University of Jordan
Department of Physics
Amman,11942
Jordan
Home Phone#:962-5-3995057
Mobile#: 962-78-5032541
Work# : 962-6-535500 ext:22043
e-mail: bizlmi@yahoo.com
basher_lahlouh@ju.edu.jo
Dr. Bashar Lahlouh
Dr. Bashar Lahlouh is a currently a faculty member at the physics department at
the University of Jordan.
Education:
1) BS in physics: 1991-1995
2) MS in physics: 1999-2000
.
University of Jordan
Texas Tech University
Amman, Jordan
Lubbock, Texas
Worked on low-k during the MS period. The degree was awarded as a non-thesis
degree after passing the qualifying exam and fulfillment of the degree’s requirements.
3) Ph.D in physics: 2000-2003
Texas Tech University
Lubbock, Texas
Dissertation: PECVD deposition of low k materials. Depositing low k material and
optimizing the CVD process to achieve controllable dielectric properties that can be
tailored to current and future semiconductors industry needs. Deposition and
characterization of nanoporous materials. Use of supercritical CO2 as an alternative
method to introduce nanoporosity and cure plasma damaged nanoporous low-k
materials.
______________________________________________________________________
Experience:
1) Research assistant: 1999-2003
Texas Tech University Lubbock, Texas
*Developed nanoporous low-k a-SiC/SiO/C:H films with dielectric constant as low as 2.1.
*Developed effective treatment methods for dielectric constant recovery of plasma damaged
nanoporous low-k organosilicate films.
*Designed and constructed a supercritical carbon dioxide system for semiconductors
applications.
*Used supercritical carbon dioxide for selective extraction of CO2 soluble components to
produce nanoporosity in organosilicate films.
*Design and development of a flow-through and pulsed supercritical carbon dioxide system.
*PECVD deposition of nanocrystalline SiC thin films.
*PECVD development and deposition of multiphase organosilicate films for nanoporous low-k
application.
*Design and implementation of MEMS micropumps, micro channels, waveguides and micro–
moisture sensors.
2) Teaching Assistant: 1999-2001
Texas Tech University
Lubbock, Texas
*Teaching first year general physics labs.
*Teaching assistant for Graduate Advanced Semiconductor Processing class.
3) Assistant Professor:
Applied Science Private University
March 2004 - September 2004
Amman, Jordan
4) Assistant Professor:
Jordan University
Amman, Jordan
September 2004 until now
As an assistant professor, Dr. Lahlouh taught many graduate and undergraduate
courses. The list of courses taught by Dr. Lahlouh includes: physics 101 (mechanics),
physics 102 (electricity and magnetism), physics 103 (life sciences), physics 105
(medicine), modern physics, quantum mechanics, waves and optics, electronics, digital
electronics, medical electronics, electricity and magnetism, and special topics
(Spectroscopy).
In 2007, Dr. Lahlouh started to build a material research lab. Currently, the lab is
functional and Dr. Lahlouh’s graduate students are doing their graduate research in this
lab. The lab includes the following instruments: spin coater, high temperature furnaces
(1200oC),
vacuum
ovens
(300o),
thin-film
metrology
tool,
Photoluminescence
spectrometer (Uv-Vis),Atomic Force Microscope (AFM), polarizing microscope, and a
hot-press.
_________________________________________________________________________
Publications and Presentations:
1. “Low-k organosilicate films prepared by
tetravinyltetramethylcyclotetrasiloxane,”
J. Lubguban, T. Rajagopalan, N. Metha, B. Lahlouh,…
J. Appl. Phys., 92 (2002),1033.
2. “Supercritical Carbon Dioxide Process for Forming Nanoporous
Dielectrics,”
S. Gangopadhyay, J. Lubguban, T. Rajagopalan, B.
Lahlouh, …
International Sematech/ Ultra low k workshop 2002
3.
“Use of SCCO2 Processing for Integration and Formation of Ultra Low-k
Dielectrics,”
D. Toma, M. Biberger, R. Butler, J. Sun, T. Rajagopalan, , B. Lahlouh,….
International Sematech/ Ultra low k workshop 2002
4.
“Novel Method for Producing Nanoporous Dielectric Films,”
B. Lahlouh, X. Wang, N. Metha, S. Gangopadhyay,…
MRS fall meeting 2000. (Symposium L)
5. “Supercritical CO2 Process for Porous Materials and Clean,”
B. Lahlouh, S. Gangopadhyay,….
SRC Center for Advance Interconnect Systems Technologies Review Meeting,
RPI 2002.
6.
“Supercritical carbon dioxide extraction to produce low-k plasma
enhanced chemical vapor deposited dielectric films,”J. A. Lubguban, J. Sun,
T. Rajagopalan, B. Lahlouh,…. Appl. Phys. Letters, 81, 4407 (2002).
7. “Supercritical carbon dioxide extraction of porogens for the preparation of
ultralow-dielectric-constant films”
Rajagopalan, T, Lahlouh, B, Lubguban, JA, et al.
APPL PHYS LETT 82 (24): 4328-4330 JUN 16 2003
8. ” A two-stage discrete peristaltic micropump”
Berg, JM; Anderson, R; Anaya, M; Lahlouh, B; Holtz, M; Dallas, T
SENSOR ACTUAT A-PHYS 104 (1): 6-10 MAR 15 2003
9. “Creating Nanoporosity By Selective Extraction Of Porogens Using
Supercritical Carbon Dioxide/Cosolvent Processes”
B. Lahlouh, T. Rajagopalan, J. A. Lubguban etal.
MRS spring Meeting 2003, April 22-24 2003, San Francisco, CA.
10. “Silylation Using a Supercritical Carbon Dioxide Medium to Repair PlasmaDamaged Porous Organosilicate Films”
B. Lahlouh, J. A. Lubguban, G. Sivaraman, R. Gale, and S. Gangopadhyay
Electrochem. Solid-State Lett. 7, G338 (2004)
11. “Post treatment of plasma-enhanced chemical vapor deposited a-SiC:H
films for low-k dielectrics.”
B. Lahlouh, T. Rajagopalan, N. Biswas, J. Sun, D. Huang, S.L. Simon, J.A.
Lubguban, Shubhra Gangopadhyay. Thin Solid Films 497 (1-2): 109-114 feb
21 2006
12. “Ferrihydrite gel
-C2H5OH-CH3CHCH2O
ternary system”. Talantsev, Evgueni F.; Pantoya, Michelle L.; Camagong,
Cristina; Lahlouh, Bashar; Nicolich, Steven M.; Gangopadhyay, Shubhra. Journal
of Non-Crystalline Solids (2005), 351(16&17), 1426-1432. CODEN: JNCSBJ
ISSN:0022-3093. CAN 143:155819 AN 2005:466955 CAPLUS
13. “Supercritical CO2 extraction of porogen phase: An alternative route to
nanoporous dielectrics”. Lubguban, J. A.; Gangopadhyay, S.; Lahlouh, B.;
Rajagopalan, T.; Biswas, N.; Sun, J.; Huang, D. H.; Simon, S. L.; Mallikarjunan,
A.; Kim, H.-C.; Hedstrom, J.; Volksen, W.; Miller, R. D.; Toney, M. F. Journal of
Materials Research (2004),
14. “Investigation on hexamethyldisilazane vapor treatment of plasmadamaged nanoporous organosilicate films”
Applied Surface Science, 2006, vol. 252, no18, pp. 6323-6331
T. Rajagopalan, B. Lahlouh, J.A. Lubguban, N. Biswas, S. Gangopadhyay, J.
Sun, D.H. Huang, S.L. Simon, D. Toma and R. Butler
15. “Hexamethyldisilazane vapor treatment of plasma damaged nanoporous
methylsilsesquioxane films: Structural and electrical characteristics”
Thin Solid Films 516 (2008) 3399–3404
T. Rajagopalan , B. Lahlouh , I. Chari a, M.T. Othman ,N. Biswas , D. Toma
, S. Gangopadhyay
16. “Ellipsometric characterization of PbI2 thin film on glass”
Physica B 404 (2009) 1–6
A. Ahmad, S. Saq'an, B. Lahlouh, M. Hassan, A. Alsaad and H. El-Nasser