1) For nano-particle synthesis:
Rotary evaporator (Cole-Parmer), Centrifuge, Vacuum oven, Magnetic stirrer,
Hot plates (Thermo Scientific), Spin coater, Sonicator (Branson), Chemical
safety hood, Chiller (Neslab), Microscopes (Olympus), Micro balances
(Mettler)
2) For patterning:
(a) Nanocube Piezo Stage (PI, 120 x 120 x 120 um travel range, 0.2 nm
resolution) (b) Galvano Mirrors
(c) Linear Motor Stages (Aerotech, 110 mm x 130 mm, 350 mm/s, 1 nm
resolution
3) For annealing and crystallization (Lasers):
- Femto second lasers (main equipment components from SpectraPhysics/Newport)
(a) Diode pumped laser pumped mode-locked Ti: sapphire oscillator <50 fs,
tunable 720-850 nm
(b) Nd:YLF pump laser for the regenerative amplifier
(c) Tunable Ti:sapphire regenerative amplifier, ~1mJ/pulse @ 1kHz, 800 nm,
<80fs pulse duration
(e) A high pulse energy multi-pass regenerative amplifier pumped by a
Nd:YAG laser producing ~ 25 mJ/pulse @ 10 Hz, 100 fs pulse duration
and from IMRA
100 kHz, = 1,054 nm
(g) TOPTICA FemtoFiber pro NIR laser, (1560 nm and 780 nm) 100 fs pulse
width, 140 mW @ 780 nm
- Pico second lasers
Vanguard Quasi-CW Mode-Locked UV DPSS Laser (Spectra-Physics, 10 ps,
80 MHz, 4 W, 355 nm)
- Nano second lasers
(a) Surelite Ex Laser (Continuum, 5 ns, 10 Hz, 1064 nm)
(b) PulseMaster 880 Excimer Laser (LightMachinery, 10 ns, 600 mJ, 308 nm)
(c) A Spectra Physics Navigator high frequency nanosecond laser 40 ns pulse
duration at 20 kHz, (200 kHz maximum frequency) with the following
harmonics: 18 W @1064 nm, 9 W @ 532nm, 3.5 W @355 nm.
(d) A Lambda Physik UV excimer laser (250 mJ/pulse, 300 Hz, 28 ns FWHM
@ 248 nm.
(e) A Tempest New Wave Nd:YAG pulsed laser (10 Hz, 7 ns FWHM, 650
mJ@ 1064 nm, 350 mJ@ 532 nm, 120 mJ@ 355 nm, 70 mJ @ 266 nm)
(f) A Polaris III-10 New Wave Nd:YAG pulsed laser, 90 mJ @ 1,064 nm, 50
mJ @ 532 nm
- Continuous lasers
(a) 95 Ion Laser (Lexel Laser, 514 nm)
(b) 3500 Ion Laser (Lexel Laser, 514 nm)
(c) Innova 300 Laser (Coherent, 514 nm)
(d) A DPSS laser, Sprout-G-5W, 5W @ 532 nm
(e) He-Cd laser, 50 mW (Kimmon, 325 nm)
4) For imaging and measurement:
(a) Gated ICCD camera, <2 ns minimum gate width
(b) Imaging Spectrograph and Monochromator
(c) Veeco Atomic force microscope (AFM)
(d) Near-field Scanning Optical Misroscopes (NSOMs) from Nanonics and
Park Systems
(e) Semiconductor analyzer
(f) Solar cell simulator
(g) A John Woolam Co. VASE scanning ellipsometer
(h) Lindberg nanowire growth furnaces
(i) A Renishaw inVia Basis Raman system
5) Labs and building:
- Total working area: 2,000 sq. ft.
- Offices (#5144, #5216, at Etcheverry Hall)
- Lab. (#5115, #6116, #6162, #6186, at Etcheverry Hall)
6) Shared research facilities at UC Berkeley:
a. Marvell Nanofabrication Laboratory
- Total working area: 14,000 sq. ft.
- 2 separate floors of cleanroom: internal stairway and elevator, single-floor
gowning
- Class100 / VC-E / plenum supply/ <3mG stray AC
- Class1000 / VC-C / ducted HEPA
b.The Berkeley Sensor & Actuator Center (BSAC):
- The National Science Foundation Industry/University Cooperative Research
Center for Microsensors and Microactuators, conducts industry-relevant,
interdisciplinary research on micro- and nano-scale sensors, moving
mechanical elements, microfluidics, materials, and processes that take
advantage of progress made in integrated-circuit, bio, and polymer
technologies
c. Lawrence Berkeley National Laboratory (LBNL):
- The National Center for Electron Microscopy (NCEM) is a Department of
Energy
(DOE)
sponsored
user
facility
for
electron
beam
microcharacterization. Equipment include the JEOL 3011 in situ TEM, the
Zeiss Libra 200kV FEG TEM and the FEI dual-beam Strata 235 FIB. NCEM
currently operates 8 dedicated Transmission Electron Microscopes. The
available microscopes cover a wide range of state-of-the-art or unique
capabilities, among them instruments that are specialized for high resolution,
analytical, soft materials, and in situ experiments. Through the TEAM project
(Transmission Electron Aberration-corrected Microscope) two new
aberration-corrected microscopes have been installed at NCEM. TEAM 0.5, is
a double-Cs corrected FEI Titan STEM/TEM and TEAM I is the world’s first
Cs and Cc corrected electron microscope, (for further details see:
http://www.lbl.gov/LBL-Programs/TEAM/).
- The Advanced Light Source (ALS), a division of Berkeley Lab, is a national
user facility that generates intense light for scientific and technological
research. As one of the world's brightest sources of ultraviolet and soft x-ray
beams--and the world's first third-generation synchrotron light source in its
energy range--the ALS makes previously impossible studies possible. The
facility welcomes researchers from universities, industries, and government
laboratories around the world.
- The Molecular Foundry is a User Facility charged with providing support to
nanoscience researchers in academic, government and industrial laboratories
around the world. The Foundry provides users with instruments, techniques
and collaborators to enhance their studies of the synthesis, characterization
and theory of nanoscale materials. Its six facilities focus on both “soft”
(biological and polymeric) and “hard” (inorganic and microfabricated)
nanostructured building blocks, and their integration into complex functional
assemblies. Users are invited to submit proposals requesting free access to
Foundry instruments, techniques, and skilled staff.