25) is in- valid unless the parameter a is improved by a method described in the next section. B. Sputtering Yields of Metals for Protons at Normal Incidence Before calculating the yield curves of metals, we have to make a decision concerning the parameter a shown in figure 2 and the surface binding condition. Figure 2 shows a as a function of c for protons and deuterons. The curves are rough estimates. In order to improve a, we scaled it to the sputtering yield value of Ag for normally incident H at 2keV provided by Grolund and Moore [1960]. We found that a better estimate of a is given by the following expression a' = a/2. For metals, the surface binding energy U. is equal to the measured sublimation energy. In Table 3, we have computed a 1 2 , E* and listed the sublimation energy (U0 ), the atomic number (Z2 ) and the mass (M2 ) of the following metals: Al, Ca, Cr, Cu, Au, Fe, Mg, Ni, K, Ag, Na, Ti and Zn. From Eq.(25) and the data provided by Fig.(2) , Tables 2 and 3, the yield curves were calculated for the metals listed in Table 3 (see Figures 3-34). 27 2.5 2.0- DEUTERONS ~ a 1.0 0.5- 0.1 Fig. 2. L. -0 Factor a in Eq.(25) for protons and deuterons [From Sigmund, 19691. incident on a heavy target. .28 (A) Metal al Al Ca Cr Cu Au Fe Mg Mn Ni K Ag Si Na Ti Zn 0.1833 0.1619 0.1535 0.1450 0.1063 0.1498 0.1875 0.1516 0.1465 0.1644 0.1251 0.1795 0.1921 0.1575. 0.1435 Table 3. 2 E* (eV) U0 (eV/atom)1 13.5 17.3 18.5 19.9 28.8 19.1 3.34 1.825 4.10 3.50 3.78 4.29 1.53 2.98 4.435 0.941 2.96 4.64 1.13 4.855 1.35 14.1 18.8 19.8 30.0 23.8 15.0 13.6 18.0 20.3 M2 (amu) 26 12 25 28 19 47 14 11 22 30 26.98154 40.08 51.996 63.546 196.9665 55.847 24.312 54.938 58.71 39.09 107.868 28.086 22.9898 47.9 65.38 Calculated a1 , E*, and U. for various targets. 2 1 From C. Kittel [19761 29 Grglund and Moore [1960] reports yield values for H+ ions incident on Ag targets (see Fig. 26). The predicted sputtering yields are slightly larger than Grolund and Moore's reported values by a factor of %l.3. The agreement with theory is surprising- ly good. KenKnight and Wehner [1964] reports yield data for light ions (H+,H ) incident on Al, Au, Fe, Ni, and Ti at 7keV, and on Cu at energies from 1 to 5keV. The results for protons were deduced from the data provided by KenKnight and Wehner [see Figs.(4, 10, 12, 14, 20, 26 and 30)]. The predicted sputtering yields differ from KenKnight and Wehner's reported values by a factor which ranges from 1.04 for Cu to 2.9 for Fe. Wehner [1964] reports yield values for H+ ions on Fe and Cu targets at 1.85keV [see figs.(10,14)]. The predicted sputtering yields in this case differ from the reported values by a factor of 2.1 for Cu and 3.9 for Fe. The agreement between theoretical and experimental values at low energies are not as good for Fe as it was in the case of Ag and Cu. This discrepancy can be explained as follows: 1) The assumption of random slowing down and of binary col- lisions may break down at low energies. There may be a small con- tribution from focused collision sequences. The quantitative ef- fect on the sputtering yield will depend on the target. 2) The uncertainty of the low-energy cross section, as defined 30 by da = CodT/T, a fects the numerical factor in front of Eq.(20), the value of C. (that may depend on the target), and the dependence on U0 . 3) The surface binding condition U(ro) = U0 /n affects the numerical factor in front of Eq.(20); the value of U. is not known from first principles but determines the magnitude of the yield. 4) The assumption of a plane surface may influence the magnitude of the yield. So long as surface roughness is on a scale that is small compared to the dimensions of the cascades, its effect on the sputtering yield will often average out. Surface roughness on a large scale, however, will tend to increase the yield. The quantitative effect depends on the geometry and can be estimated when the shape of the surface is known. 5) The assumption of an infinite medium may also affect the flux of low-energy recoils.[Sigmund, 1969] There is no way of estimating the uncertainty in the theoretical sputtering yield values from the above points, but from comparison of both theoretical and experimental data one has to expect an uncertainty of at least a factor of 2 and in some cases 3. C. Variation of Sputtering Yield with Angle of Incidence for Metals In Section I.B. we reported sputtering yield values for normally incident hydrogen ions. It appears most reasonable to con- sider the variation of the sputtering yield with the angle of in- cidence. According to Sigmund [1969], the dependence of the sputtering yield S(E,n) on the angle of incidence, fl, can be estimated by the following expression (.7a)+1- ,YI S where S(E,1) is <1 7-> (_r i) (F., -.1/2 EX 2-&x-> ](~26 - )t- -. ZX the yield for perpendicular incidence. The moments <X>, <AX 2 >, and <Y 2 > were. tabulated by Sigmund and Sanders [1967] and are given in Table 4. 11 2/M <X> 1/10 1/4 1/2 1 2 4 10 0.842 0.577 0.453 0.369 0.297 0.229 0.153 Table /NC1 4. <AX2> <X>L 0.058 0.125 0.195 0.275 0.409 0.170 1.684 <Y2>_ <XY 2 > <X>2 <X><Y4> 0.018 0.044 0.089 0.176 0.343 0.674 1.671 1.07 1.16 1.20 1.20 1.16 1.12 1.07 <AX 3 > <X> - 0.007 0.021 0.043 0.079 0.135 0.221 0.345 Averages over the range distribution. M / M 2 ' [From Sigmund and anders, dal=C E 1 2T 3 2 dT. 1967]. The values of <AX 2 >/<X> 2 and <Y 2 >/<X> 2 for M 2 /M1 > 10 were computed by fitting the best straight line of the form y=ax+b and a power curve of the form y=axb, respectively, to the data points given in Table 4 [see Table 5 and Appendix II]. Inserting the values of <AX 2 >/<X> 2 and <Y 2 >/<X> 2 into Eq.(26), we obtain the variation of yield with q [see Figs.(35-47)]. cording to Sigmund [1969], Ac- the sputtering yield goes through a 32 Metal <Ax2 26.8 Al Ca Cr Cu Au Fe Mg Mn Ni K Si Ag Na Ti Zn Table 39.8 51.6 63.0 195.4 55.4 24.1 54.5 58.2 38.8 27.9 107.0 22.8 47.5 64.9 5. 4.363 6.437 8.320 10.139 31.263 8.926 3.932 8.782 9.373 6.277 4.538 17.159 3.725 7.666 10.442 2 2 2 4.409 6.505 8.397 10.218 31.098 9.005 3.972 8.861 9.452 6.344 4.587 17.201 3.761 7.740 10.521 Calculated <Ax 2 >/<x> 2 'and <Y 2 >/<x> 2 for various targets. 33 maximum at very oblique incidence and approaches zero for 0=90*. This maximum cannot be explained on the basis of the assumption of an infinite medium. There will be a certain glancing angle at which the repulsive action of the surface atoms is strong enough to prevent the ions fr6m penetrating into the metal target, and this angle will be a function of the structure of the target's surface. Dupp and Scharmann 11966], Cheney and Pitkin [1965], and Colombie [1964] reported values of the ratio S(E,n)/S(E,1) for Ar+ ion incident on polycrystalline copper (see Fig. 2a). The agreement between theoretical prediction and experimental data is quite good for 0<700. D. Velocity Distribution of Sputtered Atoms In a later section we will be conserned with the fraction of To calculate atoms that escape the Moon by natural sputtering. this we need the velocity distribution of sputtered atoms. The average energy ET transferred to a target atom by a collision with an energetic ion is given by the following expression E = [2M, 2 /(M+N7) 2 ] E; where Ei is the energy of the impinging ion. (27 The number of atoms ejected from the target, having a velocity between v and v+dv, is given by the expression below .dV 27X N 3tN2 V .EP [ MY1 KIEflP L- E 1 2E,] dv (28 */ THEORY -PRESENT -1 81r of of MOLC MANOV (COS -*--* RL / t. 0 * DUPP of o./ 2 - O CHENEY 99at. * COLOMB 'E / ' Fig. 2a. / O Variation of the sputtering yield with angle of incidence for Ar+ ions incident on polycrystalline copper. Thick solid curve: Eq.(26): thin solid curve: 1/cos 0. [From Sigmund , 1969]. where f is known as the Maxwell-Boltzmann distribution function The most prob- and Eb is the surface binding energy of the target. able velocity, vp, of the recoil atoms can be obtained by finding the velocity at which the function f has a maximum value. It is given by the equation df/dv = 0. From Eq. (28) (29 we obtain 2n N n7_dv r I 2v rxp tv 3 -AI E-/ZE- 3 Ev22 exr(-3AA2 v2/4-r)3 0 Ex 2 - v2 _-3MZV2/4EJ 2i -- P2/ (3MZ/4 Ex(-3MzvZ/4%4'3 " -- ) Z-v EXP [-M~v1/4E.t3:0 '- Therefore V rA2(30 Z Er= M-Lv,2 /3 In Tables 6-20, vp, E and ET are tabulated for various targets. The velocity distribution, df/dv, of the recoil atoms ejected can be obtained by differentiating the Maxwell-Boltzmann distribution function f with respect to the velocity v. the following equation, It is given by - 36 df dv E I v / - 4E 2 / Substitution of the values for M2, EXr-3E /zP1 (31 LEx [-3Mzv/4~) Eb abd ET into Eq. (31) gives us the velocity distribution for various targets [see Figs.(48-62)]. Note that.the velocity.distribution of the sputtered atoms peak heavily at very small velocities (3-9km/sec) in comparison with the velocities of the incident protons [(l.4-4.4)x10 2 km/sec]. E. Sputtering Yields of Oxides for Protons at Normal Incidence The sputtering behavior of oxides is different from that of metals. According to Kelly and Lam [1973], the sputtering behavior of oxides is in some cases "normal" in the sense of following Sigmund's theory of collisional sputtering. In other cases the be- havior is "abnormal", in that the collisional sputtering is supplemented by thermal sputtering or by oxygen sputtering. The collisional sputtering yield of oxides cannot be explained by Sigmund's theory. Instead, two approximations were used: One is to use Eq.(25) with the mean atomic weight of the oxide substituted; while the other is to use Eq.(25) in a form which is weighted for the mole fractions of metal and oxygen, where + X = L(A/E)]/{(A/E) A E weighted percent B E molecular weight E E molecular weight (100-A)/B], of solute, of solvent, of solute. The sputtering yields are tabulated with the aid of Figs.(3-34). The results are shown in Figs.(63-70). Wehner [1964] reports yield values for light ions (H+,H+) incident on Al 2 0 3 ' TiO 2 , FeO, Fe 2 03 and Sio2 at 6-7keV [Table 21]. The results for protons were deduced from the data in Table 21 [see Table 22]. The predicted sputtering yields differ from Wehner's reported values by a factor of 2 except in the case of SiO 2 , which differs by a factor of 8.4. This discrepancy may be accounted for by oxygen sputterind and/or thermal sputtering. Wehner et al. [1963] studied the effects of H+ bombardment of Al 2 0 3, CuO, Cu 2 0, FeO, Fe 2 0 3 , and various rock powders at a temperature of 300*C. The results can be summarized as follows: 1) The surface of many materials, after sufficient bombardment, becomes covered with a brittle crust in which individual dust particles become cemented together by sputtered atoms. In Al 2 0 3 only very little or very fragile crusting is observed. The crust is thicker in more loosely packed places or materials. 2) The surface layer of many compounds becomes enriched with metal atoms. Black CuO is first converted into red Cu 2 0 before becoming covered with a very porous Cu layer. The red Fe 2 03 con- verts into Fe 3 0,, then to ferromagnetic FeO, and finally Fe metal traces appear on the surface. The reduction to a composition rich- er in metal and the formation of a "metal black" causes a darkening of the surface in most cases. In the process of breaking up mol- 38 ecules under bombardment and of sputtering atoms back and forth, oxygen atoms are more likely to escape from the surface than metal atoms. 3) As previously note for metal oxides, whenever a crust is formed it has a fibrous- structure with closely spaced needles and spires and deep small holes all aligned in the direction of the ion bombardment. The predominance of microscopically very steep walls is evidenced by the fact that the surface looks rather dark when viewed in isotropic light, but becomes shiny when illuminated and viewed from the same oblique angle. Another effect of sputtering the oxides with hydrogen ions is that water molecules can form by implantation of H+ and incipient formation of OH. The water molecules can be driven from the target by thermall y heating the oxide or bombarding it with ultraviolet radiation [R.L. Huguenin, personal communication]. F. Variation of Sputtering Yield with Angle of Incidence for Metal Oxides The procedure for estimating the dependence of the sputtering yield, S(E,), on the angle of incidence q in the case of oxides is quite similar to that used in the case of metals. Recalling Eq. (26) we have E,7r The necessary moments are tabulated in Table 23. ZX~ Using the infor- mation provided by Table 23 we obt'ained an estimate of the dependence of the sputtering yield on the angle of incidence [see Figs. (71-78)] and we note thatfor heavier oxides (Fe3 0 4) the difference between S(E,q) for normal incidence and grazing incidence is small in comparison with the lighter oxides (MgO,CaO). G. Velocity Distribution of Sputtered Molecules In a later section we will be concerned with the order of enrichment of oxides in the lunar material. In order to calculate the fraction of oxides which remain in the surface, we need to calculate the escape velocity of oxides which are representative of the lunar surface. Utilizing the information provided by Table 24 and Eqs.(27 and 30) we are able to compute v., Ep as well as ET for metal oxides (see Tables 25-32). Substitution of the values for M 2, Eb and ET into Eq.(31) yields the velocity distributions Isee Figs. (79-86)]. Note that at E =lkeV the velocity distribution of the sputtered molecules peaks heavily at v=(1-2km/sec) for the heavier oxides and at v=(3-4km/sec) for the lighter ones. Statistically more light than heavy molecules should be given sufficient energy to escape the solid during sputtering, therefore MgO would be sputtered in preference to Fe 3 0 . The collisional sputtering model indicates that the major oxides should be enriched in proportion to their molecular weights and predicts the following order of enrichment: Fe 3 0 4 >Fe 2o 3 >Al 2 0 3 >TiO 2 >FeO>MnO>CaO>MgO. As we 40 will discuss in a later section, the actual order of enrichment observed is Al 2 0 3 >FeO>CaO>MgO>TiO2 for Lunar Maria and Al 20 3 >CaO> MgO>FeO>TiO 2 for Lunar Highlands [Taylor, 1975] (see Table 33). There is no explanation, at the writing of this thesis, for the discrepancy in the ordering of TiO 2 ' II. SPUTTERING EFFECTS ON THE LUNAR SURFACE The lunar surface is continually bombarded by intense solar radiation. The surface is unprotected by an atmosphere or strong magnetic field; thus solar illumination is unattenuated at all wavelengths and high energy protons and other ions are allowed to reach the surface. Laboratory studies of the interaction of the solar wind with the surface indicate that the optical properties and composition of the soil should have been greatly modified. One of the predicted modifications is that the soil particles should be coated with metallic Fe, produced by solar-wind sputtering. When lunar samples were returned to the earth, metal coatings were not found. The apparent absence of metal coatings indicates that the solar wind does not modify the soils to the predicted extent. In Section B, I will show that the solar-wind protons are reduced in energy by interaction with surface magnetic fields; thus their sputtering efficiency is greatly reduced. If this is true, then the observed low abundances of metal surface coatings can be at least in part explained. A. Lunar Magnetic Field The magnetic fields associated with the electrical currents produced by electromagnetic excitation of the Moon were measured at the Apollo landing sites. Steady remanent magnetic fields were measured on the lunar surface at the Apollo 12, 14, 15 and 16 landing sites by a surface magnetometer. Table 34 gives the mag- nitudes of the remanent fields at these sites. Lin et al. [1976] were able to measure lunar surface magnetic fields down to a spatial scale of 7km by the electron reflection method. %5*S The area'observed extends from 150 E to 500 E longitude at latitude. The field strengths.range up to bl0 2y, averaged over the resolution element (see Table 34). B. Reduction of the Mean Kinetic Energy of Solar-Wind Protons at the Lunar Surface by Magnetic Field Interaction According to Scott [1976], the streaming solar-wind plasma has a magnetic field associated with it, which exerts a magnetic 'pressure' on the remanent magnetic fields associated with the lunar surface. This pressure acts to compress the surface field. If the local surface field is strong enough, it can stop the wind before it reaches the surface, i.e. a bow shock is formed. A weaker field would not stop the wind, but would reduce its incident energy at the surface. In order to determine to what extent the protons are slowed by the magnetic field compression, it is necessary to determine the strengths of the local remanent fields. Steady remanent fields have been measured at nine surface sites during the Apollo 12, 14, 15 and 16 missions and also in the region located at %50S latitude, 15 0 E-50 0 E longitude. The ratio of the plasma pressure to the total magnetic pressure is expressed as n mv 2 /(Bt2 /8r) (33 st p p s AB is the total surface compressed field, = where Bst =B S+ B S H steady remanent field, and B E B A- (B E+BS), BA = total surface field, BE E extralunar field measured by Explorer 35, vs E solar wind velocity (4.376x102 km/sec), = proton density, p . m E proton mass. n The values for <l implies that the steady remanent field is compressed to the stagnation magnitude required to stand off the solar wind. >l implies that the steady remanent field is not com- pressed to the stagnation magnitude required to stand off the solarwind plasma (see Table 35). The compressed remanent field reduces the mean energy and. velocity of the protons at one site by as much as 459eV and l.1x10 2 km/sec, respectively. Such reduction i' incident proton energies would substantially reduce the sputterin,<efficiency of the protons. In order to arrive at a reliable estimate of the sputtering rates on the lunar surface, the flux, incident energy of the proton and the sputtering yields of lunar soils have to be known. Assuming a flux of 4x10 8 protons/cm 2 sec [Formisano and Moreno, 1971] and using the data in Table 35 and Figs.(3-34 and 63-70), an estimate of the sputtering rates on the lunar surface is obtained (see Table 36). C. Fraction of Sputtered Atoms that Escape from the Moon In order to obtain' an estimate of the amount of material lost from the Moon (metal coatings, oxides), we have to compute the 44 fraction of sputtered atoms/molecules with velocities greater than the lunar escape velocity (ve=2.4km/sec). The fraction of sputtered atoms with velocities greater than the lunar escape velocity can be determined by integrating fdv from It is given by the equation v=ve to v=+m. F Zn M EXFv Mv/4E E-6/2V, 3 ] dv x (34 This gives F-f V v- t,2 -v Fr E 3/zz ./2 S/.P3,) -X r [-) M v v./45, -A e IL-3/2.]d 4Ex e xt [-3 Ej,/zE,3 dV f 2 v (I- , [-IM-zv3/41. 3z dv) (35 The change of variable v = [(C+l)/ 2 ]ve converts Eq.(35) to FT E xP C- Eb/2fT1 ( I- (2 3 -,)-m )-n Eq.(36) may be approximated by the following expression FT E P with and ( /-23-1 (E3a 2 Ak ,,~ (36 y = 3 M 2 /ET Xk E Gaussian arguments Ak E Gaussian weights 1( [ [-Y((N- -)v) 2 /4] Because velocities of the sputtered atoms depend on their masses as well as the surface binding energy of the target being 45 bombarded, larger fractions of the- lighter species will escape the lunar surface. According to Cassidy and Hapke [1975], the probable fraction of sputtered atoms lost, Fp is assumed to be 0.5FT since it is'assumed that half of the atoms will have a velocity component in the downward directi.on (see Tables 37-52). D. Fraction of Sputtered Molecules that Escape from the Moon The fraction of sputtered molecules with velocities greater than the lunar escape velocity were calculated (see Tables 53-60). Comparison of the fraction FT for metal oxides and their corresponding metals indicates that FT is a strong function of Eb as well as M2. This suggests that there would be some preferential retention of heavy oxides with high binding energies. The pre- dicted order of enrichment using surface binding energies as well as molecular weights is: Fe20 3>Fe304>Al2 0 3>FeO>MnO>TiO 2 >CaO>MgO. This order tends to be in better agreement with the order observed. III. PREFERENTIAL SPUTTERING: OF ENRICHMENT OF METALS METHOD FOR PREDICTING THE ORDER The escape rate (amount of material lost by the Moon) may be estimated by multiplying the sputtering yield of metals/oxides by the probable fraction lost, Fp (see Table 61). The order of enrichment of metals in the lunar surface material, however, can be best explained by a thermodynamic model proposed by Pillinger et al. [1976]. According to Pillinger et al. [1976], the transfer of momen- tum concept is a good initial working hypothesis for the prediction of the order of enrichment, but because it does not take into consideration the nature of the bonding between atoms, it cannot completely explain preferential sputtering either for lunar materials or two element compounds. They found that preferential sputtering will occur to give a metal when: AH s(M) [sublimation energy of the metal] > AHD(O)/y (the heat of dissociation/oxygen atom) or when AH (M)/[AHD(0)/y] > 1. The values of AH (M), AHD(0)/y and AH5 (M)/[ HD(0)/y] are given in Table 62. The thermodynamic model explains much more satisfactorily the data obtained from the lunar samples. Of the major elements onlp' iron would be converted to metal; titanium by virtue of its conversion to lower oxides, e.g. Ti 2 03' would also be enriched relative to oxygen. The calculated preferential sputtering factors gives the order of enrichment: Fe>Ti>Si>Al>Ca>Mg which agrees with the order of enrichment observed during surface analysis by ESCA {Housley and Grant, 1975] and our predicted order of enrichment 47 (see Table 61). 48 IV. SUMMARY The model for backward sputtering of metals/oxides as pro- posed by Sigmund [1969] and Kelly [1973], respectively, has been reviewed. Sigmund's theory is valid only for M,>M 2 . In order to apply Sigmund's theory to proton sputtering (M<<M2), we have therefore had to consider an approximation. The quantity a, which depends only on M 2 /M1 , was improved by substituting experimental S values into the analytical S deduced by Sigmund [1969]. The predicted sputtering yields of metals/oxides, in comparison with the experimental yield values, turns out to differ by at least a factor of 3 or better. For example, the predicted values for Cu and Fe at 1.85keV are 0.014 and 0.035, repsectively, and the experimental values are 0.03 and 0.009, respectively. The sputtering yields of metals/oxides, obtained from modified theories of sputtering by Sigmund and Kelly, are used in conjunction with the solar wind plasma- lunar surface magnetic field interaction model to estimate the sputtering rates at the lunar surface. The interaction of the lunar surface magnetic fields with the solar-wind protons has been reviewed. According to the mag- netic compression model, the streaming solar-wind plasma has a magnetic field associated 'with it, which exerts a magnetic 'pressure' on the remanent magnetic fields associated with the lunar surface. This pressure compresses the surface field. If the lo- cal surface field is strong enough, it can stop the wind before 49 it reaches the surface, i.e. a bow shock is formed. A weaker field would not stop the solar wind, but would reduce its incident energy at the surface. The solar-wind protons are predicted to be completely stoodoff at the Apollo 16 landing site, and their mean kinetic energies reduced at other sites. At the Apollo 12 landing site, for exam- ple, the protons lose about 30-80% of their nominal (lkeV) incident energies [Scott, 1976]. The loss in proton energy by interaction with compressed magnetic fields can have a substantial effect on the sputtering efficiency of the solar wind. When high energy solar-wind ions impact lunar soil, the kinetic energy is converted to thermal energy. Since the protons are small (%10- 9 cm.) in comparison to grains in the lunar soil, the thermal energy is confined to a region of atomic dimensions, and dissociation (sputtering) occurs. The number of atoms dissociated per incident ion (sputtering yield) is simply dependent on the ion energy. Sputtering rates fall off precipitously with reductions in incident ion energies. From the data of Wehner [1963] and others it appears that a minimum ion energy of near 20-50eV is required for sputtering to occur. The loss of 30-80% in the ion energy at the Apollo 12 landing site should reduce substantially the sputtering efficiency. Sputtering efficiencies at other regions of the Moon will similarly be low; thus the unexpected low abundances of metal surface coatings predicted to have been produced by sput- 50 tering can now be possibly explained. Laboratory work is needed to determine the dependence of sputtering yield on incident ion energies for lunar-like soils, in order to test the proposed interaction model. APPENDIX I Solutions of the Integral Equation- Governing the Sputtering Yield of Polycrystalline Targets In Section I.A. we analyzed the integral equation that determines the number of atoms that have sufficient energy to overcome the surface binding forces of the target. The solutions given were asymptotically exact in the limit of high ion energy. In this section the above integral equation will be analyzed with the aid of a method proposed by Robinson [1963;1968]. The average number of atoms moving in a layer (x,dx) at time t with velocity (',dsv3) is represented by the function G(x,to 1 ,t)d 3 vodx (I.1 The number of atoms with velocity (*O,dsv3) penetrating the layer x in a time interval dt is given by G (x,.V, t) CO v. IVI it (1.2 v0 y = the x-component of vo. where The sputtering yield for backward sputtering of a solid with a plane surface at x=O is given by sJ d'v. v. j d CG oG,,, (1.3 where the integration over d vo extends over all v. with negative x-components large enough to overcome surface binding forces. In an isotropic and homogeneous target, the function 52 will satisfy the Boltzmann's equation G(x, *ov,t) 0 -{ G(x, - v., N G(x/ v.t4 7) da [ G (f,,. (I.4 After Consider a particle initially at x=O moving at t=O. The proba- a time t=6t, it may or may not have made a collision. bility of making or not making a collision is given by - .,0, G votdG V ',t) + G , (I. - N E~t + [ ( 5 where the first term on the right-hand side of Eq.(I.5) expresses the probability of making a collision and the second term is the probability for not making a collision. Let v, G(bt) = G (x -7)v$t -6t) V, and x-vSt ,=t %= Therfore a and since 'bCi ) d G( s . G G(bt) bc - [dy/Idb43 = -- )v G '(Sht) -'r dQ d d bt bG d v IV /dt1- L d-/Cdtl , v b d 2G dbt -a c=, /d ( t] _bG Ga (1.7 The Taylor series expansion for G(6t) is G ) G (o) +j ()b + G(") 2! (bU 2 4- __t_ ct ItP = - 6 or G~--vs,9,7 =G(x,5 4st , )t ( v ) be + - + (1.8 Substituting Eq. (I.8) into Eq. (I.5) we have G -, ) (x , _&efd = x, ,-, ) _.(,. )t -& (1.9 b +-( I sv Jt) - t do) [ Ck $t x j [GLx,,,t )-(v [ (, -) t+ 3 zit x + GLx (I.10 zt 2)x fda GLx/,V6 4,t) + wvbt2 NV ilt de (.y b3x- E.) + -4 Neglecting the last term on the right-hand side of Eq. (I.10) we obtain (v S. 'ax +,5 = Wv )t t - d- t [G(x,",N,0zt + G(x- ,,v", t 3 f/ dera G(x,va, v,t) vt and te Now we inrc t c t ) - G ( -, 4-,,-",. t ) 3 (i. 11 G( x' Now we introduce the function F where F( x,VD, X,v.7 V) I vo I d V, Gcx,749 dv t (I [2 is the total number of atoms that pen- etrate the plane x with a velocity (vo,,dsv.). F(x,-*ov) satisfies 54 by integration over t. an equation that follows from Eq. (.4) Rewriting Eq. (I.4) - G(xVVt 1 V b4. vt)- jzX,V NJ4 cvovt -& iultiplying through by dt and integrating we have t/G[ ) a- 4, 0 ta 6x, -G x.' - t) Utilizing expression (1.12), - x P - IVTh = WNf<1C.h V (-A t-0) -- ) (1.13 t) it] -fGx t0 Eq. (I.13) assumes the form CO GOA 'tVO IVit) G, d Fxv,) = p- , V \,AI) - (1.14 ,A Nfda I -F (x, rF(4') .Flx, ). - . jO (1.15 where we have made the assumption that (1.16 represents one starting particle, and G since at t= Lx, C, oa ) -\, = 0 (1.17 all atoms have slowed down below any finite velocity t 55 yoConsidering only backward sputtering and introducing the function (1.18 H (xv1-=d'v,Iv0 j 1~(xC,7) where T19 = Vo /V _ 0, (1.19 = M2 v2/2 >_ U(no) E = mass of target atom, surface binding energy. E U(no) M2 H(xi) represents the sputtering yield of a target atom for the case that the source is at x=0 and the sputtered surface in the plane x. .L Recalling Eq. (I.15) b~)(-v" =L<d E(x;,) -7)~ ;x7,) [ - F~x,A4,9' (1.20 and multiplying it by 1vOXI, integrating over to we have S b( C - v.x dAv . - - . ( x ,U ' $ ) d . *I X * (v-v) d'v. N IV~I b ) J'v - ) -' de d'v. 1 (1.21 N-x (1.22 3v, -- - [tv., I{(F~ x v,C = Nfd- - F(x,4,v') EN(x,v) - Fxva,') -il x,- Ix - I-I ('~(4$"'~) I (1I. 23 Introducing the function 9(U) = 1 for (>O = 0 for C<0 and satisfying the condition given by expression (1.19), Eq.(I.23) can be rewritten as (1.24 In a random medium H(x,9 ) is a function of x, v, and 1, the directional cosine, but not on the azimuth of v with respect to the x-axis. Introduction of energy, E, instead of velocity vari- ables, we have - &x;)y (-)G E- (7))) E9 (1.25 N do- where E', I', E" and ( Yx,E,1)) H('x/E',3' - HxE",,)so)] " are the energies and directional cosines with respect to the x-axis of the scattered and recoiling particle, respectively. The sputter yield is given by S(E,'I) = H(x=O,E,j). (1.26 Expanding II interms of Legendre polynomials we have 57 2o HA(xIE) Pt( ) (2.-i+l) H ( x,/*El ) -= E (1.27 where Pk (q) are Legendre polynomials. Eq.(I.25) is multiplied by P (1) and integrate over a with the condition rjs.0. I I 0 (E - L)( )) F J- b6tx) (-9) O( E -u-r) N dJcr[j -Ui )- Pg {21 (T - )Q N = - J- -211:g,E') P) (x,E Pft')Ld H.(E" Pfl)Plt/'ijdbw ) E) HCx, (2 e') (1.29 ] Using the folowing relation between the P (ri) ' s (72-+0 ) P'L(9)) = (AL+0 P.,(g +P.,y) (1.30 the following equation is obtained. - 5(x) + = N 0(- ) G ( E - IH_, 2A+ I dcr [(2-I) - .. JulI (( ) u()) P)) d') (x, Ell Pj )) Pkvy)) d AtIH (x,E) = (1.31 I c.x, E I P ri)P Hjx, HL -A, E") P.4ly ) PgLg;0)'A') E' ) P ' I-y Using the following relations PL )(-) 2 (1.32 ~IfrI (1.32 the above equation becomes ) - ( -k)-rG (-1)) 0 t E-0UL0 )?A )H rNJd d (21T1( ye C21+ -(Il H ~ V~p - H(.~cV) (ZAI) -Sty- -) ( do- i - x,'PL-O)) (,(+ ) I Z(L' (A, IHL.. M E')P>t(')( - H (-x, E") (1.33 b~d d (-?)G(E-0(7))Pt))dr) N 9.H..I ()t, S)I , E)+t9 A L-..,(xE) IPL( I ) d-) (1.34 Pi->) c) ] Using the relation J j1=0 e 8 (1.35 9=,3, 5,. Eq. (I,34) has the final form bux) QJ(E) - AH,_, ()L,E) + (1+\) Hj., - (21+0) NI d4- CMk.(x, Ix;, EFl E)- P (cob 0') HL(AE') - P(cOc where Qj(E) 2z (-)d? GUE -U(7)) ) PS(t0)) (1.37 (1.36 0") 59 and laboratory scattering angle of scattered atom, E laboratory scattering angle of recoiling atom. Introducing the moment ,o kp~,~) ck H (E) (1.38 multiplying Eq. (I.36) by xn and integrating we have Q((E) 00@ (n QEJ) L x * d - 26x) x /0e[ (x, n ~0d.i x" 4 00 g(o x Ec)dx-- i Pe CoA) ,E" x (,) d - n "M.(,E)d ' 'H I(;K,E x* C0 (1C+* xH x. g(,e)d x & (0 E) i( Y,"~~ IXl Ot,E) '.(coso,) dx- (1.40 /0o With 5(.x) X" d-x=ba we have - {.J. 6,4Q,() (E + 9-+) H"2 EI = (7.M+ N de L. H" (E) - (1.41 - H (E') PI.(coso') - H;(E") Pczosp")] The terms which include the elastic and inelastic (electronic) collisions can be separated by using the method given by Lindhard et al. [1963]. Sn', This yields QJ(E) - n [l H2 (E)+ (3.+I) I (E)] =(2JL+) ,_(E) d +(21+' N g"E dE C (1.42) dur (ET) H(E) - (E-T'1 P((os') - HICT) Pf(cm #")l Tao where S (E) is the electronic stopping cross section, da(E,T) is the differential cross section for elastic scattering, T is the recoil energy, and cos $' = (l-T/t) 1/2 + [(1-M 2 /M ) (T/E)(l-T/E) cos $" = (T/Tm) 1/2 Tm = YE (1.43 2 Y = 4M 1M 2 /(M+M 2 ) M E mass of incident ion 1/2]/2 For n=O Eq.(I.41) becomes Q (E) d<r(E,T)[I*(E)- = (2R_+ 1) N P,(c*')HCE-T) - P(c*>#") HO CT)) (1.44 An especially useful approximation of da (Thomas-Fermi cross section) is the power approximation, where do = CE-mT-l-m dT and m is a number between 0 and 1. Eq. (I.44) becomes Q(E) - (2 L+1) I CE / 7dT E Hmt) C - P ((t- r/E))7 +- (1.45 x H',.(E-r) - P,((T/Tv,)") for M =M2 we have H(T)) 61 Q,(E) d z= (21+0)NCE' [ T/T'''' ( E t >IL) -T/s - -P t4* (r -T)- H*(T)] ((rT/E)') where we assumed Se (E)=. Now we proceed to solve the integral given by Eq.(I.44). We use the procedure which has been described by Robinson [1965;1968]. Rewriting Eq. (1.44) we have Q IE~ (21t ~ crz(j di.T~ - PH~iT/I") -- r- - F ((-TI E-02) A0CT I Let's consider the case for Z=O. The above equation takes the fol- lowing form Q,(.E:- odvtE T) [ R' tE)-- VA (E-'- m' T where we have made use of the relation PO(e) = 1. With the Thomas-Fermis cross section approximated by the power approximation da (ET)= CNE-mT--mdT (1.46 we have E Q(E~Ct% 0 HO(E) jdT E-:-I) (1..47 the integral of H0 (x,E) over all x; i.e. determines the number of atoms penetrating a plane at an arbitrary position x with a certain minimum energy, when there is a homogeneous isotropic source of recoiling atoms throughout an infinite medium. = 0 for E>UO 1 for U 0 <E<2U0 HO(E) (1.48 With m fixed Robinson calcu- U0 being the surface binding energy. lated the asymptotic solution H* (E) ~(. with 3 -i. 2w. for U>>2UO (1.49 (r)=2 (Z" -1)1* where C=l at m=-l (hard-sphere scattering), E=(12/7r2 )ln2=0.84 at m=0 and (=0 at m=l. If m in Eq.(I.49) is a function of E [m=m(E)], H.(E) is nonlinear over most of the energy range. the function For fixed m we have 6E T. j U. E I CE' l dE E'' CE C )T~~ i .CE'(' t lT ,...i(f~) i-rE __ - T dT 8 ~(~rvh) - art, where I UO E ~ E u. (1.50 -r j is the elastic stopping power. increases with m. From Eq.(I.50) we see that 6E/E In the keV region and below where m<0.5, 6E/E vill always be <<1 for E>>U.. ((m) This shows that m in the expression cannot be determined by Eq.(I.50). Therefore we replace Ea. (1.50) by m = m(2UO). If m[m(2U 0 )] is = (1.51 inserted into Eq.(I.49), HO(E) becomes It is possible to obtain Eq.(I.49) if the power linear for EI>>2U0 . m in the cross section, Eq.(I.50) is allowed to vary from step to step. First we consider one single step m(E) = mo for 2U 0 <E<U 1 m where m >mO and E>>2U0 . l (1.52 E>U 1 For E<E 1 we can utilize the exact solution given by Robinson [1965;1968]. .~ for For m=mo fa.,-inZ. NC( 2n' (c20, \./ :(sd (I5 (1.53 where CSt k~s ,m r a - -t (1.54 Z 1.-(.,-rt and a is some arbitrary real number > 1. (1.55 B(s,l-m) and Bl/2(s,1-m) are the Beta and incomplete-Beta functions, respectively. The integrand in Eq. (I.53) has singularities at roots si of the equa- 64 -2<s tion F(s.,m)=0 and so=l, -l<s <0 '1etc. 2 With F(s. ,n0 ) = 0 we have r r-(5) (- m) r (s - - I mn, /r (-m,> r (s -n. (1.57 Using Sterling's formula we have F (Z) ~ e-z z h r - I Li (zu1''l + 1al + 2 639 1 eSIa r-Ws)-M ~ e- (2rt I e F ( i-rr() e I" - I SI-S ($-r .. s (sS- f +I 't-m) 2(5rn)I ( I +t - i; 3 + I - 518 40 %-m ( ,,qr [I,-, 127S-tI- II I 120-M) (S- rm) [I m) - i-S -+ lZ(5-r"~ +1 (i -ni (2n), I Z 5le8900-r'* 28s (I-nr)f t Ift - T") O-M) (q0z S-5 $59 +1 - I/ (.'-mI (s-r) 1 Zs4sB3ZO (I-r") - 112 (2:r r 51z1 5(8OZ3 (s-rn) I 2 2I-M) I [ t + IZ(S-M> (1.58 ( - ")- C'- -.>0 65 For s 0 =1 we have from Eq.(I.58) that e -1 4-] (2s)"t[1 The poles of the function is one root of Eq.(I.57). so that s= k(s,mo) in Eq.(I.53) are cancelled by the poles of the denominator so that the integrand is regular outside the real axis. The path of integration C, (Fig.A.1) can be transformed to C 2 that encloses the real axis for s<l in the positive direction. residue C2 C, Fig. A.l theorem ($ fozidz = 2 i H, (E) where REs f(a) we have A-, (E/2u)C(/Nc) (1.59 Utilizing the 66 H,(\ 1= 00 A 5; "'I, -V(S; -m.) V(x> ; -- .W E 4 2u.) NC - (1.60 -x o (1.61 - "(SO For i=0, s=l Eq. (I.60) takes the folowing form (, (i--m.) [8iI, (±2' + k u-rn.) l -m.>o - -6('j -m. 0)] 5 E i \20.) Nc (I) 'f~ t*I -n~) W CI - H-2" ( t-en.)- M ) I -2'" 2 \0INc r-( r 0 [w (-n.) -en. 1 -+(0 I i/- 2 4/z - 2' M 4ru -en, -Y~) For m=O, i.e. E<E1, II (E 20. sc we obtain (using L'Hopital's Rule) In2 H'* (E) 2'4-( ) Now we wish to calculate T'(1). [ -4--t( )ci t -_ I E NCU. (1.62 We have = t -A ['4q,1)3j dt S=O I_ 67 0o kni£ Eq.(I.62) takes the form He' 31n2/T/z [E/Ncau,] (1.63 Eq.(I.63) differs from Eq.(17a) by a factor of 1/41n2. The difference occurs because in our analysis of the integral equation using Robinson's method, we solved the equation for E>2U 0 . otherhand Sigmund solved the equation for E>U 0 . On the APPENDIX II CURVE FITTING .A. Linear Least Square Fit In Section I.C., the values of <AX 2 >/<X> 2 and <Y 2 >/<X> 2 were computed by the method of least squares for M 2 / 1 1>l0, since Sigmund and Sanders [1967] only computed values for 0.l<M 2 /M <10. In this section we will explain the technique of linear regression by the method of least squares. First we will illustrate the simplest kind of least squares fit, that which is often called a simple linear regression. We will fit a straight line y = ao + a x to the data points in Table 4. as a function of M 2 /M . (II.1 The moment <AX 2 >/<X> 2 is plotted The least sauares coefficients are de- termined from the set of N data points (x ,y.) manner. in the following The function to be minimized is: I(kxv) y~ -Y;3 2(11.2 21.Ea.+ L a, x -. (11.3 Differentiating, we obtain the two normal equations or 2 (a.+a, x - yi) =0 2 (a.+ a, x; x; =o (II.4 (11.5 69 ±o I a( de + a 2: 2:X; (11.6 y (11.7 Using Cramer's rule IT: XY Z iJ dl = (11.8 N 02 Finally, we obtain the expressions for the least squares coefficiand v.: ents in terms of sums of the x. LI 1 a4 X.. -~ ... a, x zx x. N where Y = (11.9 (II.10 M 2 /M. y = <AX 2 >/<X> 2 . The quality of the least squares fit to the data points provided is given by the expression r2 1 NLN ~~NZ~ ~Z[~(jZ (11. 11 70 The value of r 2 will lie between 0~and 1. The closer r2 is to 1, the better the fit. Least-squaring the data provided by Table 4 we find that a o =O.15955, a1=0.08686 and r 2 =0.99800. II. Power Curve Fi-t We wil fit a power curve y = aoxai to the data points in Table 4. a function of M 2 /M1 . (ao>0) (11.12 The moment <Y 2 >/<X> 2 is plotted as By writing Eq. (II.12) as lny = allnx + lnao (11.13 the problem can be solved as a linear regression problem. Using the same procedure of Section I we find that (11.14 a, C3, where EP -t4(2 n a :IA)(II.15 x = M 2 /Ml y = <Y2>/<X>2 and r = (II.16 71 Fitting a power curve to the data boints provided by Table 4 find that ao=0.17381, a =0.98330 and r 2 =0.99997. Applications Programs, 1975]. [Hewlett-Packard HP-25 72 REFERENCES 1. Cassidy, W., and B. Hapke, Effects of darkening on surfaces of airless bodies, Science, 172, 716-718, 1971. 2. Cheney, K.B., and E.T. Pitkin, J. Appl. Phys., 3. Colombie', N., Thesis, University of Toulouse, 1964 lished). 4. Dyal, P., C.W. Parkin, and W.D. Daily, Surface magnetometer experiments: Internal properties and lunar field interactions with the solar plasma, Proc.Lunar Sci. Conf. 3rd., 2287-2307, 1972. 5. Dupp, G. and A. Scharmann, Z. Physik, 194, 448, 1966. 6. Formisano, V., 365, 1971. 7. GrOlund, F., and W.J. Moore, Sputtering of silver by light ions with energies from 2 to 12keV, The Journal of Chemical Physics, 32, 1540-1545, 1960. 8. Hapke, B., W. Cassidy and E. Wells, Effects of vapor-phase deposition processes on the optical, chemical, and magnetic properties of the lunar regolith, The Moon, 13, 339-353, 1975. 9. Housley, R.M. and R.M. Grant, ESCA studies of lunar surface chemistry, Proc. Sixth Lunar Sci. Conf., 3269-3275, 1975. 10. Kelly, R. and N.Q. Lam, The sputtering of oxides part I: A survey of the experimental results, Radiation Effects, 19, 39-47, 1973. 11. KenKnight, C.E. and G.K. Wehner, Sputtering of metals by hydrogen ions, Journal of Applied Physics, 35, 322-326, 1964. 12. Kittel, C., Introduction to Solid State Physics, John Wiley & Sons, Inc., New York, 1976, p.78. 13. Lin, R.P., K.A. Anderson, R.E. McGuire, and J.E. McCoy, Fine scale lunar surface magnetic fields detected by the electron reflection method, Lunar Science VII: Revised Abstracts of Papers Presented at the Seventh Lunar Science Conference, 492494, 1976. 14. Lindhard, J., V. Nielsen, M. Scharff, and P.V. Thomsen, Integral equations governing radiation effects (Notes on atomic collisions, II), Matematisk-fysiske Meddelelser udgivet af Det Kongelige Danske Videnskabernes Selskab, Bind 33, 1-42, 1963. 36, 3542, 1965. (unpub- and G. Moreno, Rivista del Nuovo Cimento, 1, 73 15. Lindhard, J., M. Scharff and H.E. Schiott, Range consepts and heavy ion ranges (Notes on atomic collisions, II), Matematiskfysiske Meddelelser udgivet af Det Kongelige Danske Videnskabernes Selskab, Bind 33, nr. 14, 1-42, 1963. 16. Molchanov, V.A. and V.G. Tel'kovskii, Dolk. Akad. Nauk SSSR, 136, 801, 1961 [English transl.: Soviet Physics - Doklady, 6, 137, 1961]. 17. Robinson, M.T., The influence of the scattering law on the radiation damage displacement cascade, Philosophical Magazine, 12, 741-765, 1965. 18. Robinson, M.T., The influence of the scattering law on the radiation damage displacement cascade. II, Philosophical Magazine, 17, 639-642, 1968. 19. Rol, P.K., J.M. Fluit, and J. Kistemaker, Physica, 26, 1000, 1960. 20. Scott, R.E., Thesis, Massachusetts Institute of Technology, 1976 (unpublished). 21. Sigmund, P. and J.B. Sanders, in Proceedings of the International Conference on "Application of Ion Beams to Semiconductor Technology," edited by P. Glotin (Editions Ophrys, Paris, 1967), p.228. 22. Sigmund, P., Theory of sputtering.I. Sputtering yield of amorphous and polycrystalline targets, Physical Review, 184, 383-416, 1969. 23. Taylor, R.S., Lunar Science: Press, Inc., New York, 1975. 24. Wehner, G.K., Sputtering effects on the moon's surface, General Mills Third Quarterly Status Report Covering Period 25 October 1963 to 24 January 1964 (unpublished). 25. Wehner, G.K., D.L. Rosenberg and C.E. KenKnight, Investigation of sputtering effects on the moon's surface, General Mills Fourth Quarterly Status Report Covering Period 25 January 1964a to 24 April 1964a (unpublished). A Post-Apollo View, Pergamon 74 TABLES 75 Energy of Incident H+ (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table Vp(km/sec) E p(eV) 69.4 62.5 55.5 48.6 41.7 37.7, 27.8 20.8 13.9 6.9 3.5 0.7 0.1 18.2 .17.3 16.3 15.2 14.1 12.9 11.5 10.0 8.1 5.8 4.1 1.8 0.6 46.3 41.7 37.0 32.4 27.8 23.1 18.5 13.9 9.3 4.6 2.3 0.5 0.05 6. Calculated ETI Vp, and Ep for aluminum bombarded by H Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table ET(eV) T 7. Calculated ET ET (eV) 47.9 43.1 38.3 33.5 28.7 23.9 19.1 14.4 9.5 4.7 2.4 0.5 0.05 Vp, and E V (km/sec) p 12.4 11.8 11.1 10.4 9.6 8.8 7.8 6.8 5.5 3.9 2.8 1.2 0.4 E (eV) p 31.9 28.7 25.5 22.3 19.1 16.0 12.8 9.6 6.4 3.2 1.6 0.3 0.03 for calcium bombarded by H .76 Energy of Incident H (eV) ET (eV) Vp(km/sec) E (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 37.4. 33.6 29.8 26.1 22.4 18.7 14.9 11.2 7.5 3.7 1.9 0.4 0.04 9.6 9.1 8.6 8.0 7.4 6.8 6.1 5.3 4.3 3.0 2.1 0.9 0.3 24.922.4 19.9 17.4 Table 8. Calculated V , and E m ,r 14.9 12.5 10.0 7.5 5.0 2.5 1.3 0.3 0.03 for chromium bombarded by H Energy of Incident H (eV) ET (eV) Vp(km/sec) Ep(eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 30.7 27.7 24.6 21.5 18.4 15.4 12.3 9.2 6.1 3.1 1.5 0.3 0.03 7.9 7.5 7.1 6.6 6.1 5.6 5.0 4.3 3.5 2.5 1.8 0.8 0.2 20.5 18.5 16.4 14.4 12.3 10.3 8.2 6.2 4.1 2.1 1.0 0.2 0.02 Table 9. Calculated E , Vp, and E p for copper bombarded by H 77 Energy of Incident H (eV) ET (eV) V p(km/sec) E (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 10.1 9.1 8.1 7.1 6.1 5.1 4.1 3.0 2.0 1.0 0.5 0.1 0.01 2.6 2.4 2.3 2.2 2.0 1.8 1.61.4 1.2 0.8 0.6 0.3 0.1 6.8 6.1 5.4 4.7 4.1 3.4 2.7 2.0 1.4 0.7 0.3 0.1 0.01 Table 10. Calculated ET' p and E p for gold bombarded by H Energy of Incident H (eV) _f(eV) ZT V p(km/sec) Ep(eV) 1000 900 800 700 600 .500' 400 300 200 100 50 10 1 34.8 31.3 27.9 24.4 20.9 17..4 13.9 10.4 7.0 3.5' 1.7 0.3 0.04 8.9 8.5 8.0 7.5 6.9 6.3 5.7 4.9 4.0 2.8 2.0 0.9 0.3 23.2 20.9 18.6 16.3 13.9 11.6 9.3 7.0 4.6 2.3 1.2 0.2 0.03 Table 11. Calculated ETo' V 1 and E for iron bombarded by H p 78 Energy of Incident H (eV) ET(eV) V p(km/sec) E (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 35.4 31.8 28.3 24.7 21.2 17.7 14.2 10.6 7.1 3.5 1.8 0.4 0.04 9.1 8.6 8.1 7.6 7.1 6.4 5.8 5.0 4.1 2.9 2.0 0.9 2.9 23.6' 21.2 18.9 16.5 Table 12. Calculated T Energy of Incident H+ (eV) 1000 900 800 700 600 500 400 300 200 100 50 Table 13. NT. Vp, 14.2 11.8 9.4 7.1 4.7 2.4 1.2 0.2 0.03 and E for manganese bombarded by H P E (eV) Vp (km/sec) Ep (eV) 76.4 68.8 61.2 53.5 45.9 38.2 30.6 22.9 15.3 7.6 3.8 0.8 0.1 20.1 19.1 18.0 16.8 15.6 51.0 45.9 40.8 35.7 30.6 25.5 20.4 15.3 10.2 5.1 2.6 0.5 0.1 14.2 12.7 11.0 9.0 6.4 4.5 2.0 0.6 Calculated E , Vp, and E P for magnesium bombarded by H .79 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 Table 14. Ep (eV) 33.2 29.9 26.5 23.2 19.9 16.6 13.3 10.0 6.6 3.3 1.7 0.3 0.03 8.5 8.1 7.6 7.1 6.6 6.0 5.44.7 3.8 2.7 1.9 0.9 0.3 22.1 E* T (eV) 49.0 44.1 39.2 34.3 29.4 24.5 19.6 14.7 9.8 4.9 2.5 0.5 0.05 1000 900 800 700 600 500 400 300 200 100 50 10 1 Calculated Vp (km/sec) (eV) Vp, and E Calculated ET Energy of Incident H (eV) Table 15. NT ET E ,'Vp, and E 19.9 17.7 15.5 13.3 11.1 8.9 6.6 4.4 2.2 1.1 0.2 0.02 for nickel bombarded by H Vp (km/sec) Ep (eV) 12.7 12.1 11.4 10.6 9.8 9.0 8.0 7.0 5.7 4.0 2.8 1.3 0.4 32.7 29.4 26.1 22.9 19.6 16.3 13.1 9.8 6.5 3.3 1.6 0.3 0.04 for potassium bombarded by H 80 E (eV) NT. Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 Table 16. Vp (km/sec) 17.5 .16.6 15.7 14.6 13.6 12.4 11.1 9.6 7.8 5.5 3.9 1.8 0.6 66.9 60.2 53.5 46.8 40.1 33.4 26.8 20.1, 13.4 6.7 3.3 0.7 0.07 44.6 40.3 35.7 31.2 26.8 22.3 17.8 13.4 8.9 4.5 2.2 0.5 0.1 and E for silicon bombarded by H Calculated ETV Vp, p Energy of Incident H (eV) ET (eV) Vp (km/sec) 1000 900 800 700 600 500 400 300 200 100 50 10 1 18.3 16.5 14.7 12.8 11.0 9.2 7.3 5.5 3.7 1.8 0.9 0.2 0.02 4.7.4.4 4.2 3.9 3.6 3.3 3.0 2.6 2.1 1.5 1.0 0.5 0.1 Table 17. E (eV) Calculated E , V , and E T P p E (eV) p 12.2 11.0 9.8 8.6 7.3 6.1 4.9 3.7 2.5 1.2 0.6 0.1 0.01 for silver bombarded by H Energy of Incident H (eV) E (eV) T VP (km/sec) E (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 80.5 72.4 64.4 56.3 48.3 40.2. 32.2 24.1 16.1 8.0 4.0 0.8 0.1 21.2 -20.1 19.0 17.8 16.4 15.0 13.4 11.6 9.5 6.7 4.7 2.1 0.7 53.7 48.3 42.9 Table 18. Calculated ET' Vp and E ET(eV) ZT vP (km/sec) 1000 900 800 700 600 500 400 300 200 100 50 10 1 40.4 36.3 32.3 28.3 24.2 20.2 16.1 12.1 8.1 4.0 2.0 0.4 0.04 10.4 9.9 9.3 8.7 8.1 7.4 6.6 5.7 4.7 3.3 2.3 1.0 0.3 Calculated ET V, 32.2 26.8 21.5 16.1 10.7 5.4 2.7 0.5 0.1 for sodium bombarded by H Energy of Incident H (eV) Table 19. 37.6 E (eV) p 26.9 24.2 21.5 18.8 16.2 13.5 10.8 8.1 5.4 2.7 1.4 0.3 0.03 titanium bombarded by H and E for f p .82 Energy of Incident H (eV) E (eV) T. v p(km/sec) E (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 29.9 26.9 23.9 20.9 17.9 15.0 12.0 9.0 6.0 3.0 1.5 0.3 0.03 7.7 7.3 6.9 6.4 5.9 5.4 4.9 4.2 3.4 2.4 1.7 0.8 0.2 19.9~ 17.9 16.0 14.0 12.0 10.0 8.0 6.0 4.0 2.0 1.0 0.2 0.02 Table 20. Calculated TIV 1 and E for zinc bombarded by H+ p Energy of Incident H (eV) ET (eV) v p(km/sec) E (eV) 1000 900 800 700 600 500 400 300 200 100 50 111.5 100.4 89.2 78.1 66.9 55.7 44.6 33.5 22.3 11.2 5.6 1.1 0.1 30.0 28.4 26.8 25.1 23.2 21.1 18.9 16.4 13.3 9.5 6.7 3.0 0.9 74.4 66.9 59.5 52.1 44.6 37.2 29.7 22.3 14.9 7.4 3.7 0.7 0.1 Table 20a. Calculated ET Vp, and E for oxygen bombarded by H f -83 Oxide keV 10 3S H+ 2 3 FeO 7.0 7.0 6.0 6.5 6.5 10.5 11.8 7.5 7.5 12.7 15.0 17.1 12.9 10.6 20.4 Fe 2 03 Sio 2 7.0 7.5 9.4 83.0 12.8 92.0 Al203 TiOx Table 21. keV Al20 7.0 7.0 6.0 6.5 6.5 0.005 0.006 0.004 0.004 0.006 0.010 0.010 0.013 0.011 0.011 7.0 7.5 0.005 0.042 0.013 0.005 FeOx Fe 2 03 SiO 2 Table 22. x=1.86 beam shift x=1.86 uniformity (?) Sputtering yield of oxides for H+ and H+ ions at normal incidence. [From Wehner, 1964]. Oxide TiOx Comment 10 3 s H+ SH+(Eq. 32 ) Sputtering yield of oxides for H+ at normal incidence. * Values for SH+ deduced from data given in Table 21. Oxide M2 /M <AX2>/<X>2 <y 2 >/<X> 2 Al203 101.2 16.227 16.278 Cao 55.6 8.964 9.043 FeO 71.3 11.461 11.538 Fe 2 0 3 158.4 25.366 25.304 Fe 3 O4 229.7 36.740 36.462 MgO 40.0 6.468 6.536 MnO 70.4 11.317 11.394 TiO2 79.3 12.735 12.808 Table 23. 2 2 2 Tabulation of the moments <AX 2 >/<X> and <Y >/<X> for oxides. 85 Table 24. Qxide M 2 (amu) Eb (eV) Al 20 101.96. 10.0' CaO 56.08 8.4 FeO 71.85 13.1 Fe2 0 159.69 14.3 Fe 30 4 231.54 13.8 3 MgO 40.31 7.9' MnO 70.94 10.6 TiO 2 79.9 10.31 Molecular weight and binding energy of metal oxides. -From Kelly and Lam 11973]. 86 Energy of Incident H+(eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 25. E T(eV) ET V p(km/sec) E p(eV) 19.4 17.4 4.9 4.7 4.4 4.1 3.8 3.5 3.1 2.7 2.2 1.6 1.1 0.5 0.2 12.9 23.3 11.6 9.1 7.8 6.5 5.2 3.9 2.6 1.3 0.7 0.1 0.02 15.5 13.6 11.6 9.7 7.8 5.8 3.9 1.9 1.0 0.2 0.01 Calculated KT, Vp r and E p for Al 203 bombarded by H+ Energy of Incident H (eV) ET (eV) V p(km/sec) E p(eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 34.7 31.2 27.8 24.3 20.8 17.3 13.9 10.4 6.9 3.5 1.7 0.3 0.04 8.9 8.5 8.0 7.5 6.9 6.3 5.6 4.9 4.0 2.8 2.0 0.9 0.3 23.1 20.8 18.5 16.2 13.9 11.6 9.3 6.9 4.6 2.3 1.2 0.2 0.03 Table 26. Calculated ET , and E for CaO bombarded by H+ p f 87 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 27. ET(eV) V (km/sec) Ep (eV) 27.3 24.6 21.8 19.1 16.4 13.6. 10.9 8.2 5.5 2.7 1.4 0.3 0.03 7.0 6.6 6.3 5.8 5.4 4.9 4.4 3.8 3.1 2.2 1.6 0.7 0.2 18.2 16.4 14.6 12.7 10.9 9.1 7.3 5.5 3.6 1.8 0.9 0.2 0.02 NT Calculated T, Vp, and E p for FeO bombarded by H Energy of Incident H (eV) ET (eV) vp (km/sec) 1000 900 800 700 600 500 400 300 200 100 50 10 1 12.5 11.2 10.0 8.7 7.5 6.2 5.0 3.7 2.5 1.2 0.6 0.1 0.01 3.1 3.0 2.8 2.7 2.5 2.2 2.0 1.7 1.4 1.0 0.7 0.3 0.1 Table 28. Calculated T Vp, and E E (eV) p 8.3 7.5 6.7 5.8 5.0 4.2 3.3 2.5 1.7 0.8 0.4 0.1 0.01 H for Fe203 bombarded by 88 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 29. Calculated T T Energy of Incident H+ (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 30. Calculated ET' ET (eV) v P(km/sec) E p(eV) 8.6 7.8 6.9 6.0 5.2 4.3 3.5 2.6 1.7 0.9 2.2 2.1 2.0 1.8 1.7 1.5 5.8 5.2 0.4 0.5 0.1 0.01 0.2 0.1 V , and E 1.4 1.2 1.0 0.7 4.6 4.0 3.5 2.9 2.3 1.8 1.2 0.6 0.3 0.1 0.01 for Fe 30 bombarded by H+ 4 E (eV) Vp (km/sec) Ep (eV) 47.6 42.8 38.1 33.3 12.3 11.7 11.0 10.3 9.6 8.7 7.8 6.8 5.5 3.9 2.8 1.2 0.4 31.8 28.6 25.4 22.2 19.0 15.9 12.7 9.5 6.4 3.2 1.6 0.3 0.03 28.6 23.8 19.0 14.3 9.5 4.8 2.4 0.5 0.05 bombarded by H+ , and Ep for MgO Energy of Incident H (eV) ET (eV) Vp (km/sec) E (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 27.6 24.9 22.1 19.3 16.6 13.811.1 8.3 5.5 2.8 1.4 0.3 0.03 7.1 6.7 6.3 5.9 5.5 5.0 4.4 3.9 3.2 2.2 1.6 0.7 0.2 18.4 16.6 14.7 12.9 11.1 9.2 7.4 5.5 3.7 1.8 0.9 0.2 0.02 Table 31. Calculated ETr V , and E Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 32. for MnO bombarded by H E* ST (eV) v p(km/sec) E (eV) 24.6 22.1 19.7 17.2 14.8 12.3 9.8 7.4 4.9 2.5 1.2 0.2 0.03 6.3 6.0 5.6 5.3 4.9 4.5 4.0 3.4 2.8 2.0 1.4 0.6 0.2 16 .4 14 .8 13 .1 11 .5 9 .8 8 .2 6 .6 4 .9 3 .3 1 .6 0 .8 0 .2 0 .02 by H+ Calculated ET, V , and Ep for TiO2 bombarded 90 Oxide Maria (wt %) Highlands (wt %) SiO2 45.4 45.5 TiO2 3.9 0.6 Al2 0 3 14.9 24.0 FeO 14.1 5.9 MgO 9.2 7.5 CaO 11.8 15.9 0.6 0.6 Na20 K 20 Table 33. ---- Average chemical composition of Lunar Surface [From Taylor, 1975]. Regolith. 91 Coordinates . Site Apollo 12 Apollo 14 Site A Site C' Apollo 15 Apollo 16 ALSEP Site 2 5 Site Site 13 FRPS Taylor Crater Alfraganus Crater M. Tranquilitatis Toricelli R Capella CA Capella D Gutenberg G M. Fecunditatis Table 34. Field Magnitude(y) 23. 40 W 38 3.20 S 2.60S 26.1 0 N 17. 20 W 15.5 0 W 3.70 E 103 43 3 8.90S 15.5 0 E 15. 50 E 15.5 0 E 15. 50 E 15. 50 E 4.50 S 5.0*S 5.0*S 234 189 112 327 113 20 83 86 30 85 75 43 100 3.20 S 9.0*S 9.1 0 S 8.9 0 S 9.0*S 16. 0*E 19 . 00 E 26. 50 E 29.0 0 E 36.0*E 39. 00 E 40. 50 E 42. 5*E 6.0*S 6.5*S 6.50 S 6.0*S 6.0*S Summary of Lunar remanent magnetic field. et al., 1972 and Lin et al., 19761. From [Dyal Final Velocity of H+(km/sec) Site Apollo 12 Apollo 14 Site A Site C' Apollo 15 Apollo 16 ALSEP Site 2 Site 5 Site 13 FRPS Taylor Crater Alfraganus Crater M. Tranquilitatis Toricelli R Capella CA Capella D Gutenberg G M. Fecunditatis .Final Energy of H+(eV) 2.788 351.9 641.3 0.380 2.178 348.300 -561.8 323.1 438.7 1635.0 540.7 997.1 0.074 0.113 0.321 0.038 0.315 10.070 0.584 0.544 4.464 0.557 0.716 2.178 0.403 -1560.0 -1233.0 -639.0 -2221.0 -674.4 417.0 -370.5 -401.9 387.2 -391.6 -276.9 323.1 -535.2 12600.0 7872.0 2115.0 25560.0 2171.0 900.6 711.0 836.9 776.4 794.4 397.1 540.7 1484.0 Table 35. The ratio of solar-wind plasma pressure to total magnetic field pressure. Oxide Site Apollo 12 Apollo 14 Site C' (Gutenberg A1 2 0 3 CaO FeO MgO MnO TiO 2 [Sputtering Rate at Moon] A/year Atoms/cm 2 year 0.91 x 1015 WV 1.61 "V 0.72 "V 1.33 "V 0.81 0.83 3.0 5.3 2.4 4.4 2.7 2.8 Metal [Sputtering Rate at Atoms/cm2 year Al Ca Cr Cu Fe K Mg Mn Na Si Ti 0.69 x 1015 It 1.14 t 0.43 it 0.41 t " 0.40 2.18 1.61 0.58 2.17 0.51 0.38 "V Vt "t " A1 2 0 3 CaO FeO MgO MnO TiO 2 0.91 x 1015 if 1.60 it 0.73 WV 1.33 'I 0.81 it 0.84 Al Ca Cr Cu Fe K Mg Mn Na Si Ti 0.69 x 1015 "V 1.11 "t 0.42 " 0.44 t 0.40 2.15 " 1.59 WV 0.57 " 2.13 WV 0.51 if 0.37 A1 2 0 3 CaO FeO MgO MnO TiO2 0.85 x105 Al Ca Cr Cu Fe K Mg Mn Na Si Ti 0.72 1.19 0.45 0.32 0.43 2.27 1.64 0.61 2.24 0.52 0.40 Moon] A/year 2.3 3.8 1.4 1.4 1.3 7.2 5.3 1.9 7.2 1.7 1.3 2.3 3.7 1.4 1.5 1.3 7.1 5.3 1.9 7.1 1.7 1.2 iV Apollo 15 1.59 0.67 1.29 0.76 0.75 "V "V WV "V "V 2.8 5.3 2.2 4.3 2.5 2.5 x1015 "V "V " " " " "V "V WV "V 2.4 3.9 1.5 1.1 1.4 7.5 5.5 2.0 7.5 1.7 1.3 Site Oxide Taylor Crater A1 2 0 3 CaO FeO MgO MnO TiO2 [Sputtering Rate at Moon] A/year Atoms/cm2 year 0.86 x 1015 it 1.59 0.68 " 1.30 " 0.78 0.77 2.9 5.3 2.3 4.3 2.6 2.6 Metal Al Ca Cr Cu Fe Al 03 Ca8 FeO MgO MnO TiO2 0.89 x 1015 it 1.59 it 0.71 1.31 0.76 0.79 2.9 5.3 2.4 4.3 2.6 2.6 0.72 x 1015 f 1.16 I 1.5 0.35 if 1.2 0.42 it 1.4 7.4 5.5 2.23 1.64 "" Mn Na 0.61 " 2.21 0.52 0.39 " Al Ca Cr Cu Fe 2.4 3.9 0.45 K Mg Si Ti Toricelli R [Sputtering Rate at0 Moon] A/year Atoms/cm 2 year 0.71 1.16 0.44 " " 2.0 7.3 1.7 1.3 x 1015 " 2.4 3.8 " 1.5 0.38 " 1.3 0.41 " K Mg 2.22 " 1.61 " 1.4 7.4 5.4 Mn Na Si 0.59 2.18 0.52 0.38 " Ti Table 36. Estimate of the sputtering rates at the lunar surface. " 2.0 7.3 " 1.7 " 1.3 95 FT Energy of Incident H (eV) 0.929 0.921 0.912 0.899 0.883 0.871 0.830 0.778 0.685 0.463 0.207 0.0002 0 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 37. Calculated FT. Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 38. and F F p 0.465 0.461 0.456 0.450 0.442 0.436 0.415 0.389 0.343 0.232 0.104 0.0001 0 for aluminum bombarded by H FT F p 0.940 0.933 0.924 0.913 0.900 0.879 0.849 0.802 0.711 0.488 0.349 0.0002 0 0.470 0.467 0.462 0.457 0.450 0.440 0.425 0.401 0.356 0.244 0.175 0.0001 0 Calculated FT, and Fp for calcium bombarded by H Energy of Incident H+ (eV) FT 0.837 0.822 0.802 0.776 0.742 0.698 0.635 0.542 0.392 0.144 0.018 0 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 39. Calculated FT', and F Energy of Incident H (eV) Table 4 0. Calculated FT, for chromium bombarded by H+ FT 1000 900 800 700 600 500 400 300 200 100 50 0.827 0.808 0.786 0.758 0.722 0.674 0.606 0.507 0.351 0.113 0.055 T F p 0.419 0.411 0.401 0.388 0.371 0.349 0.318 0.271 0.196 0.072 0.009 0 0 F p 0.414 0.404 0.393 0.379 0.361 0.337 0.303 0.254 0.176 0.057 0.028 0 and F for copper bombarded by H+ p Energy of Incident H+(eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 41. Calculated FT, and F Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 42. FT 0.363 0.319 0.272 0.219 0.164 0.109 0.058 0.020 0.002 0 0 0.182 0.160 0.136 0.110 0.082 0.055 0.029 0.010 0.001 0 0 for gold bombarded by H+ FT 0.820 0.801 0.779 0.750 0.714 0.666 0.599 0.500 0.336 0.111 0.010 0 0 Calculated FT, and Fp for iron bombarded by F p 0.410 0.401 0.390 0.375 0.357 0.333 0.300 0.250 0.168 0.056 0.005 0 0 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 Table 43. 0.969 0.966 0.961 0.956 0.948 0.939 0.923 0.898 0.849 0.714 0.497 0.021 0 0.485 0.483 0.481 0.478 0.474 0.470 0.462 0.449 0.425 0.357 0.249 0.011 0 Calculated FT, and Fp for magnesium bombarded by H Energy of Incident H+ (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 Table 44 . FT FT 0.870 0.856 0.839 0.817 0.788 0.750 0.694 0.610 0.467 0.202 0.035 0 0.435 0.428 0.420 0.409 0.394 0.375 0.347 0.305 0.234 0.101 0.018 0 Calculated F , and F for manganese bombarded by H+ T P .99 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 45. 0.806 0.786 0.762 0.731 0.693 0.642 0.571 0.469 0.314 0.090 0.008 0 0 F p 0.403 0.393 0.381 0.366 0.347 0.321 0.286 0.235 0.157 0.045 0.004 0 0 Calculated FT, and F for nickel bombarded by H T p Energy of Incident H+(eV) 1000 900 800 700 600 500 400 300 200 100 50 10 Table 46. FT FM 0.970 0.966 0.958 0.952 0.944 0.932 0.914 0.883 0.823 0.655 0.397 0.030 F p 0.485 0.483 0.479 0.476 0.472 0.466 0.457 0.442 0.412 0.328 0.199 0.015 0 Calculated FT, and Fp for potassium bombarded by H 100 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 47. 0.899 0.889 0.875 0.859 0.837 0.808 0.766 0.699 0.582 0.335 0.033 0 F p 0.450 0.445 0.438 0.430 0.419 0.404 0.383 0.350 0.291 0.168 0.017 0 Calculated FT' and F for silicon bombarded by H+ T' . p Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 48 . FT FT 0.719 0.690 0.655 0.612 0.558 0.489 0.400 0.282 0.138 0.026 0.0001 0 F p 0.360 0.345 0.328 0.306 0.279 0.245 0.200 0.141 0.069 0.013 0.00005 0 Calculated FT, and F for silver bombarded by H + T '? p 101 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 49. 0.978 0.976 0.973 0.968 0.964 0.955 0.945 0.927 0.890 0.785 0.603 0.058 F p 0.489 0.488 0.487 0.484 0.482 0.478 0.473 0.464 0.445 0.393 0.302 0.029 Calculated FT' T and F for sodium bombarded by H . p Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 50. FT FT 0.827 0.810 0.788 0.761 0.727 0.680 0.616 0.521 0.371 0.130 0.015 0 0 0.414 0.405 0.394 0.381 0.364 0.340 0.308 0.261 0.186 0.065 0.008 0 0 Calculated FT, Tand F for titanium bombarded byH+ p 102 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 51. Calculated FT, and F Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 52. FT 0.915 0.905 0.892 0.876 0.854 0.824 0.780 0.709 0.579 0.300 0.073 0.458 0.453 0.446 0.438 0.427 0.412 0.390 0.355 0.290 0.150 0.037 0 for zinc bombarded by H FT 0.966 0.962 0.956 0.950 0.942 0.931 0.915 0.888 0.836 0.697 0.481 0.026 0 0.483 0.481 0.478 0.475 0.471 0.466 0.458 0.444 0.418 0.349 0.241 0.013 0 Calculated FT, T and'Fp for oxygen bombarded by H+ 103 Energy of Incident H+(eV) 1000 900 800 700 600 500 400 300 200 100 Table 53. Calculated FT, and F Energy of Incident H (eV) 1000 900 800 700 600 .500 400 300 200 100 50 10 1 Table 54. FT 0.428 0.388 0.343 0.292 0.236 0.174 0.111. 0.051 0.011 F. p 0.214 0.194 0.172 0.146 0.118 0.087 0.056 0.026 0.006 for Al203 bombarded by H FT 0.686 0.657 0.623 0.581 0.531 0.466 0.383 0.276 0.142 0.019 0.0003 0 0 Calculated FT, Tand Fp for CaO bombarded by H 0.343 0.329 0.312 0.291 0.266 0.233 0.192 0.138 0.071 0.010 0.00015 0 0 104 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 Table 55. Calculated FT, and F Energy of Incident H (eV) 1000 900 800 700 600 .500 400 300 200 100 Table 56. Calculated FT, and F FT 0.474 0.435 0.391 0.341 0.284 0.220 0.149. 0.078 0.021 0.0004 0 0.23.7 0.218 0.196 0.171 0.142 0.110 0.075 0.039 0.011 0.0002 0 for FeO bombarded by H+ FT F 0.138 0.110 0.082 0.056 0.034 0.017 0.006 0.001 0 0.069 0.055 0.041 0.028 0.017 0.009 0.003 0.0005 0 0 0 0 0 p for Fe203 bombarded by H+ 105 Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 Table 57. Calculated FT'. and F Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 58. Calculated FT, and F FT Fp 0.046 0.032 0.020 0.011 0.005 0.002 0.001 0.0003 0.023 0.016 0.010 0.006 0.003 0.001 0.0005 0.00015 0 0 0 for Fe304 bombarded by H FT Fp 0.776 0.754 0.727 0.694 0.653 0.599 0.526 0.423 0.272 0.072 0.005 0 0 0.388 0.377 0.364 0.347 0.327 0.300 0.263 0.212 0.136 0.036 0.0025 0 0 for MgO bombarded by H + 106 Energy of Incident H +(eV) 1000 900 800 700 600 500 400 300 200 100 50 10 1 Table 59. 0.547 0.511 0.469 0.420 0.362 0.294 0.215 0.127 0.043 0.002 0 0 0 0.274 0.256 0.235 0.210 0.181 0.147 0.108 0.064 0.022 0.001 0 0 0 Calculated F Ty and Fp for MnO bombarded by H Energy of Incident H (eV) 1000 900 800 700 600 500 400 300 200 100 50 10 Table 60. FT Calculated FT, and F FT F 0.514 0.476 0.433 0.383 0.325 0.257 0.175 0.095 0.030 0.001 0 0.257 0.238 0.217 0.192 0.163 0.129 0.088 0.048 0.015 0.0005 0 for TiO2 bombarded by H p Site Apollo Oxide 12 [Loss Rate] Atoms/cm2 year Al2O 3 CaO FeO MgO MnO TiO2 x 1015 A1203 CaO FeO MgO MnO TiO2 .09 x 1015 I .40 t .09 I" .42 i" .13 i" .12 "t It it It " to 0 A/year .40 .48 .37 .98 .52 .48 Metal Al Ca Cr Cu Fe K Mg Mn Na Si Ti [Loss Rate] Atoms/cm2 year A/year .31 x 1015 1t .52 .16 .15 .15 .03 .77 .23 If .05 it .22 is .14 to Apollo 14 Site C' (Gutenberg .30 .31 .30 .34 .44 .40 Al Ca Cr Cu Fe K Mg Mn Na Si Ti .30 .49 .15 .15 .14 .01 .75 .22 .27 .21 .13 Al Ca Cr Cu Fe K Mg Mn Na Si Ti .33 .49 .19 .13 .18 .10 .80 .27 .10 .23 .17 it It "I It "t it "t "t ifl it "I "t "t It "I it"t it 1.00 1.64 0.50 0.51 0.46 3.34 2.49 0.72 0.91 0.69 0.43 it Apollo 15 A1 2 0 3 CaO FeO MgO MnO TiO2 .18 x 1015 f .55 .16 i, .50 .21 .19 .60 .81 .53 .66 .69 .64 It IV it it 1.11 1.86 0.63 0.44 0.59 3.66 2.64 0.88 3.64 0.77 0.55 Site Oxide Taylor Crater A1 2 0 3 CaO FeO MgO MnO TiO 2 Toricelli R Al203 CaO FeO [Loss Rate] Atoms/cm2 year . x105 " " "I "I x 10 it to MgO it MnO of TiO2 it 15 [Loss Rate] Atoms/cm2 year A/year Metal 0.55 1.13 0.49 1.63 0.66 0.61 Al Ca Cr Cu Fe K Mg Mn Na Si Ti* . 33 x 1015 Al Ca Cr Cu Fe K Mg Mn Na Si Ti .32 x 1015 11 .53 of .18 of .15 ", .16 it "t .06 "I 0.49 1.62 0.45 1.56 0.58 0.55 Table 61. Sputtering rates at Moon under solar-wind bombarment. .55 .19 .14 .17 .08 .79 .26 .08 .23 .16 .77 .25 .06 .23 .15 " " " " '-' " "I ", A/year 1.10 1.81 0.63 .0.47 0.55 3.59 2.62 0.87 3.57 0.77 0.52 109 AH D(0)/y Oxide AH (M) Al203 76 134 0.57 CaO 36 151 0.24 FeO 84 64 1.31 MgO 33 145 0.23 Si0 2 87 104 0.84 TiO 2 106 114 0.93 Ti 2 03 106 123 0.86 Ti3 0 106 117 0.91 Table 62. AHs (M)/[AHD(O)/y] Comparison of AH (M) and AHD (0) for some elements IFrom Pillinger et al., 1976]. occuring in lunar soils. 110 FIGURES ..I ~ "O . -I II:, I 10 X 10 TO THE CENTIMETERH 1 KEUFFEL & ESSER CO. MADE IN U.S.A. AI 4t )X , . - - +. .- , - I I . . . .. .. - . . I ... . . . . . .. . . . .. 46 1bIU Lm .- .I ,. .I ., ;. ,.. - : : - : .. .. .. .. - : : : : : 7 I - :. . , : - .. . , - -I: : : :: : : I. I. . . I . . . . :,., :::: . I - - I 1: ,* I I : . I : . . I -, - : : -., ,* I : I - . I. I , , . , , . I I . ::. . .. . . : . . 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I I Ii I... .1 .. . .I., .I.: 1 .::: : :... 1. - !, .- --I. +. , I +. - 1 : : . :.... : : : :.. : :'I -I ... * . + : %, _ , - i:. . - 7 : l--. . :_I_ FI. I -_.... -1 . .. , __ - I-:: __ , . I ,- , . i - ... :': .: -- : , : ,, . . - f% .. w --:.--I- : I :::: ::. " I -,. - . :::T I - I I:,. -, :: t-- _; : ':,:1!:,!I : : :: ::!: :,:: ... - . . :: -:J_ :-, __ ...... 1_10- . - '. .... .- l '.. . . _ . f- :I + .... : ': :: , . . . I i 4 II I . I i I - I I ._, , , I.-- I : a -I-I: -L"; - Al _. , . . _____ -, - 1 .77-- , . I -----. ! . 4 -- - :: :!. ,; :; !: : ,;It ;: t; : 1 I ... I .... : _.,, ! : :...... . ,.. I . : .. .. .. 7 T. T I :, I:: ___j_._ * :::: ---. . ; *,*. ::: - !:: :. . " , - .. 11. , .. : I;:;1 - , , . : - : : I ,- , I ...I - .- - - ,. , - , . -- .. II , I I. t - .. : I- I. I . : : , , , i . ., . , : i : i ! - 1- : - , : . . : :: : , + . I : : : : *: , * . III ' I .. ...' . - - . . . '. . + . I L - -- .- - - -: t . : : . - . . . : : I , _ '. - - I - .... . L LI :I:::: :, :: ,:1 . I . L . . _ _ t - ... - - I : . - . I: : . : 1 I _. : : - : : : __ . I- : .., I t .... ...-i--- - " 18 X 25 CM. 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. MADEIN US A 46 1510 .7K7 t -- Fig. - 4. Sputtering yields for H+ ions incident on aluminum [calculat- Sed . from Eq. (25) * KenKnight and Wehner 2 - 1 4 - -44 t.. ......... . -- ~~7 7 - --- ... -.- ... V I 71 Ek , 1 : t 177.j t 4 --- .- -77 T T -- -7 ----- T -- w .. - -* - -1-- *- - HI 7 - - -77 1 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. "-- 18 X 25 CM. 46 1510 Fig. 5. . . *. - .' .. -- ----. -- ... INU.S.A MADE - - ' """""""'"- Sputtering yields for H+ ions incident on calcium [caculated from Eq. (25)]. _ 4 44 - ~ - t 1 5 1 -t44 I - - 1 I7 { - _7_ - -6-7 -7 - .1 -. - . -_- 0<1~ ~~~ 05 I-Aq ~~1~7 Li~i+. Ek~ 1 - 1 ..... 0 . - Ir4: WEUFFEL*& - - -. . -TV ESSER CO. MADE INU S A. _- -- - . . .. .4 f 7 i F g. - Sputtering yields for H ions incident on calcium [calculated 6. Eq. (2 5)] *from - - w .~~ . ....... 77 .. T> i t i r +- V itI ~ . .. ... .. - 20 0 -- P-.. . . tt ..-......... -. ,. .. . . -.. . 50 -4 * . . ... . t li 10 ... . .. .. I Jt!I-77 *~~~ a2- L%.#A. V t 0 *.; I & .8i .. T -I 0 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO MADEIN U S A 46 1510 18 X 25 CM. . IL . ... ... 4 Fig. . 4 7. q -- t : U j - . - - 7F7-711 777 ___ - -- - t -- _ *- +- ~ _ _ _ _ - t7 7 .~7 7 4 F IL- . . ... .. ___~~77 -t on chromium [calculat- ed from Eq.(25)]. .-- . Sputtering yields for H+ ions 7incident I7__ U _. * - I(k .4 - IL . -1 1 1 _ _ L-... Iu A U I u KEUFFEL & LSSER CO. MADEIN USA l t .:nIlmelC., -4) -t~lu - - -- -- - I Fig. 8. - 7777 - . U.Upteigyed ......from .. .. -- Sputtering yields for H~ ions incident on chromium [calculated o Eq. (25] t-- i - --- -(.2454). 77 ---- -- 7- -- I a 00 ..--.I7 -717- a 7I ~ 111. .'i ~ii'V .ii~tiL1hIL ~LI . -3- -60 ~a i 77- E . ...ft7 4 vi w_ 7 7 7 77 - IL Iw L 7 _ -77 ~.~.LJw 29_ -r10 X 10 TO THE CENTIMETER L - * KEUFFEL & ESSER CO. 7 ..-- -- MADEIN U S A. ___ 7 46 1510 . -- *> I:: ___~~~ 18 X 25 CM. t . ai- * - - . -7777~ 7 . .~__-- t- ...---- . -- - t.. Fig. 9. Sputtering yields for H+ ions and Wehner k'' FKenKnight 7777j incident on copper from Eq.(25)]. - --- ---- - --- - - [calculated AWehner - - - - S .... - -7 - - - - ----- ... .. .. . _ -w __71 - _4 -7 .. -- -0 t 0 - -t ~t .... -. - 0T0 0flj4 ~ 0 5 0 6j .... ... 0 1 8 . .. 0.. 0 I09 - I44 ............. .................. _ -... -.-. ?--- I? t- ----- III L-m IN I I CI U A IU IA. KEUFFEL & ESSER CO. MADE IN U.SA .rx U * V 10 r. '-t) LOWU 41 w-------.Fig. qt;... 10. -- -~ -* . ii - Sputein It . :' ; :i TTF..-7 t7 -77 . I ,.. . . ... - 4AWehner 777~T~ . yields for H+. ions Iincident on copper [calculated ....from Eq. (25)1. adWhe 2 --- a ., Sputterin Fig. 10 . . .. .. ... . . . . ... ... ... ....... a _ .. _ wt_ -77~ 17t 77t It T 7-_ -:l--I7TT, t1 l i~~t~ 1 T .I ... .. . .. 407 ,7 . w 601'<1 7 - 70 0 li * 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. MADE 18 X 25 CM INU.S.A I-~K 46 1510 JAILJJ~:LL: :J f -j 1-4- 77_.LIi-+ - - - -v-I * U A L 7 a A-i I I FTt' I I I - - - - + t*- I. ---- .- . - ______ 11. Sputtering yields for H+ ions incident on gold [calculated from Eq. (25)]. *KenKnight and Wehner I I * i. v!..- II____ ...... . --.. .. .. S- - -- *-- j q,. I - L - . :j.~--. .. w * w- - - -- - - I -4 -- ___a 7~T7f7f7lW17f77177j77177tT77i1i~[tv-~ *~~~~~: -- q .I_ 1 t - j 4, - wt - ~ ~I.. Fig. t .t : , Wi-i L*IL UJW*.:. - cJ - 7- A ubili1U iLL~i~ibL~ LA ---- __ 0 . 10 X 10 TO THE CENTIMETER 18 X 25 UM. KEUFFEL & ESSER CO. MADEIN U.S.A. . 46 1510 incident 7 on gold Eq _7from I I 02 q F f _ * q - 7 T. 2~~- 57. 4 .. ... 0 T tft i t -7 7-- - - ; 7 Wehner and - ta -7--7 7- [calculated *1 - t ions (25)1] *KenKnight -06 H for yields Sputtering 12. "Fig. . 7r -77k ;_IIT .. . . .. . . . . . -7)- -,-L4 .. ,7~~~I, .. ... a-*7 ! LM * 1 - -- -. - . . . . IrW' KEUFFEL & ESSERCO. iNUSA A+ID J. D L V MADE .I -77 -777-j 7- i I 7 -~ I I -- Fig. 13. Sputtering yields for f+ ions incident on iron [calculated from Eq. (25)]. *Kenknight and Wehner AWehner I -I - tt t ..1 .I t 14r1 OQ - 1e I 4-b ;hi I7Y 41. 77 ~I7 -I- i~-d~4i P-HH -7 VH t A I - '- TMI 7-7- + i -777 q n -7 7- I- 4-, 4: -7 7 -- 4 tKWLd4 117 1 7 7 7- -_i .9 k .... R. .. .. ........ .. -7 I il 18 X 25 CM. L/f' 10 X 10 TO THE CENTIMETER 461510 KEUFFEL & ESSER CO. MADEIN USA - . _ - . - .T _ I - . I . - -q 717 7 .... 4 - -7. -4- Sputtering yields for H+ ions Fig. 14. incident on iron [calculated * -from Eq.(25)]. -KenKnight and Wehner AWehner -- - - _ - - - .j -- - -- t -- - 77 - --.... K - .K....... 1 ---- - - t .77 . .. ; fl-. * 7 7 -- -. . . ~I . tI- 7 4 0 -. .~ 1 -: -6. . - 7 - 1 - .. - -7 - - - . -. - . - - 5 6...7.0 . 8 0i9 - E} -- 0 0 . 7 -7770 - - - ....... ~.. . - -. 46 1510 18 X 25 CM. L/... 10 X 10 TO THE CENTIMETER M L--- KEUFFEL & ESSER CO. MADEIN U.S.A. ;___ 1~-7~-~ :q Fig. 15. Sputtering yields for H+ ions incident on magnesium [calculated from Eq. (25)]. - ~~ . .. . 7<P7 I e - 1 . .. . . . .. . . . . ._ _ t _ _ _ . ._ _ -_ - . . .. ._ {} -_ _ - _ _ _ _ --- -s -- - 4- - . -A - -- -- -- - 1 '77 7 -F - ...-.... ..._.. It 0-----I4~..I -77_ 7= 7_. -1LLL ---3- - 04j 7 -LL II_ -67' -0 7+ : ,w 1 It= MtEUI-tLL a-( tM UL.. MAUL IN U A. -': t - 7 7-. _ _ 1 -~~~. * . Fig. . . 7 . . . . . . . .... ... ... .1 16. - 7.- for H+ Sputtering yields 71 .2 .. . _ 71r" ~1t It 77 ... .. . _IT __T - ions incident on magnesium [calculated from Ec.(25)]. -7 .1 611 .. CI - . . . I I. .... .. 0 tit~~; - -t -I .. .. . .-- - . 22 '2~~~~~~ I .....~l ... .... .. 4 . -. . . i !lit - - -T - - T - - - -7-t - - t + +-- - - - - - L*, 10KEUFFEL X 10 TO THE CENTIMETER & ESSER CO. MADEIN U SA 4b IbIU 16 A Z3 UM - 71 ! _ *1q_ * _ 7--- Fig. ->.. - 17. H Sputtering yields for ions ed from Eq.(25)]. - q _ _ 7= 77 t t8i- _ __7-7 q 1 -f-7 __ - _ 7 -- 74 0- h7 - I 6- q7 05 1 _ l7 777 _ 7 0 ____ K 7._ ________________ I ijL- 1 -- 7 ---- -: 0 -7 1-I_ L. qi _q ------ __ _ 1 0 0 --.________________ _------------___ KEUFFEL & - - 7- - -7 1 - - - 7. -7'777-71T< 'F g t IT1 1 7T - - -7- -7 - -7 Sputtering yields for H+ ions on manganese [calcuIincident N lated from Eg. (25)1]. T JT ' TFig. 18. TT7 7777 9+ 1U '+70 10 LDJ. MADE N U S A SSER CO f rH i n incident o m 7 ri 7~~T 7 -w -T b - T; l I 7~ -7-77 T- - T it - T - w.-- . 77 wu w 4A 71:: 7 -U I - 71~~I T - - ti H- wI: .17 tI 7 .~.1 . ...... '- ar 4 1< TI71 I- -- 1 ------- i -. -.- . pp -L~~ 0 T2 0 T -- i w -71 _- -- Ti ;7 T$-0T 4 T6 it ~j t T A 7 0 7 8 0 it -77 T TTT T T41 - - , T i t - if- T T 10 KEUFFEL & ESSER HOE X 10 TO THE CENTIMETER CO. 18 x U 46 IblO (M. MADE IN U S A I. - - .. ..... .__ - ___... .. 5 1- Fig. 7 * ions Sputtering yields for H 19. incident on nickel [calculated from Eq. (25)]. *KenKnight __ and Wehner t- ------------------------- ------ - -- -- -- - - 477 - t - Ta 7 H q 4 7 . F- I .. .4. 7 -- q-- 7t__ ----- ------- _] 1d 7 +-77_ _7 -7 .. . t k -77 7 777 -7 1 )4 L.. 18 X 25 CM. 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. MADE IN US A 46 1510 7_77 77.77 ___~~~7- 7 7 7 ~----ig. 20. *- i- - os Sputtering yields frH -- incident on nickel - [calculat- ----- -ed from Eq. (25)]. *KenKnight and Wehner 4 4 ti I = 7... ... ___ ... _..._._7_ _L-7_. 7-,-'-* 7 7___ ... ..... .. . r T~V +b _-47 7 . -7 4 .. . .. 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. MADEIN U S.A. IL~t#- V,~ 18X 46 1510 25 CM. - tFig---7t- 7- I Fig - ___ . . . Sputtering yields for H+ ions on oxygen [calculated .-.. -v from Eq. (25) ]. 21. -incident .. . -- - 177 *- ....... . .i . 717i.. .. ... - Iig -- *- t C6 - . . .... . .77 .... .~~~~~T -.- - . ---- - 77 --- -n -xge -:-:7---77-*-- - * t er n in id n -. _ . - - -1 -p -y.e-l-s t.. - . - - --.--*- . - - -7 -f - -E7 ----- +. -..--. -. +. .. -7 - I iiii IiiiiiI" ~ 7 7| ~~ ~ ~~ - ~ -7 ~. ~ ~ ~ ~ ~ ~ ~ -. IiI-I.IiiIi1 17 -.-, ' .. .. : . ---7Y---77 7-- 4 + --.- -* ". -- --- . .- . - - IrE 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. 18 X 25 CM. 461510 MADEIN U S A ... I ...... ... . . ...:.V .> .: . 2.. I 'I fht77t+ ~ 7j77 Thi T t - - nt -77 . . . . T ig. 22. Sputtering yields for H + ions incident on oxygen [calculated from Eq.(25)]. ..iii......_._ _. I~. i- .----- ~ ~ -------- -- _ - 1-41 os2~~-4--7 -- __ ,__.__ -- -s . - i 11: : P - 4-- -r ~'~1- - - -. f .... - .. . . .... ... .. * 4- .. ... ... .,_ *~~. ....: .... ___- -. ...... f .. .. - --.. . __ .. __ W ... .. .. . I *- 3.. ,--~-I------------- : w~ . H.HFiL_1 * +---- . * 1 - IL. A U U K~k KEUFFEL x In n I 5~I ir ' U S.A. & ESSER CO. MADE IN 4b 1i)IU -r o r A-i- 1-- I- I -I Fig. 23. Sputtering yields for HI ions i incident on potassium [calculat-ed from Eq. (25)]. -A u.Jv 77-. -- 71-7- - - -- - - 7. - - . - 1--- *I 17 15 0 ... . q: . T -I7 . 7 .. . w w. 1q 1 .1. ~I~t2 0. ... q 0-4- -0 10 ... -~. V -- 7- 777 ;i l - t IIr.I ..... IUX I IINM t.U -,,N TrHt; 10 &T ESSER 10 KEUFFEL CO. MADE I . K A > 4 . 4b 1olu S.A. . .~ . , . inc924nt on potssium [acuj .... lated _ from . .1~ . . Eq. (25)]. . . . . . . . . . . . . . . . . . . . .. tt 7V7 4 * .._ __.... I 'S . . . . ..- .. .. |L/Ark & ESSER CO. 46-1510 18 x 25 CM. 10 X 10 TO THE CENTIMETER KEUFFEL INUS A MADC I f*.ii:;* .- -~~~~;1 ,.. 7- '. . I .. ' I 44, -7 I Fig. 25. Sputtering yields for H+ ions incident on silver [calculated from Eq.(25)]. flGrolund and Moore It 7-71~ - 7- -..-. .. .q 7 - -- T"t -77 T- w -0--O 5-~~~~~ . - - - 4 I H1- . . . - -' 17 IT - 1 t-- T77- - -. 1 ..... *.. 0.1 T -] .- 0 T~:* 0 4 0 5 0 6 0T 09 ()l~ !Ij *' L14~~~1 T1 1 __j il.p L~~L±u~fILLILi 4 I .1+. 10 L/ X 10 TO THE CENTIMETER Ho-- KEUFFEL & ESSER CO. MADEIN USA. 46-1510 18 X 25 CM. .... ..... _. K r.1i Th __ 7~7 7- 717 .. ... __-_-_-__-_-__-_4 H Sputtering yields for H 26. -;Fig. incident on silver S7ed . - --- - - - _7 - 7 . . . - .. . . LW~~7 __.l 1~i -- - -01.41-_ - .~ .. - - - - 7 . 7 WJ., ..ILtiLiTLjdi~jLL ; -- -- I.4 . . - _- b - .*I-*- -7-. -. -. - --- . t - -* ions [calculat- from Eq.(25)]. -__--__ *z-~ - - EGrolund and Moore 7 U .... . .____ .- t ,: 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. MADEIN U.SA. 46 1510 18 X 25 CM I~~7 T~7- 777-7--------Fig. ...... ...2.Spu ._.... te.n yield - ..or H.on *---------------------------------------incident on silicon [calculated .... fromnEg (25)]. ... ... .. . . -777 7 _ 7 :q., 7 _ __7I . q 07777-- - 5L-706 7K .*. 3~~ . . . .... ...... , . . .. .. I .. -: . j- - . : . 4. ' . , : :. : . 4 . ;~~~ . . 7 - . --. . . . --. .. .--- . - 61 4. I I--1 , . ... S- : : ! . - - - - . - 4- :~~~~~4 - - L - - - . - . . . . . . . - - :4 . . I , - : , 28. - . . - * - , ; : : : 4: ' . : : - *I - -: - 4 I -. -: .. 4. - - - ' . - - - : - - ei , : :~ i l - - - . . . . *:: : 1 , .7 - . . - . - t-: - - t t- I I + --- I - - I 1 . - - - - II ! , , !, ! " I , i ; .. I II 4 - -=- .- . t .: - - . I i , , I I . , : A - . -- 1- i I - :- - -. - -: ' - t I 7---w -. I -1-I T . - - -.--- - . . .- - - - - -. -- - - - - - ,.: --- - .. -:. - .-- - - - - - - T . - . - - - . . . -- - : - : -. * ' - - - -- - - - -'-- --- - . . - - -4- -; - - - * - - -+-7 -- . -i. -- - ---: - - - - - - .. : : : : - . - - , * : - - - - - - - - - --- _ -- : -: -. -. - - - - -. * , -- - - - + -, - - - - - - * - - - - 4 * : : : : : - - - - * -- -- -* -- - t - - -* - t - - - - - - - - - - -- - ~~~~ - --i ! -, -. --! -l --- - -- - - - - -: -4: - - * - -.. . : . ' - -- -- -- -- .1 . 7; . - - * - ( -- -1- - - - - -.-ro- -q -- - ! - -:: -: : -....: ' - i -l i , :, - - -- - 4 4 1! :-: } - - - - --- - - :-:;, - - - : : - 7 - 4: : : - : - I -- - . I, !. - - - - : - - - - - . .. I 4 . * - -: -: - -. - - - - -: : --- -, - - u : i: - -+- . - - ionsI -: - - - -. . . . : ; . t H : - -.. -;i - - - -, ' .-. -.. - . . . . . -: -, . : : - - - 1i 1 . .a . : , : -: . for . . . . .. - - : - i4 ::-~~~ - . :t I - :: : : - - - -. ;:~~~ ~ ~~~ ~~~~~~~. 1 - yield : ,.: *-: - 4 - -. 4 4. '.. --. Sptern t -; I - : :: : -. : g. - . --- ~ ~ ~ ~ ~~ ~ ~~ ~~ ~ .:~~ '.--- 1 . . . I I - I1 - -: -.. 7 1 I -, : - . . . . . : 4 - . .-- F , : / .4 - : : : UI L tC3IL KEUFFEL & ESSER CO. MADE IN U S A -I - - . - . - . . . - - I . : ::. . . . . 46-1510 10 X 10 TO 'HE CENTIMETER 18 X 25 CM M 6-I_ KEUFFEL & ESSER CO. MADE US A. VJ4,'q IN _i7K777i .J.f ::,4 4 - Fig. L A 29 Sputtering yields for H+ ions incident on sodium [calculated from Eq. (25)]. 1~ 7kVI- .I .l .~~ -.~ II-iq 2 771Y7T :77 t 7:, .. I 1 . -0-2 __ -S 7__ I I I .... 7+717717 V +4+7K 7 4--4-1- 77177 *1 --------------------------------------------- .. :. - L4-IV'iItL q LA _.. 7177 17 -- 1.-i- >1< III,. _ __7 7_ 7_7 __ . .1 11 ... II _ L I I I I _._ I I.--. I 4 .... T1 -1 .-... 75 .. . . . . .- .-.-.. t j.J --to. 7-0 1;--3- _77i I i I . I I - I I I i I ; I I . T " T I I I - - . I - *( 71]L i O.j9 k I 1 L7~7777~h LI_h~i7714~±IT1 7, Ti - T F I - - 10 X 10 TO THE CENTIMETEIRKEUFFEL & ESSER CO. MADEIN U S.A. 18 x 11 m. 4b Fig iU Sputtering yields for H 30. ions incident on sodium [calculated f i-- -- It IIIi I -1 1 --from Eq. (25) 1 41 iI 4 I1. 1 1I- I I --- 1f 4 - -, --- ----- *1 4 4 77 _ - - - -- -- - -- --- .1 t* 1 t t 3~~~ I --- 4- 1- - 5 - I i i I~~~LIiiK TLFTI1 IJ 7 7 77 7 I~7F]7F 17 - U,,r 10 X 10 TO THE CENTIMETER 6KEUFFEL & ESSER CO. MADEIN U.S A " ~ ~~ ~~~ - - - ~ - 18 X 25 CM. 46 IblO --- r . 4. .7 F-I-- F ig. 31. Sputtering yields for H+ ions incident on titanium [calculated from Eq. (25). BKenKnight and Wehner I :I -7 - -4 _ + - 4 ~ .-. 4 - 40. i-i~~ ... 7 ;,. .7t 7.. I . t- . . -4 It-7-, r . I-I I ~ . . . . . . 7 002' -I 4A- T .. - ." + 7 -1± 3Q -4 n 0 5 (k% 0O 6- . . . . - -O 0 0 0 9 __ i 0 70 7- 10l "OX 10 TO THE CENTIMETER 3% KEUFFEL & ESSER CO. MADE IN U S A. 46 1510 18 x 25 CM. Fig. ...-- - - -- - - 32. - - Sputtering yields for H+ ions ed ...... . Eq. (25)] from . and Wehner -KenKnight ~z 77 0-.-~~: [calculat- on titanium -incident ~z _ -7- m_ _ tt * 1 . . .I - -j - . . 7 7 -;7; -- S; 7-- Tj - -77-1t 74. 7._ 0 jQ 723 0 21-501a .{.:.7j _ ----------- .1 1_ 60 .jj .i .... L [ I. -, - _____ LGC-# A KEUFFEL f3 10 e 1+ 0 1 )U 1U u vcit MADE rmi INU S.A. & ESSER CO. w. .. . I Sputtering yields for H+ ions 33. :-----Fig. incident on zinc [calculated from Eq. (25)]. O~ 10 1 ~~ ~ I _ ~ ~ - _7 ---- -7-7----- - - - - -- - - - -- -- 00 8 ~~-oi8 I- S : tI :-j -- _ 1 71 -77 W _ _ 0A )_04 --- I I7 .~~~~4. .. 7I ~ "7-~T 'lii77 - 4 .. I - - - ---- F j w 7~ _ 77I-_ T 7777--I-N -- - - _ 7 18)Ax?2I1VI 10 X 10 TO THE CENIIMLIEH .; n% &-KEUFFEL & LSSER CO. MADE IN U S A 46 1510 . ... . Ii . , . - .. :, : ..i : - wI - - . .I . I * : I. . 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I7 LI , i iI : -! :i I + , . . I... ; ; - , , , : : - i 4 .1 -; .I I . + I. : I 1 ;T . . . .. I . . . -- - - : + . . . . : " : 1 . I- . 7. . ; , t * '1I ; i ; . . . : : . , 4 : ! : 4 : I, 1 4 ; ! I t ; : t i ' ! ; ; , , Ii ; . , + : Ii i , , , ! II . I I, . 4 II .. ! -, f , I I: j t ' . t , ! - + : : : : , I , __ , :;:11-+ ' ,.-, : I - i.- i . , -i f I . : L1 : _' : 4 . . . I ; - I. I. , . . _ - , -+ . ,. - II II. -i : . ; , i ; : : 1tI , , - . f . I; : I I ,. I !; .: : j I t . . I ; 4 +!;' i; II : j" t t ; . . 1, i . I . i ;, , : .! ! : II : II i , *i I! ,. 1 : I, . ; i I. : i : i III I I 4: " I 1 - . : : 1 , i II' T + , , . 2 f : ; I i II: 1 t i, I ! I . -4 1 - i L : : 411 i : I f * I *1 ?i : + - , . . ; :_I , . , I i , ; 1 , , . .. . i 4 1 i I I iI 7 . -, , t II I : ; I1 I ! ;1 ;I I ,! t I i ' I, , . 1 ' . I . ; , , , I, I, f . 1 iI, ! . , , ; - : i ; 1 j f t , I, i ;! . " ?: : ; i ; : , . ! t .' ; , I: . t I ; , i , , . , , . : . - t' . I . " I T_ . ; t , f , , , ! t I- + t - - . _.-_'TTTm46mT . . 1 4. t I : i I I; , , . - ! '. j . I. . :f ': : t ; : ;t I I!f , i" I i .! 1 ? 'i i. ; , ; ! ! z; , i 11 : ,t ; : 1 I i :+ I 14 , i !i i 1r I + iI 1 , I t, I .. -' i ; , 1 1i I j TI ' 11 , , II I , , j I 1: 1 =i 4 . 'I4 i ' . . ' i . : : 1: Ij , ; : : ; , I . . : t . LL I ' -1' * . II I I i : 1 i : i i I ' . . . : T. II; + - :I i , : I TI t 1_1 _' !_1i I I I :'*11 i ! , , : I ; ;i ; 1 ! i : 1 ; ; ; ; Ij . j j . I I I . If i: i1 , I I1 -. i' 1 i i ,t : 1 f4, i ; I 1,.1 1i1, , I, ; 1 1 .1 1 , 11 I: I ;__L_i , t I , i , T-- 4 ; ,, 1 . i I. I ; I 11 -,-1 . I I ; I i I I , ---, , - - I; It i ! I 7- . , -- - I . " :- _ , iI . . i I , , - - . ; t - T , . . " T - -- -, - . . . . . - . . . . ,::: - -- . +. . . - -__ -, . : - -_-_ : : : : I :_ : _ '. I - I- I -- . , - - . , , I. , I I: I. , ,,, . . . , :- : : : . ;; , -- : ! I : ; ! ; i I ; , ,. I . ! . . . i 1, :i , - :_-..-* I' iI . I - . . . .- - : : I : : '. I- - . - - .I . . . , I '- : : - - I. : : - : : -1 . . .. . - - . _ - +++ . . : - I II- ' _, : I : : - : : : : - : _ : :.* . ' I :: :: : : ' * : : : i ' : : : Iw : - I: - : ' : : . : : . , . " . . . I - - + . . I. . .. . + . . I . . : : : I : * : : : : : : : : : : : - : : . . + : : : : : - I: - - - : : 1 Ii " I , 1 i II1: . i , I I, i , , I f ! f : i f i I ! ! 4. ; t . . i It . I . I+ I ; 'I , t 11 I : : 1, I I ; . I, ; ? ! ! ' , . i : t I t II ! : -1_ . t , I: i I t ,I i t i ! " 4 Ii ! I ; I , i Ii ; . i i IIi i ;1 i ; f f+ i ; , i ! t t t ! I, , , : I 4 . 1 . : i , 1 - ;11,1 11 i i 1! I , , II. . . . I - I I. . . . - i- -- I -_ ,, I I " 1:i ;j ! , : , . -_ - : - - , - : : -1I : 4 0 : + , , *; 'f " . . I- : +I I I. . . . : . . . . . I . I: : : : I : -' : . . + : : 7: . : : : : : : : : I : I, 4 + j ' I 11 ' , t + -i * : I ! i t 4 i IT I .. ! ; I ; i i. i - I II ! ji 1, : : .' : .... , ; t , , I. ' - - : : : : : ; . , . . 1 , -, t i; _1 I I i, i _4 i 4 I . . , . . t ; . 1, , i ! 1+ - i ! 1 . , , 11 ; : f I i ' II . I : ; 4 11 t , , - . f I + I w: : '" : : : :: :- ';i:, I" + jI + + T + ., .. ' '_ I- -'" t .' , . I , I . : : t :' I . -. : T t t - ; ; . .. . I - ,- , t - , . t , f I , 7: : ; , I1 : f ' : T : t ! :: ! II - 4 1.T.. , t ; . i-, I , I; 4 1I I I -4f 11 : , ; It I ? j " 1.. . , , - 1 -. ' , :II _+ i i r i I I II r i i- __4 11 i , , I T 11 4 Ii i , i :, 41 . , .. : ; I , .! ! . ,:; t; ,- , , i ! , i .. : - t : I, : , :: : w: :: .1 , . : : : -, _: - _- : : : '- : - I: : : : : _ + . -: : _-. :- ' ,: : : : .:. :. :. : : : : _* : . I . . . ; :: . . . : : : _. :" ' : : -. ' : . : - ' ; ' : . I. . - , : : i - I , . , . I. , : : : ' , : : : : : -- AI~ : . I. . I- - : : - -1 . ' . . . . i . : . + - . . : " : , , : - - - : I - . , " 1- - t 7+ - . , : : . 1 i 4, 1' : : I, - . I .. I .. , + . -I II , - - , , -_ _ I , : " ! , : I' ' : ! t . , : " ' i: T: -_ , 4 , I, I I - , , . 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I-. t , I, .- .1 : I I - : - .- - -_ . ::+ . . . . . . . . . . .:: : _-: - - : : -1 . - -: - : : .- : : : : : : : : : : : :: :: : : , : : _ a+ " : : : : : ' : - . . .. . ,. . . . . . - , - . . .: . .. . : : +' : . . , . 7 - . - :: . : : -: : : -I I ' - * : : : : - t * I : - ;+ , I::-.: . _: - __ ' - - - . - . t : 11 . : - . - I 1 . , , T : :. I ' ' * i - . : : + . I II . , - . : ! .:-: . : : : : j . , . 1, * 1 T! irt '' , , -, '* ; f . . : , . , I - TI + t I " i 'Ii : T : I " I -, I i '* i !I , ! I . i , I : ifi ; I , i : i 1I .!- I -, t II 1 ; 1 5 ! I , ! , ; 11 1t i; ; : Ii II ..., . , I; .- 1, I I " , I L 1I 1i i ; 1! i i, I I; , It ! - t , I , ,, t+ ,,, : 1 II, t j j 1 : , , . 41, , , .! I 11 ; A iI ! T 1 I !f : Iif I : 11I t , . : : : - I . 4 : . . , . . : ' : : . I. ". - - '. 1. . . : t ' ,- : : : ; : .. - ';i I T+11 - , !- =" IT: - :::, :': :'_ :::::, 1j4ti: I 'i11 iI? ; i.. .1;4 1111, ;.-,.I '" '- . . , 11 : , . Ii I I i 1 t Ii : -1 . I 1, ' 1-, , i 11! . : : I i -- i , , I 1 : '7 : I , -T i ;: . . i . - 4 ; , , -- , !! I - I-1 I . -1I +I I i- I I i . I: I - i t , I, ; f , , , ! ,, - I t ,I , , i" t --i : : . ; 11' '' , 1 4 -. I f i ' ' ' , , -j I + - , _q 4_', I,t I I f , 4 I- , ; , i i : - : i ! i ; i ". ! 1! "' ! 1: : - I III I III . I. ' 111 I1, i I ! I. ..II -... .I.. ..t. , I , t . , I - . I I - . - ...f ... ; : . w-_- *1 i -_ -_ T: i ." ; T - i * , I , I i ! i I, ; i ,, , I; I , ; I, I " Tt ,I i 4 ; I : . I .i I1 - ' ;i'' 11 -+_ -1I-; i - ; 1 , : , . . - . I. I. I ki : : : : : I : I " ! '. I . + . . I. - . -1 I I I : ; ; , I; II, . . I... ; I , . I- t' ' ..'; iI ; .,I ,,I , ! ,- ., ., I I .. i. t . + . . . . i I 1T . : i t ' * ; , - 1 I ' T, :: _____A I. I ^ . - i I : :. , , :* 4 _ ., : I . , I . + ; .: I . ,, . .. . . + , _ : , . -. -. , ,. 7 .. , . I , , , , :: ,11 i * ,I : : : . . t : - : : , : , : I. I. . I -_ - . . 1 - 1- . I : . : , '. - 1 ! .. .: : II I' It : - : : ; I: ! ! II. 1 : . *1 ,. . ; i ! : ;: ; : I , .. 4 I. ., . I -I f iii . . :_____'* - - - .. + . . . - = : .: I . + -_ p: : : : : : : __ _ _ _. . I I . . :* -- , w: V I'. _' :: . : - : : : * ' " . : p: + . : III I :. : . . . . , r% I - , : : - - : I: : . : ' I -- __ I. : - I: -- : I. . . i . . . . .. . . . . ! w : : ' . . - . ::- - I:- I_ - . I. . + : : i . . . ! - - : . : I: . .* : : . - - - . . - : : : I : ; I + : - -, . __ 7' 1 : A I. . -- W T* W . . ; + , I. I T . -: 1 ; . : . ; , 1 T" ; ; 1 : i * ! i 1 I ,' 4 0 4, . . . I . : : : 4, , , , , - it ti I : I I , I ^ - I II, , I i i 1, , I :, 1 --1, 1 ! 1 !: I - I ; , i -, t1 ,; : 1- 1 , 1 ff-i : +,I yl_" I 1I 0 - 'f:i 11+1 1; 'I , '4 II L ,I 1 '-. 4 4 i 1 1 f 1f ! it ' , ,i I - t I, j 1 ,I1. IIi , : , ; ; , ; I. : i _i 't " , : 7i : : : 1 I I I ,i' ,1 I 4 , ! ; 1 . , : I! I I I ' I T , , - , 4i ! , : ' I it * i :i : :- i i . . .. ; I ii I T; ,i 1, I - ,! :! '. I I , : 11 jI T, , I T, ; 1: , - I 4 ' , i iI + +1 1. I. I. - I. I- .. .I , 1 I j 4 : :4Ii 1 I I. , t II. . .1. t ; . I ; I I. . . j . 1; t ::' 40 ': t '..*_; :11 I; . I. 1 4. . . . . : . j . . . ... : . : t - II- . I. I I 4 . . i 7 ; , , : . I 7 ,7 . .;!; t- ! 1.1 . ___ . . . . . :: : ; - - - !, t : : I- : : I: .,:: _*' i 1, : :4 .... + . : 1i: : . -, '] : IdIk . . I It. . .: 1 .: ,: i . , . : I. . - , - , . I . - i "_ .: .' .' I t , -- 77,7-- - V 1 - :: II I , -- , . : : f . . . ; . I. . T. t ! - : . : i: __ ^ : : . . - - - I . ........... - : 18 X 25 CM. 10 X 10 TO THE CENTIMETER 46 1510 KEUFFEL & ESSER CO. MADEIN U.S A. .. - .ig Variation of the sp uttering yield with angle of incidence for H ions on aluminum [calculated from Eq.(26)]. Clt . . ..C *C. 35. ig. 15 t. I -- - - 1- --- 7 -7 t - I 4-+ -- - - -- - -+ - --- --- -t +4- + - .~~. --4 1 1 4- t:-* t~----- --. .~~~~~~~. O I I I Il 4 .. -- . t1- . .. - -. . . - - - - . -q - -- - 7 I---- -7 - - +t - -. - - - . .. -- . -- I . --- - *- -.. . .. 4. t_*_ -77 -. -7 -...- t~- tL I - T:fVi 7 1'7 771 7fP 11 1- . - - .. - ti -,- F -7 -. -. +-- * -- t ~~~ -. t 4 t -r*-- -- -- s~~~~. - I -T+ -- - - --- ++- - - _7-1 +I + t - -7* --- T -t .. . ..... . I II -1111 . .. . .. . - '8 F .. - . .. ;; --. -- -- -1 -t - - - ~ . ... -- ... ....... 10 X 10 TO THE CENTIMETER SA. & ESSER CO. K~KEUFFEL 46 1510 18 X 25 CM. MADEIN U 77 -.- ~ 77i-.- - -t - I- .9 . t ,. , . . -.- . t _- . ,- Fig. 36. Variation of the sputtering yield with angle of incidence for H+ ions on calcium [cal- culated from Eq.(26)]. .- ...- - -.-.-.-.- - 0 -- - t- G 7- 0 .o .- -.. - -- - 7 - - - - - _1 - -7 - -.. - .- - . q.j q - . - - *7* - -* - - - -... *7 - 4 I 7 7 - = ~ ~~ * - . --7 . 7 _ - tt - -- 4z-__-_ 1-t - -7 7*-7 - - -i"' - L -IL - - - - - _ KEUFFEL & " -SSER CO. MADEIN U S A I I I I 'I ~i~" 1---4--- t -p: I I I I -- I 2-F..7V1-1__17 -1- -'-4- ----- 1K t1~* Vt.:.. *1~ V- . + 7-- F- , I . 1 Fig. 37. '-t- F -T - ja --I I Variation of the sputtering yield with angle of incidencefor H ions on chromium [calculated from Eq. (26 ) ]. - * * 1 - , I 1' v : -- T::: 144: K 1- -i--F- ----------------- C), . ...... J (D - -7 777-- I -7 -1 ILL C-677-, 7777 7 -7 - -- - - - - . b. I -1-4 77 IF. . . ;4 1fIW . b. . I :1.1 7 iii *I''I I I I + 4+ -7 77 -- r. vv _ V I7 W-1 2C-(ffi407 - ::: -71771-71-7 .. ...-... -7 I - 1+4+7 NJ,' - 1 - 1 4 -P-HHI IK IiiiI; 'vii 7Jj~J - -. - - 4+479 9+ -- 1 - ___ I ___ II.....I..........I I1 - 1 r I 7K,-I--- I - ' -7 18 X 25 CM. 10 X 10 TO THE CENTIMETER iF'" KEUFFEL & ESSER CO. MADE IN U S A. 46 1510 -I- .1 I~ I- II 17I ~~~1~1- I 7'- 2...... LI I.- 1- .4.... I.. I V _7 *;,r..V7f [V Fig. 38. - ' I .: I I I HA ~ I ~Y 1K11V -1 -- . A I~... t _ - I--- -77H- Lo I H-K I ~ H 0h -7-771. liii-... 0 ~ I _ t 7-- 0 -~~~ 4 .......... 7 T ........ . .. I~~~~ 4~; _ I I. 771. H)..4. .I C) -- _ ~ t7 { _________ Variation of the sputtering yield with angle of incidence for H+ ions on copper [calculated from Eq. (26)]. I_ ~~:8~-. I .. -7)I ______ I i V7I77iI7 7T'7----------7i 7t77 __ I_ 46 1510 18 X 25 CM. X 10 TO THE CENTIMETER k6 10KEUFFEL & ESSER CO. S.A. LJ/- MADEIN U --- H -~7 }** ~~~~~~. *_ . ... ... ... ' ' .~_ ... Fig. 4- flhi4Ii ~ xr J _ 39. _ .. .... .. . _ _ _ Variation of the sputtering yield with angle of inciden ce for H+ ions on gold [calculated from Eq. (26)]. 71 _ _ _ _ -- *1- 7 c-d I I _T1 IF I J ~~Jj it -- -1 C6 7__ - 4 1 , _.d.r_..._ 1C2 ) -I-- 71. 0 717~~~~~~_ -. 7 I717 ~. 4 iT1 !HI ;T i; O* -t 16~K T1 ai 0 40 100. -'--I 7-7,{§17 .. H .... .J F11 t :K L TNivII trt 10 IM X 10 KEUFFEL & ESSER CO. MADE IN U.S.A 10 -- Kr mb A. 40: {. p, .K.i. 1210I V.. .jJ 11 J77 Cj. 7 __ _.7, F j :F Fig. .... .... .... I2IUJIffiIZIILI[ILIiLIL L 40. ___-. Variation of the sputtering yield with angle of incidence for H+ ions on iron [calculated from Eq.(26)]. - r T T7 1- .'11'1 1tl00- 4 -- ~~1~~~~~~~~~ '- 'T 7 4__ _ _ .*. . ------------- -0-- -6 I (D) 1.-i. I I I ~ ~~~IT ' : . 4 :I t.J.f:I I tT Il ..~ . r' - 7 1 iLl 1 1 f 1 1 t~t7V 1 1 i 1 1 4-i I .- 10 X 10 TO THE CENTIMETER IF%C-KEUFFEL & ESSER CO. MADEIN U.5,A 18 X 25 CM 46 1510 .. .. .I...7 7 ~~~4~~ ., £. - d -Fig. . . -_ 41. _ . * 1H 7 IT_ _ Variation of the sputtering yield with angle of. incidence for H+ ions on magnesium [calculated from Eq. (26)]. 24 7, I i I 1w - - t_ _ -4---4- -- __________ -- 4- -# 0 V _~iI47PH -1 v-f ~~-V~~2 --i--4 -7±- +1+' ~ ______ .~.... a. I -- I - i. _T I .~. I r------I------- ___ ___ ___ ___ fITT-rT:-TTr-T1-r-T-1-------~-------r +__ I 1 ------- VP~777K "~I 7I~.K ~......... a ViK-------------------------0; 4--- (D -7 4-K _ r I .-j---I t - 7 7.-..... ___ ___ I I -- 4- _ -t----I---------------------------------------------_ .-- 4 7..t 7 .77 . ........ . I _ __ o0h1 17. T 7 I -. -.-. ; F 5 ril!; 6 D 7j0. I 0* - z.ZL~li~tt~zp 90*9C* -7 ' .-.--.. ~1II1I2I I_ f 77 77-7L K 1 ~ .~ -~ - 10 X 10 TO THE CENrIMETLr ** KEUFFEL & ESSER CO. Id A M. 46 1510 MADE IN USA -I-H -4I-------------------.. . j--------_ ---- ------ --- -i----- _~. - .. -.... 7,+ Variation of the sputtering yield with angle of incidence for H+ ions on manganese [calculated from Eq.(26)]. Tig. 42. K *1~.A. -0 ) A~ 1 =WZT-'Qr- I ! :12.if I . 4 ii>. 22~ I i.Lii -K 4L- .177-77- -T~~ 1 I- . . t* 7____ .... .. ._. - ..- - ...-- 4.- -.. ~ .. . . 7 __. ... ff -47 77T .. .. .... - ._. ... CJo. . .f- - .K.......... b 77 _ ... _. ... H.. .... I . ... . .... _ Ln~qL _ _ 17-1~m_ _~ I'::-b _F I-_ _ ~ :T_ I I _ IL - 1 1~t ~ . - T- 18 X 25 (M. 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. MADEIN US.A. 77-- - 4b -*- - 7--. 1. - -+1 -~I- --- - -vr - - - r - ----- --- - - -- - - - - 7- ? 7 - 7 -d 1 Variation of the sputtering -- Fig. 43. - I U 172 -77* ~ 477-*1 71777 - ..-.7-7 - .... t. -. 7~ - 7. - t . t. -t tti 0 i-i-- -7 -- -- - 77 7* 7- 7T Cl) 7t} - -~ti - t - - *- -7 *-- t * -7 -7t7 - -7 7- - - - I. - 7- -- 77 .77 . . .. . II 0 -< [calcu- for H+ ions on nickel lated from Eq.(26)J [. . i ..-.. incidence angle of yield with - - * - - - - - - * - -T - V-j 7 -7 -7 *7 - - *P--N U) - -- K- ----- 1 - - IVK1f7t717177~ 7 ~KHKV17i7Vi7i71l~KVK7 - t t ---- -9t . -7-7- t4 t - -- - - -7 - __ ___ -'- 7 ___-- 0 C7 5 I -7 --- - - * -- - -H- -t - -- - -- -7-07 -- - --- - -I ----- L - 7 * - - * - - -- -- '1 !0 -------- .. -- --.. ---.. ___ 10 X 10 TO THE CENTIMETER Lk'- 7 18 ---. 46 1510 25 CM, -r--- - -- --4 4-- - - - i * - X KEUFFEL & ESSER CO. MADE IN U S A. - cu a e. from p - H+ - ion -(261. .ig. 4. :: t_ . ii.---... . ., . _.. 7.7f77 44- t . ---- -.- - --- --- Va. -... I 7 .- ..... - [cal- - ~ --..- m _( _ * Variation of the sputtering yield with angle of incidence Fig. 44. 4 -t. --- - - --_ " . -- . . . - -. -.. -. -.. - - - ~ ~~ ... - . . . . . . ----- . . T_71 L -f -- --- -----. - - 4 . - - -. . - + - I4 - 7 -~~~~~~~~ 7 4 t - - - t t - - - . ...... .. - -- --. -- .. .... .. .. . f . .. . - t- . - - - - 4 t U? * *- - - -. }-'E 10 X 10 TO THE CENTIMEIE .= KEUFFEL & ESSER CO. MADE US A - ..... } IN Id -- 7 ......- 46 1b10 xt 2Liv 77777-~ _1___ Fig. of Variation 45. for H tI -- -- incidence, [calcu- Eq .(26)]. -- -- t -i- i * a, sputtering of ions on silver lated from - the angle yield with C), T - t - -.7 7- - - - - - - T ... o 2 * ... ........ 3 -I .... 49 7771 Ii rr --- 1 45 6~ 80 9 0* 100 - L4'' 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. . ... _. * .. . **. 46 1510 18 X 25 CM MADE IN U.S.A. 77- 7_77 -- '-7-- 7-7---------7 I .. *. --Fig. 45a. ~ . . . . . . . . . .. . . . . .i t . of the sputtering Variation of incidence.. angle with yield ... for H+ ions on sodium [calcufrom Eq. (2 6) ]. lated 120 . . . . .t . L .4 *~ - - -- 1 * - ~~ - 3 I- 4- - -7 -.- 1- - T - __ _ -: _-__ 10 ** 8 - 1I 1~~~.. 00 0 --T ~ -_ 9_* -7 T I-- 72(30 _ _13 __ n _ *1 1 -1L. ,012 _ -- -- 4 1: : -____________ . 4, ___. I 7- --- - 7-- - - .7 .__._.._. .. ...1 .-... IW: I6 -) . 1.1 71}.7 -77- 7- . ............ ... .. J..3.Z.L...... ___il..I.. _ .... ... ) _ I 01 Q__ If- KEUFFEL & ESSER CO. 46 1510 18 X 25 CM. L/f- 10 X 10 TO THE CENTIMETER MADE IN U.S.A 1 - ... F~~~~: ~ .7. . Variation of the sputtering yield with angle of incidence 46. Fig. for H+ . ions on titanium . . . . . . . - -- - - - - - - - 11 ... .. ... .I. 0 L- . . .. 2- - c>nt ] [ ( E it ..-.. . [cal fromnEq.(26)]. -culated -u B * ----- * C) Cl) - .-- . J~~... -. . - ... .... . . -4- 1~~~~ . . - *. . 4 1 1 1 2 -- j~ -iF 4---- . - - -1 - 1. -- -. i I "- - " t ~1~ I: I 30* ~ I~ ~ ~~ 4 ~ 5(* 17:L- ~ ~ 6 ~ 7T* ~ II ,- ~ -. -. q- .- I - - - - - -7 - 7 t -- -.- --7 7 -7 7 -0 ---- ;7 0 -. -7 -' : t1 -7 -- -7 -- i - --1- 4 -- { (--> -. . 1 - - 7 - - --- - 4-7 J L-K- t-L + L- -__ ~~~~~I ,-,,-,j_ _!,,, 10 X 10 TC THE CENTIMETER KEUFFEL & ESSER CO. MADEINU.S A. . ... 18 X 25CM. 46 1510 .. _. 7 :7, 7-q - Fig. Variation of the sputtering yield with angle of incidence for H+ ions on zinc [calculated from Eq.(26)] 47 :7I T-- 7 .4 4. .. II . L7 I411142L712217L22J222IL1L 4 I-- --- q . 117 ,i. 177 I-7T-I-~r--1~~------4---4-----,-----------44t--*--1 11 - . I- -- -4- 4-4- ---- __ - _ _-A I---4- .. *KVK~* - 77 It <4 :r 2. - 11 I I. -; --i ft :, I ~~~ 1 _ 7t ~~.1~ 1-- 4---, 1~ 0O~& - ii~~x7 -- --Li Iz:lzi . - 4+0 KEUFFEL & ESSER CO. MADEIN U S.A. /DZ-/- 4 10 10 10 2 3 45 2 2 2 3 4 5 6 7 8910 6 789 __ T 4 -L I . . . - Velocity distribution of ejected atoms for H+ ions incident on aluminum. OEi=8OOeV *Ei=lO00eV AEi=200eV AEi=400eV Fig. 48. -4 5 5 5 7 89 6 789 -. -H A-' 2 4 6 6 789 I 10 9 3 5 jVjj1 }j I F71 __ ~- ~F~i"I--'iI .ii{iLII 'IF ____ I7 'I ' IAf hi 7 . 41 ~ -t - -- -77 - 10 39 8 7 -A-- 6 - - --- - -- _77- I I-- -~1 ---- ii 4 - -- 7- 3 ro 2 5 10 71-- -9 I 9 i~.ji ' - -~- Iil 1-I AL - 8 7 10 .4 -7 -- \17 6 - - -I -j -t 5 4 1 F 4 It 3 :1: 1 II ii' -I. 7T7 I 14 Th~ AllI + 1, f [ }.44~ T" ll 1W v (m/sec) - -- - -r I 41, I:, I I I I I I AZ~ 144 44 1+: VH Z 10 2 -7 3 4 5 67 89 - 4 KEUFF 2 3 2 11 I 8 7 6 & ESSER CO MA'E -rr'r' 4 5 67 , 10 89 .,+( '+0 USA 10 3 3 4 5 67 /i O44 10 A. 5 2 3 6 7 89 4 5 6 7 8910 89 T -rr---i -- 49. Fig. F Velocity distribution of ejected atoms for H+ ions incident on calcium. 4 -T-4 109 iVTI -71 1I22~ 2 5 - I 7- II 14 ~.7 3 8 Ii 0 A 7T- 7 V -V4 +1 '77 K>: 18 OEi=800eV AE -=200eV *Ei=10OOeV AEi=40 0eV , ,,,kO ___ _ __ ___ __ K,I! ~1 *1 'I -i-I t. 6 A -- 7 4 // 44 75 3 7 0 ~r--41i. IlL I. 4 -~ ~1~~~ 4.-- rIT H- 4 .7 7 i' Ii T A4h J t It I -~ t I T t4 411 7, 7 7Ri1 M i I I I I I I I 11!1111fI Jill 1 'Iq lj III "R I- tH t v (m/sec) IT 'I.I 5*?'- 46 4 7522 KEUFFEL & ESSER CO. MADE N US.A. 10 104 4 5 7 8 910 7 6 6 6 7 8 9 10 2 3 4 5 6 7 8 9 10 9 8 Fig. 50. Velocity distribution of ejected atoms for H+ ions - 6 incident on chromium. OE-=800eV *E-=1000eV AEi=400eV &Ei=200eV 3 ......... 2 10 9 8 7 7-- 7 4. 6 - -- +- K K 5 4 r -H- IF! 3 I-I - -~i K- -- ---4.-H -A - i KIH 2 - - -7- -9 10 9 -~ 8 76. 74174 -I ~FT1 ____ _ I 5- F - 4- T. L~d ~ - I! VT:1 - '1 4-h ' , i 11't i j i ;i; - 4 -i -t4 -LI J 4 +-T 4, tr+ f4URI T f ,fi'l - I . v (m/sec) .. 4E11~fl4Itt~II~Iti1 1~ L .uI . a i~~t:Ib I*1.1~~1'i1 nIH1.ILii.I I 2tT'4 III II I' K ; 46 7522 %TL.L Z" X " i I A t ^ & ESSER CO. MADE IN U.S.A. KEUFFEL 10) 2 Is 3 4 5 10 1 3 2 4 5 8910 6 789 I 1 i 6 789 IF K4 ~Z Velocity distribtuion of ejected atoms for H+ ions incident on copper. OE-=8OOeV *E-=10OOeV &Ei=200eV AEi=400eV -~ gIF~"' t 7 -- 7 111 IL -I K i - _1*'17~--~ 4 -8 13 9 8 7 I 6 4 KV- 3 ru q--.1~ - J -9 6 -1I mr 7-7- -- -*1 j- -7-7 P L -+ 5 4 0 Ki 1o 9 8 7 I-J I 2 iLTI. L -7 S----- - 3 T-VF iiT..... .tJ T:,! [II- -I- 1 T~ -4------ 4~~~ T-T Tr Ii h -V -I '-; 1/ 5 - 22 M i- I ...L~L.LLJJ~LIJLU~L v (m/sec) 71+ i - _: -- J4~I I74't -- l~Izj44j4{:44 ~~~~~~~~~~~ -TT KEUFFEL & ESSER CO. MADE INU.S.A. 2 6 10 2 10 2 10 2 3 4 56 3 4 5 6 3 4 5 6 3 _ ~.. ..T71.. 8910 Ji2rI~m1ur ~i:ViiVYv} -777--T7 * VY **~j ; 17 - - L -- / 6 A7 5 4 -I at'; -il- - 7b--W .... rd ~7 2 - t 9 .111 8 7 ~ 6 5 K II i-I Lt~I4ti17L K! ,I T -tit 4 - vT~I ~ l-+ 1-+-f ---- v-v-ti T ~ 1 - ___ i - I P1.17 ~P1~ PT t71777V11iI1-V7Y1T 11477 1771 7717 KV.1 7171711] II T ::j m dnli .1I i Ii~ i .tIm l1 *MmI *:::. I .114TT~it2Tt77V1717171 7t114 171717171T1717 4 .:j - -- ~r~ -17 VVTT7 7: - ,,* 4- - 4 3 7 Velocity distribution of ejected atoms for H+ ions incident on gold. OEi=800eV *Ei=loooev AE=200eV AEi=400eV SFig. 52. *j ~]tt 9 8 7 -4-4 _ 6 7 7--7 _ T7>mKI 3 5 7 89 -711= 4- 4 8 9 789 Al___~ -7 7 ~. ta v1 (m/sec v (rn/sea) -frR4 . . 5 'A &. KEUFFEL & ESSER CO. MADE IN U S A. 2 3 10 105 10 10 2 3 4 2 3 4 5 3 6 7 8910 5 4 6 789 6 7 89 5 6 7 8 9 5 6 7 89 .......... <Fig. 53. .4 D . Velocity distribution of ejected atoms for H+ ions incident on iron. OEi=800eV *Ei=10OOeV &Ei=200eV AEi=400eV " -I 'K 1-c 9 7 6 til . 5 4 3 £0 I I 1~. 414t un~J -- t. ~,1,t Li~ tvI~I~ I141 +WI{+1}4IA1iiVF i~iI1II1ItII~I; Id.7n-lt 1'i iI'ii (m/sec) . t ...... T11 11 I I I , , , , , '' Tr v 'i 14+-, t4 t LITP 'H - - --- ---- - --- rnnTrrrame I" TTu; tu T-1-1-1-1- 4b /b22 INU.SA4 KEUFFEL & ESSER CO. MADE 4 10 2 3 4 5 10 2 3 4 5 67 3 4 5 89. 7 .. i Fig. 54. Velocity distribution of ejected atoms for H+ ions incident on magnesium. OEi=800eV *Ei=l0OOeV AEi=200eV AEi=400eV 411 ~ 717177 ___ . 1: 1.1 *- z i -S 8 7 -i 1--------- t - -- *j ..1 - - ~rij I- 4-I 9 6 7 89106 5 6 7 8 9 0 5 4 3 6 7 89 6 789 TT - I 2 10r 2 10 - -i * I ii __ 6 1 H 4 5 4 Q-~-- ;g4r- -- 0I ___ 3 2 ' H Lj... ii I 10 II.- I L..j... .9 9 8 7 T Qi 6 .4 Li~ 5 4 1. Ad LI-s - I 222 i2~ 2.. -:2 * 1 :jI:I :4. 7: 4if T71711?i I' "TtJ T, ['hI __ j I .1 I ______________ 171 717:1711I 7ii I $4~~42i 44:: II I. -1 IL i T-1 MIT v (m/sec) I.:: p{ 4T 4 ;iV~+; ~IL~ ~ 11 K..1. _T ........ 4 l 4567 10 23 102 2 3 4 5 67 4 56 78 9 10 6 5 6 7 89 789 89 10 9 8 I +- Fig. 55. 6 _. 4 3 Velocity distribution of ejected atoms for H± ions incident on manganese. OEi=800eV *Ei=l0OOeV AE-=400eV &E-=200eV -I 7 2 - -- I -- - 7.j 7.1i77 5 10 -----8 7 6 5 II 4- -9 3 4- 9 o ~1 I H -4 10 9 8 7~ ~ 6 5 1 i t t I~t ITLi ] I ; -- -- - 't - - T - -- | -~ I: -- - - 77- T I*- ::YI. I I~Y~ -4i - -4-4 .... ------ 4 7tlT 1- -7- - -- "It v ,(m/sec) - ii; -ij..-j--i I --- __[ - I T - - ' f:~ }1~ " KEUFFEL & r - 4b /O22 S. M 10 10 2 10 -7 10 9 8 ----6 - -5 3 4 5 2 3 4 5 10 4 3 4 5 S 4 5 6 7 89 6 789 6 7 8 9 6 7 8 9 *1'1 Fig. 56. 4. . . 4.4 7 1 4 3 Velocity distribution of ejected atoms for H+ ions incident on nickel. *Ei=10OOeV OEi=800eV &Ei=200eV AEi=400eV '1.41 *1 2 1~~Ki I21 [. 10 9 8 7 6 - 5 7/I c( Ii .1'--I -- I-I-. 4 4m 3 Ii K 2 9 8 7 - K.. I- 6 1- _ ____ 3 --. -t - - K- hiI . 7f .LVL..4 - t fri 5 4 ~IL 7 @1 I 10-C9' r i ~Ii7{7 t 7.i7V~7Pi7i VlILLi.A77ii7~7f Ylt~1Vi1"K1i777 i~1II 1 11 ~.:j ____ iTVT1KVVT 1 i ____ :.~J777! liii: -+ WV.. t.. -111 1~gV4 t-t 7 i~t II i!i~ - i ---11 - - 2f~I T2II2IhW I 712121 v (m/sec) -14 -tt 11V4,1i t +, 'i 'I 4 4 - +11 1 -41t - 10 4 2 -7 2 102 3 4 6 7 8 9 10 5 6 789 10 I~4 444jiI 7 ~ Fig. 57. 6 - 4 - - - - - - - - - - .1i..iiz.ziitiizilzjtzil th I~ 1-H7H{± H is;7 =77 - 5 Velocity distribution of ejected atoms for H+ ions I L incident on potassium. OEi=800eV @Ei=10OOeV &Ei=200eV AEi=400eV - Lr B~ 77- ___ 7F' 4 7 ___1-*- IFJ -I *- 7_ .1-i- ..77 ~ 10 9 8 7 6 5 4 6 7 8 9 10 5 6 7 89 9 3 8 7 2 1015 - 4 I- -e 3 h7-I 77 2 -9 10 9 8 7 6 - 777 I I i £1111 q 7.h I 2~ I~ + -~ I,: I 101 7717 I~. ~ I H, f f Iff IIJi4tjztitIIA biT tI j4 jL ittjdiijiL 12d1i ~ HI F'--7{ -7V---~ I-HH T 4 1141, 111 I ill" iid d v (m/sec) JAI., I I -i T .. ... .... 1 4 T'fil [Ht I . 7L& 7-IL' 0 1o;;7-7 4 iw I 4r," 'IT: K u &r SSKRi ii ECT IN U A- 2 2 10 10 2 2 -7 3 4 5 3 3 4 5 4 3 5 6 7 8910 6 7 89 7 8 9 6 7 89 6 789 10 9 8 7 6 - . 5 Fig. 58. 4 3 .1.~~~~~~ 2 Velocity distribution of ejected atoms for H+ ions incident on silicon. OEi=800eV *Ei=lOOOeV AEi=200eV AEi=400eV 1 2±~.~-- __ io 9 I 8 7 .1. 6 - ---- - - AkA 5 4 3 0 4 ro f. /111 A4 U -~1' -1 ~~*~1 :7 -t 1-;ITT iL i 1..LII-T I ~1 .T.I7T. - 11 ~F77 f- TI I: I: (m/sec) UI L! i i ; i i i i K T47t 1 ih I I- i4.~i~i ~ M W v IT Llt1. 1 ~ - -0 I 4---4--4- 1 i 0a .1---. i-I. -- A-- 1 T1 -i I j -1. . 11 11 4 . - LI - t1n-t T -71", 1 1 ! 1 1 1 11 11 Iii II- >1 - + 1'' 1 .. I - I I ! 192 EEL & ESSER CO MADEIN , SA 10 10 5 10 2 3 4 ---'A-1- - - t -- ; - , T - - - ,, t ; -7 7 9 - i ;, -: :, ,iT; tI - - tI.i - I;- -I -w I I- -I ----- I +- I+ ;+ - w-1-i- 8910 7 -I 1--++4 ++++- 1.4 1i Ii++++; I ,' Velocity distribution of Gr> t7 2 - 1717-7- - 6 5 4 7- _ 44 0 4_ 77-''"- - - --------- T 2 I/K' 1 10 9 8 F Irhi -7---7 t -7 7-.. I T___- 7 5 6 ejected atoms for H+ ion s incident on silver. OEi=800eV *Ei=10OOeV AEi=200eV AEi=400eV 7 6 5 4 6 7 8 9 8 3 3 5 6 7 89 - - ----p----- -7 I--- V 4 T4 -i--'---1 -7 2 4 .L ~LJil~ -I 10 A.d - Fig. 59. 3 2 . i :;-, I I 4 5 6 7 89 I 8 7 6 5 4 -I 5 6 7 89 -6e 9 3 u ~ T ffiLI. 7TT L]IIiI lIt IL ih HI v' (m/sec) I , , I . -_4_~ t -+++- _ , . 2 2 10 2 10 5 3 4 3 4 5 3 4 5 6 7 891 6 7 89 5 6 7 89 6 7 89 1 I I I I I I I I I I I Velocity distribution of ejected atoms for H+ ions incident on sodium. OEi=800eV *Ei=l0OOeV AEi=200eV AEi=400eV 4 ,-8 .0 - -*----- 9- §V711 7 - 6 1 -_ - - _ _ 5 - 7 - 4 Li~ 3 1< j 1711 2 I, - -9 8 7 6 1 4 -7 - 7 7474' .1:. f -I i i 1; I~ i v i t 1 /s 1 v (m/sec) i :- -: inj It tFut r T _J t rv[ 1+0 KEUFFEL & ESSER CO. MADEIN U.S,A. / J44 105 10+ 6 4 5 7 8910 7 8 9 12 10 2 -1 3 4 5 6 789 r I TiF1:T-&J~-.wT~LI4:k i*. 9 . 8 7- Velocity distribution of ejected atoms for H+ ions incident on titanium. OE-=800eV *Ei=l0OOeV &Ei=200eV AEi=400eV Fig. 61. 6 5- Al Ij~i4P:V 7: 4 1.-ti- 3 2 ro 10 11 I. I .4 :4: 4:1 - 9 8 7 ,t7777 77 6 5 4 ;t i-I 7i.t ale 7- ~ :1l I I I1~i :7 -i-I- 7f... tJ.. 7: HT~ v (m/sec) 7 it__ W~ 46 7522 LOGARITHMIC x 5 CYCLES MADEIN U.S.A. KEUFFEL & ESSER3 CO. 6 7 89 10 10 2 3 4 5 7 89 10 2 5 6 789 6 7 89 A 12 -I- --JI '1 P471t i---- -i _________ ______ 7 .. : i - Velocity distribution of ejected atoms for H+ ions incident on zinc. OE -=800eV OE'=lOOOeV = 2 00eV AE AE -=400eV 62. Fig. tTilI7Tf717t77177t V11L1 I . - #:-- TiK2 / I - -8. 8 7 6 4 AAA' -7 9 5 6 7 89 10 4 3 2 10 -T { K,, - - j -I ~ , 4 . -- 4 0 - .1 ____ -LL - - -.-- 1 - T -- 4- -I--4 II' 4 "'I/1 5 4 - -- II - 3 4 -- - fK ~ - --- - - - I I tj:- -7 . it L£f rt iT471 . '1 11 77.7. .i1 .19 4 7 II I:::': I 4:,jI :44.1. '1 H .u u u un u n u. T U. M v (m/sec) .. I T1 4[ 114 jijz X 10 TO THE CENTIMETER -E10KEUFFEL & ESSER CO. % 18 x 46 1510 25CM. MADEIN USA A7 7, -7- - Fi.63. .. .. . ... I - -4--... --- Sputtering yields for H+ ions on A1 2 03 [calculated from Eq.(32)].4 7 -77 -0.1. -- Iincident - 7--7 =_ , - 7T. 0 7 3 ... .2101.. a 0.1. . ... ..05 07 0. I ~ .... .... w.... . . iiii, ~~- II -7 -77 L -- ,r10 K - - -----I-1~ - q 46 1510 18 X 25 CM. X 10 TO THE CENTIMETER :- KEUFFEL & ESSER CO. MADEIN U.S.A. w, -7 :7- 7777 * 7- _ _ _ _ _ I _ - -7.. 77 _ --- 64. Sputtering yields for H ios7 1'---1incident *on CaO [calculated from Eq.(32)]. 1-.. 7G-2J-t1: {_ 7 w 1-4_I TI ....... ... 1.... .... ... . 7_7__7_; 1 ~ ..1 ._.._.._.._ i5- 1 77- -1 T~ 7 ... ... .... ~ : _ 7i .. __~ --- Fig. I: -v -- 7- .KL ..i._ J t j. 18 X 25 CM 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. MADE IN U S A. --- -- - 46-1510 '- t-- 65. 7Fig. Sputtering yields for H+ ions on FeO -7incident - - - £ -- -. -. ,' Eq. (32) ] .from .- 4 -1--. - 7-=-7ii - . [calculated r r I 77 - 1 -1 7 - - 7 -- _ -! - - ~77777--. - pp w 7 1777717 -7,I (keV) V---7 -_' fE 32 7-_ 7---- <1 .jjI~i .. . . -}71 --40- 77 I ±- .. L :Vr*; _I, _ I I :4 ffi~~:: 4I 7 ... p _77 1 r -. -i - :;--- 10 X 1U 10 1 HL ULN IeIML I L UKEUFFEL & ESSER CO. MADE IN USA A Id " 46 1510 VI 7-< ii.... ______ _______ ...... .. ,T 7. Fig. 66. ... . . .... .... . .7 .. . . .2 yields for H+ ions Sputtering incident on Fe 0 [calculated from Ec. . 3 (32)] -7--- *7-l...... ..... 0 0 7. .. ... .. -. ~2 ~ 0t~~ ~ z0 - -+ ~ ~ ~ 4I 02g ..... ~ . ... .... .. 6{_ IT ~ I~ . , 7 ;---j---- 1 _~~-- .. . . ---- 7 --- 1 -i _ I 77. . 77.i. ..._.._. 4b 4 IbIU INU S A KEUFFEL & ESSER CO. MADE -. . 7777 -7; ~ ~~ . .. ...... .. . .. .. .. .. .. .. . . 7: .. 7,7ii4 -= ~. . . ... . _ .... Sputtering yields for H+ ions incident on Fe 0 (calculated from Eq*(32)). 67. !Fig. 1-4 . F-4r- . . . . -4 - -K- -- - . ----- - ---- -. . . - - - - . + ! -- -- - ..... 2 1* -- 03-- -- it . - - v--_-_ -7 -- -- --- - - - .- . -- --- -. It 7 11 . t _ _ 4 -V -~- I __ IL' 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER CO. 8 x 25CM 46 1510 MADE IN U.S.A <I.. * -~ I I -- -*-- -~ I 11 1- ii I *--- - I. I. Fig. 68. Sputtering yields for H' ions IJ777-T- .4incident on MgO [calculated from EcT.(32)] -tp-- I. _ 17-' -. ... ._ ....... ..... ... -I - o . _.. .. . .. ' -........ _: .:q_____ .. ..... _____ .. .. ....- qEk1)I ______I_ 1 ______ 7 - I-i-. ___ _______ 10 X 10 TO THE CENTIMLTJ-R KEUFFEL & ESSER CO. MADEIN U S A 16 x 2 46 1510 LM. . ;q 1-1-1- --I- , 71 -- f Fig. 69. 7 t-tI* w ;.~ :. - Sputtering yields for H ions incident on MnO [calculated r17from Eq.(32)]. -7 7T77 - i... .. ... 71 __ - i, 7. 44 777~7~ ,777 -77 t 7 , I _77 f7 _ _ q qI -IHH L: I f-H *4~- U A IU I Mr: U:.N KEUFFEL & ESSER CO. I IML I LN MADEIN USA 16 A L. 2( 46-1510 I. .. .... .... -1~~- w .... .... I 14 77 qi I o_ ____ ____ a' Fig. 70. Sputtering yields for . .... ... incident on TiO from Eq.(32)]. .. .. . -= ... -- 7 - -- - .., ____ _____ - - _.. - -. - - - ~ - -.- -- - -- i1 ...... . I .-... ........................... : -J 4 2 --77 +- 1 f . ; - Jt-7I--p7+-: -- - - __* *-S ions [calculated ---- -- . ... H I t. . . . 4 3 KK -.fi ,t --- - *, - 10 X 10 TO THE CENTIMETER INU SA. 18 X 25 CM. 46 1510 n% 4-- KEUFFEL & ESSER CO. MADE - -- Fig. 71. Variation of the sputtering yield with angle of incidence for H ions on Al 0 [calcu- .. ....-- 1 120lated from Eq. (26)]. 7 777 _ 7*-1- -- -- - ------ - - 4: -. ..-- - - - - - '2 * 100 -- - 77 1 3 * 4 ; i I - - -- - + - 7 - - I q - - - - q *.- n5 * &)* .7 t - - 604 - -7 - 7- - - - - -- 90* .......... JHIAL~LIIZJ7 - 1A x 10 X 10 TO THE GENTIMELI KEUFFEL & ESSER CO. MADE IN U.SA. _ _ ~ ~ ~ _ - ~ ~ ~ ~ 4. 46 1510 (M. . .... .... ....... ,. fi2-.- ig. 72. _ Variation of the sputtering with angle of incidence H+ ions on CaO [calculated Iyield ___for from Eq.(26)]. ,. < I '.. .. ... _... . .___...___...___... . .. 7 -I-- - { 7. ... ...... " ---.. ----- t_ . ... ... ... JI 777q 7 , ~XLLI7 i ., ..... ..... .. . 4 -. _- I MtR I & ESSER IUFXL U KEUFFEL .- - --- - -4-- -A- -2 - - -7-- - . IN U.A U.S MADE DE II CO. MA - 7* . - A -- 40 i*1v ^L1U - - - -1- -- - - -- -- ~ - -- - - * -. * - Variation of the sputtering 2.... ~~~~~~~~~...V.. -. - - --- i7 Fig. 73. <-I,~~ - -- -- - yield with angle of incidence: for ions on FeO [calculat-1 il H+ wt nl o niec ed from Eq.(26)]. . * --- 7-7- 6- -*--7 .-. -. --- - -- - G * t - .77o-, - . - 1%- -1 - - - - - - - -.-.-.--.-.-. t7 - -1 -t7 . . . .. ) d- - 4i-4-*1- -4 - - - - - - - 711 - - -- - -!t . .7 - -T 1 .~ . - -09 11 14IAH7 - - - - - -3- WB~ imHi -. -Q iT e 7 SR e -9- 0 0* "I 1112. 171 v T _ _ L//_ 10 ENN' X . 10 TO THE CENTIMLIL & ESSER CO. MADE IN U S A 46 1510 A '~KEUFFEL . . ______~~~~~~~~. it I.____ ____ I '..___ ... ... __4 _ 4 ___ :A Fig. 74. ........... of Variation the __ sputtering yield with angle of incidence for H+ ions on Fe 0 - 1.... 1 a4-- -~~~~: .-- 77* 777.... - H . -.. - -. .. -- . .. _. .. . . . .~~~. .. - . - . ... ~ _. _'A - - - - - - - 1i . t. .. .. V.< . . t _7 -* - 4. - - -- __ 7- . - ....... 4 Os~~-- . --..- [calculat 0ed from Eq. (26)] 6 .. . 789 -. 1 87 - -- - . . .. T .... .. - L/.. nV 18 X 25 CM. 10 X 10 TO THE CENTIMETER KEUFFEL & ESSER 46 1510 CO. MADE IN U S.A 77*7- --. -... +.7.7..7 -'Fig 75. Variation of the sputtering yield with angle of incidence- Ilated [calcu for H+ ions on Fe 3 0 2 from Eq. (26)]. 4 ; 7 K I -- -t 7-.- IT i F I .611 I.~ -.. -..-..-- -F t;y i 110 4 77- t T_~ ii. ~.::>:,:: L~JILJ 0 - 6 9* .4 Iii 1 10 ~ --------_ [W ______ ____ IL-F 10 X 10 TO THE CENTIMETER KC -- KEUFFEL & ESSER CO. 18 X 25 CM. MADEiN U S.A -- 7-I-.. 46 1510 .I:2777 ... ...... 77, 7-I. II _________ V * .... .. ... ... .... K~ , :'..~~. , Fig. .. .... 76. -~- .. .... I .--...-... ... ____ _ _ _ _____ _ _ _ _ _ _ _ _ . . - - _ with angle of incidence ------- ... 77I.. (Z) 4 __ from eq. (26)]. 7 _A _ Variation of the sputtering -tyield - I. _ for H+ ions on MgO [calculatedt- I . _ . . . . . . . . . . . ... . .7 . .. .. . I. . . ..... I .. _ . .. jill.. .. . .~ Q ,. . . . ... .... _ I.. .. . .~~... -4 .. O 7F ~ii VT 07 I , ~.. 901O .... _ _ _ _ _ L .. U A U 4*J C KEUFFEL & ESSER CO. .. m E. MADE INA. .. U.S.A 1+ 01 D1.u <77s, I -Fig. 77. - i--1...~-~ - _ _ _ Variation of the sputtering yield with angle of incidence for H+ ions on MnO [calculat-ed from Eq. (26)]. -~ K1 I - .- . . T ~~ -~~~ -t - i -v T i V'7TH. t- I - n- . 7 ----7 -G t 77-7 I L L '1~ - 7 - I J-7 . - I . T 7 - 7-- 4 ____TI II 7 - 1 t *7 - t ---- . . . .. ... -. -C*2 LI H-r 7*T5 )-9 6 -T3 090. . . . . . . 0- 0 . ._ -1+71 1 18 X 25 CM. O 10 X 10 TO THE CENTIMETER L IM 6 KEUFFEL & ESSER CO. MADE IN U.S.A. 46 1510 . -71 .,71 _!7 :-i - ----- 7::-~ ... .. ~Fig. : -. - 77 for H+ ioso .ed 7-- - [calculat- _ 7 77 q '77 77 ~I ------. -7-- II --7.I . - - -.--- -J -7, - 7 1 I -7 7 i 2 from Eq. (26)]. -7- --- -7- -7 - I77=t ~-P---~------------------ -'~ -- -L4 Variation of the sputtering yield with angle of incidence 78. --- 7- 09-4______ Or_____ -- -- __ _ 7] ~~~ . ~ Ac- I--j F 2 7 I _ _ _ _ _ ___ 0 .1~ -0: 5______ -1 0_______ t -47-- - 7-- - 2 7!-- -, 7LL-LL .L ___ __ ___ LT _ _ __77_ _ rA'= KEUFFEL & ESSER CO. MADEINU.SA 10 3 2 -7 3 4 10 9 5 . 4 2 K1Z7flZFTTT1ITIZE1ITE.EIULTZT7Y1~E~I w iii JIUIIIIIILLIIIIIIIIIILItIIiJ I 6 8 .: ~ ~- 3 / 7 I I I I I I 10 4 3 2 4 5 6 78930 5 6 7 89 Fig. 7 --Velocity distribution of ejected molecules for H+ ions incident on A10 3 OEi=8OOeV *Ei=10OOeV AEi=200eV AEi=400eV 7t 4. 3 3 5 6 7 89 6 7 89 t~ 2 V I ~hTV 7--p 7 )i 5 7T7 9 S1 77- + 00; c1o ool... 8 26 7 5 4 7 109 3 to 7 2 71 7 --I-- :0 9 7 .1. -I:xL. 6 5 7'7I~7F7~ 4 ...V - l41 . ..it . .... -1 T.~ 17. '--4-- ITI I-F IHI I I I 1111IIIIII.IIIIi~iIII~IIIiIjiII.[III T1I~I-1i~rT1Tr-I~JI.r1,irrir~r[~Ii.t rr v (m/sec) mt mtrm LUUAM I I X x43 MlIV] 4b /! ZZ T %- KEUFFEL & ESSER CO. MADEINU.S.A. 10 2 2 3 4 5 5 4 10 7 10 5 67 89 5 4 3 2 10 7 8910 6 78 9 6 6 7 89 1 ~~ 771 L i L '~ i.~~~ rzy 8 7 7 80. Fig. 4. 6 ions incident on CaO. - 5 Velocity distribution of Iejected molecules for H+ . . *E-=l0OoeV 4 11- OEi=800eV 7AEi=400eV 77~7 3 -- -- TT - -T AE =200eV 77 : 7777-- 71. 1 2 - -s 8 7 -- L- - - I.- 6 - - -- -- - 9 5 4 . - 3 -7 7 tt LI-4 2 _ _ It --- lT-! * I 10 9 8 7 6 J7 i± - ,: t__. _ - I, -~ -7- 5 4- L-- it 3- 11-14...It I *iir iif LF F41 I -" f4 :,1 1- - - T - - - - - t1 I 1 .j~ii~~tt~~djdHi~tI.if14~1' 4 - t. +J,I v (m/sec) i1 - -a 11 -i1 i I L -ILL -- 4liI l~-I1--1P~Fi4IPi~-if4 -i-i4+7r - 4T INU.S.A. KEUFFEL & ESSER CO. MADE 10 103 2 2 3 4 5 3 4 5 3 4 5 3 2 4 2 3 4 5 4 5 6 7 8910 6 7 8 9 6 7 89 6 7 89 6 7 89 ! 10 I 9 itt~ 8 7 6 5 Fig. 81. 7-7-7 Ill:: 4 I .j 1tt117t1i7117117 FIVV~~1. ~ 77l~ 1'I-7V yE 3 Velocity distribution of ejected molecules for H+ ions incident on FeO. OEi= 80 0 eV *Ei=lOOeV AEi= 2 00eV AEi=10OOeV II ~.1111.! .1: 2 - TT FI I V. 9 8 *1 H 7 6 5 0, .1 Iii K- 4 - §t777 v-V. 77~ 4 3 2 -4 TK '7 10 9 8 7 V7H77i T 6 I. 5 LI 4 - -I -- J-- F ' T1 -il - q4K I ~ .... ~ IT4HF - . . . . ; -it . I.~.1..I j-It t~ iT .1 I i +I~I4 . . 1- IWVI 't~f'dffl+{4 -T 1111 iii ;1 , II...li~~iALL..L.LAL~tt1~ ILPI~kIL.Iiil.1t~ hI iIt," If - TT l v (m/sec) ~ lI lulttl~lt~ h4fi 4 I ' t lW ll . IiF!1 1IA It 1 tt f-,rtl JH, . ' ' ~iI~ 1 III - I i 1 I :" ::Ta MIT I T -1 IIt~v I 1 Tit till -1.1. I f 2 4 10 2 10 2 2 -- 3 4 5 6 4 6 7 3 9 - . 4 7i 71[-. 4-' Fig. 82. .. .. -t -I: ii *F .1-i -- , - ......... 1!. K F - .....................................................-. I-. , -. 4- ~- I I 01--i Kfl 1~ *1 -57-1 F I -'--4 - .I -- - -IH YF< -F-- F- t1. ~ j-i7+j -4{ ~--p~t L41 I I Fl-. I -i 4-F--H-tItt-F-~h-±.1 4-,t -4 -- 4-4-1 -F---4--4--4- . I I I 1 F. I I 4 ± ~-r1-t ~-r.t~-~I 14t-fl-i -t-1-F- 4trt pma -~ ~--j .7 'A IFLt 1 F-111- 1'tITh 1 umme nI v (m/sec) 4-- -v-mr 1+1 rTTh I iT +JI+I _ I - _ - 4- i~JLEI~LJ~AL 41- -- -- - --I I TflhhCFIZlThYLYIZJIiI KLZ]ILLLiZI22J2&2L12 mmm -i-i F v--i-----........................................................................................... F.::: F :1 I -*+++tA+r1 [2I1~rtt~ ~I JIIII 1IVfl I144 ~-I4444ii4ftI'P I~_I.I4. 4L -rrr-r r~-i-r- ri' 4R F F - --I --1 I ~ -.- -L- 4it :2 .4 I.: - I -I- .1 F-{ - .-. 1- 1.~.~~.. j -I I ~~~1~ -I-i- F. - ~- -- i-I --I- F- - -F* - -- -1t K -I --- -- 4 .1 F-F 1 H Ft : 11 Ii F 2 6 78910 ~- -- -F F 5 ocity distribution of cted molecules for H+ s incident on Fe 2 O3 OEi=800eV 1000eV 400eV AEi=200eV - II 5 4 1 2 1 4-V-I <-W-t---~ -4-4i i 7I.Z4..~4XIIi>:riI1I 3 6 7 8 9 6 7 8 9 5 I1 7 89 444 7 3 5 .I...i... 1... I.I.*.I F F.-4 SiV KEUFFEL & ESSER CO. MADE INU.S.A. 10 3 2 10' 45s6 7 89 I II 9 3 2 10 i 4 109 9 ~~- 6 Fig. 83. K 2 10 6 7 89 4 3 5 6 7 8910 iij AEi=400eV AEi=200eV L-- 1 }.1 -T - 4 - --- --- tu -------- t - 5 4 -7 - 7- - - - 3 A T 2 7 I I * 77 44 -7....= -9 io 9 7 - Ti -4 I I 4---- 7I7- 6 -- 51qL 4 -- 3- r HE11 1 I :111 lit 1I Tj; t Ti T1 -;T- Trio[ 1 6 Velocity distribution of ejected molecules for H ions incident on Fe30. OEi=8OOeV *Ei=l0OOeV - T'- H-- 8 7 - \ Ii 2 5 7 89 - i:UILLLJLL:ii2 - 7 3 10 3 4 5 6 7 8 19 7 6 5 4 . T + -'t Tw I-, 4-zzU t~'~U v (m/sec) 3 2 -T 4 5 6 2 10 2 3 2 10 4 3 789 56 4 5 , I I 6 789 II| - 7 t, 6 j -- -_~-i-i-- 5 4 1 I ~ .______- 84. Fig. 1 -1177T2PT -7:7 2 I... Velocity distribution of ejected molecules for H+ ions incident on Mgo. OEi.=800eV *E-=loOOeV AEi=200eV AEi=400eV V' Ii.~~jj ~ {1111L1{L Ii -1. 8 7 3 I o- L>~7 ____ - S- iii c7± T 7 6 5 4_ m ~Ft, I--- 4 F 7 4 -- S14 -4 1 -Ii-.-.-- -777 - 1-tt~T St-" it- 221. -T R iH Htf ::: ---- L -I4 ~KV7<L4 :'LIiiiiTd -- 7Y-P 7 -Kv - ..1~ 3 - - 1T -7T '1T~7t7~I7V~ 171~ 77V T1 j7 Ff 17~ 1 - 2 _ 4 -- 7 2 -- ____ 7l74]- I 5 4 -- -4 t. ~~1~~ T T~t 71 10 9 6 7 8910 6 6 789 7 8 9 10 9 8 3 5 4 3 2 10 5 10 t__ 4 T 4 I ++ -t Ii- i IT v (m/sec) TT t 1 7 TI r.4114 i4- - t - - -: 4 -T %J KEUFFEL & ESSER CO. MADEIN U.S.A %VC I 1J 4- 4r 10 10 10 3 2 10 2 3 4 5 6 4 5 6 4i~ 6 5-4 Fig. 85. 7hfit I _i_ - 9 8 A ii ILH 7 -~1* . 4 5 1/ ,~ - 71 I I Velocity distribution of ejected molecules for H+ ions incident on MnO. OEi=800eV *Ei=10OOeV AEi=200eV AEi=400eV r T: 7 7 I . I I 1.- AI 1A ~ 1:11 2 4o 9 8 7 ~-4~1~1ii - 6 5 7 8910 6 /oYA 4 3 3 1.. V--V 2<.. 6 S 2 6 7 8 9 y - -L!7 *7~f 2 10 5 7 8 9 F~i1-1; 7 3 I. 4 7 89 - 1 i t 3 7 89 io 9 8 7 4 2 __ _ - . .- I IT 4 r7, . t.. T; t.j 111 _47 '[Id1 1 !!.'!; T , tf-I " -i ! 111T IN111T H I I I I I II IIIIIIIIi I IIIIIIIIIIIil I I III II ii A T12< T}77Vi~ iH~ 14 ~~~~~ v (m/sec) b[~ 11 1-id~ I IL... ~ ~i J4: ~~~+b1 TTI11011i"'I tTll',171 *T . d LS!rJc Kr.FF1; . 6 WJ. MAU u A. 2 2 10 10 2 3 4 - { 4 Li 8 7 6 5 4 4 5 Z .. i I I T 86. wV71V 4 1. 3 .17 Velocity distribution of ejected molecules for H+ ions incident on TiO 2 . *Ei=l0OOeV OEi=8OOeV AEi=400eV AEi=200eV i~Tt ~1~ r 7, i 10 liiiTh71L{ -S 9 8 77 --- - 7 -77K J. r 5 4 7-' 7 I I .1 I Li~ **~~V *±i4± . . .1... ~1 ~ 11< :1 l i. j, Ii - -v *14. ... ... i~ - - 1 -4 41 Ii T ---t t-7 __77 -7 -7i~ II 1:: .4! 0 I t,Ili 7- Hti t ! ld''tl- ill T1-1Th 4 1 -7__ ~jj ~T~1 I~ - rt&-. I ii --- I - I I ~L. ' -7___ 6 *1 6 6 7 8910 2 fTI 2 3 56 7 8 9 5 6 7 8 9 10_ 9 - - 3 ! it f H !lit lit; -RJ v (m/sec) - WK~ it + T- 7] .. ....... Fict LII LI .. .....:: . 111441 11iiit1~;774~7~.. ..