11 (Saturated) MOSFET Small-Signal Model ■ Concept: find an equivalent circuit which interrelates the incremental changes in iD, vGS, vDS, etc. for the MOSFET in saturation Transconductance The small-signal drain current due to vgs is therefore given by id = gm vgs. vGS = VGS + vgs , iD = ID + id -- we want to find id = (?) vgs iD = ID + id D G We have the functional dependence of the total drain current in saturation: iD = µn Cox (W/2L) (vGS - VTn ) (1 + λnvDS) = iD(vGS, vDS) _ + Solution: do a Taylor expansion around the DC operating point (also called the quiescent point or Q point) defined by the DC voltages Q(VGS, VDS): iD = ID + ∂v GS Q GS _ VDS = 4 V S VGS = 3 V_ 2 1 ∂ iD ( v gs ) + --2 ∂ v2 B vgs 2 ∂i D + + 600 2 ( v gs ) + … 500 Q iD If the small-signal voltage is really “small,” then we can neglect all everything past the linear term -- id 400 vGS = VGS + vgs Q (µA) 300 vGS = VGS = 3 V gm = id / vgs 200 100 ∂i D iD = ID + ∂v GS ( v gs ) = I D + g m v gs 1 Q 2 3 4 5 6 VDS (V) where the partial derivative is defined as the transconductance, gm. EE 105 Fall 1998 Lecture 11 EE 105 Fall 1998 Lecture 11 Another View of gm Transconductance (cont.) * Plot the drain current as a function of the gate-source voltage, so that the slope can be identified with the transconductance: ■ Evaluating the partial derivative: W g m = µ n C ox ----- ( V GS – V Tn ) ( 1 + λ n V DS ) L D iD = ID + id G ■ + + B vgs _ + _ VDS = 4 V In order to find a simple expression that highlights the dependence of gm on the DC drain current, we neglect the (usually) small error in writing: S VGS = 3 V_ gm = iD(vGS, VDS = 4 V) 600 500 iD 400 2I D W 2µ n C ox ----- I D = ------------------------- L V GS – V Tn For typical values (W/L) = 10, ID = 100 µA, and µnCox = 50 µAV-2 we find that id Q gm = id / vgs (µA) 300 gm = 320 µAV-1 = 0.32 mS 200 100 3 1 2 vGS = VGS = 3 V 6 vGS (V) 4 5 vGS = VGS + vgs EE 105 Fall 1998 Lecture 11 EE 105 Fall 1998 Lecture 11 (Partial) Small-Signal Circuit Model ■ Output Conductance/Resistance How do we make a circuit which expresses id = gm vgs ? Since the current is not across its “controlling” voltage, we need a voltage-controlled current source: ■ We can also find the change in drain current due to an increment in the drainsource voltage: ∂i D 2 W g o = ------------ = µ n C ox ------ ( V GS – V Tn ) λ n ≅ λ n I D 2L ∂v DS id gate + vgs Q The output resistance is the inverse of the output conductance drain gmvgs 1 1 r o = ----- = -----------λn ID go _ source _ The (partial) small-signal circuit model with ro added looks like: id = gm vgs + (1/ro)vds gate drain + vgs _ source EE 105 Fall 1998 Lecture 11 gmvgs id ro + vds _ EE 105 Fall 1998 Lecture 11 ,, MOSFET Capacitances in Saturation Complete Small-Signal Model fringe electric field lines gate ■ drain ,,,, ,, ,,, source All these capacitances are “patched” onto the small-signal circuit schematic containing gm and ro ... gmb is open-circuited for EECS 105 since vbs = 0 V. n+ n+ Csb qN (vGS) overlap LD overlap LD Cdb depletion region Cgd gate id + drain vgs Cgs Cgb gmvgs gmbvbs ro _ source _ Csb vbs Cdb + bulk In saturation, the gate-source capacitance contains two terms, one due to the channel charge’s dependence on vGS [(2/3)WLCox] and one due to the overlap of gate and source (WCov, where Cov is the overlap capacitance in fF per µm of gate width) 2 C gs = --- WLC ox + WC ov 3 In addition, there is the small but very important gate-drain capacitance (just the overlap capacitance Cgd = Cov) There are depletion capacitances between the drain and bulk (Cdb) and between source and bulk (Csb). Finally, the extension of the gate over the field oxide leads to a small gate-bulk capacitance Cgb. EE 105 Fall 1998 Lecture 11 EE 105 Fall 1998 Lecture 11 p-channel MOSFETs p-channel MOSFET Models ■ Structure is complementary to the n-channel MOSFET ■ In a CMOS technology, one or the other type of MOSFET is built into a well -- a deep diffused region -- so that there are electrically isolated “bulk” regions in the same substrate n-channel MOSFET A (a) DC drain current in the three operating regions: -ID > 0 ( V SG ≤ – V T ) –ID = 0 A – I D = µ p C ox ( W ⁄ L )[ VSG + V Tp – ( V SD ⁄ 2 ) ] ( 1 + λ p V SD )VSD 2 – I D = µ p C ox ( W ⁄ ( 2L ) ) ( V SG + V T p ) ( 1 + λ p VSD ) ,,,,, ,,,,,,,,, ,,,,,,, ,, ,, , ,,,,,, , ,,,,,,, ,,,,,,,,,, , , , ,,,,, ,,,,,,,,,,, , , , , , , ■ ■ ( V SG ≥ – V Tp, VSD ≥ VSG + V Tp ) The threshold voltage with backgate effect is given by: p-channel MOSFET V Tp = V TOp – γ p ( ( – V SB + 2φ n ) – 2φ n ) Numerical values: µpCox is a measured parameter. Typical value: µpCox = 25 µAV-2 A isolated bulk contact with p-channel MOSFET shorted to source –1 0.1µmV λ p ≈ -------------------------L VTp = -0.7 to -1.0 V, which should be approximately -VTn for a well-controlled CMOS process , ,,,, ,,,,,, ,, ,,, ,, ,,, ,, ,,, ,,,, common bulk contact for all n-channel MOSFETs (to ground or to the − supply) ( V SG ≥ – V Tp, VSD ≤ VSG + V Tp ) p+ (b) n+ source p-type substrate n+ drain p+ drain p+ source n+ n well EE 105 Fall 1998 Lecture 11 EE 105 Fall 1998 Lecture 11 p-channel MOSFET small-signal model ■ the source is the highest potential and is located at the top of the schematic + source gmbvsb Cgd _ gate vsb gmvsg Cgs vsg ro −id drain Cgb _ bulk Csb Cdb EE 105 Fall 1998 Lecture 11