High-Frequency Characterization and Circuit Modeling of Via in Multi-Layered IC Package Research Area: Transmission Lines Hyewon Kim and Yungseon Eo Dept. Electrical and Computer Engineering Hanyang University Ansan, Korea hwkim@giga.hanyang.ac.kr, eo@giga.hanyang.ac.kr Abstract—A via is experimentally characterized by using highfrequency s-parameter measurements. Test patterns are designed and fabricated by using a package process. They are measured by using VNA (vector network analyzer) up to 25GHz. The parasitic effects due to access lines for on-wafer probing are deembedded. Then modeling the via as two equivalent circuits (Ttype and Pi-type), the circuit model parameters are determined. It is shown that the T-type circuit model has excellent agreement with the measured s-parameters. Keywords-via; s-parameter; de-embedding; circuit model I. INTRODUCTION Both the level of integration and the operating frequency of today’s integrated circuits are now plunged into the Giga-scale ( × 109 ) [1]. As the scale-down of the semiconductor process technology approaches a physical limitation, recently, 3dimensional integration technologies such as “through silicon via (TSV)” and “package on package (POP)” become one of the technical issues [2]-[7]. In such gigantic high-frequencyoperating integrated electronic systems, the signal integrity degradation of interconnect lines between the circuit subblocks substantially limits the circuit performance [8]-[10]. In order to integrate more transistors in a small silicon die, many metal layers are required. Even in today’s high-density integrated circuits, metal layers exceed more than 8 [1]. However, in the future 3-dimensional integrated systems, much more metal layers are definitely required. In such multi-layered integrated systems, lots of vias are inevitable. It is well known that the distribution of vias is strongly related with geometrical structures and routing algorithms [11]. In geometrically far more complicated future 3-dimensional chips or packages, the vias may have a much more significant effect on the circuit performance. Thus, for the sake of a reliable circuit design, the via effects have to be taken into account in the early phase of the circuit design. To date, there have been many techniques to characterize and model vias [12]-[21]. However, most of them are based on numerical calculation [12]-[14], commercial field solvers [15][16], or simple models [17][18]. Relatively, there are only a few experimental characterization techniques [19]-[21]. In practice, it is inherently difficult to accurately characterize a small via because of parasitics. Further, an air calibration using SMA connectors may not be suitable for deembedding the parasitic effects. In this paper, a novel waferlevel high-frequency characterization technique for the via is presented. II. EXPERIMENTS FOR TEST PATTERNS Since a via is too tiny in its size to be accurately characterized in high-frequencies by using SMA connectors, a wafer level characterization technique should be employed. However, the wafer-level probing for 2-port network measurements requires a pair of contact pads on the same plane. Otherwise, the two port measurements may not be possible. Thus, two vias should be considered a pair for the wafer-level via characterizations. That is, one is a top to bottom via and the other is a bottom to top via. Furthermore, access lines between the contact pad and the via are required. Test patterns for a wafer level characterization are designed and fabricated by using a package process as shown in Fig. 1. The test pattern layout and its cross-sectional dimensions are described in Fig. 2 and Fig. 3, respectively. Figure 1. Picture of a test module Figure 2. Top view of the test structure CIRCUIT MODEL AND PARAMETER DETERMINATION 300um III. In order to de-embed the parasitic access line effects, the measured s-parameter data of the test structure are represented by using ABCD parameters ⎡A B⎤ ⎡A B⎤ ⎡A B⎤ ⎡A B⎤ . ⎢C D ⎥ = ⎢C D ⎥ ⎢C D ⎥ ⎢ C D ⎥ ⎣ ⎦ total ⎣ ⎦ line ⎣ ⎦ via ⎣ ⎦ line (1) Thus, the de-embedded s-parameters for DUT (device under test) can be readily determined as follows. Figure 3. The cross-sectional view of the test structure Zo Zo a1 b1 ⎡T11p T12p ⎤ ⎢ p p⎥ ⎣T21 T22 ⎦ ⎡T11via T12via ⎤ ⎡T11p T12p ⎤ ⎢ via via ⎥ ⎢T p T p ⎥ ⎣T21 T22 ⎦ ⎣ 21 22 ⎦ a2 b2 -1 Zo Zo Figure 4. Network representation of a test pattern. Note, T-parameters are used for the cascaded network. A VNA (Vector Network Analyzer) for the test pattern measurements is calibrated by SOLT (short, open, load, and thru) calibration method up to probe tips. Then, s-parameters for the test patterns including access lines as shown in Fig. 4 are measured from 50MHz to 25GHz by using on-wafer probe tips (Cascade Microtech GSG probe tips). Note, although the access lines are inevitable for the wafer level measurements, the effects have to be de-embedded for an accurate characterization. Thus, a 0.5 mm-long line is designed on the same test module for the purpose of the parasitic effect deembedding. In order to investigate how much the vias have an effect on signal integrity, the s-parameters of the line including vias are compared with the straight lines in Fig. 5. Note that the line including vias has much more significant signal integrity degradation than the straight lines. Although the total length of the line including vias is 1.1mm long, its S21 characteristic is worse than that of the 5mm long straight line. (2) Note, there is large discrepancy between the de-embedded sparameter data and those without de-embedding as shown in Fig. 6. Considering the electromagnetic field distribution of a signal line through two vias as schematically described in Fig. 7, a via may be represented with one of the possible two circuit models: T-type model as shown in Fig. 8 and Pi-type model as shown in Fig. 9. In the T-type model of Fig. 8, the measured sparameter data can be equated by using ABCD network parameters as follows ⎡ Z1 ⎢1+ Z ⎡A B⎤ 3 =⎢ ⎢C D ⎥ ⎣ ⎦ measured ⎢ 1 ⎢ Z ⎣ 3 Z1 Z 2 + Z 2 Z 3 + Z 3 Z1 ⎤ ⎥ , (3) ⎥ ⎥ ⎥ ⎦ T-Type Z3 1+ Z2 Z3 where the measurement reference impedance is Z 0 = 50 [Ω] . Thus, the circuit model parameters for the T-type can be determined as follows Im (1 Z 3 ) ω Im ( Z 2 ) ω 0.0 = = Im ( C ) 2πf T = Cvia , Im ( ( D − 1) C ) 2πf = (4) LTvia . S21 0 (5) 0 S11 straight line : 1mm -1.0 straight line : 2mm -1.5 -20 -1 -40 -2 straight line : 5mm non-de-embedded de-embedded de-embedded Via -60 -2.0 0 5 10 15 20 25 Frequency [GHz] Figure 5. Comparison of the line including vias with straight lines 0 5 10 15 20 -3 25 Frequency [GHz] Figure 6. Via test structure characteristics after de-embedding S21 [dB] S11 [dB] -0.5 S21 [dB] -1 ⎡A B⎤ ⎡A B⎤ ⎡A B⎤ ⎡A B⎤ . =⎢ ⎢C D ⎥ ⎥ ⎢ ⎥ ⎢ ⎥ ⎣ ⎦ via ⎣C D ⎦ line ⎣C D ⎦ total ⎣C D ⎦ line The total inductances and total capacitances of the test structure are compared in Fig. 10 and Fig. 11, respectively. Note, regardless of the circuit models (i.e., T-type model and Pi-type model) of the test structure, the circuit model parameters show perfect agreement each other up to 5GHz. On the contrary, as the frequency increases, they show large discrepancy. The deviation of the circuit model parameters in the high-frequency is considered due to the simple lumped circuit models. Thus, the values of the 100MHz to 5GHz are averaged for the circuit model parameters. The total inductance and total capacitance are 0.26nH and 0.27pF, respectively. Both T-type model and Pi-type model are represented in Fig. 12 by using the extracted circuit model parameters. Figure 7. Conceptual description of electro-magnetic field distribution for the circuit model of the test structure T Z1 Lvia Zo In order to verify the accuracy of the experimental characterization, the s-parameters are determined by performing HSPICE simulations. As shown in Fig. 13, the LTvia Z 2 T Cvia Z3 Zo 0.5 2 LTvia 0.4 Inductance [nH] Figure 8. T-type circuit model of the vias 0.3 0.2 Lπvia 0.1 Figure 9. Pi-type circuit model of the vias 0.0 Y ⎡ 1+ 2 ⎢ Y3 ⎡A B⎤ =⎢ ⎢C D ⎥ ⎣ ⎦ measured ⎢ Y1Y2 +Y2Y3 +Y3Y1 ⎢ Y3 ⎣ 1 ⎤ Y3 ⎥ , (6) ⎥ Y ⎥ 1+ 1 ⎥ Y3 ⎦ Pi-Type the circuit model parameters can be determined as follows Im (1 Y3 ) ω Im ( Y1 ) ω = = Im ( B ) 2πf = Lπvia , Im ( ( D − 1) B ) 2πf π = Cvia . (7) 5 15 20 25 Figure 10. Extracted total inductances for the test structure 0.5 T Cvia 0.4 0.3 0.2 π 2Cvia 0.1 (8) 10 Frequency [GHz] Capacitance [pF] Similarly, since ABCD parameters for the Pi-type circuit model are 0 0.0 0 5 10 15 20 25 Frequency [GHz] Figure 11. Extracted total capacitances for the test structure IV. VERIFICATION OF THE CIRCUIT MODEL The circuit model parameters corresponding to the T-type model or Pi-type model can be determined by using (4), (5), (7), and (8), respectively. Total inductances and total capacitances for each circuit model are defined as follows π π LTtotal ≡ 2 LTvia , Ltotal ≡ Lvia , π π T T , Ctotal . ≡ 2Cvia Ctotal ≡ Cvia (9) (10) Figure 12. T-type circuit model and Pi-type circuit model with experimentally extracted circuit model parameters simulated s-parameters using the T-type circuit model has excellent agreement with the measured s-parameters up to 20GHz. In contrast, the Pi-type circuit model shows discrepancy with the measured data from 10GHz. It is understandable since the vertical via structure may be inductive-prominent at the beginning and then capacitive due to the line in the bottom signal line. Thus, it is considered that the T-type circuit model for the via test structure is better than the Pi-type circuit model. V. REFERENCES [1] [2] [3] [4] CONCLUSION A via has a significant effect on the signal integrity of high-speed integrated circuits and packages. In this work, vias were experimentally characterized up to 25GHz. Then, representing the via with the T- and Pi-network, the circuit model parameters were directly determined by using the measured s-parameters. It was shown that the simulated sparameters using the T-type circuit model have excellent agreement with the measured s-parameters. [5] [6] [7] [8] [9] T-model 0 S11 [dB] [10] -20 [11] Pi-model [12] -40 Measurement [13] -60 0 5 10 15 20 25 [14] Frequency [GHz] Figure 13. 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