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Improving the SiC Wafer Process
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SiC, a semiconductor compound consisting of silicon and carbon, belongs to the wide-bandgap family of materials.
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Its physical bond is very strong, giving the semiconductor a high mechanical, chemical, and thermal stability.
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 August 19, 2021 Maurizio Di Paolo Emilio (https://www.powerelectronicsnews.com/author/maurizio/)
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 July 6, 2022 Maurizio Di Paolo Emilio
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The importance of silicon carbide in markets such as e-mobility and new energy has prompted many companies to review
and invest in wafer technology to define development plans in line with the demand. X-Trinsic is a company that aims to
improve the manufacturing process and focuses on accelerating the adoption of products in the SiC field as quickly as
possible. X-Trinsic was founded by Dennis Ricco, CEO and EVP of customer operations, and Dr. Robert Rhoades, president
and CTO, with the explicit purpose of providing services focused on the SiC market. These services fall into three
categories:
1. Wafering (all process steps to transform a solid puck of SiC into epi-ready or device-ready prime wafers)
2. SiC wafer reclaim to restore certain engineering or off-spec wafers to a usable state
3. Technical or business consulting on a wide range of topics.
In an interview with Power Electronics News, Dr. Robert Rhoades highlighted the steps of fabrication for SiC wafers and
the importance of solid background knowledge for those working in this field, concerning not only electrical engineering
but also materials science. “It’s critical to have a good, diverse team with the goal of understanding the properties of the
material and how to design devices and circuits — and then systems — to be built with this unique material,” said
Rhoades. “You need people who understand how to develop modules and systems and assemblies leveraging the
properties of silicon carbide and the device’s characteristics in the best way at the system level. It’s very useful for
engineers and technologists to have a broad broad perspective to understand the whole technology.”
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SiC (https://www.powerelectronicsnews.com/?s=SiC+devices) demand is rapidly growing in three major markets: discrete
power devices for energy efficiency (MOSFETs and diodes); power inverters and regulators (in electric vehicles, charging
stations, data centers, wind and solar generators, etc.); and 5G communications (mobile phones and base stations which
include both SiC devices and high-speed GaN-on-SiC devices (https://www.eeweb.com/formula-e-using-sic-technologyfor-power-inverters/)).
Silicon carbide
SiC, a semiconductor compound consisting of silicon and carbon, belongs to the wide-bandgap family of materials. Its
physical bond is very strong, giving the semiconductor a high mechanical, chemical, and thermal stability. The wide
bandgap and high thermal stability allow SiC devices to be used at junction temperatures higher than those of silicon,
even over 200°C. The main advantage offered by SiC in power applications is its low drift region resistance, which is a key
factor for high-voltage power devices.
SiC wafer fabrication is a delicate process. Not all wafers are ideal for final solutions such as diodes and MOSFETs.
Rhoades pointed out that wafer reclaim is a very interesting process being offered by X-Trinsic. “If a device manufacturer
or engineering team has a batch of wafers that they’ve used for engineering tests and can’t be used for devices, you can
reclaim them by removing any damaged surface layer and then repolishing to restore a device-ready surface at a much
lower cost than buying a new wafer,” he said.
What’s more, as the industry continues to grow, and more wafers are processed by more companies, there will be an
increasing demand for wafer reclaim, as well as process optimization. Silicon technology is different from SiC technology,
so processes that work well for silicon will almost certainly have to be redeveloped for SiC. The test and fabrication
techniques for these high-voltage devices can be very different from what an automated test company might be used to
with silicon devices. An example of a process for fabricating SiC wafers is displayed in Figure 1.
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Figure 1: SiC wafer-processing sequence (Source: X-Trinsic)
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“Slicing SiC is very different than silicon wafers because the material is so hard, so you must adapt your slicing method. It
(https://www.powerelectronicsnews.com/pen-ebooktakes 10× or 20× longer to slice a SiC puck than a silicon boule of the same diameter, so adapting the type of wire, the
october-2022-boosting-power-density-in-battery-suppliedtension, the feed rate, etc., are all important things to optimize in silicon carbide slicing,” said Rhoades. “Another option is
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to adopt the newer laser-splitting techniques, but many customers are reporting some technical issues. Whichever
method you choose, you just have to go through the engineering and the development work to adapt it for your
particular silicon carbide boules. Edge grind is not as much of a radical change from silicon. The shaping step can be a
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choice between lapping or surface grinding, especially on 150-mm and smaller wafers. Double-side lapping has some
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issues that make single-side lapping more attractive and a lot of people find it a little bit easier. It takes longer because
you may have to run the wafer twice, but there are some advantages. Each customer needs to make lots of decisions
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depending on how tightly they want to control the edge profile and other choices on cost and throughput. It’s a very
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complex set of process steps leading up to the final polishing step. However, the choices you make at wafer shaping steps
Applications
(https://www.powerelectronicsnews.com/penwill impact how much you have to remove at polish. If you do a very, very fine grinding wheel for the final step in a surface
ebook-october-2022-boosting-power-density-ingrind, you might need to remove less material at polish than, for example, coming off a lapping system.
“After polishing, there are different opinions on how many steps and what kinds of cleaning chemistry and chemical baths
are needed, but it’s somewhat similar to a traditional prime silicon final cleaning sequence,” he added.
When needed, the thickness and dopant level of an epitaxial layer depends on what kind of device you are trying to make,
especially what operating voltage you want to. You may be able to build the devices directly on the SiC wafer or you may
need to grow an epitaxial layer, especially for 600-, 900-, 1,200-V, and higher voltages. “X-Trinsic will work with partner
companies that can do epitaxy,” said Rhoades. “Many customers may prefer to do their own epitaxy so that they can keep
the doping profile as a trade secret rather than share those details in technical specifications to an outside supplier.”
The slicing process can take many hours to cut through a boule of SiC, but you can slice multiple wafers simultaneously
(multi-wire saw) and get 10 to 20 wafers or more in a single process run. “Usually, it takes as much as 16 or 20 hours to get
all the way through. Some new wiresaw technologies are being developed around diamond-coated wire; that might cut
the slicing time down to about one-fourth, so maybe four hours to get all the way through but there are some control and
TTV issues to consider,” said Rhoades. “Laser splitting generally takes about the same average amount of time per wafer
and there’s an additional step required to smooth off the surface of the puck before you can do another laser split.”
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Process time and throughput vary greatly among the process steps in the wafering sequence. Edge grind is one of the
shortest steps at somewhere between 5 and 10 minutes per wafer. Dr. Rhoades commented that there are many
assumptions around lapping and surface-grinding approach, and they depend on how many wafers you are willing to run
per batch. “Let’s assume you have a standard or typical batch size of 12 to 16 wafers per batch, and it takes a couple of
hours for the lapping and post-lap cleaning process to complete,” he said. “Surface grinding is faster, about 5 to 10
minutes per wafer, and if something goes wrong you will only lose 1 or 2 wafers instead of losing the entire batch in the
last couple of years, grind wheel manufacturers have really focused on silicon carbide to reduce the grind time, and so the (https://www.eetimes.com/podcast/power-up/)
process times per wafer are still coming down.”
Polishing is similar to lapping; it takes up to a couple of hours per batch. Typical production cleaning lines have
throughputs that are in the 20 to 50 wafers per hour, depending on the size of the batch tanks, so this step is not generally
a capacity bottleneck.
The need for an epitaxial layer, and the associated thickness and dopant profile, is part of the device designer’s decision.
It relates primarily to the voltage at which the device needs to operate. “The reason we consider epitaxy as optional is
that some devices require an epitaxial layer and some devices don’t,” said Rhoades. “So it depends on the type of device
that the customer intends to build, whether they need epitaxy or not. If epitaxy is needed, the process generally takes
anywhere from 30 minutes to several hours per wafer. The thicker the layer, the longer it takes to grow.”
Standard wafers
Rhoades noted that the majority of current wafer production is either 100-mm or 150-mm diameter (typical 300- or 350µm thickness). Both are in very strong demand, but 150 mm is where most of the growth is currently taking place in the
industry. Some companies have started to adopt new processing methods for 150 mm, such as laser splitting instead of
wiresaw. “So there is a big competition in the industry right now to see which method is better for 150mm wafers, and at
the same time, the industry is trying very hard to get to a 200-mm wafer diameter,” said Rhoades.
The 200 mm wafer size is desirable not only because you can produce more devices on each wafer, but also because it
potentially enables customers to retool some fabs currently running older generations of silicon technology. The
opportunity to leverage that installed device fabrication capacity would pave the way for many more SiC devices to be
built, ensuring strong adoption and driving the EV market.
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“There’s a lot of push from a lot of companies to try to get to 200-mm silicon carbide, and so far, two companies have
announced they are able to produce 200mm wafers,” said Rhoades. “These are Cree and II-VI, but they are not yet selling
on the open market. They are using all their production capacity for internal development and internal use. Also, ST has
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One of the interesting process implications of getting to 200 mm diameter wafers is that batch lapping and batch
polishing are much lower throughput due to simple geometry. Unlike 100mm or 150mm wafers which may have 12 or 16
wafers per batch or more, you get only three or four of the 200mm wafers per batch. “And so the economics start to
strongly favor a single-wafer approach, namely a single-wafer grinder and single-wafer polisher,” said Rhoades. “Not only
do you get better control over each wafer, but you also actually get higher throughput out of the system because you can
run the processes more aggressively on a single-wafer tool than you can on a batch tool.”
Vertical GaN (https://www.powerelectronicsnews.com/reinventing-power-electronics-nexgen-power-systems-with-vertical-
SiC is usually much thinner than a standard silicon wafer, by roughly 50%, and it is very prone to cracking and chipping.
This requires that most process equipment needs to be redesigned to reduce the risk of breakage for SiC.
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SiC is itself a green product in terms of electrical efficiency in the systems in which it is used. However, the production
process for growing SiC boules requires a lot of energy, and many companies are working on using only clean energy
whenever possible. In addition, very high growth temperatures above 2,000°C imply considerable energy and safety
control systems. Fortunately, the system-level efficiency gains of SiC devices over the lifetime of the end use products are
more than sufficient to pay back the energy investment required to grow and process the initial SiC material.
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Maurizio Di Paolo Emilio has a Ph.D. in Physics and is a Telecommunications Engineer. He has worked on various
international projects in the field of gravitational waves research designing a thermal compensation system, x-ray
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microbeams, and space technologies for communications and motor control. Since 2007, he has collaborated with several
Italian and English blogs and magazines as a technical writer, specializing in electronics and technology. From 2015 to 2018,
Assemblies & Cables Automotive Components & Devices Consumer Design Energy Harvesting Motion Control Power Supplies & Energy Storage
he was the editor-in-chief of Firmware and Elettronica Open Source. Maurizio enjoys writing and telling stories about Power
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Test & Measurement
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Lighting
Electronics, Wide Bandgap Semiconductors, Automotive, IoT, Digital, Energy, and Quantum. Maurizio is currently editor-inchief of Power Electronics News and EEWeb, and European Correspondent of EE Times. He is the host of PowerUP, a podcast
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3 thoughts on “Improving the SiC Wafer Process”
 October 5, 2022 Maurizio Di Paolo Emilio
 October 5, 2022 Maurizio Acosta
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(https://www.powerelectronicsnews.com/author/maurizioacosta/)
lovati/)
Dr. Armin Renneisen says:
February 9, 2022 at 12:49 pm (https://www.powerelectronicsnews.com/improving-the-sic-wafer-process/#comment-4697)
Dear Maurizio Di Paolo Emilio,
a very interesting article. As a laser supplier I would be interested in the requirements for the lasers been used for SiC
splitting process.
Thank you very much for a feedback.
Reply
Maurizio Di Paolo Emilio says:
February 9, 2022 at 12:50 pm (https://www.powerelectronicsnews.com/improving-the-sic-wafer-process/#comment-4698)
Thank you. I will work on it.
Reply
Maurizio Di Paolo Emilio says:
February 13, 2022 at 4:55 pm (https://www.powerelectronicsnews.com/improving-the-sic-wafer-process/#comment-4711)
Please check this article for more details https://opg.optica.org/ome/fulltext.cfm?uri=ome-7-7-2450&id=367567
(https://opg.optica.org/ome/fulltext.cfm?uri=ome-7-7-2450&id=367567)
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