Supplementary information Growth of Epitaxial Co2FeSi 25-nm-thick Co2FeSi (CFS) films for a spin injector and detector were grown on Si(111) templates by low temperature molecular beam epitaxy (LT-MBE) [1]. We have already established the epitaxial growth for Heusler-compound thin films by intentionally using (111)-oriented Si or Ge substrates in LT-MBE conditions [2]. It is essential for obtaining the epitaxial layers to use the atomic matching at the (111) interfaces between Heusler compounds and Si or Ge. If we use the (100)- or (110)-oriented substrate, even the epitaxial growth cannot be achieved. Prior to the growth, surface cleaning of substrates was performed with an aqueous HF solution (HF : H2O = 1 : 40), and then, they were heat-treated at 450◦C for 20 min in an MBE chamber with a base pressure of 2 × 10−9 Torr. After the reduction in the substrate temperature down to 100◦C, we co-evaporated Co, Fe, and Si with stoichiometric chemical compositions by using Knudsen cells. During the growth, two dimensional epitaxial growth was confirmed by observing reflection high energy electron diffraction patterns. The formed epitaxial CFS films were characterized by means of cross sectional transmission electron microscopy (TEM), nanobeam electron diffraction (ED), and 57Fe conversion electron Mössbauer spectroscopy. From these detailed characterizations, we have observed highly ordered L21 structures in the CFS layers[1]. Introducing the resistance area product for nonlocal spin signals In the lateral spin valve consisting of two ferromagnetic wire bridged by a nonmagnetic strip as shown in Figs. 2a and 2b, the nonlocal spin signal ΔRS based on a one-dimensional Here PF and PI are the bulk and interface spin polarizations of the ferromagnetic electrode, respectively, and RSFinj , RSFdet and RSN are the spin resistances for the ferromagnetic injector, detector and the nonmagnetic strip, respectively. Also, RSIinj and RSIdet are the interface spin resistances for the injecting and detecting junctions, rescpectively. d and _N are, respectively, the separation distance between the injector and detector and the spin diffusion length for the nonmagnetic strip. The spin resistance is defined as 2/((1−P2)S), where , and S are the resistivity, the spin diffusion length and the effective cross section for the spin current, respectively. The interface spin resistance RSI is defined by 2RA/((1 − PI2 )S), where RA is the resistance area product. In the nonmagnetic strip with a long spin diffusion length over a few hundred nanometer, S is given by the cross section of the strip. On the other hand, in the ferromagnets with a short spin diffusion length less than 10 nm, S is given by the size of the junction in contact with the nonmagnetic strip because the spin current abruptly decays in the vicinity of the F/N interface[5]. In the conventional ferromagnetic metals, RSF is much smaller than RSN because of the short spin diffusion length. However, RSF increases with P and diverges at P = 1. In the present CFS/Cu LSV, RSF is equal to RSN at P = 0.97. However, RSF for the CFS is sufficiently smaller than RSN for P < 0:9. Moreover, RSI for CFS/Cu is also much smaller than RSN. When RSN ≫ RSF;RSI, the above equation can be simplified as By introducing the junction sizes (Sinj, Sdet and SN), this equation can be revised as By defining ΔRSA as ΔRS(SinjSdet/SN), we obtain In Eq. (4), the influence of the junction sizes on the spin signal can be normalized. Thus, ΔRSA allows us to fairly evaluate the device performance of the lateral spin valve in theohmic junctions with the conditions RSF, RSI ≪ RSN for various combinations of a ferromagnetic metal and a nonmagnetic Lateral spin valves with interface barrier or highly resistive ferromagnetic electrodes The backflow of the spin current can also be reducded by inserting the tunnel burrier at the F/N interface. Relatively large spin accumulations have been reported in CoFe/Al2O3/Al, Py/Ag and Py/MgO/Ag junctions[6–9]. However, the generation efficiency of the spin current is limited by the spin polarization of the spin injector. Moreover, the interface barrier strongly reduces the diffusion of the spin current into another ferromagnet, giving rise to a poor injection efficiency of the spin current. When the resistivity of the spin injector is quite large, the similar situation can be realized, resulting in the large spin accumulation. The large spin signal reported in Ref. [10] mainly originates from its large resistivity of 420 Ω cm at 77 K, which is ten times larger than that in the Heusler Co2FeAl film reported by other groups[11, 12]. We also pointed out that a large interface resistance is intrinsically induced at the interface between the transition ferromagnetic metal and aluminum [13] although the authors of Ref. [10] assumed a transparent interface. Estimation of interface resistance The interface resistance was estimated by measuring the 4-terminal resistances with local spin valve configuration. In this configuration, the total resistance consists of the resistance of the Cu wire and the two interface resistances. Since the resistance of the Cu wire can be estimated from the resistivity for Cu, we can roughly calculate the interface resistance by subtracting the resistance for the Cu wire from that in the local spin valve configuration. By using the relation that the difference in the resistance ΔR is given by RAF/N(Sinj+Sdet), we can obtain RAF/N. For the CFS/Cu LSVs, ΔR was ∼ 30 mΩ, indicating RACFS/Cu∼ 1 fΩm2. Thus, the value of RACFS/Cu is much smaller than CuCu, implying that the enhancement of the spin signal is caused by the high spin polarization, not by the interface resistance. Estimation of spin polarization By fitting the experimental data on the distance dependences of the ΔRSA using Eq. (4), we can estimate the spin polarization of the spin injector in the LSV systems. For the Py/Cu LSVs, RPy/Cu is less than 0.1 fΩm2, much smaller than PyPy (0.75 fΩm2). Thus, we can neglect the second term in the numerator of Eq. (3), then obtain PPy ∼ 0.3 at RT and 0.35 at 80 K, respectively with assuming Py;RT = 3 nm and Py;80K = 5 nm[14]. For the CFS/Cu LSVs, as described in the previous section, RCFS=Cu can be approximately estimated as ∼1 fΩm2. Because of the following reasons, we assumed that the spin diffusion length for CFS (CFS) is the same order of that for CFSA (CFSA), which was reported as 2.2 nm at RT and 3 nm at 14 K in recent study of the vertical magnetoresitance device[15,16]. The spin-diffusion length is proportional to the magnitude of the spin-orbit interactions. Since the atomic number of Al is close to Si, we expect that the magnitude of spin-orbit interaction in CFS should be almost same order of CFSA. From these considerations, we expect that CFS is the same level or shorter than CFSA. Since the use of the longer CFS prevents an overestimation of PCFS, we use CFS;RT = 3 nm and CFS;80K = 4 nm, which are slightly longer than the values for CFSA. We then obtained 0.56 at RT and 0.72 at 80 K with assuming PI = 0.5, which is typical interface spin polarization between the Co-based alloy and Cu [17, 18]. Switching spin currents for CFS and Py We roughly compare the switching current of CFS to that of Py. According to the simple spin-transfer torque model in metallic junctions, the critical current is proportional to the saturated magnetization MS and the damping constant _. From VSM measurement, the MS for our CFS is approximately 1000 emu/cc, slightly larger than that for Py (860 emu/cc). The values for our CFS and Py are found to be 0.008 and 0.013, respectively, from the FMR measurements. Therefore, the product of MS and for CFS is smaller than that for Py. This implies that the critical current for the magnetization switching is smaller than that for Py. Therefore, assuming the same switching current both in CFS and Py provides a proper evaluation of the power consumption. [1] Yamada, S., Hamaya, K., Yamamoto, K., Murakami, T., Mibu, K. & Miyao, M. Significant growth-temperature dependence of ferromagnetic properties for Co2FeSi/Si(111) prepared by low-temperature molecular beam epitaxy. Appl. Phys. Lett. 96, 082511 (2010). 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