Savannah Atomic Layer Deposition Operation Procedure
1.
Initial Settings
BE EXTREMELY CAREFUL, THE REACTOR CHAMBER IS HOT!!!
1.1. Reboot computer, as the previous user has to login to keep the program running.
1.2. Login with netID and AD password
1.3. Savannah Software will automatically launch, login with your software password
by clicking at the top right corner.
1.4. Turn on heater ASAP to try to keep the heater close to the standby temp.
2.
Sample Loading
NO POLYMERS OR METALS ARE ALLOWED IN THE CHAMBER!
2.1. Click Vent Reactor to vent the chamber and wait until you see “Vent sequence
complete” at the top status bar. Remove heat guard cage and lift the chamber lid,
but don’t use excessive force and be aware that the reactor chamber is hot!
2.2. Blow out the chamber with the Nitrogen gun
2.3. Load sample. DO NOT USE POLYMER TWEEZERS OR POLYMER
TIPPED TWEEZERS. THEY WILL MELT AND CONTAMINATE
CHAMBER!!!
If your samples are small, please use
larger pieces of Si to hold them in
place as shown in the left, so that the
small samples will not get blow away
during pump down
Prepared by Edmond Chow
Checked by Paul DiPippo
1
Version 3.0
Version 3.1
March 27, 2020
March 26, 2020
Savannah Atomic Layer Deposition Operation Procedure
2.4. CAREFULLY close and align the lid.
2.5. Replace the heat guard
2.6. Press “Pump” to pump down the chamber
3.
Recipe Selection
3.1. Right mouse click on Process Sequence Table. Looks like an Excel table.
3.2. Select “Load Recipe”
3.3. Source Port Numbers
Source 0
Source 1
Water
Hafnium
Source 2
Aluminum
Source 3
Zr
Source 4
Si
Source 5
Ozone
3.4. To preserve the integrity of the high temp O-ring (cost over $400 a piece), the
allow temp range for heater 8 and 9 is from 80C to 250C.
3.5. For SiO2 deposition, it requires some additional training, please contact staff.
3.6. Verify and modify the number of deposition cycles.
Processing
3.7. Start the recipe
3.8. Start an entry in the logbook with your name, date, and what film you will
deposit Record the chamber pressure in the Logbook
3.9. Enter Electronic Log in my.mntl portal
Prepared by Edmond Chow
Checked by Paul DiPippo
1
Version 3.0
Version 3.1
March 27, 2020
March 26, 2020
Savannah Atomic Layer Deposition Operation Procedure
3.10. Monitor the deposition for 15 to 20 cycles to make sure the precursors are
entering the chamber from pulse in pressure graph. If there is a problem, abort
the process and make a comment in the logbook and send an email to all tool
users via the reservation system.
4.
Sample Unloading
4.1. Confirm the recipe has finished from the top status bar.
4.2. Click Vent Reactor to vent the chamber and wait until you see “Vent sequence
complete” at the top status bar. Remove heat guard cage and lift the chamber lid,
but don’t use excessive force and be aware that the reactor chamber is hot!
4.3. Unload sample. DO NOT USE POLYMER TWEEZERS OR POLYMER
TIPPED TWEEZERS. THEY WILL MELT AND CONTAMINATE THE
CHAMBER!!!
4.4. CAREFULLY close and align the lid.
4.5. Replace the heat guard
4.6. Press “Pump” to pump down the chamber
4.7. Run stand by “Standby 150C recipe” in ProcessRecipe folder
4.8. If you measure the film thickness, please help us monitor the deposition rate by
entering the deposition rate in Electronic Log in my.mntl portal
4.9. Lock the computer screen, but do NOT logout from Windows, so that the
software will continue to run and keep the temp at standby condition.
Prepared by Edmond Chow
Checked by Paul DiPippo
1
Version 3.0
Version 3.1
March 27, 2020
March 26, 2020