Publications： (2002~2005)
1. J. T. Sheu and C. H. Wu, "Silicon Nanomachining by Scanning Probe Lithography and
Anisotropic Wet Etching", Chapter 8 of Materials and Process Integration for MEMS,
Kluwer Academic publishers, 2002.
2. T. C. Chang, T.M. Tsai, P. T. Liu, Y. S. Mor, J.T. Sheu , T.Y. Tseng, “The Novel
Method Low-k hybrid-organic-siloxane-Polymer film using x-ray exposure”, Thin Solid
Films, B420-421, pp 403~407, 2002.
3. J. T. Sheu , K. S. You, C. H. Wu and K. M. Chang, “Single-electron transistor
structures based on silicon-on-insulator silicon nanowire fabrication by scanning probe
lithography and wet etching,” J. Vac. Sci. Technol. B 20(6), Nov/Dec, pp. 2824~2828,
2002.
4. J. T. Sheu , S. P. Yeh, C. H. Wu, K. S. You and C. C. Chen, “ Fabrication of
Ultrahigh-density Nanopyramid Arrays on (100) Silicon Wafer using Scanning Probe
Lithography and Anisotropic etching”, International Journal of Computational
Engineering Science, Vol. 4, No. 3, pp. 695–698, 2003.
5. J. T. Sheu , S. P. Yeh, C. H. Wu, K. S. You and C.C. Chen, “Nano-scale Patterning of
Titanium Thin Film with Local Oxidation of Scanning Probe Microscope”, International
Journal of Computational Engineering Science, Vol. 4, No. 3, pp. 699–703, 2003.
6. T. C. Chang, T. M. Tasi, P.T. Liu, Y.S. Mor, C.W. Chen, J. T. Sheu , and T. Y. Tzeng,
“Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-ray Exposure
Technology,” Solid-State Letters, 6, G69, 2003.
7. K. M. Chang, K.S. You, J. H. Lin, and J. T. Sheu , “Alternative process for silicon
nanowire fabrication with scanning probe lithography and wet etching system”, J.
Electrochem. Soc. Vol. 151, pp. G679~G682, 2004.
8. F. M. Pan, C. Y. Chen, Y. B. Liu, Y. Chang and J. T. Sheu , “Selective growth of
carbon nanotubes on scanning probe tips microwave plasma chemical vapor deposition,”
J. Vac. Sci. Technol. B 20(6), Jan./Feb., pp. 90-93, 2004.
9. J. T. Sheu , G. M. Kao, K.S. You, and C. C. Chen,” Fabrication and Electrical
Properties of Silicon Nanowires”, Journal of Microelectronic Engineering, Vol. 73-74, pp.
594-598, 2004.
10. J. T. Sheu , C. C. Chen, K.S. You, and C. H. Wu, “ Nanoflash Device with
Self-Aligned Double Floating Gates Using the Scanning Probe Lithography and TMAH
Wet Etching”, J. Vac. Sci. Technol. B. Vol. 22, pp. 3154~3157, 2004.
11. J. T. Sheu , C. C. Chen, P. C. Huang, Y. K. Lee and M. L. Hsu, “Selective Deposition
of Gold Nanoparticles on SiO 2 /Si Nanowires for Molecular Detection,” Japanese
Journal of Applied Physics, Part 1, Vol. 44, No. 4B, pp. 2864-2867, 2005.
12. J. T. Sheu , C. C. Chen, P. C. Huang, and M. L. Hsu, “Selective Deposition of Gold
Nanoparticles on SiO 2 /Si Nanowires,” Journal of Microelectronic Engineering, Vol.
78-79, pp. 294-299, 2005.
TOP
專利
1. J. T. Sheu, K. J. Chuang and S. Su,”Membrane Type Integrated Inductor and the
Process Thereof,” United States Patent US005773870, Jun. 30, 1999.
2. 張鼎張 , 劉柏村 , 許鉦宗 , 潘扶民施敏 ,“ 半導體元件之銅導線鑲崁製
程 ,”2003 (R.O.C. patent) No. 51618.
3. T. C. Chang, P. T. Liu and J. T. Sheu, “Method of Patterning Dielectric Layer with
Low Dielectric Constant,” Uinted States Patent US6716741 B2, April, 2004.
4. J. T. Sheu and K.S. You, “Nano Flash Memory with Double-Side Floating Gates,”
2005. (U.S. patent 申請中 )
TOP
研討會論文 (2001~2005)
1. J. T. Sheu, W. L. Cheng, C. H. Wu and H. T. Chou , "Fabrication of Soft X-ray Grating
on (110) Silicon by Scanning Probe Lithography," Symposium on Nano Device
Technology 2001, pp. 74-77, April 24-25, Hsinchu, 2001. (Oral)
2. J. T. Sheu, J. H. Wu, H.T. Chou and W. L.Cheng, "Patterning of EUV grating
nanostruture by Scanning Probe Microscopy," International MEMS, pp. 421-427, July 4~6,
Singapore, 2001. (Oral)
3. J. T. Sheu, C. H. Wu, K. S. You and K. M. Chang, "Linearity of scanning probe
lithography on (110) Silicon Wafer", IEEE-NANO 2001, pp. 23-26, Oct. 28 ~30, Hawaii,
2001. (Oral)
4. J. T. Sheu, C. H. Wu, K. S. You and K. M. Chang, " Optimization of KOH wet Etching
process in silicon nanofabrication," IEEE-NANO 2001, pp. 213-217, Oct. 28 ~30, Hawaii,
2001. (Oral)
5. J. T. Sheu, S. P. Yeh, C. H. Wu, K. S. You and J. Y. Lin, " Ultrahigh-density
Nanopyramid Array Fabrication on (100) Silicon Wafer using Scanning Probe Lithography
and Anisotropic etching," EDMS Proceeding, pp. 739-742, Dec. 12-13, 2001. (Oral)
6. K. M. Chang, K. S. You, C. H. Wu, J. T. Sheu, "Single-crystal Silicon Nanostructure
Fabrication by Scanning Probe Lithography and Anisotropic Wet Etching,”International
Symposium on Microelectronics and MEMS, pp.34-42, Dec. 17 - 19, 2001, Australia.
(Oral)
7. Yao-Jane Hsu, Der-Hsin Wei, Gung-Chian Yin, Yau-Shan Wu, Jyh-Chyuan Jan, JengTzong Sheu, Chia-Haur Wu, “Study of X-ray Spectromicroscopy on the Nanofabrication
of Ti and TiN Film,” 中華民國化學年會 , 2002.
8. J. T. Sheu, G. M. Kao, K.S. You, and C. C. Chen,”A New Fabrication Technique of
Silicon Nanowire,” Micro and Nano Engineering 2003, Sept. 23 ~25, 2003.(Oral)
9. J. T. Sheu, S. P. Yeh, C. H. Wu, K. S. You and J. Y. Lin, " Fabrication of
Ultrahighdensity Nanopyramid Arrays on (100) Silicon Wafer using Scanning Probe
Lithography and Anisotropic etching,” ICMAT, Dec. 7~ Dec. 12, 2003.
10. J. T. Sheu, S. P. Yeh, C. H. Wu, K. S. You and J. Y. Lin, "Nano-scale Patterning of
Titanium Thin Film with Local Oxidation of Scanning Probe Microscope,”ICMAT 2003,
Dec. 7~ Dec. 12, 2003.
11. J. T. Sheu, T. Y. Tseng, and C. H. Wu,“Fabrication of nano-scaled alumina template
mask by using self-assembly anodic oxidation method,”4th WSEAS Int. Conf. On
Nanoelectronics and Nanotechnology, Jan, 13~15, 2004. (Oral)
12. W. L. Hung, C. C. Chen, J. T. Sheu,“Comparison of Anisotropic Etching with KOH
and TMAH for Silicon Nanostructure Fabrication”, SNDT 2004, May 11-13, 2004.
13 . J. T. Sheu, K. S. You, C. C. Chen and S. C. Lin ,“Characteristics of silicon nanowire
in biological molecules detection,” EIPBN 2004, June, 2004.(oral)
14. J. T. Sheu, K. S. You, C. C. Chen and H. T. Tsai, “Nanoflash Device with
Self-aligned double floating gates using the scanning probe lithography and TMAH wet
etching,” EIPBN 2004, June, 2004. (Poster)
15. J. T. Sheu, C. C. Chen, P. C. Huang, and M. L. Hsu, “Selective deposition of gold
nanoparticles on SiO2/Si nanowire,” Micro and Nano Electronics Conference 2004, Sept.
2004.(poster)
16. J. T. Sheu, C. C. Chen, P. C. Huang, Y. K. Lee and M. L. Hsu, “Selective Deposition
of Gold Nanoparticles on SiO2/Si Nanowires for Molecular Detection,” SSDM 2004,
July, 2004.(Oral)
17. J. T. Sheu, C. H. Wu, H. H. Liu , W. H. Hung and T. S. Chao, “UV light Induced
Production of Gold nanoclusters on a N-type Silicon Nano-wires by Using Dip Pen
Lithography Technique,” EIPBN 2005, May 31-June 3, Orlando, 2005.(poster)
18. J. T. Sheu, C. H. Wu , H. H. Liu, and T. S. Chao, “Nano-scale patternning on the
silicon oxide surface by using dip-pen nanolithography, IEEE Nano 2005, Japan, July,
2005.(poster)
19. J. T. Sheu, S. P. Yei, S. T. Tsai, and C. H. Lien, “Fabrication and Electrical Transport
Properties of Nickel Monosilicide Nanowires,” IEEE Nano 2005, Japan, July,
2005.(Oral)
20 . Jeng Tzong Sheu, San Pin Yeh, S. T. Tsai, C. H. Lien,“Fabrication of
nanoscaled-schottky diodes based on metal silicide/silicon nanowire with scanning probe
lithography and Wet etching and its electrical characterization,” International Conference
on Solid State Devices and Materials, Kobe, Japan, September, 2005.
21. Jeng-Tzong Sheu, Chia-Hao Wu, Tieng-Sheng Chao,“Selective deposition of gold
particles on DPN patterns on silicon dioxide surface,” International Conference on Solid
State Devices and Materials, Kobe, Japan, September, 2005.