Semiconductor Vertex Detectors for High Luminosity Environments The Dawn of Vertexing e+e- colliders Through Tevatron, towards LHC The Golden Age some villains and some heroes Super Heroes of the future The Rise and Rise of pixels: MAPs, DEPFETs, CCDs, 3d detectors, SOI… Rad Hard(er) Devices: Novel materials, device engineering… 19th February, VCI 2007 Paula Collins, CERN Paula Collins, CERN 1 Alternatively… To Infinity and Beyond! SLHC Who will be the true superhero of the SLHC era? 19th February, VCI 2007 Paula Collins, CERN 2 Alternatively…. How do I cope with having 10 quadrillion particles thrown at me?* *1016 fluence / cm2 at 4cm SLHC 19th February, VCI 2007 Paula Collins, CERN 3 The LEP era Singapore Conference, 1990 ‘The LEP experiments are beginning to reconstruct B mesons… It will be interesting to see whether they will be able to use these events’ Gittleman, Heavy Flavour Review 10 fun packed years later, heavy flavour physics represented 40% of LEP publications 19th February, VCI 2007 Paula Collins, CERN 4 and more… semiconductor vertex detectors used for vertexing flavour tagging, lifetimes.. help in tracking triggering even dE/dx… used at all current HEP collider experiments exploits great precision and small beampipes Reconstructed B-mesons in the DELPHI microvertex detector B hadron Vertex Primary Vertex 19th February, VCI 2007 Paula Collins, CERN tB 1.6 ps l = ctg 500 mmg 5 Challenge of the LHC ATLAS at full luminosity L=1034 cm-2 s-1: ~23 overlapping interactions in each bunch crossing every 25 ns ( = 40 MHz ) inside tracker acceptance (|h|<2.5) 750 charged tracks per bunch crossing per year: ~5x1014 bb; ~1014 tt; ~20,000 higgs; but also ~1016 inelastic collisions – impact parameter resolution important Fast Hadron dose at 4 cm after 10 years/500 fb-1 is 3 x 1015 cm-2 Fast Hadron Dose at 22 cm after 10 years/ 500 fb-1 is 1.5 x 1014 cm-2 detector requirements: speed, granularity, radiation hardness 19th February, VCI 2007 Paula Collins, CERN neq/cm2 per year severe radiation damage to detectors: LHCb radius [cm] 6 What of the future? The problems pile up….. 19th February, VCI 2007 Paula Collins, CERN 7 SLHC environment Integrated Luminosity 2500 fb-1 = 5 x LHC dictates technology choice Peak luminosity 1035 cm-2 s-1 = 10 x LHC dictates detector granularity Scenarios dominated by 50ns or 25 ns running Phase 1: no major change in LHC L = 2.34 ∙1034cm-2s-1 (higher beam current) Phase 2: major changes in LHC L = 4.6 ∙1034 cm-2s-1 with (BL/2, qc) L = 9.2 ∙1034 cm-2s-1 with (fill all bunches) Phase 3: increase beam energy to 14 TeV (9 to 17 T magnets) Detector R&D focused on short term replacement/upgrades e.g. replacement of ATLAS b layer after 2-3 years (1015 neq), CMS Phase 1 pixel replacement, replacement of LHCb VELO … SLHC upgrades (major changes expected to modules and electronics SLHC fluences R=75cm, 1.5 1014 cm-2 3.5 MRad, charged hadrons 20% R=20cm, 1 1015 cm-2 30 MRad, charged hadrons 50% R=4cm, 1.6 1016 cm-2 400 MRad, charged hadrons 100% 19th February, VCI 2007 Mika Huhtinen Paula Collins, CERN 8 Non Ionizing Energy Loss NIEL: displacement damage Point defects + clusters Dominated by clusters A common language: “1 MeV neutron equivalent” Use the NIEL scaling factors 19th February, VCI 2007 NIEL allows us to look into the future and predict what will happen in complex environments (!) Is known to fail for neutrons/charged hadrons in some cases Paula Collins, CERN 9 Radiation Damage: Traditional Villains Increased Leakage Current 10-1 I / V [A/cm3] Noise Hard to bias e.g. I(-10 oC)=1/16 I(20oC) 10-3 n-type FZ - 780 cm n-type FZ - 410 cm n-type FZ - 130 cm n-type FZ - 110 cm n-type CZ - 140 cm p-type EPI - 380 cm 10-4 10-5 10-6 11 10 E I exp g 2 k T B 1012 1013 eq [cm-2] anneals with time and temperature Effective Doping Changes negative space charge builds up, depletion voltage changes Junction moves from p+ to n+ side Buildup of negative space charge worsening in time Strongly temperature dependent: 500 years @ -10oC = 21 hours at 60oC! 19th February, VCI 2007 1014 1015 [M.Moll PhD Thesis] a, the damage parameter, very consistent for a wide range of impurities and silicon types Fluence Depletion voltage [V] Annealing effects I/V=a * f Depletion voltage [V] strong temperature dependence – cooling essential n-type FZ - 7 to 25 Kcm n-type FZ - 7 Kcm n-type FZ - 4 Kcm n-type FZ - 3 Kcm p-type EPI - 2 and 4 Kcm 10-2 Paula Collins, CERN time [years] 10 New Villain: trapping Trapping is characterized by an effective trapping time teff for e- and h: 1 Qe ,h (t ) Q0 e ,h exp t t eff e ,h 1 where t eff e,h 0.5 24 GeV/c proton irradiation 0.4 data for electrons data for holes 1/t changes with annealing Inverse trapping time 1/t [ns-1] Inverse trapping time 1/t [ns-1] Increase of 1/t with fluence 0.3 0.2 0.1 [M.Moll; Data: O.Krasel, PhD thesis 2004, Uni Dortmund] 0 0 2.1014 4.1014 6.1014 8.1014 N defects fluence 1015 0.25 24 GeV/c proton irradiation eq = 4.5.1014 cm-2 0.2 0.15 data for holes data for electrons [M.Moll; Data: O.Krasel, PhD thesis 2004, Uni Dortmund] 0.1 particle fluence - eq [cm-2] 10 cm / s 2 10 1 5 10 5 102 annealing time at 60oC [min] t eff (1015 ) 2ns w vsatt eff 10 7 cm / s 2 10 9 s 200 mm t (1016 ) 0.2ns w vsatt eff 19theff February, VCI 2007 7 Paula Collins, CERN 5 103 10 s 20 mm Huge Decrease in CCE? 11 Radiation Damage: Is Neff really so bad? V. Chiochia et.al. IEEE Trans. Nucl. Sci 52 (2005) 1067 Charge collection measured using cluster profiles in a row of pixels illuminated by a 15º beam and no magnetic field after type inversion - = 6x1014 n/cm2 Neff=NDNA<0 19th February, VCI 2007 Model with constant space charge density does not describe the measured charge collection Paula Collins, CERN 12 Two trap model EA/D = trap energy level fixed NA/D = trap densities from fit se/h = trapping cross sections from fit 1=6x1014 n/cm2, NA/ND=0.40, sh/se=0.25 Data --- Simulation n+-p junction n-p+ junction E 19th February, VCI 2007 Paula Collins, CERN V.Chiochia, Vertex 05 13 Radiation damage as experienced in running HEP experiments NA60 first use of pixels in high multiplicity experiment dimuon production by 158 gev indium ions 16 planes of silicon pixel detectors 12.8 x 13.6 mm2 active area 32 x 256 cell matrix 50 x 425 um2 cell size ALICE 1LHCb readout chips ATLAS faster pixels radiation damage type inversion after 4 weeks running 4x1012 ions on target ~1013 neutrons equivalent 19th February, VCI 2007 Paula Collins, CERN 14 Irradiation at CDF/D0 2 fb-1 data collected (goal = 5-8fb1) L00 (1.4cm) SVXII (2.5-10.6cm), ISL Ionising dose measured with TLDs 3cm z<45cm: 300 +- 60 kRad/fb-1 scales as 1/ra (1.5 < a < 2.1) L00 2 MRad, SVX layer 0 800 kRad Measured depletion voltages both with signal and noise methods Ignacio Redondo, CMS workshop, 20th October 2006 L0 depletion Voltage 19th February, VCI 2007 Paula Collins, CERN 15 tackling the villains Defect Engineering Oxygen enriched silicon Cz silicon … New Sensor Materials Silicon Carbide Amorphous silicon Compound semiconductors Diamond Device Engineering p-type silicon detectors Operational conditions thin detectors Cryogenic operation 3D See talk of S. Eckert 3D silicon stacks Monolithic devices -> see talk of J. Mnich DEPFETS -> see talk of W. Dulinkski MAPS CCDs with on situ storage SOI … -> see talk of Toru Tsuboyama + posters of Bamberger, Traversi, Gabrielli, Servoli, Luuka, 19th February, VCI 2007 Paula Collins, CERN 16 new kid on the block: p-type substrate n-on-n already preferred option for ATLAS, CMS, and LHCb Faster charge collection underdepleted operation an option After type inversion n-on-n effectively becomes p-on-n: Why not start with step p type substrates p side n side Efficiency ATLAS ATLAS Vbias NIM A 450 (2000) 297 Reminder: figure shown at VCI 2001 – silicon experts p side learn about weighting field!! n side Resolution [mm] 19th February, VCI 2007 Paula Collins, CERN Vbias LHCb LHC b Vbias Vbias NIM A 440 (2000) 17 17 p type continued Advantages of p-type high field region always on the strip side – no need for (expensive) double sided processing easier handling proven radiation hardness collect electrons – slightly less susceptible to trapping after neutron irradiation indication of good annealing behaviour (as measured with CCE) cooling, handling Effort going into characterising strip isolation methods (as for n-in-n) S2 high-field regions RD50 collaboration with CNM, Micron FZ, DOFZ, MCz silicon pads, strips, pixels p-stop, p-spray Many groups: Liverpool, IFIC, KEK, INFN.. p-stop p-spray S1 S1 p-spray/p-stop S2 high-field regions Cint, VBR improve with radiation Cint, VBR degrade with radiation 19th February, VCI 2007 Paulainitially Collins, CERN (Oox), worse initially (Oox), better S1 S2 high-field region depends on Qox compromise 18 p type; irradiation of short strip devices Detector geometry: Thickness=300 mm, strip pitch=80 mm, implant width= 18 mm, LHC speed readout (SCT128A-HC), beta source measurements n-in-p : annealing n-in-p : standard FZ ~40% charge loss after 3x1015 p/cm2 (23 GeV) ~7000 e after 7.5x1015 p/cm2 (23 GeV) 3 x 1015 n/cm2 Vdep ~ 1200 V Vfd~1200 V 0.7x1015 Vfd>2500 V 1.9x1015 4.7x1015 10x1015 P.P. Allport et al., IEEE Trans. NS 52(5) (2005) 1903. Performance superior to p-on-n (n-on-n unknown at these fluences) 19th February, VCI 2007 Collected Charge (ke) 14 Vfd 12 10 8 6 600 V 4 400 V 2 900 V G. Casse, this conference 0 M Lozano, this conference 1 10 100 1000 10000 Eq. days @ 20 oC Annealing behaviour w.r.t. CCE spectacular Paula Collins, CERN 19 p type continued Full scale sensors manufactured for LHCb and placed in final detector layout in test beam 8.4 cm diameter sensors strip pitch 40-100 mm excellent leakage currents fraction of bad strips < 1% preliminary results show preirradiation performance very comparable to n-in-n – technology feasibility demonstrated p-type IV characteristics 2433-07A Current (uA) 2433-08C 1000.00 2433-10A 100.00 2433-12A 2433-12B 10.00 2433-01D 1.00 0.10 0 100 200 300 400 2433-06D 2433-05D 0.01 0.00 19th February, VCI 2007 2433-01E Volts T. Bowcock 2433-05E 2488-01D 2488-01E Paula Collins, CERN 20 Oxygen lessons from LHC 10 8 Carbon-enriched (P503) Standard (P51) O-diffusion 24 hours (P52) O-diffusion 48 hours (P54) O-diffusion 72 hours (P56) Carbonated 500 6 Standard 2 0 0 400 300 4 Oxygenated However, note that neutron irradiation is 3xmore damaging and constant for all materials… 600 200 Vdep [V] (300 mm) |Neff| [1012cm-3] Based on RD48 discovery that Vfd varies more slowly for oxygenated sensors, DOFZ chosen for detectors in most irradiated regions of ATLAS,CMS,LHCb 100 1 2 3 4 24 GeV/c proton [1014 cm-2] 5 try materials naturally rich in Oxygen Czochralski silicon Pull Si-crystal from a Si-melt contained in a silica crucible while rotating. Silica crucible is dissolving oxygen into the melt high concentration of O in CZ Material used by IC industry (cheap), now available in high purity for use as particle detector (MCz) 19th February, VCI 2007 Epitaxial silicon Chemical-Vapor Deposition (CVD) of Silicon CZ silicon substrate used diffusion of oxygen Growth rate about 1mm/min Excellent homogeneity of resistivity 150 mm thick layers produced (thicker is possible) price depending on thickness of epi-layer but not extending ~ 3 x price of FZ wafer Paula Collins, CERN 21 Oxygen concentration in FZ, Cz, and EPI Epitaxial silicon 1018 5 Cz as grown 1017 5 1016 5 0 1017 5 DOFZ 72h/1150oC DOFZ 48h/1150oC DOFZ 24h/1150oC 50 100 [G.Lindstroem et al.] 150 depth [mm] 200 250 1016 5 75 mu 50 mu 5 5 1018 5 CZ substrate 25 mu 5 EPI layer O-concentration [1/cm3] O-concentration [cm-3] Cz: high homogeneous concentration and formation of Thermal Donors (reducing acceptors due to radiation) 1018 5 1017 5 1016 5 0 SIMS 25 mm SIMS 50 mm SIMS 75 mm simulation 25 mm simulation 50 mm simulation 75mm 10 20 30 40 50[G.Lindström 60 70 80European 90 Symposium 100 on et al.,10 Semiconductor Detectors, 12-16 June 2005] Depth [mm] th EPI: inhomogeneous O DOFZ: inhomogeneous oxygen concentration due to diffusion distribution, increasing with time from substrate into epi-layer at high temperature 19th February, VCI 2007 during production Paula Collins, CERN 22 MCz silicon irradiation with charged hadrons 8 Carbonated 600 PN std irradiated 3E13 p/cm2 PN oxg irradiated 3E13 p/cm2 PN std irradiated 2E14 p/cm2 PN oxg irradiated 2E14 p/cm2 PN std irradiated 3E14 p/cm2 PN oxg irradiated 3E14 p/cm2 NP std. irradiated 3E14 p/cm2 MCZ irradiated 3E13 p/cm2 MCZ irradiated 2E14 p/cm2 MCZ irradiated 3E14 p/cm2 140 120 500 MCz-n Helsinki 6 Standard -3 400 300 4 Oxygenated 2 Vdep [V] (300 mm) Carbon-enriched (P503) Standard (P51) O-diffusion 24 hours (P52) O-diffusion 48 hours (P54) O-diffusion 72 hours (P56) Neff (x 1E11 cm ) |Neff| [1012cm-3] 10 200 100 100 80 T=80ºC FZ 60 DOFZ 40 p-type 20 0 n-type -20 Cz -40 0 0 1 1 2 3 4 24 GeV/c proton [1014 cm-2] 5 E. Tuovinen et. al. 4th RD50 workshop 10 100 Time (min) Annealing behaviour 1000G. Pellegrini et. al “Annealing Studies of magnetic Czochralski silicon radiation detectors” Gradient of slope after minimum (b) is smaller for MCz than for FZ for 10 MeV, 50 MeV and 24 GeV proton irradiation The effective trap introduction rate for both electrons and holes is similar for MCz, FZ, and DOFZ silicon Leakage current behaviour is also similar 19th February, VCI 2007 Paula Collins, CERN Many groups studying Cz, MCz: INFN, Glasgow, BNL, HIP, Purdue, Liverpool, Rochester… 23 MCz TCT measurements 300 4 250 3 200 150 2 100 hole collection 1013 5 1014 24 GeV/c protons [ cm-2 ] High field 5 5x1014 p/cm2 electron collection High field Low field Low field 19th February, VCI 2007 1 MCZ (n320) - Vfd from IV MCZ (n320) - Vfd from CV 50 | Neff | [ 1012 cm-3 ] TCT measurements confirm that after irradiation with charged hadrons the material does not type invert the trap introduction rate for holes and electrons is similar for FZ, DOFZ and MCz silicon This behaviour can be understood qualitatively as a build up of donors, which overcompensates the (classical) introduction of acceptors Vfd [V] Paula Collins, CERN Time [ns] 1 4 A. Bates, VERTEX 04 24 MCz TCT measurements continued [D. Menichelli, RD50 Workshop, Nov..2005] 1 MeV, = 5 ×1014 cm-2 CZ n-Si, p+ n+ Φ (1014n*cm-2) Irradiation with neutrons shows a more complex picture High field region on n+ side implies type inversion In this respect MCz and FZ behave similarly p+ E(x) is non-uniform in these sensors (as in other, n+ E2 2 non MCz, heavily irradiated structures) E1 1 hn Consider 3 regions: Neff>0, electrically neutral, Neff<0 reverse current flow induces electric field in electrically B Eb neutral base For detector performance, Vdep is an “abstract concept” W2 W1 W More important to consider CCE, charge collection time etc. b 19th February, VCI 2007 25 Verbitskya et.al. NIM A 557 (2006) 528 Paula Collins, CERN MCz CCE MCz Si microstrip detectors p-type MCz Si MG diodes 1,0 1,0 0,8 0,8 13 0,4 CCE CCE 0,6 2 4.0x10 n/cm SMG1 13 2 6.8x10 n/cm SMG2 14 2 1.4x10 n/cm SMG4 14 2 2.7x10 n/cm SMG7 14 2 6.8x10 n/cm SMG16 0,2 0,0 0 200 400 600 Voltage [Volt] 800 0,4 1000 p type MCz Si diodes, proton irradiated AC coupled r/o shaping time 2.4us At overdepletion 90% CCE for 6.8 x 1014 neq Sadrozinski STD07 19th February, VCI 2007 m bruzzi et al, hiroshima symposium 2006 0,6 0,2 non-irradiated 14 2 3.3x10 n/cm 0 200 400 600 800 Voltage [Volt] p-on-n MCz microstrip device, 200 ns shaping time proton irradiated 90% CCE achieved at 500V for 3.3 x 1014 neq Simulation predicts for 300 and 200 um thick a S/N of 10 at 3 x 1015 which would be adequate for operation of a detector Paula Collins, CERN 26 EPI silicon G. Lindström et al. neutron irradiation Kramberger et al 8th RD50 workshop June 2006 G. Kramberger et al., 8th RD50 workshop SMART coll., 8th RD50 workshop Neutron irradiation: excellent peformance of Neff evolution; no SCSI for 50 mm sample CCE measured with mips : 3200 electrons after 8 x 1014 neq / cm2 Superrad hard : Fledermaus-man? (performs best in superhero mode…) 19th February, VCI 2007 Paula Collins, CERN 27 EPI silicon : annealing behaviour Kramberger et al 8th RD50 workshop June 2006 Annealing behaviour shows drop of Vdep in time Using the LHC operation model: With cooling when not operated 600 Operation without cooling is beneficial!!! S-LHC scenario Vfd [V] Radiation @ 4cm: eq(year) = 3.5 1015 cm-2 SLHC-scenario: 1 year = 100 days beam (-7C) 30 days maintenance (20C) 235 days no beam (-7C or 20C) 500 50 mm cold 50 mm warm 400 25 mm cold 25 mm warm 300 Without cooling when not operated 200 100 19th February, VCI 2007 0 0 365 Paula Collins, CERN 730 1095 time [days] G.Lindström et al.,10th European Symposium on Semiconductor Detectors, 12-16 June 2005 (Damage projection:28 M.Moll) 1460 1825 Diamond Polycrystalline Diamonds traditionally grown by CVD large band gap and strong atomic bonds give fantastic radiation hardness low leakage current and low capacitance both give low noise 3 (1.5) times better mobility and 2x better saturation velocity give fast signal collection Ionization energy is high: MIP 2x less signal for same X0 (w.r.t. SI) Diamond: 13.9ke- in 361 mm SI: 26.800 ke- in 282 mm In Polycrystalline Diamond grainboundaries, dislocations, and defects: limits carrier lifetime, mobility and charge collection distance and position resolution 19th February, VCI 2007 Grain size: ~100-150μm growth substrate Diamond as detector material now well established with BCM as first large scale (HEP) application Detector application (pixel, strip, pad) 29 Paula Collins, CERN demonstrated Radiation Hardness of pCVD diamond pCVD charge collection distances of 250-300 mm now routinely achieved charge collection distance saturates at 1V/mm pCVD detectors have been built as pixel, pad, strip detectors Proton irradiation of strip detectors to 2.2x1015/cm2: 15% loss of S/N at 2.2x1015/cm2 Decrease of leakage current (~ pA) Improvement of resolution by ~35% - irradiated material is more “uniform” Proton irradiation to 1.8 x 1016/cm2 75% loss of signal S/N performance > 10 19th February, VCI 2007 Paula Collins, CERN 30 Single Crystal Diamond • Single crystal diamond has been fabricated with Element six ≈ 10 mm × 10mm, >1 mm thickness. • Largest scCVD diamond ≈ 14 mm × 14 mm. Most probable charge versus thickness High quality scCVD diamond can collect full charge at 0.2 V/um Width of Landau distribution is ≈ 1/2 that of silicon, ≈ 1/3 that of pCVD diamond radiation hardness under study d=320 μm Excellent mobility. For this sample: µ0h = 1714 cm2/Vs, µ0e = 2064 cm2/Vs High drift velocity better lifetimes charge trapping might not be an issue 19th February, VCI 2007 Paula Collins, CERN QMP=9500e- 31 Irradiation: 3d detectors Proposed by Parker, Kenney 1995 Planar Device 3D Device Maximum drift and depletion distance governed by electrode spacing Lower depletion voltages Radiation hardness Fast response same technology: dope edges of sensor for edgeless detection efficiency At the price of more complex processing 19th February, VCI 2007 Narrow dead regions at wells Paula Collins, CERN Unit cell defined by e.g. hexagonal array of electrodes 32 How do we make the holes? p n p n (not like this) 19th February, VCI 2007 Paula Collins, CERN 33 3d detector processing Non Standard Processing: Wafer bonding, Deep reactive ion etching , Low pressure chemical vapor deposition, Metal deposition Mass production expensive 1) ETCHING THE ELECTRODES 2) FILLING THE ELECTRODES Aspect ratio: D:d = 11:1 IR picture of 2 bonded wafers 290 mm WAFER BONDING (mechanical stability) Si-OH + HO-Si -> Si-O-Si + H2O d DEEP REACTIVE ION ETCHING (electrodes definition) Bosh process SiF4 (gas) +C4F8 (teflon) C shaped test structure ~1VCI mm2007 difference between top and bottom 19th February, Paula Collins, CERN D LOW PRESSURE CHEMICAL VAPOR DEPOSITION (Electrodes filling with conformal doped polysilicon) 2P2O5 +5 Si-> 4P + 5 SiO2 2B2O3 +3Si -> 4 B +3 SiO2 METAL DEPOSITION Shorting electrodes of the same type with Al for strip electronics readout or deposit metal for bump-bonding 34 3d detectors: characteristics Efficiency measured in testbeam 98% rise time seen on oscilloscope Aug 2006, H8 CERN beam line 100 GeV/c pions Institutes: Stanford Brunel/Manchester Hawaii/LBL New Mexico Glasgow Freiburg Bonn Praha Genova Oslo +++ 19th February, VCI 2007 Paula Collins, CERN 4000 e threshold 40V depletion v 35 3d detectors: radiation hardness electrode spacing 71 mm n type before irradiation Irradiated with reactor neutrons signal height measured on scope Compilation plot from C. da Via M Lozano, n-on-p this conference 19th February, VCI 2007 EPI Paula Collins, CERN 36 Different Geometry: 3D devices 1um 0.4um Passivation Oxide 50mm Metal 5mm n+ doped P-stop p+ 10mm TEOS 2um 300mm Poly 3mm p- type substrate p+ doped 50mm p+ doped Oxide Metal 55um pitch 19th February, VCI 2007 Paula Collins, CERN Design proposed by RD50 collaboration (IRST, CNM, Glasgow) •much simplified process – no need for support wafer during production •single sided processing with additional step of etching and B diffusion See S. Eckert talk for beautiful results 37 What about the ILC? At LC: “x sections are tiny” “No radiation issues” “Triggerless operation possible” “Modest rates” 30% E Why not use a LEP detector? we need to trim the X0! LC physics demands Excellent Vertexing (b,c,t) and Tracking in a high B field with energy flow 19th February, VCI 2007 t t event at 350 GeV Paula Collins, CERN 38 Silicon for vertexing @ the ILC Required Vertexing performance Flavour tagging: beauty + charm discriminate b e e tt bq qb q q Vertex detector characteristics point resolution 1-5 mm from background discriminate b from c disentangle complex events Thickness ~ 0.1 % X0 H bb , cc , gg ,tt 5 layers e e AH tt tt Inner radius ~ 1.5 cm h 12 jets background: mainly e+/e- pair production due to beamstrahlung radiation tolerance ~ 360 kRad / year d(IP) < 5 mm 10 mm/(p sin3/2 q) best SLD 8 mm 33 mm/(p sin3/2 q)) [C.Büssser, DESY] 19th February, VCI 2007 Use a silicon based pixel detector Confine the background with a big solenoidal field Paula Collins, CERN 39 Timing @ the ILC Time Train/rf pulse LEP 0.2 TeV NLC/JLC Superconducting Linac 0.5 TeV Train length, ms 0.750 0.265 950 Number of bunches/Train 4 190 2820 Bunch separation, ns 200 1.4 337 Repetition rate, Hz 45500 100 5 at ILC, keep occupancy reasonable by reading out innermost layer in 50 msec 19th February, VCI 2007 Paula Collins, CERN 40 Silicon Trends p+ + + - +n bulk +- chip chip amplifier Al strip SiO2/Si3N4 n+ + Vbias Start with high resistivity silicon More elaborate ideas: •n+ side strips – 2d readout •Integrate routing lines on detector •Floating strips for precision •Stripixels: 2d readout Hybrid Pixel sensors Chip (low resistivity silicon) bump bonded to sensor Floating pixels for precision n+ n+ p chip Basic idea DEPFET: Fully depleted sensor with integrated preamp chip CCD: charge collected in thin layer 19th February, VCI 2007 and transferred through silicon MAPS: standard CMOS wafer Integrates Paula Collins, CERN all functions 41 DEPFET sensors Kemmer, Lutz, 1987 R&D for tracking ~ 2000 15 V 0V 0V + + + + •Amplifying transistor integrated into high resistivity silicon detector Image of DEPFET team •Low noise operation possible at room temperature •Thinning possible to 50 mm R&D: pixel size, power, thinning, speed, radiation tolerance 2005: 128x64 36mmx29mm prototypes Paula Collins, CERN 512 x 512, and 128 x 2048 array under development 19th February, VCI 2007 42 Testbeam setup: 5 DEPFET planes Switcher chip provides gate voltages PCB ‘hybrid’ with DEPFET matrix, 2 x SWITCHER, 1 x CURO DEPFET Matrix 64x128 pixels 36 x 28.5µm2 row clear Sources ~ Switcher chip provides clear voltages 19th February, VCI 2007 Sources Drain 2 Drain 1 Sources row gate double pixel Paula matrix Collins, CERN double metal 43 DEPFET S/N for 450 mm thick sensor 110 upper limit on position resolution ~8 mm (contains an estimated 7 um contribution from low energy tracks – data from CERN testbeam will improve this) cluster sizes for inclined tracks comparable to simulation FE 55 spectrum from irradiated pixel measured at room temperature Ionising dose to ~1MRad without degradation in performance of pixel HV switcher does not survive this dose New switcher layout with rad hard technology and “stacked transistors” submitted and will be tested soon 19th February, VCI 2007 Paula Collins, CERN noise of 3.5 e (was 1.6 before irradiation) 44 P Fisher et. al. Vertex 06 Thinning sensor wafer handle wafer 1. implant backside on sensor wafer 2. bond wafers with SiO2 in between 3. thin sensor side 4. process DEPFETs on top side to desired thickness. 5. etch backside up to oxide/implant active DEPFET area (~ 50µm thick) Estimated material budget for first layer 0.11% X0: pixels, 50 mm thick, 0.05% X0 chips, 50 mm thick, 0.008% X0 perforated frame, 300 mm thick, 0.05% X0 leakage current Thinned diode structures: leakage current: < 1 nA/cm2 19th February, VCI 2007 CURO Readout chips SWITCHER Steering chips 100pA / cm2 Paula Collins, CERN Possible ILC implementation 45 Monolithic Active Pixel Sensors (MAPS) 1999 – R&D on CMOS MAPS 1999 – small scale prototypes 1999-2000 first beam tests 2001 – large prototypes 2005 – dedicated application specific chips Same unique substrate for detector and electronics No connections(e.g. bumps) Radiation hardness (no bulk charge transfer) Advantages of CMOS process: Easy Design/good yield/low power/Rad hard Very small pixel sizes achieveable Mimosa I …….. IV V ……. VIII …….. IX Process 0.6 mm AMS 0.35 mm AMS 0.6 mm AMS 0.25 TSMC 0.35 mm AMS Epi layer 14 mm 0 (!!!) 14 mm 8 mm 14 mm 19th February, VCI 2007 64x64x4 1Mx7 # pixels 64x64x4 Paula7k Collins, CERN7k …… X …….. 0.25 mm TSMC XIV .. 0.35 mm AMS 8 mm 0 16k 16k 46 MAPS Beam Test Results MIMOSA I MIMOSA II MIMOSA V Resolution 1.4 mm 2.2 mm 1.7 mm Efficiency at S/N > 5 99.5 % 98.5 % 99.3% Signal to Noise Resolution [mm] MIMOSA V MIMOSA I Two track separation 30 mm thinning possible to 50 mm R&D for high temperature operation (STAR upgrade) 19th February, VCI 2007 Paula Collins, CERN 47 MAPS: Radiation Hardness Expectations at ILC (for 3 years of nominal running): - “non-ionizing” radiation: 3.1010 neq/cm2 MIMOSA I, II, V irradiated with 1013 n/cm2 Gain -> constant Noise -> constant Leakage current a moderate rise collected charge a 50-70% of initial value (smooth decrease after 1012 or few x 1011 ) MIMOSA9 chip irradiated with 1011n/cm2 test beam: S/N ~ 25, e > 99.9% dose increased to 1012n/cm2 with good results - “ionizing” radiation: 5.4.1012e(10MeV)/cm2 MIMOSA5 and MIMOSA9 chips irradiated at Darmstadt with 1013e(9.4MeV)/cm2 test beam (MIMOSA9): S/N ~ 23, e > 99% - slight deterioration but still excellent performance 19th February, VCI 2007 Paula Collins, CERN michael deveaux 48 Charged Coupled Devices - CCDs CCDs invented in 1970 – widely used in cameras, telescopes etc. Tracking applications for HEP: 1980-1985 NA32 120 kpixels 1992-1995 SLD 120 Mpixels 1996-1998 SLD upgrade 307 Mpixels ILC 799 Mpixels 10V 2V ~1000 signal electrons are collected by a combination of drift and diffusion over a ~20mm region just below surface • Small pixel size – 20 x 20 mm • Possibility of very thin detectors •Column parallel readout: serial register -> direct bump bonding to chip 19th February, VCI 2007 Paula Collins, CERN 49 CCD R&D for ILC requirements Speed up readout 5 MHz readout -> 50 MHz Reduce clock amplitudes 10V->2V Build with high resistivity epitaxial material distributed busline over entire image area • Study radiation resistance to LC doses of 100Krad ionising radiation + 5 x 109 neutrons Temperature dependence CCD 55Fe spectrum: 1MHz 2V clocks noise ~ 60 e- Layer Radius (mm) CCD lxw (mm x mm) CCD Size (Mpix) Clock / readout time Background (Hits/mm2) Integrated background (kHits/train) 1 15 100 x 13 3.3 50 MHz/50 ms 4.3 761 5 60 125 x 22 6.9 25 MHz/250 ms 0.1 28 19th February, VCI 2007 Paula Collins, CERN 50 CCDs: Thinning CCD community have come up with incredible ways to lose weight! Unsupported silicon with tensioning - lateral instabilities Silicon thinned to epitaxial layer and glued to substrate - can reach 0.15% X0 Carbon fibre substrates - good CTE match but instabilities Silicon on foam substrate or sandwich core - < 0.1% Xo should be possible!!! silicon carbide foam 19th February, VCI 2007 RVC foam Paula Collins, CERN 51 ISIS – In-Situ Storage Image Sensor ISIS1 “proof of principle” constructed at e2V Beam-related RF pickup is a concern for all sensors converting charge into voltage during the bunch train; The In-situ Storage Image Sensor (ISIS) eliminates this source of EMI: Charge collected under a photogate; Charge is transferred to 20-pixel storage CCD in situ, 20 times during the 1 ms-long train; Conversion to voltage and readout in the 200 ms-long quiet period after the train, RF pickup is avoided; 1 MHz column-parallel readout is sufficient 19th February, VCI 2007 Paula Collins, CERN 52 Conclusions I Silicon is not the only solution to your vertexing requirements: 1996: scintillating liquid capillaries for LHCb liquid: 1-methylnaphtalen Capture light in borosilicate capillaries self cooling system read out with APDs or HPDs SLAC expts workshop 1982 19th February, VCI 2007 thanks: P. Koppenburg But remains the dominant player Paula Collins, CERN 53 Conclusions II Devices are being tested which give excellent CCE and can be operated at room temperature after high fluences – we are almost there! n strip technology looks very promising for all but the most inner layer For which diamond and 3D look very good Major developments underway for ILC Electronics/services not touched on (see Spieler and Mnich talks) 19th February, VCI 2007 Paula Collins, CERN 54 Conclusions III Neff used to be THE bad guy For heavily irradiated detectors other villains come into play, Neff becomes almost benign 19th February, VCI 2007 Paula Collins, CERN 55 Conclusions IV We also have to see what LHC brings… 19th February, VCI 2007 Paula Collins, CERN 56 Conclusions V Thank you for your attention Thanks for material to: MCz Alison Bates MAPS Marc Winter, Grzegorz Deptuch, Wojtek Dulinski, p type Gianluigi Casse, Marina Artuso CCD Steve Worm, Andrei Nomorotski DEPFET Marcel Trimpl Johannes Ulrici SDD Rene Bellweid, Vladimir Rykov Irradiation Sherwood Parker, Ulrich Parzefall, Richard Bates, Cinzia da Via, Angela Kok, Michael Moll, Mika Huhtinen, William Trischuk, Zheng Li Tevatron Alan Sill Overview Guy Wilkinson, Daniela Bortoletto 19th February, VCI 2007 Paula Collins, CERN 57 backup slides 19th February, VCI 2007 Paula Collins, CERN 58 depfets https://wiki.lepp.cornell.edu/ilc/bin/v iew/Public/WWS/VtxProjects 19th February, VCI 2007 Paula Collins, CERN 59 Properties of Diamond Si diamond Band gap [eV] 1.12 5.45 Electron mobility [cm2/Vs] 1450 2200 Hole mobility [cm2/Vs] 500 1600 Saturation velocity [cm/s] 0.8x107 2x107 Breakdown field [V/m] 3x105 2.2x107 Resistivity [Ω cm] 2x105 >1013 Dielectric constant 11.9 5.7 Low capacitance, noise Displacement energy [eV] 13-20 43 High radiation hardness e-h creation energy [eV] 3.6 13 Ave e-h pairs per MIP per μm 89 36 Charge coll. dist. [μm] full ~250 CERN RD42 Collaboration: - Development of detector grade diamond - Industrial partner: Element Six, Ltd. 19th February, VCI 2007 Paula Collins, CERN Low Ileakage, shot noise Fast signal collection Smaller signals + high thermal conductivity: Room temperature operation 60 ILC vtx comparison 19th February, VCI 2007 Paula Collins, CERN 61 n+ p+ Active edge 4 mm 19th February, VCI 2007 n+ p+ n+ p+ n+ p+ n+ 50 mm Paula Collins, CERN 62 MAPS MIMOSA 9 promising technology for star vtx upgrade Main features: Self Bias / Standard Pitch 20/30/40 mm Small/large diodes (3/6 mm) With/without epi intended to withstand high temperatures Noise vs temperature (Noise2∝Ileak=a+b.T2exp(-Egap/2kT)) – signal independent of T 1.2 mm 0.96 mm 6 x 6 mm 3.4 x 4.3 mm 5 x 5 mm 3.4 x 4.3 mm 19th February, VCI 2007 Paula Collins, CERN 3.4 x 4.3 mm 3.4 x 4.3 mm 6 x 6 mm 6 x 6 mm 63 p+ 500 mm n+ 19th February, VCI 2007 Paula Collins, CERN 64 Silicon for tracking: Silicon Drift Detectors Principle of sideways depletion – as for DEPFET sensors p+ segmentation on both sides of silicon Complete depletion of wafer from segmented n+ anodes on one side !! Drift velocity must be predictable x y Temperature control resistivity control Calibration techniques SDD fully functioning in STAR SVT since 2001 216 wafers, 0.7 m2 10 mm in anode direction 20 mm in drift direction Particle ID 19th February, VCI 2007 Paula Collins, CERN 65 Silicon for tracking: Drift detectors SDD are a mature technology – attractive for LC 5 precise silicon layers to replace TPC 56 m2 silicon R&D needed: Improve resolution to 5 mm Improve radiation length Improve rad hardness Track stamping possible at nanosecond level c2 separation for out-of-time tracks for different drift direction configurations 19th February, VCI 2007 Paula Collins, CERN 66 particle Sis Frenkel pair Vacancy + Interstitial EK > 25 eV Point Defects (V-V, V-O .. ) V I EK > 5 keV clusters Influence of defects on the material and device properties charged defects Neff , Vdep e.g. donors in upper and acceptors in lower half of band gap 19th February, VCI 2007 Trapping (e and h) CCE shallow defects do not contribute at room temperature due to fast detrapping Paula Collins, CERN generation leakage current Levels close to midgap most effective 67 New Materials: Diamond, SiC, GaN Property Eg [eV] Ebreakdown [V/cm] me [cm2/Vs] mh [cm2/Vs] vsat [cm/s] Z er e-h energy [eV] Density [g/cm3] Displacem. [eV] Diamond 5.5 107 1800 1200 2.2·107 6 5.7 13 3.515 43 GaN 3.39 4·106 1000 30 31/7 9.6 8.9 6.15 20 4H SiC 3.26 2.2·106 800 115 2·107 14/6 9.7 7.6-8.4 3.22 25 Si 1.12 3·105 1450 450 0.8·107 14 11.9 3.6 2.33 13-20 Wide band gap (3.3eV) lower leakage current than silicon Signal: Diamond SiC R&D on diamond detectors: RD42 – Collaboration http://cern.ch/rd42/ CCE at high fluences degrades even more in SiC and GaN than in Si. 19th February, VCI 2007 Paula Collins, CERN 36 e/mm 51 e/mm Si 80 e/mm more charge than diamond Higher displacement threshold than 68 silicon 19th February, VCI 2007 Paula Collins, CERN 69