Thin-Film Semiconductor Technology Applied to Large Area Radiation Detectors CIRMS Conference 2012 October 23, 2012 Bruce Gnade UT Dallas Flexible Electronics Research Group at UTD • POST‐DOCS/STAFF SCIENTISTS – Dr. I. Mejia, Dr. Kurtis Cantley, Dr. M. Jia, Dr. I. Trachtenberg, Dr. A. Carrillo, Dr. N. Hernandez, Dr. J. Conde, Dr. Dick Chapman • GRADUATE STUDENTS/PROJECTS – – – – – – – – • Ana Salas– PhD. – Alternate Contacts (AFOSR) Duo Mao – Ph.D. – Organic Memory (ARL) Mike Perez, Ph.D. – n‐type flexible TFTs (NSF) John Murphy Ph.D – Large Area Neutron Detectors (ARL, FUSION) Martha Rivas – Pulsed Laser Deposition of Chalcogenides Dewan Lutful Kabir – Reliability and Electrical Characterization Lindsey Smith – Neutron converter layers (DNDO) Kevin Larosa – Backplane electronics (DNDO) VISITING SCHOLARS – J. Ramos (UACJ), V. Martinez, (CIMAV), G. Gutierrez (CIMAV), Alfredo Luque (CNyN) • Collaborators – Dr. David Allee (ASU), Dr. Eric Forsythe (ARL), George Kunnen (ASU) • FUNDING – U.S. Army Research Labs,Military Tech, DOE, UT Dallas, Texas MicroPower, NSF, Texas instruments, FUSION, DNDO, AFOSR, DARPA Agenda • • Large Area Radiation Detectors – Why thin‐film devices – Large area neutron detector project Current state of thin‐film semiconductor devices – Transistors – Memory – CMOS – Circuits Why large area detectors? Large area neutron detector 2” 3He tube Neutron Source 8 ft 0 8 ft Probability of neutron hitting 2” tube ~ 1 part in 36000 Probability of neutron hitting large area detector ~ 1 part in 3 Future Flexible Electronics Throughput vs cost/cm2 Throughput (m2/sec) 100 1 Displays Source: Organic and Printed Electronics, Organic Electronics Association (OE‐A) Broucher, 3rd Edition, 2009 Digital X‐ray imagers 10‐4 10 1 100 500 Minimum feature Size (m) # of TFTs per min Area per min ~108/min 4m2/min Yield zero redundancies 99.99997% Display ~cost/cm2 $0.05/cm2 Si-CMOS ($5k/wafer) $6.86/cm2 Thanks to Dr. Eric Forsythe – Army Research Laboratory Digital X-ray 1-up/subs Digital x-ray 4-up/subs $29/cm2 $7/cm2 Large Area Sensor Arrays: The Concept with ASU ROW RESET • Neutron Detection •VIS / IR Imager • Millimeter Wave • MEMs • • Blast Acoustic • Electronic Textiles AMPLIFIER PIXEL READ Energy to charge conversion Very large area, flexible, low power neutron detectors Three main pieces ‐ energy conversion layer ‐ sensing diode ‐ backplane electronics Neutron conversion layer strategies Isotope Reaction 3He 3He(n,p)3H 6Li 6Li(n,α)3H 10B 10B(n,α)7Li natGd natGd(n,γ) 157Gd 157Gd(n,γ) 235U 235U(n,f) Converter‐on‐diode 6Li 10B nanoparticle composite Thermal σ (barns) 5333 940 3835 49700 259000 681 Charged particles and energies (keV) p: 573, 3H: 191 3H: 2727, α: 2055 α: 1472, 7Li: 480 Conversion e‐: 29‐191 Conversion e‐: 29‐182 Various fission products Converter‐in‐diode 6Li nanoparticles 10B Au (100nm) Au (100 nm) Sensing diode Sensing diode Al (100 nm) Al (100 nm) Flexible substrate (~1 mm) Flexible substrate (~1 mm) Neutron Detector Modeling in MCNPX and MATLAB Detector Layers simulated in MCNPX: Weapons Grade Plutonium Example neutron conversion layer optimizations result in 2.6um 10B thickness • • • • Front end captures Neutron and emits charged alpha particle, Alpha detected with PIN diode and active pixel sensor circuit MCNPX used to model and optimize detector front‐end layers Detector layers capable of being fabricated with FDC process MATLAB model of arrayed pixel sensors with simulated alpha particle exposure (Red Boxes): With Correlated Double Sampling applied: • Each cell represents an active pixel sensor • Sensors modeled to reflect FDC process variations. • CDS dramatically improves ability for detector to resolve alpha particle strikes Thin‐film diode optimization ‐ MCNPX TABLE II. Intrinsic gamma efficiencies for selected thicknesses and gamma energies. (LLD = 300keV and a 2.8 µm 10B conversion layer) Thickness (μm) γ energy (keV) Si CdTe GaAs ZnO 3 511 1460 0 0 0 9×10-14 0 0 0 8×10-14 10 511 1460 0 1×10-13 6×10-13 9×10-12 0 2×10-12 1×10-12 8×10-12 30 511 1460 6×10-11 1×10-10 6×10-7 2×10-7 1×10-7 6×10-8 3×10-7 2×10-7 100 511 1460 3×10-6 2×10-6 4×10-4 1×10-4 2×10-4 6×10-5 2×10-4 9×10-5 300 511 1460 3×10-4 2×10-4 4×10-3 3×10-3 2×10-3 2×10-3 2×10-3 2×10-3 Sensing Diode Optimization: Schottky vs. MIS Integrating over channels for peak Detector bias (V) Particles detected 0V 5V 20V 562 595 651 Measured source strength 1,938 1,954 2,245 Efficiency 60% 60% 69% Integrating over channels 100‐450 Detector bias (V) 0V 5V 20V 100V Particles detected 785 772 752 869 Measured source strength 2,486 2,445 2,382 2,752 Efficiency 77% 76% 74% 85% Radiation measurement setup Preamp Oscilloscope Amp and det bias MCA Sample chamber TFT‐based Active Pixel Sensors The detection of two alpha particle strikes on a commercial diode and amplified with the two stage low noise thin film transistor amplifier. Flexible CMOS NMOS PMOS Why CMOS – Dramatically reduced power consumption – Analog circuitry possible –Sensor applications 12 VGS = -20V W/L = 400m/7m 10 IDS ( 8 VGS = -15V 6 4 c VGS = -10V c 2 VGS = -5V How to do F‐CMOS 0 0 -5 -10 -15 -20 -25 -30 VDS (Volts) 102 –Combine Processes 5x10-3 W/L = 400m/7m VDS = -25V 4x10-3 100 3x10-3 10-1 2x10-3 10-2 1x10-3 10-3 10-4 0 10 0 -10 VGS (Volts) -20 -30 Sqrt (IDS) (A)1/2 log(| IDS |) (A) 101 • N‐Type a‐Si:H TFTs • N‐Type inorganic TFTs • P‐Type Organic TFTs –Standard Cell Approach a‐Si / pentacene CMOS Devices – with ASU Inverters NAND Gates 12 25 B 20 15 Input (V) Input (V) 20 15 10 5 8 pmos Vin Vout 4 5 nmos GND 0 0 0 5 10 VIN (V) 15 20 B 15 10 5 A 0 0 25 25 NOR Gate Output (V) VDD 10 NAND Gate Output (V) A Gain VOUT(V) 25 16 20 NOR Gates 20 15 10 5 0 20 15 10 5 0 -0.02 -0.01 0.00 0.01 Time (seconds) 0.02 -0.02 -0.01 0.00 0.01 Time (seconds) 0.02 Technology Comparison Chalcogenides 250 650 ZnSe 600 SnSe2 27 InS 50 SnS2 18 10 21 N 10 20 N P N N 10 19 N P P P P 10 18 10 17 P P P N N P N 10 16 10 15 P-TYPE N P P P N N N 10 14 CuGaS2 20 CuInS2 15 ZnTe 100 PbS 5 Cu2S 10 Zn O C dS C dT e Zn S Zn Se C dS e Zn C T uI e nS C e2 uI C nS uI 2 n C Te uA 2 C lSe uG 2 aS e2 CdSe Concentration (cm-3) CdS N-TYPE Electron or Hole Semiconductor Mobility (cm2/V‐s) e‐ h+ 10 22 Organic semiconductors ~ 6x10−2 to 1 cm2V-1 s-1 Amorphous silicon: ~ 0.01 to 1 cm2 V-1 s-1 Inorganic semiconductors: 100 cm2 V-1 s-1 CBD CdS/ Evaporated Pentacene Inverters VI VOUT N 100 20 V O U T G A IN • Optimized pentacene and CBD CdS deposition 80 15 10 40 5 20 0 0 0 5 10 V IN [V ] 15 20 G A IN V O U T [V ] 60 • Inverters yield gains of about 80 Ferroelectric‐based organic Memory (FeRAM) PVDF ‐ TrFe P MFM Capacitor – 1T‐1C memory cell ‐ relatively easy to fabricate ‐ destructive read ‐ complicated read / write circuitry HH HH C C C C F F F F Au Ferro‐ electric Gate – Au Fully integrated TFT used for 1T1C 1. 2. 3. 4. CBD CdS as the semiconductor ALD HfO2 as the gate dielectric Parylene as ILD Low temperature process, maximum temperature is 100 oC 1E-3 120.0µ 0.016 VG = 0 V VG = 2.5 V VG = 5 V VG = 7.5 V VG = 10 V VG = 12.5 V VG = 15 V 100.0µ SQRT ID ABS ID 0.014 1E-5 0.012 1/2 60.0µ W = 160 um L = 5 um 40.0µ 1E-6 W = 160 um L = 5 um 0.010 1E-7 0.008 FET = 1.5 cm /V-s 1E-8 0.006 VT = 5.5 V 1E-9 2 0.004 20.0µ 0.0 0 2 4 6 8 VD [V] 10 12 14 ID [A] SQRT ID [A ] 80.0µ ID [A] 1E-4 1E-10 0.002 Saturation 0.000 VD = 15 V -5 0 5 VG [V] 10 1E-11 1E-12 15 2T2C FRAM Characterization BAL DWL WE DWL SL GND SR CL0 CL1 PL WL0 CL2 CL3 WL1 WL2 CL4 CL5 WL3 WL4 CL6 WL5 CL7 GND WL7 WL6 64‐bit FRAM layout 20 In‐pixel charge amplifier – Ramirez design Prototype neutron detector • The output signal from the sensor element is a low voltage pulse with 10’s ns width, with very high impedance due to the capacitive nature of the device. • Charge amplifiers provide very high input impedance ‐ they integrate weak charge pulses to convert them into voltage pulses with low impedance. [1] F. J. Ramirez‐Jimenez et al., Nuclear Instruments and Methods in Physics Research A, 497, (2003), 577‐583. [2] Bernd J. Pichler et al., IEEE Transactions on Nuclear Science, 48(6), (2001), 2370‐2374. [3] HAMAMATSU, model H4083. Potential Advantages • • • • • Very large aperture at moderate cost based on AMLCD In‐pixel electronics provide low capacitance for pixelated array Potential for high γ‐ray rejection rate due to TFT array electronics Potential for fission neutron multiplicity measurements Potential for determination of directionality of the neutron source Thank You!