Spin diffusion and transport in (110) GaAs microcavity structures K. Biermann, R. Hey, and P. Santos Paul-Drude-Institut für Festkörperelektronik Berlin DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 1 outline „Spin diffusion and transport in (110) GaAs microcavity structures“ • motivation, basic concepts • MBE growth • surface acoustic waves (SAWs) in microcavity structures • spin diffusion and spin transport measurements - external applied magnetic field - Hanle effect measurement - intense SAW fields • summary / outlook DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 2 motivation Aim: transport and manipulation of spins up to LN2 temperature (2007-2009) / RT (2009-2011) Basic concept: rf light in IDT light out V M undoped QW SAW gate electron photons Requirements: a) long spin-lifetimes b) effective conversion of circularly polarized light into spin-polarized carriers & vice versa DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 3 requirement a: long spin-lifetimes 1) Transport by SAW: -> enhanced carrier lifetime hwL -> enhanced spin lifetime (reduced exchange interaction of electrons and holes -> suppression of the Bir-Aronov-Pikus spin dephasing mechanism) 2) Transport of spin-polarized carriers in (110) QWs: dominant spin-lifetime limitting process (Dyakonov-Perel mechanism) in semiconductors without inversion symmetry: spin induced splitting of the conduction band effective magnetic field Bint (ke) of spin-orbit-interaction (001) QW: laser Bint s (110) QW: laser s s z Bint z x x DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 4 requirement b: effective light-carriers conversion insertion of the QW into a micro-resonator (cavity) structure M4-2142 I z = 18.9 nm I no of DBRs: 18/ 4 dTmatch dlC K nm 1 840 (e lC -hh 1 ) 860 ~ 10 Tmatch QW ________________ ___upper DBR____ cavity with QW _ ___lower DBR____ ____substrate____ l(nm) -> s. e r y it 820 lC cav 100 200 T (K) 300 -> precise control of layer thicknesses mandatory! DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 5 MBE growth: challenges MBE challenges: a) Growth of high structural perfection on (110) oriented GaAs substrates <-> spin-dephasing <-> transport of carriers (eg. recombination at local potential minima) b) Growth of exactly tuned cavity structures at working temperature: QW-emission wavelength lQW<=> cavity resonance wavelength lC DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 6 MBE growth of high-quality (110) cavity structures Compared to (001) GaAs based structures: • stronger tendency to facetting • reduced critical thickness (GaAs)/(Al,Ga)As (110) TG= 480C PL-Int. (arb. u.) Growth parameter for (110) GaAs based structures: • low Tg (~ 490 °C) • high V/III BEP ratio (~ 45) • MEE grown smoothing buffer layer • growth interruptions • in-situ annealing steps • whole cavity structure is composed of short-period-super-lattices (SPSLs) 10K-PL of a GaAs-QW in a cavity (out of resonance) dQW~20 nm: FWHM 0.7 meV 1911 1.520 1.525 1.530 Energy (eV) DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 7 MBE growth of exactly tuned cavities M4_2147 measured in-situ reflection measurement calculated 400 350 Filmetrics F30 lC light out 1l- cavity light source 300 growth time (min) ‘Y’- fiber Spectrometer 5 mirror pairs reflected light heatable viewport (Createc HW-63-40) PC rotating sample 250 18.5 mirror pairs 200 ( Al0.20Ga0.80As / Al0.95Ga0.05As ) 150 100 MBE growth chamber (V80) 50 0 #M4-2147 (at RT) 750 800 850 900 950 750 800 850 900 950 GaAs (110) substrate l (nm) l (nm) lc reflectivity 1.0 Real-time growth rate corrections 0.5 Deviation of the cavity resonance wavelength from the nominal value (lc) is smaller than the MBE inherent lateral thickness variation (due to flux inhomogeneities) 787.8 801.4 center edge (of a 2" wafer) 0.0 700 800 l (nm) 900 DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 8 SAWs in modified cavity structures 1-l ZnO l/4 Al0.60Ga0.40As QW x4 Ga0.93Al0.07As l-cavity Ga0.93Al0.07As l/4 Al0.60Ga0.40As 3l/4 Ga0.93Al0.07As l/4 Al0.60Ga0.40As l/4 Ga0.93Al0.07As l/4 Al0.60Ga0.40As l/4 Ga0.93Al0.07As l/4 Al0.60Ga0.40As x5 • reduction of Al-content in every layer • ¾-l Ga-rich layers • 2-l (instead of 1-l) Ga-rich cavity -> propagation of SAWs is supported Additional deposition of a 1-l thick ZnO cap layer (sputtering) to increase the piezoelectric potential of the SAWs. M4_2170 + 424nm ZnO normalized intensity ( w/2 ) l/4 Ga0.93Al0.07As `Al-reduced´cavity structure: 1 10 (110)-GaAs (220) 0 10 -1 10 -2 ZnO (0002) 10 17.2 SPSLs -3 10 ZnO (0004) 36.3 -4 1x10 -5 1x10 -6 10 15 20 25 30 35 w (°) DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 9 spin diffusion and spin transport measurements T = 80 K spin diffusion IDT switched off Il I r Il I r v= 3 µm/ns B generation point G y || [001] generation point G Il Ir y || [001] B spin transport SAWs IDT switched on measurements with in-plane magnetic field B DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 10 spin transport B=0 B = 40 mT 0.15 T = 80 K PSAW = + 8.6 dBm l1/e = 25.2 µm (8.4 ns) 0.10 Pl=790nm = 150 µW (100µm pinhole, 20x objective) B=0 spins || z no in-plane spin component tz ~ 8 ns 0.05 0.00 -0.05 0 5 10 15 20 25 30 y[001] (µm) 35 40 B>0 -> spin precession -> in-plane component sy ty << 8 ns F:\biermann\data\Probendaten\R0619\M4_2170\M4_2170B_A12\Jan2408-002_003-f(y B) Graph1 16.04.2008 17:27:27 Lamor frequency Spin polarisation ge B B ge = -0.36, = 1.27/ns x s z exp( x / d1/ e ) cos vSAW d1/e = 25.2 µm DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 11 Hanle effect measurement T = 80 K, Pl=790nm = 25 µW Measurement of spin diffusion along [001] in dependence of B[1-10] s x [1-10] 0.03 Bext 0.04 0.02 0.01 y [001] -40 Precession leads to an in-plane spin component. -> t = f(B) if ty <> tz -> allows for an estimation of ty g B B t S ,Z t S ,Y 1 1 1 1 * T2 2 t S ,Y t S , Z -20 0 20 B (mT) 40 (0) 2)2)-1 s(B) ( B)= s,0 * (1s + (T* ns T2* = 1.3 T* ns2 =(g1.3 = -0.36) = g B/(h/2) * 2 B 1 T 1/T*2 = 1/tr+1/ts 2 tr electron scattering lifetime ts spin lifetime in-plane: ts,y out-of-plane: ts,z F:\2008_02_29 group meeting\M4_2170b_d11\Feb1408-002 0.7 ns 8.4 ns (@ 8.6 dBm) T = 80K 1 * T2 t S ,Y 0.7 ns 2 DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 12 influence of strain fields transport by intense SAW fields: 0.10 PSAW = 0 (B = 0) PSAW = 15 dBm (B = 0) 0.05 T = 80 K PSAW = 15 , 23 dBm Pl=790nm = 58 µW (100µm pinhole, 20x objective) 0.00 0 10 20 30 40 y[001] (m) 0.10 PSAW = 0 (B = 0) PSAW = 23 dBm (B = 0) SAW strain field -> internal magnetic field along (1-10) S 0.05 0.00 0 10 20 30 40 1 C3 k x s XZ -> strong influence on spin polarization y[001] (m) DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 13 summary /outlook summary • growth and processing of high quality (110) GaAs cavity structures, that support SAW propagation • spin diffusion and tranport measurements at T=80K - effect of an external magnetic field and of SAWs on spin polarisation - estimation of the in-plane (1 ns) and out-of-plane spin-lifetimes (8 ns). outlook • processing of narrow lateral channels (along [001]) to increase in-plane spin lifetime (deep etching / metal stripes on top of samples) • implementation of electric / magnetic gates • replace GaAs QW by InGaAs QW (higher confinement) DFG SPP1285 Treffen der Projektgruppen, Hannover 6./7. Juni 2008 14