Microelectronics
Circuit Analysis and Design
Donald A. Neamen
Chapter 3
The Field Effect Transistor
Neamen
Microelectronics, 4e
McGraw-Hill
Chapter 3-1
In this chapter, we will:
 Study and understand the operation and characteristics of
the various types of MOSFETs.
 Understand and become familiar with the dc analysis and
design techniques of MOSFET circuits.
 Examine three applications of MOSFET circuits.
 Investigate current source biasing of MOSFET circuits, such
as those used in integrated circuits.
 Analyze the dc biasing of multistage or multitransistor
circuits.
 Understand the operation and characteristics of the
junction field-effect transistor, and analyze the dc response
of JFET circuits.
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Microelectronics, 4e
McGraw-Hill
Chapter 3-2
Basic Structure of MOS Capacitor
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Microelectronics, 4e
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Chapter 3-3
MOS Capacitor Under Bias:
Electric Field and Charge
Parallel plate capacitor
Negative gate bias:
Holes attracted to gate
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Positive gate bias:
Electrons attracted to gate
Chapter 3-4
Schematic of n-Channel
Enhancement Mode MOSFET
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Microelectronics, 4e
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Chapter 3-5
Basic Transistor Operation
After electron
inversion layer is
formed
Before electron
inversion layer is
formed
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Chapter 3-6
Basic Transistor Operation
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Microelectronics, 4e
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Chapter 3-7
Current Versus Voltage Characteristics:
Enhancement-Mode nMOSFET
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Chapter 3-8
Family of iD Versus vDS Curves:
Enhancement-Mode nMOSFET
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Chapter 3-9
p-Channel Enhancement-Mode
MOSFET
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Microelectronics, 4e
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Chapter 3-10
Symbols for n-Channel
Enhancement-Mode MOSFET
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Chapter 3-11
Symbols for p-Channel
Enhancement-Mode MOSFET
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Chapter 3-12
n-Channel Depletion-Mode MOSFET
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Chapter 3-13
Family of iD Versus vDS Curves:
Depletion-Mode nMOSFET
Symbols
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Chapter 3-14
p-Channel DepletionMode MOSFET
Symbols
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Chapter 3-15
Cross-Section of nMOSFET and pMOSFET
Both transistors are used in the fabrication of CMOS circuitry.
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Microelectronics, 4e
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Chapter 3-16
Summary of I-V Relationships
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Microelectronics, 4e
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Chapter 3-17
Enhancement and Depletion Mode
 In field-effect transistors (FETs), depletion mode and
enhancement mode are two major transistor types,
corresponding to whether the transistor is in an ON
state or an OFF state at zero gate-source voltage.
 Enhancement-mode MOSFETs are the common
switching elements in most MOS logic families. These
devices are OFF at zero gate-source voltage, and can
be turned on by pulling the gate voltage in the direction
of the drain voltage; that is, toward the VDD supply rail,
which is positive for NMOS logic and negative for PMOS
logic.
 In a depletion-mode MOSFET, the device is normally ON
at zero gate-source voltage. Such devices are used as
load "resistors" in logic circuits (in depletion-load NMOS
logic, for example).
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Microelectronics, 4e
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Chapter 3-18
Enhancement and Depletion Mode
 For an n-channel enhancement -mode MOSFET, a
positive gate to source voltage greater than the
threshold voltage VTN must be applied to induce an
electron inversion layer. For VGS > VTN the device is
turned on.
 For an n-channel depletion-mode MOSFET, a channel
between source and drain exists even for VGS=0. The
threshole voltage is negative, so that a negative voltage
is required to turn the device off.
 Current voltage relations are the ideal relations for long
channel devices. Long channel devices are the ones
whose channel length is 2um. However we are in the
order of 0.2um nowadays.
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Microelectronics, 4e
McGraw-Hill
Chapter 3-19
Non-ideal Current Voltage
Characteristics
Finite output resistance
 Body effect
 Subthreshold conduction
 Breakdown effects
 Temperature effects

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Chapter 3-20
Channel Length Modulation:
Early Voltage
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Chapter 3-21
Body Effect
The occupancy of the energy bands in a semiconductor is set by the position of the Fermi
level relative to the semiconductor energy-band edges. Application of a source-to-substrate
reverse bias of the source-body pn-junction introduces a split between the Fermi levels for
electrons and holes, moving the Fermi level for the channel further from the band edge,
lowering the occupancy of the channel. The effect is to increase the gate voltage necessary
to establish the channel, as seen in the figure. This change in channel strength by
application of reverse bias is called the body effect.
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Microelectronics, 4e
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Chapter 3-22
Subthreshold Condition
As MOSFET geometries shrink, the voltage that can
be applied to the gate must be reduced to maintain
reliability. To maintain performance, the threshold
voltage of the MOSFET has to be reduced as well.
As threshold voltage is reduced, the transistor cannot
be switched from complete turn-off to complete
turn-on with the limited voltage swing available; the
circuit design is a compromise between strong current
in the "on" case and low current in the "off" case, and
the application determines whether
to favor one over the other. Subthreshold leakage
(including subthreshold conduction, gate-oxide
leakage and reverse-biased junction leakage),
which was ignored in the past, now can consume
upwards of half of the total power consumption of
modern high-performance VLSI chips
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Chapter 3-23
NMOS Common-Source Circuit
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Chapter 3-24
PMOS Common-Source Circuit
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Chapter 3-25
Load Line and Modes of Operation:
NMOS Common-Source Circuit
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Chapter 3-26
Problem-Solving Technique:
NMOSFET DC Analysis
1. Assume the transistor is in saturation.
a. VGS > VTN, ID > 0, & VDS ≥ VDS(sat)
2. Analyze circuit using saturation I-V relations.
3. Evaluate resulting bias condition of transistor.
a. If VGS < VTN, transistor is likely in cutoff
b. If VDS < VDS(sat), transistor is likely in
nonsaturation region
4. If initial assumption is proven incorrect, make
new assumption and repeat Steps 2 and 3.
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Microelectronics, 4e
McGraw-Hill
Chapter 3-27