2012 2020 > Date

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Un continuum du lycée à l’université
Présentation des projets de recherche
2012>2020
Date
2
CRMD, GREMI et Lycée Pothier
Doctorant : Alexane VITAL
Lycéens : Benoit-Joseph GINDRE, Alexandre
BEAUJOUAN, Justine DUCK, Alan SIGNOR,
Dylan POUTEAU, Méline MORISE
3/19
Laboratories
• CRMD (Research Center of Divided Matter)
works on complex disordered materials at
variable scales
• GREMI (Research Group in the Energetics of
Ionized Media) works on laser & plasma
process and their applications
4
4/19
Outline
I. Introduction
II. Results and discussion
1. Influence of O2 gas flow
2. Influence of temperature
III. Conclusion
5/19
I. Introduction
Daily usage
6/19
The nanotechnologies
Nanometric
scale
Used for electronic
The base element of these devices is
the integrated circuit
7/19
The miniaturization
It is more profitable to produce at nanometric scale
It allows to increase the functionalities
For 1 million of
transistors
• The production cost has radically decreased
• Reduce the energy consumption
8/19
Next step : circuit in three dimensions
This process consists to pile up several electronic integrated
components in a same circuit to be more efficient.
The used equipments
9/19
Hood
Alcatel 601 E
SEM
10/19
II. Results and discussion
11/19
1. Influence of the O2 gas flow
Sccm (gas unit): Standard Cubic Centimeters per Minute
O2 is used to protect holes walls created by plasma.
If O2 gas flow is not good, the created holes will have defaults.
α
Positive slope
α
Negative slope
Columnar structures
12/19
1. Influence of the O2 gas flow
Holes
interconnection
13/19
1. Influence of the O2 gas flow
α
α
14/19
II. Results and discussion
15/19
2. Influence of the temperature
At ambient temperature , the probability to have
etching default is higher.
The temperature of passivation layer SiOxFy is -85°C.
Liquid nitrogen is used to cool down the reactor
temperature.
We test the temperature between -70°C and -130°C.
-196°C
16/19
2. Influence of the temperature
α
+
Holes
interconnection
17/19
2. Influence of the temperature
Roughness on the walls
The best result
18/19
III. Conclusion
Influence of the O2 gas flow and the temperature
The best result:
19/19
Thank You For Your Attention
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