TWMCC
Texas-Wisconsin Modeling and Control Consortium
T. F. Edgar • Co-Dir ector
The University of Texas at Austi n
Department of Chemical Engineer ing
Austi n, Texas 78712- 1062
Tel: ( 512) 471- 3080 • Fax: (512) 471-7060
email : edgar @che.utexas.edu
J. B. Rawl ings • Co-Di rector
Univer sityof Wisconsi n-Madi son
Department of Chemical Engineer ing
Madi son, Wi sconsin 53706-1691
Tel: ( 608) 263- 5859 • Fax: (608) 262-5434
email : jbraw@che.wi sc.edu
T.F. Edgar
Department of Chemical Engineering
The University of Texas
Austin, Texas 78712
February 19-20, 2001
Austin, Texas
Agenda
Monday February 19th
8:30
9:00
9:10
10:10
10:40
11:00
11:45
1:00
Coffee and Donuts
Introduction/Review of Agenda
PI Overviews
T.Edgar
J. Qin
J. Rawlings
Comparison of Process Systems Consortia
Break
Multi-model Robust MPC
Lunch (TCC Cafeteria)
Closed-Loop State and parameter Estimation
2:00
Process Modeling and Control at Motorola
2:30
Break
T. Edgar
T. Edgar
J. Wang
M. Nikolaou
Univ. of Houston
Karen McBrayer
Motorola
Agenda
Monday, February 19th
3:00
4:00
5:30
6:30
Reactive Distillation Modeling and Control
J. Schell (UT)
J. Peng (UT)
S. Lextrait (UT)
Poster Session
J. Hahn
J. Schell
S. Lextrait
J. Peng
H. Potrykus S. Valle-Cervantes
Q. He
J. Wang (UT) J. Wang (UW)
Adjourn
Mixer/Dinner Matt’s El Rancho - 2613 S. Lamar
Agenda
Tuesday, February 20th
8:15 Meeting with PI’s and Sponsors - Continental Breakfast
9:00
9:30
CPC-6 Review
Recent Advances in Global
Optimization
10:15 Break
10:30 Hierarchical Statistical Monitoring
11:20 Subspace Identification Using PCA
11:50 Wrap-up
12:00 Adjourn
J. Rawlings
L. Lasdon
S. ValleCervantes
J. Wang (UT)
T. Edgar
TWMCC - Multiple Projects
Company
AMD
Aspentech
Condea-Vista
DuPont
Equilon
Exxon/Mobil
Fisher-Rosemount
KLA-Tencor
Motorola
JBR
√
√
√
√
TFE
√√
√
√
JQ
√√
√
√
√
√
√
TWMCC - Multiple Projects (Cont’d)
Company
JBR
Pharmacia
√
SmithKline Beecham
√
Texas Instruments
Tokyo Electron America
Union Carbide/Dow
Weyerhauser
TFE
√
√
JQ
in progress
√
√√
Courting Applied Materials, GE-Continental Controls,
Chevron, DOT Products, Alliant Energy, SEMATECH,
Matrikon, Oil Systems, Honeywell, Yield Dynamics
M.S., Ph.D. Graduates
(1999 - 2001)
Student/Supervisor
K. Teague (TFE)
C. Pfeiffer (TFE)
Q. Finefrock (TFE)
J. Campbell (TFE)
M. Misra (JQ)
T. Nugroho (JQ)
R. Bindlish (JBR)
C. Rao (JBR)
G. Scheid (JQ)
W. Cho (TFE)
B. Ko (TFE)
Destination
Ph.D. (5/99)
Ph.D. (12/99)
Ph.D. (?/?)
Ph.D. (8/99)
Ph.D. (8/99)
Ph.D. (8/99)
Ph.D. (12/99)
Ph.D. (12/99)
M.S. (5/99)
Ph.D. (5/01)
Ph.D. (5/00)
Aspentech
Motorola
Still consulting
KLA-Tencor
Motorola
Pertamina
Dow
Postdoc/Ohio State
LSI Logic
AMD
ExxonMobil
M.S., Ph.D. Graduates
(1999 - 2001)
Student/Supervisor
H. Yue (JQ)
S. Middlebrooks (JBR)
C. Bode (TFE)
T. Soderstrom (TFE)
S. Alici (TFE)
J. Schell (TFE)
J. Wang (JBR)
D. Patience (JBR)
S.V. Venkatesh (JBR)
S. Valle Cervantes (JQ)
R. Mak (JQ)
S.B. Hwang (TFE)
Destination
Ph.D. (5/00)
Ph.D. (2/01)
Ph.D. (5/01)
Ph.D. (2/01)
Ph.D. (5/01)
Ph.D. (5/01)
Ph.D. (5/01)
Ph.D. (12/01)
M.S. (5/01)
Ph.D. (5/01)
M.S. (5/01)
Ph.D. (5/01)
Tokyo Electron America
LSI Logic
AMD
ExxonMobil
Air Products
Interviewing
Interviewing
Interviewing
ASML Mastools
Interviewing
Interviewing
Return to Hyundai
Highlights (Edgar Group)
• Added two new (experienced) graduate students in Spring
• Six Ph.D.s to graduate in 2001
• Publication of optimization book (with Himmelblau and
Lasdon)
• Seven students doing research at industrial sites during
past year
(AMD, Motorola, Condea-Vista, KLA-Tencor, Tokyo
Electron, SEMATECH)
• ChE Department looking for systems faculty
Six Ph.D Candidates to Graduate in 2001
1. Tyler Soderstrom: Data Reconciliation and Gross Error
Detection
2. Semra Alici: Dynamic Data Reconciliation Using Process
Simulators
3. John Schell: Modeling and Control of Reactive
Distillation Column
4. Chris Bode: Run-to-run Control of Photographic Overlay
5. Sung Bo Hwang: Modeling of Lithography Dry
Development and RTCVD of SiGe
6. Wonhui Cho: Multivariable Temperature Control in Rapid
Thermal Processing
Simultaneous Data Reconciliation and Bias
Detection/Identification Research Contributions
Tyler Soderstrom
• Formulate Combined Problem as a Mixed Integer
Programming (MIP) Problem
• Evaluate the Effects of Method Parameters Using Linear
Steady State Models (MILP Problem)
• Incorporate Empirical Bias Detection Methods Directly
into the Problem Framework
• Extend the Method to be Applicable to Nonlinear Systems
and Investigate Novel Solution Techniques (MINLP
Problem)
• Extend the Method to be Applicable to Nonlinear Dynamic
Systems
Dynamic Data Reconciliation
via Simulation Software (DDRSS)
Semra Alici
DDRSS Algorithm
• Two New Approaches for the Incorporation of
Simulation Software Into Dynamic Data
Reconciliation
Measurements,
Initial Guesses
Model
Identification
• Finite Difference Approach
• Time Series Model Approach
Simplified Model
• Identification Methods
• Parametric (Ordinary Least
Squares, AR, ARMA,... Models)
• Multivariate Adaptive Regression
Splines (MARS)
• Neural Networks
HYSYS
NLP
New
Estimates
Constraints
Objective
Func.
Modeling and Control of Reactive
Distillation Columns
John Schell
• Novel Application of Reactive Distillation
– Kinetic, Exothermic Reaction with Stearic Equilibrium
in Product
– Pilot Column > 40 feet tall
• Validation of Steady State and Dynamic Models
– RADFRAC, RateFRAC, Aspen Dynamics
• Control Study
– Shows need for nonlinear control
Run-to-run Control of Lithography Overlay
and Poly Gate Linewidth
•
•
•
•
Christopher A. Bode
Compiled a set of known disturbances to the process
responsible for overlay and linewidth performance, and
completed an analysis of variance to identify the
significant disturbances.
Identified an strategy for the control of these significant
disturbances based upon control thread methodology.
Developed a run-to run Model Predictive Control (MPC)
method for each controlled variable.
Deployed above to high-volume semiconductor
manufacturing, realizing a 40% improvement in process
capability (Cpk) for overlay and a 44% improvement in
gate linewidth Cpk.
Rapid Thermal CVD of Si1-xGex
Sung Bo Hwang
RTCVD of Si1-xGex using Si2H6-GeH4 chemistry (470oC~550oC)
Minimize diffusive mixing at interfaces using temperature and gas switching
 Need process optimization to get the quantum dots or to deposit a Ge-graded film
 DOE(Design of experiments)
 3 factors : Temperature, flow rates of GeH4 and flow rate of Si2H6.
 Responses : Growth rate, Ge concentration in films, and Morphology (dot size and density)
 Full factorial with 3 center points
Neural network modeling
Using Bayesian Network
AFM (Morphology)
 Dot density ( on Si > on SiO2 )
XRD (Ge concentration and thickness)
 Ge composition ration and growth rate mainly
depend on the reactant ratio (PGeH4/PSi2H6 )
1000000
DS/GeH4=10sccm/15sccm
DS/GeH4=10sccm/11.25sccm
DS/GeH4=10sccm/7.5sccm
100000
12.68%
10000
17.75%
1000
Ge 20.48%
100
10
1
0.1
31
31.5
32
32.5
33
Omega/2Theta
on SiO2
on Si
33.5
34
34.5
Modeling and Control of Rapid
Thermal Processor
Wonhui Cho
• Multi input/output wafer heat transport dynamic model
based on finite difference method (FDM) and view factor
analysis
• Closed loop parameter identification
• Nonlinear MIMO (3X3) Iterative Control application to
temperature uniformity control
• Development of Windows NT-VME based real-time
control system
Reactive Distillation Project Goals
(J. Schell, S. Lextrait, J. Peng)
• Operate columns
– Alkylation (Condea Vista)
– Etherification (TAME chemistry)
• Validate existing reactive distillation simulators
– Aspen’s RADFRAC (equilibrium stage)
– Aspen’s RateFRAC (mass transfer rate)
– Aspen Custom Modeler
• Develop fundamental nonlinear models for comparison
• Future funding by Aspentech, GOALI proposal to NSF
Optimization of Chemical Processes
Second Edition
McGraw-Hill - available January, 2001
By Edgar, Himmeblau, and Lasdon
ISBN 0070393591
Major changes from First Edition:
Chapter 2
Modeling for Optimization
Chapter 6
Unconstrained Optimization
Chapter 7
Linear Programming
Chapter 8
Nonlinear Programming
Chapter 9
Mixed-Integer Programming
Chapter 10 Global Optimization
Chapter 15 Process Design and Operations
Chapter 16 Planning/Scheduling/Control
Process Systems Research Consortia
(www.che.utexas.edu/cache/trc/t_process.html/systems)
• Chemical Modeling & Process Control Research Center, Lehigh
University
• Center for Process Analytical Chemistry, University of
Washington
• McMaster Control Consortium
• Measurement and Control Engineering Center (University of
Tennessee, Oklahoma State)
• Center for Advanced Process Decision-Making, Carnegie
Mellon
Process Systems Research Consortia
•
•
•
•
Texas - Wisconsin Modeling & Control Consortium (TWMCC)
Texas Tech Process Control and Optimization Consortium
UC Santa Barbara Consortium
University of Delaware Process Monitoring and Control
Consortium
• Computer-Integrated Process Operations Consortium - Purdue
Consortium Metrics
Washington
Purdue
CMU
TWMCC
McMaster
Delaware
UT/OSU
Lehigh
Texas Tech
UCSB
Number of
Students/Postdocs
26
28
24
28
22
16
15
14
9
6
Number of
Faculty
28
3-4
6
3-4
4
3
10
4
2
1
Number of
Sponsors
33
12-15
20
15
20
13
16-19
7
7
11
General Observations
• Several operate with formal consortium agreement,
previous or current government agency funding (UW,
CMU, Lehigh, UT/OSU)
• Two are mostly focused on analytical measurements and
chemistry faculty (UW, UT/OSU)
• Most use agency funds to supplement industrial
contributions (UCSB, Delaware, Purdue, Lehigh,
McMaster, CMU, TWMCC)
• Some allow special membership for vendors or for
hardware/software donations in lieu of cash (Delaware,
UCSB)
• Company fees typically range from $12,000 (McMaster-in
$US) to $35,000 (UW); UCSB (Single prof) = $5000
• Most consortia meet twice per year