System Information Machine: Manufacturer: Model #:

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Boise State University
Document Control
Date: 5/28/2016
System Information
Machine: Nanospec Film Measurement
Manufacturer: Nanometrics
Model #: 212
Spot Size vs Objective Lens
1.
2.
3.
5x objective lens: 50 micron spot size
10x objective lens: 25 micron spot size
50x objective lens: 5 micron spot size
Film Types
1.
2.
3.
4.
5.
6.
7.
8.
9.
10.
11.
12.
13.
14.
Oxide on silicon
nitride on silicon
Negative resist on silicon
polysilicon on oxide
Negative resist on oxide
nitride on oxide
Thin oxide on silicon
thin nitride on silicon
Polyimide on silicon
positive resist on silicon
Positive resist on oxide
red resist on silicon
Thick films
(if silicon is not mentioned in the above as the substrate, then it is implied as
the substrate to the stated 2-film system).
Operating and Maintenance Procedures
1.
2.
3.
4.
Turn on monitor and let it warm up – usually 5 minutes.
Turn on the power knob (bottom red toggle switch).
Turn on the light (top silver toggle switch).
Follow direction on screen, which will ask the following questions listed below:
a. Enable data link <No>
b. Is wavelength 480? Look by scope eyepiece and see of it reads 480. If
not, type in the value it reads and press <enter>.
c. NF option? If you know the index of refraction of your material, select
yes and choose from a list of generic pre-sets.
5. Put a blank reference wafer under the scope.
6. Move the lens with the cap on it (so no light is let through) into place. The
photo intensity meter should read between 0.5 – 1.0.
7. Move the 10X lens into place. The photointensity meter should read between
65-67. If it doesn’t, adjust the gain knob until it does.
8. Enter the program # of choice.
9. Enter the objective lens #.
10. Enter the objective lens #.
Document Number: BSU_COEN_IML17001
Prepared By: P. Miranda
Rev. A
Page: 1 of 2
Boise State University
Document Control
Date: 5/28/2016
11. Enter a sample ID – any # will work…
12. Enter the Nf of the film (if you chose Nf option).
13. Measure the reference wafer by pressing <MEASURE>. This should read “less
than 100Å”.
14. Replace the reference wafer with your sample and take measurements by
pressing <MEASURE>.
15. When finished, turn off light, power and monitor.
Document Number: BSU_COEN_IML17001
Prepared By: P. Miranda
Rev. A
Page: 2 of 2
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