CHINHOYI UNIVERSITY OF TECHNOLOGY
SCHOOL OF ENEGINEERING SCIENCES AND TECHNOLOGY
MECHATRONICS ENGINEERING DEPARTMENT
MODULE OUTLINE
School: SCHOOL OF ENEGINEERING SCIENCES AND TECHNOLOGY
Department: INDUSTRIAL ELECTRONICS ENGINEERING
Module identity
Module title and code:
NanotechnologyModule level:
Module credits:
Date Module outline last updated:
Prerequisites, (if any):
Module coordinator:
CUIEEM 305 Electronic Devices and
3.1
12 CREDITS
10 Feb 2024
NONE
Eng. B.Sibanda
Office location:
E-mail address: bsibanda@cut.ac.zw
Module contact hours:
48 HOURS
Face to face:
24 HOURS
Online:
24 HOURS
Tutorial hours:
12 HOURS
Industrial Related /Fieldwork hours:
Practical/Laboratory work hours:
Self-directed learning hours:
12 HOURS
Preamble
The major goals and objectives are to provide graduate students with knowledge and
understanding of physical background and applications of nanoelectronics. The course will
cover electricaland optical properties of materials and nanostructures, fabrication of
nanostructures, nanoelectronicdevices including resonant-tunneling devices, transistors, and
single-electron transfer devices, as well asapplications of nanotechnologies in molecular
biology and medicine.
Module Objectives:
The course intends to give students a broad understanding of fundamentals,
fabricationtechnologies and applications of nanoscale structures. Students will also be trained
for literature studyand critique, oral presentation, problem formulation, solution development,
and formal writing. The course will generally be grounded on the following objectives:
1. Understand nano-CMOS scaling, advantages, and implications of scaling down
nanoelectronic devices.
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2. Describe the solid-state physics and quantum mechanics that govern the operation and
electrical characteristics of nanoelectronic devices.
3. Explain different fabrication and characterization techniques for nanoscale electronic
devices.
4. Study 3D ICs and progress in interconnect technology.
5. Understand the importance and significance of key reliability issues in nanoelectronic
devices and materials.
6. Become familiar with recent research progress related to new devices and materials,
and its application in nanoelectronics and nanotechnology field.
Expected Learning Outcomes:
At the end of the course the student will be able to:

Describe the challenges of CMOS scaling beyond 65nm technology, possible
solutions and advantages/challenges of scaling down devices.

Explain distinct phenomena of semiconductor physics and carrier transport that are
important in nanoelectronic devices.

Understand advanced concepts and operating principles of nanoelectronic devices.

Understand specialized methods to fabricate nanoscale devices.

Gain familiarity with the application of advanced techniques needed to characterize
and study reliability of materials and nanoscale electronic devices.

Understand the applications of nanoelectronic devices in logic/memory and other
related applications.

Describe the structure-physics property relationship, operating principles, merits,
demerits and challenges of some of the futuristic nanoelectronic devices.

Explore application of nanoscale devices in different nanoelectronic and
nanotechnology related engineering fields.
Delivery Methods:
Continuous Assessment will apply, including tests, tutorials, assignments fieldwork and
laboratory reports. A pass mark of 50% is required. The final exam will contribute 70% and
30% will be from continuous assessment. Overall the assessment includes the following:
1. Regular homework assignments
2. In-class tests
3. Tutorials assessments
4. Oral presentations
5. Field trips
6. Mini design projects
7. Laboratory practical reports
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8. End of Semester Examination
Detailed Content layout to include
Topics (outline) / Module content detailed with activities, assignments, tests, timing,
practical work/ lab work. (This information can be presented in tabular form as shown in the
table below).
Day
Topics
Content/concepts/detaile
d
Methodolo
gy
employed
Student
activities
1
Introductio
n to
confinemen
t
Introduction
to
synthesis
of
nanostructure
materials, Bottom-up
approach and Topdown approach with
examples-Trapped
particles-Quantum
dots and artificial
atoms-Quantum wires
and Quantum wells.
Teaching,
Blended
learning

Research on
availability
of quantum
physics
NanoSemicondu
ctor
technology
Tunnel junction and
applications
of
tunneling, Tunneling
Through a Potential
Barrier,
Metal—Insulator,
Metal-Semiconductor,
and Metal-InsulatorMetal
Junctions,
Coulomb
Blockade,
Tunnel
Junctions,
Tunnel
Junction Excited by a
Current
Source.
Spintronics
and
Foundations of nanophotonics,
Field
Emission,
Gate—
Oxide Tunneling and
Hot Electron Effects
in nano MOSFETs,
Theory of Scanning
Tunneling
Microscope, Double
Teaching,
Blended
learning

Assignment
1
2
3
4
5
6
3
Durati
on/time
(for
content
)
6hrs
16hrs
Barrier Tunneling and
the
Resonant
Tunneling Diode.
7
MEMS and
NEMS
Technilogy
8
9
10
Nano
Electronics
and
Spintronics
Introduction
to
MEMS and NEMS,
working principles, as
micro
sensors
(acoustic
wave
sensor,
biomedical
and
biosensor, chemical
sensor, optical sensor,
capacitive
sensor,
pressure sensor and
thermal sensor), micro
actuation
(thermal
actuation,
piezoelectric actuation
and
electrostatic
actuation–micro
gripers,
motors,
valves,
pumps,
accelerometers,
fluidics and capillary
electrophoresis, active
and passive micro
fluidic
devices,
Pizoresistivity,
Pizoelectricity
and
thermoelectricity,
MEMS/NEMS
design,
processing,
Oxidation,
Sputter
deposition,
Evaporation,
Chemical
vapor
deposition etc
Teaching,
Blended
learning
Introduction – Scaling
of physical systems –
Geometric scaling &
Electrical
system
scaling. The SingleElectron Transistor:
The Single- Electron
Transistor
SingleElectron
Teaching,
Blended
learning
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



Research on
MEMs and
NEMs
Systems
Test 1
16hrs
Assignment
2
Test 2
16hrs
Transistor
Logic,
Other SET and FET
Structures,
Carbon
Nanotube Transistors
(FETs
and
SETs), Semiconductor
Nanowire FETs and
SETs,Coulomb
Blockade
in
a
Nanocapacitor,
Molecular SETs and
Molecular
Electronics.
Assessment:
Assignments
5%
Tests
25%
References:
Online access to course material on central server, including online journal with assistance of
the library Information will be provided periodically on relevant text books, internet
resources and other reading material
References Texts:
1. Stephen D. Sentaria, Microsystem Design, Kluwer Academic Press
2. Marc Madou, Fundamentals of microfabrication & Nanofabrication.
3. Fukada & W.Mens, Micro Mechanical system Principle & Technology,
Elsevier,1998.
4. Julian W.Gardnes, Vijay K. Varda, Micro sensors MEMS & Smart Devices, 2001.
5. Nano Terchnology and Nano Electronics – Materials, devices and
measurementTechniques by WR Fahrner – Springe
6. Nano: The Essentials – Understanding Nano Scinece and Nanotechnology by
T.Pradeep; Tata Mc.Graw Hill.
7. Spin Electronics by M. Ziese and M.J. Thornton
8. Nanoelectronics and Nanosystems – From Transistor to Molecular and Quantum
Devicesby Karl Goser, Peter Glosekotter, Jan Dienstuhl
9. Silicon Nanoelectronics by Shunri Odo and David Feny, CRC Press, Taylor &
FranicdGroup
10. Nanotubes and nanowires by C.N.R. Rao and A. Govindaraj, RSC Publishing
11. Quantum-Based Electronic Devices and Systems by M. Dutta and M.A. Stroscio,
WorldScientific.
12. James R Sheats and Bruce w.Smith, “Microlithography Science and Technology”,
Marcel Dekker Inc., New York, 1998.
13. J.P. Hirth and G.M.Pound “Evaporation: Nucleation and Growth Kinetics”
Pergamon Press, Oxford, 1996
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Academic integrity: Articulate policies for attendance, withdrawal, late assignment
submission; plagiarism; statement of academic integrity should be clarified.
The University policy on plagiarism and general behavior is to be adhered to all the time.
Attendance register will be signed everyday with at least 80% attendance to be allowed to sit for
the Institute examination.Pass mark for continuous 50% and no student will be allowed to sit for
the Final Examination examination without passing continuous assessments.The continuous
assessment will contribute 30% to the overall mark and then Final examination will contribute
70%.Students are expected to exhibit good work ethics and behavior in class i.e
 Punctuality for lectures
 Sit for the online tests/quiz during the required window period
 Being in the right place at the right time
 Being courteous
 Hand in all work on time
 Use of cell phone in class is not permitted.
Above all communicate with the lecturer on any issues pertaining to the course.
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