Data Sheet MEPGGPENd
Gas Purification Assemblies
PG Series Gaskleen® Purifier
Assemblies and Manifolds
Description
Pall’s Gaskleen® PG purifier assemblies
have been designed to handle process
flow rates up to 1,000 slpm.
• An optional bypass manifold is available
complete with isolation valves and
backplate for easy mounting.
• Pall’s purification materials are available
in every standard configuration.
• All purifier assemblies contain an integral
316L stainless steel particle filter.
• 100% helium leak and pressure tested.
• No detectable metal contribution
above background in HCl gas with
HCLP material
• No detectable metal contribution
above background in HBr gas with
HBRP material
Specifications
Assembly Flow Rates
• PG550: 75 slpm
• PG2400: 500 slpm
• PG11000: 1,000 slpm
Particle Filter Options
• PG550/PG2400: 0.4 µm or 0.003 µm
• PG11000: 0.4 µm
Connections
• 1⁄4 in or 1⁄2 in gasket seal (VCR1 or
compatible) male/male
• Inlet/outlet isolation valves (for PG11000)
Assembly Material
• Electropolished 316L SS
• <0.25 µm/<10 µin Ra internal surface
finish
Operating Conditions
• Maximum operating pressure
PG550/PG2400: 3.45 MPa/500 psig
PG11000: 1.72 MPa/250 psig
• Maximum operating temperature:
100˚C/212˚F (INP, SIP, FCP, SF6P),
40˚C/104˚F (NH3P, GEH4P, OXP,
CLXP, HCLP, HBRP, CDAP)
• EU Pressure Equipment Directive:
Assemblies have been evaluated for
compliance with the European Union’s
Pressure Equipment Directive
97/23/EC and are CE-marked.
1 VCR is a trademark of Swagelok Co.
List of Purifiable Gases
Gas Family
Material
Effluent Specification2
Nitrogen, argon, helium, xenon, krypton, neon
INP
<1 ppb H2O, O2, CO2 and CO
Silane, hydrogen, methane, cyclopropane, propane, dimethyl ether
SIP
<1 ppb H2O, O2, CO2 and CO
Carbon monoxide
SIP
<1 ppb H2O, O2, CO2, Ni(CO)4, and Fe(CO)5
Fluoromethane, difluoromethane, trifluorine, tetrafluoroethane,
pentafluoroethane, heptafluoropropane, carbon tetrafluoride,
perfluoropropane, perfluorocyclobutane, hexafluoroethane
FCP
<1 ppb H2O, O2, CO2 and CO
Ammonia
NH3P
<1 ppb H2O, O2, CO2 and CO
Germane
GEH4P
<1 ppb H2O, O2, CO2 and CO
Sulfur hexafluoride
SF6P
<1 ppb H2O, O2, CO2 and CO
Air, carbon dioxide, oxygen, nitrous oxide
OXP
<10 ppb H2O
Boron trichloride, chlorine, trichlorosilane, dichlorosilane
CLXP
<100 ppb H2O
Hydrogen chloride
HCLP
<15 ppb H2O
Hydrogen bromide
HBRP
< 50 ppb H2O
Photolithography clean dry air
CDAP
< 1 ppb H2O,
< 300 ppt organics (as C4),
< 10 ppt acid gases (as SO2),
< 15 ppt basic gases (as NH3),
< 1 ppt refractory compounds (as HMDSO)
2
As tested in inert gas.
Pressure Drop vs. Gas Flow Rate
Nitrogen flow rate (in scfm @ 68˚F and 1 atm)
Nitrogen flow rate (in scfm @ 68˚F and 1 atm)
2.50
2.00
1.50
0.00
10.0
7
103 kPa/15 psig inlet
6
3
207 kPa/30 psig inlet
2
552 kPa/80 psig inlet
37.5
25.0
50.0
62.5
75.0
0
0.0
552 kPa/80 psig inlet
40.0
6
4
20.0
2
100 150 200 250 300 350 400 450 500
0
Pressure drop (kPa)
8
Pressure drop (psid)
Pressure drop (kPa)
60.0
25.0
37.5
50.0
62.5
8
40.0
6
30.0
4
20.0
552 kPa/80 psig inlet
10.0
0.0
0
50
100 150 200 250 300 350 400 450 500
70.0
2
10.0
100 150 200 250 300 350 400 450 500
0
Nitrogen flow rate (in slpm @ 20˚C and 1 atm)
Pressure drop (kPa)
4
552 kPa/80 psig Inlet
Pressure drop (psid)
40.0
103 kPa/15 psig inlet
60.0
8
6
30.0
207 kPa/30 psig inlet
20.0
10.0
0.0
552 kPa/80 psig inlet
0
50
100 150 200 250 300 350 400 450 500
PG2400___VMM8 with 0.4 µm filter
30.0
35.0
50.0
Note: For pressure drop information for a specific application,
please contact Pall Microelectronics.
10
103 kPa/15 psig Inlet
60.0
Pressure drop (kPa)
25.0
207 kPa/30 psig Inlet
8
40.0
6
30.0
4
20.0
552 kPa/80 psig Inlet
10.0
0.0
0
2
0
100 200 300 400 500 600 700 800 900 1000
Nitrogen flow rate (in slpm @ 20˚C and 1 atm)
PG11000 Series assembly
Pressure drop (psid)
70.0
20.0
10
6
40.0
Nitrogen flow rate (in scfm @ 68˚F and 1 atm)
15.0
0
8
50.0
Nitrogen flow fate (in slpm @ 20˚C and 1 atm)
PG2400___VMM8 with 0.003 µm filter
10.0
2
Nitrogen flow rate (in scfm @ 68˚F and 1 atm)
2.0 4.0 6.0 8.0 10.0 12.0 14.0 16.0
207 kPa/30 psig Inlet
20.0
10
0.0
80.0
10
30.0
103 kPa/15 psig inlet
PG2400___VMM4 with 0.4 µm filter
Nitrogen flow rate (in scfm @ 68˚F and 1 atm)
8.0 10.0 12.0 14.0 16.0
5.0
0.00
Nitrogen flow rate (in slpm @ 20˚C and 1 atm)
0.0 2.0 4.0 6.0
80.0
103 kPa/15 psig Inlet
70.0
0.0
80.0
75.0
207 kPa/30 psig inlet
50.0
Nitrogen flow rate (in slpm @ 20˚C and 1 atm)
PG2400___VMM4 with 0.003 µm filter
Pressure drop (kPa)
12.5
70.0
12
10
50
0
0.50
0.25
552 kPa/80 psig inlet
0.0
80.0
14
60.0
50.0
207 kPa/30 psig inlet
2.0
Nitrogen flow rate (in scfm @ 68˚F and 1 atm)
2.0 4.0 6.0 8.0 10.0 12.0 14.0 16.0
207 kPa/30 psig inlet
60.0
0.75
4.0
PG550 with 0.4 µm filter
80.0
50
1.00
6.0
Nitrogen flow rate (in slpm @ 20˚C and 1 atm)
Nitrogen flow rate (in scfm @ 68˚F and 1 atm)
8.0 10.0 12.0 14.0 16.0
0
1.25
103 kPa/15 psig inlet
Pressure drop (psid)
12.5
1
Pressure drop (kPa)
4
0.0 2.0 4.0 6.0
100.0
103 kPa/15 psig inlet
0.0
2.50
2.00
1.50
5
PG550 with 0.003 µm filter
0
1.00
8.0
Nitrogen flow rate (in slpm @ 20˚C and 1 atm)
0.0
0.50
Pressure drop (psid)
1.00
4
2
0
Pressure drop (psid)
0.50
Pressure drop (psid)
Pressure drop (kPa)
0.00
50.0
45.0
40.0
35.0
30.0
25.0
20.0
15.0
10.0
5.0
0.0
0
Lifetime Calculations
75.0
62.5
37.5
2 ppm
25.0
5 ppm
12.5
0.0
1 ppm
10 ppm
0
2,000
4,000
6,000
8,000
10,000
Flow rate (slpm)
Flow rate (slpm)
50.0
Service life (hrs)
Pall AresKleenTM purification material: inert gas service
Gaskleen® PG550 purifier assembly, part # GLP9INPVMM4
500
450
400
350
1 ppm
300
250
2 ppm
200
150
5 ppm
100
50
10 ppm
0
0
2,000
4,000
Service life (hrs)
6,000
8,000
Pall AresKleenTM purification material: inert gas service
Gaskleen® PG2400 purifier assembly, part # GLP24INPVMM4/VMM8
Inlet pressure: 207 kPa (30 psig) contaminant challenge as H2O
Flow rate (slpm)
Inlet pressure: 207 kPa (30 psig) contaminant challenge as H2O
1000
900
800
1 ppm
700
600
2 ppm
500
400
5 ppm
300
200
10 ppm
100
0
0
2,000
4,000
6,000
Service life (hrs)
Note: For lifetime calculations in a specific application,
please contact Pall Microelectronics.
8,000
10,000
Pall AresKleenTM purification material: inert gas service
Gaskleen® PG11000 purifier assembly, part # GLP110INPVFM8
Inlet pressure: 207 kPa (30 psig) contaminant challenge as H2O
Nominal Assembly Dimensions
1041.4 mm
41.0 in
990.6 mm
39.0 in
201.7 mm
7.94 in
439.4 mm
17.30 in
ø76.2 mm
ø3.00 in
PG550
ø152.4 mm
ø6.0 in
Note: For manifold dimensions, please contact Pall Corporation.
10,000
ø101.6 mm
ø4.00 in
254.0 mm
10.0 in
PG2400
PG11000
Technical Information
Impurity Removal as Tested in Specific Gases
Specific Gas
Impurity Removal Efficiency
Inert gases: nitrogen, argon, helium, xenon, krypton, neon
<1 ppb H2O, CO2, O2, and CO, as tested in argon and
nitrogen using APIMS analyzer
Flammable gases: silane, hydrogen, methane, ethane,
cyclopropane, propane, dimethyl ether
<1 ppb H2O, CO2, O2, and CO, as tested in argon,
nitrogen and hydrogen using APIMS analyzer
<1 ppb H2O, as tested in carbon monoxide
using trace moisture analyzer
H2O and siloxanes removed to trace levels, as
tested in silane using APIMS
Carbon monoxide
<1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5, as tested
in carbon monoxide using GC-ECD analyzer
Ammonia
<1 ppb H2O, CO2, and O2, as tested in argon using APIMS
<12 ppb H2O, as tested in ammonia using NIR-TDLAS
Removal of O2 and CO2 to trace levels, as tested in
ammonia using GC-DID
Fluorocarbons: fluoromethane, difluoromethane, trifluoromethane,
tetrafluoroethane, pentafluoroethane, heptafluoropropane,
carbon tetrafluoride, perfluoropropane, perfluorocyclobutane,
hexafluoroethane
<1 ppb H2O, CO2, O2, and CO, as tested in argon and
nitrogen using APIMS analyzer
<1 ppb O2, as tested in trifluoromethane using trace
oxygen analyzer
<10 ppb H2O, as tested in trifluoromethane using trace
moisture analyzer and FTIR
Germane
<1 ppb H2O, CO2, O2, and CO, as tested in argon and
nitrogen using APIMS analyzer
Sulfur hexafluoride
<1 ppb H2O, CO2, and O2, as tested in argon using APIMS
Oxygenated gases: carbon dioxide, oxygen, nitrous oxide,
clean dry air
<10 ppb H2O
<1 ppb H2O, and CO2, as tested in argon using APIMS
analyzer
Chlorinated gases: boron trichloride, chlorine,
trichlorosilane, dichlorosilane
<100 ppb H2O
<1 ppb H2O, and CO2, as tested in argon using APIMS
analyzer
Halogenated gases: hydrogen chloride,
hydrogen bromide
< 15 ppb H2O as tested in hydrogen chloride using CRDS
< 50 ppb H2O as tested in hydrogen bromide using CRDS
< 1 ppb H2O as tested in argon using APIMS analyzer
Photolithography clean dry air
< 1 ppb H2O as tested in argon using APIMS analyzer
< 300 ppt C4H8 as tested in argon using APIMS Analyzer
< 10 ppt SO2 as tested in nitrogen using ion chromatograph
< 15 ppt NH3 as tested in nitrogen using ion chromatograph
< 1 ppt HMDSO as tested in argon using APIMS analyzer
and baseline subtraction
Unit conversion: 1 bar = 100 kilopascals
Part Numbers / Ordering Information
Series
Part Number3
PG550
GLP9xxxxFVMM4
Description
Purifier assembly, 75 slpm, 0.003 µm filter,
⁄4 in gasket seal (VCR or compatible) male/male
1
GLP9xxxxFMAN
Bypass manifold with GLP9xxxFVMM4 assembly
GLP9xxxxFVMM4GCMAN
Gas cabinet manifold with GLP9xxxFVMM4 assembly
GLP9xxxxVMM4
Purifier assembly, 75 slpm, 0.4 µm filter,
⁄4 in gasket seal (VCR or compatible) male/male
1
PG2400
GLP9xxxxMAN
Bypass manifold with GLP9xxxVMM4 assembly
GLP9xxxxVMM4GCMAN
Gas cabinet manifold with GLP9xxxVMM4 assembly
GLP24xxxxFVMM4
Purifier assembly, 300 slpm, 0.003 µm filter,
⁄4 in gasket seal (VCR or compatible) male/male
1
GLP24xxxxFVMM8
Purifier assembly, 300 slpm, 0.003 µm filter,
⁄2 in gasket seal (VCR or compatible) male/male
1
GLP24xxxxFMAN
Bypass manifold with GLP24xxxxFVMM8 assembly
GLP24xxxxVMM4
Purifier assembly, 500 slpm, 0.4 µm filter,
⁄4 in gasket seal (VCR or compatible) male/male
1
GLP24xxxxVMM8
Purifier assembly, 500 slpm, 0.4 µm filter,
⁄2 in gasket seal (VCR or compatible) male/male
1
GLP24xxxxMAN
PG11000
Bypass manifold with GLP24xxxxVMM8 assembly
4
GLP110xxxxVFM8
Purifier assembly, 1,000 slpm, 0.4 µm filter,
1
⁄2 in gasket seal (VCR or compatible) female inlet/male outlet
GLP110xxxxMAN4
Bypass manifold with GLP110xxxVMM8 assembly
3 See list of purifiable gases on page 1. Example: GLP9INPFVMM4.
4 The PG11000 stainless steel assembly (used with all GLP110 part numbers) is fabricated in accordance with the ASME BPVC Section VIII, Division 1, and has a
U-stamp. If the user determines that an L-stamp is required for a lethal service application, please contact Pall Microelectronics for cost and availability.
25 Harbor Park Drive
Port Washington, New York 11050 USA
+1.800.360.7255 toll free (toll free in USA only)
+1.516.484.3600 phone
+1.516.625.3610 fax
microelectronics@pall.com
Visit us on the Web at www.pall.com/micro
Pall Corporation has offices and plants throughout the world. For Pall representatives in your
area, please go to www.pall.com/contact.asp
Because of technological developments related to the products, systems, and/or services
described herein, the data and procedures are subject to change without notice. Please
consult your Pall representative or visit www.pall.com to verify that this information remains
valid. Products in this document may be covered by the following patent number: US 7,465,692
© Copyright 2007, 2011, 2014 Pall Corporation. Pall,
, and Gaskleen are trademarks of Pall Corporation.
® Indicates a Pall trademark registered in the USA. Filtration. Separation. Solution.SM is a service mark of
Pall Corporation.
MEPGGPENd
December 2014