J Comput Electron (2014) 13:818–825 DOI 10.1007/s10825-014-0592-x Poisson–Nernst–Planck model for an ionic transistor based on a semiconductor membrane Alexey Nikolaev · Maria E. Gracheva Published online: 22 July 2014 © Springer Science+Business Media New York 2014 Abstract In this paper we developed a Poisson–Nernst– Planck model of an ionic current flowing through a nanopore in a layered solid-state membrane made of a single highlydoped n-Si layer sandwiched between two thick oxide layers which we call the ionic transistor. We studied this layered membrane for a range of source-drain voltages while keeping the gate (the semiconductor membrane) voltage fixed at a certain value, which was later varied too. We find that for this ionic transistor to be effective in controling the ion fluxes through the nanopore, the gate voltage must be kept relatively large. Another solution could be to increase the surface negative charge on the membrane or to replace the outer oxide layers with the semiconductor material, such as the p-Si material. The developed model can be applied to study ionic filtering and separation properties of membranes of different composition and nanopore geometries. Keywords Nanopore · Semiconductor membrane · Poisson–Nernst–Planck model · Ion flux · Computations · Nanotechnology 1 Introduction The Poisson–Nernst–Planck (PNP) model is a continuum theory which was originally developed to calculate ionic fluxes through a biological ion channel [1]. The PNP model allows to evaluate the ionic current passing through the channel and the channel’s permeability to ions [2]. In the PNP model, the Poisson equation is applied to describe the elecA. Nikolaev · M. E. Gracheva (B) Department of Physics, Clarkson University, Potsdam , NY 13699, USA e-mail: gracheva@clarkson.edu 123 trostatic potential in the system, with the gradient of this potential (the electric field) serving as a driving force for the ionic motion. In addition, the Nernst–Planck equations describe the electrodiffusion of ions due to the gradient in ion concentration and the gradient in electrostatic potential. The Nernst–Planck equations are coupled with the Poisson equation to form the complete PNP model. The PNP model is a very well established model, which, despite it’s known limitations, is widely used in biology, chemistry, engineering and physics [3,4]. Recently, a considerable attention has been drawn to the nanofluidic ionic diodes and transistors [5–13]. These solid-state devices allow for control over the ionic and molecular flows through a channel in the device or in the environment in close proximity to the device due to their nanoscale features. For the ionic flow through a nanometer diameter pore in a solid-state membrane the diode-like and transistor-like ionic transport characteristics are usually obtained due to a non-uniform fixed surface charge which is patterned on the channel walls, as it was done in [5]. In a semiconductor membrane, the non-uniform electric potential in a channel or a pore can be achieved by varying the doping concentration of the semiconductor material, and as a consequence, the non-uniform distribution of the ionic species may be controlled by the voltage applied to the semiconductor membrane or a specific layer in this membrane, as it was shown in [14–16]. Asymmetric shape of the nanopore also leads to the non-linear ion currentvoltage characteristics [6–8,14–16]. Alternatively, the same effect can be obtained by varying the pH of the solution on either side of the membrane, in which case the resulting transistor-like ionic transport characteristics are apparent [8,12]. In the recent years, the ability of the gate-operated nanopore in a solid-state membrane to exert influence on J Comput Electron (2014) 13:818–825 biological molecule transversing the nanopore has become increasingly appreciated in the view of a truly breakthrough potential in cheap and ultrafast DNA sequencing with applications in research, national security and personal medicine [17–19]. New materials, such as ultrathin graphenebased membranes, are being discussed as the next evolution of these devices [20–22]. Nanopore-carrying multilayered semiconductor membranes in a variety of designs have been introduced and studied by us previously [14–16,23]. In particular, we have shown that unlike dielectric membranes that always attract cations at the electrolyte/membrane interface whenever a negative surface charge is present, the properties of the double layer in semiconductor membranes can be adjusted in a broad range. We found that in the presence of a dopant charge in the semiconductor membrane, the shape of the nanopore and the fixed negative surface charge resulting from the pore fabrication process have competing influences on the double layer formation [14]. Inversion of the electrolyte surface charge from negative to positive is observed for n-Si membranes, while no such effect occurs for dielectric and p-Si membranes. Furthermore, we have already shown that a nanopore in a silicon membrane can be used as an electrically tunable ion filter [15,23]. Other structures, studied by us, include double and triple layered n-Si and p-Si membranes [15,16]. The rectification of ionic transport through a nanopore in a double layered p − n semiconductor nanopore was observed, while transistor-like ionic current blocking and switching has been characteristic of the triple layered n − p − mn membrane [15,16]. Here, we apply the Poisson–Nernst–Planck model to calculate the ionic current through the nanopore in a singlelayer semiconductor membrane made of n-doped silicon material. We sandwich this electrically active layer between two thick layers of dielectric silicon dioxide material (each of these layers is as thick as the central n-Si layer of the membrane). This membrane is similar in operation to a p − n − p (a triple-layered) membrane introduced and studied by us before [16], however the present setup is much more simpler in design. With this simplified system, while utilizing the PNP model, we demonstrate that the nanopore may be used to control the ionic current through the membrane while the middle n-Si layer serves as an electrode gating the flow of ions. We currently explore the model developed here on more elaborate membrane setups, designed for the ion flow and biomolecule manipulation. In the present paper, the membrane and nanopore geometry is described in Sect. 2, the mathematical formulation of the PNP model is given in Sect. 3, and the obtained results are presented in Sect. 4, we conclude with Sect. 5. 819 2 Semiconductor membrane device The device studied here is similar in operation to other experimentally and theoretically studied solid-state transistor-like devices [5,6,9,17,24–26]. While the material make up of these extensively studied devices is different, they all pursue the same goal: these devices aim to either detect or control the electric potential inside the nanoconstriction (a nanochannel or a nanopore), and to exert influence on the dynamics of biomolecules (i.e. DNA) and/or ions passing through the said constriction. The uniqueness of our device is in the explicit use of semiconductor materials in the membrane composition. Silicon based, capacitor-like membranes are currently used by an experimental group [25], while silicon nanowires are also used in membrane designs developed and studied by another experimental group [24], in both instances the nanopore membranes are used for DNA characterization. Our ionic transistor has the following design. The solidstate membrane is composed of three layers: SiO2 material, n-Si material, and again SiO2 material. The electrically active middle n-Si layer, sandwiched between dielectric SiO2 layers, is 8 nm thick, and the total membrane thickness is 26 nm. A cylindrical nanopore with the diameter of 2 nm is formed in this membrane, as shown in Fig. 1. Thus, we have a problem with cylindrical symmetry. Even though we consider a cylindrical nanopore, the shape of the pore can be easily changed to a double conical or any other shape, which introduces additional geometrical effects on the electrical potential and the concentrations of ions in the pore. The n-Si membrane in the pore region is isolated from the solution by a 1-nm thick layer of SiO2 . We apply voltage VG to the middle n-Si layer, which acts as a gate electrode for the ions of the aqueous solution, in which the membrane is immersed. The electrolyte concentration is [KCl]0 =0.1 M. The Debye screening Fig. 1 Triple-layered membrane: the membrane is made of n-Si material sandwiched between two layers of SiO2 material. The insert shows the ion distribution inside the nanopore while the middle n-Si layer (the gate electrode) is biased at VG = 0: in this situation Cl− ions are in excess at the center of the nanopore, while K+ ions are in abundance at the nanopore entrance and exit 123 820 length of the membrane electric potential is λ D =0.96 nm for this solution concentration. Since the nanopore diameter is 2 nm, this allows us to use of the PNP model as the validity of it for charged membranes with nanopore radii down to Debye length was confined previously by Brownian Dynamics simulations and Monte Carlo simulations [27,28] concentration of the counter ions. For a charged channel the paper [27] reports lower. This is the situation in our nanopore membrane, where a moderate charge is always present. The surface of our membrane contains negative charge with the density of σ = −0.16 e/nm2 . Two thick oxide layers play crucial part in the membrane setup: the negative surface charge on the oxide-electrolyte boundary attracts [K+ ] ions, producing (at the center of the nanopore) the local concentration of potassium ions [K+ ] about four time larger than the bulk concentration, and the local concentration of chlorine ions [Cl− ] approximately 0.25 of the bulk concentration. These concentration values are obtained at zero applied electrolyte bias. Even larger charge separation is possible, if the membrane negative surface charge is larger, or if additional p-Si layers are added instead of SiO2 layers, as it was done in [16], however, here we develop the PNP model for the ionic current that was not implemented in our earlier work. In other words, we develop a more sophisticated model for a less complicated membrane system. Due to the presence of three distinct solid state layers in the membrame, the electrolyte inside the pore also forms three distinct regions, Fig. 1. The two regions adjacent to the top and bottom silicone dioxide layers (carrying negative charge at the surface) are similar to the heavily doped Source and Drain regions of the mosfet. In these electolyte regions, the concentration of potassium ions is greater than that of the chlorine ions, [K+ ][Cl− ]. The central region is adjacent to n-doped silicon layer, but insulated from it by a 1-nm thin layer of oxide. In the unbiased state, [Cl− ]>[K+ ] in the central pore region, and the whole ionic transistor is similar to the p-channel enchancement-mode (normally off) mosfet [29]p. 362. A non-zero voltage VG must be applied to turn the mosfet on. The voltage terminals that are applied at the top and bottom compartments filled with electrolyte act as the Source and the Drain terminals. The geometry of our system has the mirror symmetry with respect to the plane of the membrane, therefore, the difference between these two terminals is purely nominal. We call the left terminal the “Source”, V S , and the right is the “Drain”, V D . For all the following calculations, we assume that our membrane (the ionic transistor) and the voltage sources form a common-source electric circuit. The membrane/electrolyte system is characterized by the following variables: ϕ( r ), the electric potential; n( r ) and 123 J Comput Electron (2014) 13:818–825 p( r ), the concentrations of electrons and holes in the semir ) and [Cl− ]( r ), the conductor material in membrane; [K+ ]( concentrations of potassium and chlorine ions in the electrolyte solution (KCl). 3 Method 3.1 Poisson- -Nernst–Planck model We placed the origin of our coordinate system at the center of the pore, whereas the x-axis in this set-up coincides witht the pore axis. The concentration of ions varies in the pore region, reflecting the charge distribution in the membrane layers and screening of the electrical potential in the pore vicinity. To obtain the electrostatic potential distribution ϕ( r) generated by the membrane and the electrolyte, we solve Poisson equation [14–16,30]: ∇ · (ε( r )∇ϕ( r )) = −ρ( r ), (1) where ρ( r ) is the charge density, ε( r ) = ε0 εr ( r ), with εrSi = Si 11.7 in silicon (Si), εr = 3.9 in silicon dioxide (SiO2 ), and εrSi = 78.0 in the electrolyte, ε0 is the permittivity of free space. The charge density ρ( r ) is given by: ρ( r ) = e{ p( r ) − n( r) + Nd+ ( r ) − Na− ( r ) + Nsur f ( r) r ) − [Cl − ]( r )}, + [K + ]( (2) where e is the elementary charge, Na− and Nd+ are the acceptor and donor densities in the semiconductor regions, and Nsur f is the equivalent volumetric density of the fixed oxide surface charge (σsur f ) on the membrane surface at the interface with electrolyte. In the semiconductor regions, n and p are governed by Fermi-Dirac statistics, and concentrations are expressed using the Fermi-Dirac integrals: n( r ) = Nceff F1/2 p( r) = Nveff Nceff = 2 F1/2 e(ϕ − VG ) − E gSi /2 , kb T −e(ϕ − VG ) − E gSi /2 2π m ∗n kb T h2 kb T 3/2 , Nveff = 2 (3) , where 2π m ∗p kb T h2 (4) 3/2 . Above, m ∗n and m ∗p are effective masses of electrons and holes, E gSi is the energy band gap of Si, VG is the voltage applied to the n-Si layer. More details on the electrostatic part of the model can be found in [30]. J Comput Electron (2014) 13:818–825 821 Local concentrations of potassium and chlorine ions, r ) and [Cl− ]( r ), in Eq. (2) are computed from the solu[K+ ]( tion of the steady-state Nernst-Planck equations [27]: ∇ · [μi Ci ∇ϕ + z i Di ∇Ci ] = 0, Ci = [K + ], [Cl − ], (5) c|x=±L x = [K Cl]0 , ( J · ĵ)| y=±L y = 0, ( J · k̂)|z=±L z = 0, ( J · n̂) = 0. δM where D K − (Cl + ) = 1.95(2.03) × 10−5 cm2 /s is the diffusion coefficient, μi is the mobility, Di = μi kb T /e, z i = ±1 depending on the ionic species charge sign. Steady state Nernst–Planck equations for ionic current densities: Furthermore, we set the electric potential on both sides of the membrane, away from it. In addition, that the electric field is zero on the other box boundaries. The boundary conditions for the electric potential are ∇ · J = 0 ϕ|x=L x = VD + VBKICl , ∂ϕ ∂ϕ = = 0. ∂ y y=±L y ∂z z=±L z Current densities are JCl = −eμ[Cl − ]∇ϕ + eDCl − ∇[Cl − ], JK = −eμ[K + ]∇ϕ − eD K + ∇[K + ]. And the resulting equations for [Cl− ] and [K+ ] are ∇ · (−μ[Cl − ]∇ϕ + D∇[Cl − ]) = 0, + (6) + ∇ · (−μ[K ]∇ϕ − D∇[K ]) = 0. (7) The discretization of the Nernst–Planck equations is usually much more important then the discretization of the Poisson’s equation. This procedure is well explained in papers [31–34]. The total current through the pore is the sum of currents of both ionic species, K+ and Cl− through a pore cross-section S I = I [Cl −] + I [K +] = S JCl − · d A + JK + · d A. S It is natural to choose the cross-section S so, that it is perpendicular to the axis of the pore. The specific position of the cross-section within the pore is not important, because the correct discretization of the Nernst–Planck equations guarantees that the total ionic current is conserved at any crosssection inside the nanopore. 3.2 Boundary Conditions The PNP model requires boundary conditions to be solved. These are as follows. The electrolyte concentration is maintained at [K Cl]0 . We assume there is no flux of ions on the box boundaries. Similarly, there is no flux normal to the membrane. Mathematically, these are formulated as follows: ϕ|x=−L x = VS + VBKICl , VBKICl is the built-in potential of the electrolyte with respect to silicon. Ultimately, it depends on the material of the drain and source electrodes. Here, it is assumed to be equal to 0.077 V [15]. The system of equations is solved self-consistently using a finite difference method. Potential ϕ and concentrations n, p, [Cl − ], [K + ] are replaced with their discrete representations on a grid with a variable grid-point size from 0.2 nm to 0.8 nm. Gummel’s method is implemented for Poisson’s equation to speed up its convergence. Finally, all systems of linear equations are solved using Gauss-Seidel method. If VS = VD ≡ VD&S , there is no ionic current across the membrane, thus the solution of the Nernst-Planck equations (6) and (7) is the standard Boltzmann distribution: q(ϕ − VD&S − VBKCl − I ) [Cl ] = [K Cl]0 exp (8) kT −q(ϕ − VD&S − VBKCl + I ) [K ] = [K Cl]0 exp (9) kT Solution of a such simplified electrostatic problem (equations 1, 8 and 9) provides initial conditions for the full PNP problem. 4 Results 4.1 Model validation: SiO2 membrane We validate our computational model by testing it on a dielectric membrane with no surface charge. We compare computed ionic curent with current estimated analytically. This can be done easily if two facts are considered. First, the cylindrical nanopore in such membrane must have uniformly distributed ionic concentrations [K + ] = [Cl − ] = [K Cl]0 (hence, no diffusion contribution to the current), 123 822 J Comput Electron (2014) 13:818–825 while the ionic current is produced only by the drift component qμ[K Cl]0 ∇ϕ. Second, the magnitude of the electric field can be estimated as follows. The current of each ion species must be constant for each cross-section, and I ∝ E · (Area). The size of the modeled system is 17 nm × 17 nm × 53 nm, and the diameter of the pore is 2 nm, thus the cross-sectional area changes from (17 nm)2 outside to π nm2 inside the pore. The ratio of this areas is ≈92. Therefore, the electric field inside the pore is about 100 times larger than that of the outside, Oxide, no surface charge. Cylindrical. 150 Ohm’s law Simulation 100 I (pA) 50 I (VDS ) = 2qμ[K Cl]0 × (VDS /L) × π R 2 (10) Here, the factor ”2” comes from the assumption that both ion species have the same mobility μ. We take both valences to be |z| = 1. The membrane thickness is assumed to be L = 26 nm. The comparison between the simulated ionic current with the PNP model and the calculated current obtained from Eq. 10 is shown in Fig. 2. The simulated points fit calculated straight line very well. Also, both used assumptions are correct: the concentration of ions indeed remains constant and the electric potential varies linearly in the pore , while the electric potential is constant outside (results are not shown). 4.2 Triple-layered SiO2 – n-Si – SiO2 membrane 0 4.2.1 I–V curves and the transfer characteristics -50 -100 -150 and we can safely assume that the voltage drop happens only inside the pore. Using Ohm’s law, the total current is estimated as: -0.6 -0.4 -0.2 0 0.2 0.4 0.6 VDS (V) Fig. 2 The comparison of the ionic current flowing through a cylindrical nanopore of diameter 2 nm as found from the PNP model (squares) and from Eq. 10 (dash line). The electrolyte concentration is set to 0.1 M and the ”source-drain” voltage, V DS , between the ends of the modeled system is varied. The nanopore is made in a SiO2 membrane that has no surface charge. The simulated points are in excellent agreement with the theory The current–voltage characteristins (the I–V curves) are shown in Fig. 3. For negative VDS , currents almost saturate, maintaining a small slope. A negative gate voltage VG S is necessary to increase this saturation current. The device behavior resembles that of the standard mosfets. The already saturated current slowly increases with VDS almost linearly, which is similar to the channel-length modulation in mosfets, and the Early effect in Bipolar Junction Transistors (bjt). As it is shown in Fig. 3 (the left panel), for VG S ≥ 0, there is a region of high conductance for small VDS (less than 0.1 V , the right panel), and current quickly saturates Oxide-n-Si-oxide. Cylindrical. Oxide-n-Si-oxide. Cylindrical. 400 20 300 10 100 I (pA) I (pA) 200 0 0 -10 -100 VGS = 0.4V VGS = 0.0V VGS = -0.4V VGS = -0.8V -200 -300 -1 -0.8 -0.6 -0.4 -0.2 0 VDS (V) 0.2 0.4 0.6 -20 VGS = 0.4V VGS = 0.0V VGS = -0.4V VGS = -0.8V -0.4 -0.3 -0.2 -0.1 0 0.1 0.2 0.3 0.4 VDS (V) Fig. 3 The current–voltage characteristics (I–V curves) for the oxide-n-Si-oxide membrane with the surface charge σsurf = −0.16 e/nm 2 . The full range of studied VDS voltages on the left, and only small voltages (|V DS | < 0.4 V ) on the right 123 J Comput Electron (2014) 13:818–825 823 Oxide-n-Si-oxide. Cylindrical. VDS=-0.05V. 5 0.1 4 [Cl-] / [KCl]0 φ (V) -0.1 -0.2 -0.3 -0.4 -0.5 VGS=0.4V VGS=0.0V VGS=-0.4V VGS=-0.8V -0.6 -20 -13 VGS=0.4V VGS=0.0V VGS=-0.4V VGS=-0.8V 3 2 1 -4 4 13 0 -20 20 -13 4 13 4 [Cl ] / [KCl]0 -0.1 - -0.2 -0.3 VGS=0.4V VGS=0.0V VGS=-0.4V VGS=-0.8V -13 4 13 20 4 13 20 Oxide-n-Si-oxide. Cylindrical. VDS=-0.6V. 5 VGS=0.4V VGS=0.0V VGS=-0.4V VGS=-0.8V 4 3 2 0 -20 -4 x (nm) 1 -4 0 -20 20 + 0 φ (V) -4 [K ] / [KCl]0 0.1 -13 2 Oxide-n-Si-oxide. Cylindrical. VDS=-0.6V. 5 -0.6 -20 3 x (nm) Oxide-n-Si-oxide. Cylindrical. VDS=-0.6V. -0.5 VGS=0.4V VGS=0.0V VGS=-0.4V VGS=-0.8V 1 x (nm) -0.4 4 + 0 Oxide-n-Si-oxide. Cylindrical. VDS=-0.05V. 5 [K ] / [KCl]0 Oxide-n-Si-oxide. Cylindrical. VDS=-0.05V. VGS=0.4V VGS=0.0V VGS=-0.4V VGS=-0.8V 3 2 1 -13 x (nm) -4 4 x (nm) 13 20 0 -20 -13 -4 4 13 20 x (nm) Fig. 4 The electrical potential and the ionic concentrations (K+ and Cl− ) through the central axis of the pore for V DS = −0.05 V (top row) and VDS = −0.6 V (bottom row) for larger VDS . A similar nanofluidic system was shown in [10,11], and it resembles two diodes with their n-terminals connected (as in pnp bjt). It is shown in Fig. 4 that for larger VDS (bottom row), there is a depletion region at x ≈ 4 nm, while for small |VDS | < 0.1 V (top row), concentrations of ions is relatively large, hence, the √ conductance is higher. The transfer characteristic I versus VG S is shown in Fig. 5. It demonstrates the efficiency of the gate voltage, and, is obtained for VDS √ = −1.0 V. In mosfets [29] (p. 353), saturation current I ∝ (VG S − VT ), where VT is called the threshold voltage. Thus, the transfer characteristic is expected to be linear for VG S < VT , however, this is not the case: Assuming that VT ≈ 0 V , the curve becomes nonlinear for VG S < −0.6 V , because current does not reach saturation for these voltages. Therefore, on the one hand, the transfer characteristic should be obtained for stronger drainsource bias, such as VDS = −1.0 V . On another hand, we cannot choose VDS < −0.6 V , because the excess concentration of [K + ] on the right side of the pore vanishes for strong negative source-drain voltage VDS . Therefore, the system requires an improvement: there should be higher concentration of the excess [K + ] in the channel. One of the possibilities is to change the oxide surface charge from −0.16 e/nm 2 to −0.5 e/nm 2 , which is done in the next section. 4.2.2 Modified system: the increased surface charge σsurf = −0.5 e/nm2 In this case, the excess concentration of [K + ] is almost twice larger (≈8 × [K Cl]0 ) than it was before, and it provides a basis for stronger performance of the device: the differential conductances remain flat for saturated I-V curves even for VDS = −1.4 V, and the new transfer characteristic is linear, with the slope 21.4 pA1/2 V−1 , and the threshold voltage VT ≈ 1.08 V. It is important to note that the modified transistor is on for zero gate-source voltage, so it is a depletionmode fet. The current–voltage curves are shown in Fig. 6. It can be seen clearly that for the negative VDS currents practically saturate (although, they still have a small slope). A negative gate voltage VG S is necessary to increase this saturation current. The transfer characteristic demonstrates the efficiency of the gate voltage: the current begins to increase at VG S ≈ −0.1 V with almost constant transconductance g ≈ 359 pA/V. However, the current for VG S < 0.6 V does not saturate at reasonable drain-source voltages, and it makes it difficult to estimate the exact shape of the transfer characteristics, it is possible that the ideal curve should be a quadratic function of VG S [29] (p. 353), and not linear. However, in general, the device 123 824 J Comput Electron (2014) 13:818–825 Oxide-n-Si-oxide. Cylindrical. VDS = -1.0V. 0 I 1/2 (pA) 1/2 -5 -10 -15 -20 Fit: (21.4 VGS - 23.2) pA Simulation -25 0 0.2 0.4 0.6 0.8 1 1.2 1.4 VGS (V) Table 1 Values of model parameters utilized in the simulations Parameter Value E gSi 1.124 eV E gSi O2 9.0 eV qχ Si 4.05 eV qχ Si O2 0.95 eV ε Si 11.70 ε Si O2 3.9 Nd+ Na− 2.0 × 1020 cm−3 Nsur f −4.0 × 1020 cm−3 2.0 × 1020 cm−3 T 300 K ε K Cl 80.0 [K Cl]0 0.1 M Fig. 5 The transfer characteristics for the oxide-n-Si-Oxide system with surface charge σsurf = −0.16 e/nm2 Oxide-n-Si-oxide. Cylindrical. 200 I (pA) 0 -200 -400 -600 VGS = 1.2V VGS = 0.8V VGS = 0.4V VGS = 0.0V -1.4 -1.2 -1 -0.8 -0.6 -0.4 -0.2 0 0.2 0.4 VDS (V) Fig. 6 The current–voltage characteristics for the modified system with a greater surface charge of σsurf = −0.5 e/nm2 behavior is very similar to a standard mosfet, where the saturated current slowly increases with VDS almost linearly. More precise determination of the characteristics may be done. Nevertheless, shown results are already very promising, and the original design can be enhanced to reveal other properties of the system, as well as to improve the performance of the device (Table 1). 5 Conclusion In this paper we developed a Poisson–Nernst–Planck model of an ionic current flowing through a nanopore in a layered solid-state membrane made of a single highly-doped n-Si layer sandwiched between two thick SiO2 layers which we call the ionic transistor following [8]. We studied this layered 123 membrane for a range of source-drain voltages while keeping the gate (the semiconductor membrane) voltage fixed at a certain value, which was later varied too. We find that for this ionic transistor to be effective in controling the ion fluxes through the nanopore, the gate voltage must be kept relatively large. 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