Curriculum Vitae
Donnie K. Reinhard
Donnie K. Reinhard
Department of Electrical and Computer Engineering
2120 Engineering Building
Michigan State University
East Lansing, Michigan 48824 - 1226
Ph: (517) 355-5214
FAX: (517) 353-1980
email: reinhard@egr.msu.edu
Education
Ph.D. Massachusetts Institute of Technology, 1973 (Solid State Electronics)
M.S. Massachusetts Institute of Technology, 1968 (Electrical Engineering)
B.S. Purdue University, 1967 (Electrical Engineering)
Professional Positions
1987 - present
1992 April-June
1980 - 1987
1975 - 1980
1973 - 1975
1972 - 1973
1971 - 1972
1968 - 1971
1967 - 1967
Professor of Electrical and Computer Engineering, Michigan State
University,
Visiting University Professor, Microelectronics, University of Wuppertal,
Germany
Associate Professor of Electrical Engineering, Michigan State University
Assistant Professor of Electrical Engineering and Radiology, Michigan
State University
Research Fellow and Assistant Professor, Department of Therapeutic
Radiology, Tufts New England Medical Center
Research Fellow and Instructor, Department of Therapeutic Radiology,
Tufts New England Medical Center
Physicist, Department of Therapeutic Radiology, Tufts New England
Medical Center
Teaching Assistant, Electrical Engineering Department, Massachusetts
Institute of Technology
Associate Engineer, Applied Physics Laboratory of Johns
Hopkins University
Technical and Professional Societies
Institute of Electrical and Electronics Engineers
American Vacuum Society
Tau Beta Pi, Eta Kappa Nu
Awards
Withrow Teaching Excellence Award, Electrical Engineering Department, Michigan State
University, 1998.
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Publications
A. Books
J. Asmussen and D. K. Reinhard, editors, Diamond Film Handbook, Marcell Dekker, New York,
2001.
D.K. Reinhard, Introduction to Integrated Circuit Engineering, Houghton Mifflin, Boston, 1987.
B. Monographs and Book Chapters
J. Asmussen and D. K. Reinhard, Chapter 1, "Introduction", Diamond Film Handbook, Marcell
Dekker, New York, 2001.
D. K. Reinhard, Chapter 13, "Diamond Film Optics", Diamond Film Handbook, Marcell Dekker,
New York, 2001.
D. K. Reinhard, "Electrons", Wiley Encyclopedia of Electrical and Electronics Engineering, Ed.
J. Webster, John Wiley and Sons, New York, vol. 6, pp. 678-683, 1999.
C. Patents
U.S. Patents
1. D. K. Reinhard, J. Asmussen, M. F. Becker, T. A. Grotjohn, R. Schuelke, and R Booth,
“Drapable Diamond Thin Films and Method for the Preparation Thereof”, U. S. Patent
7,147,810, December 12, 2006.
2. D. K. Reinhard, R. Chakraborty, and J. Asmussen, "Improved Method for Radiofrequency
Wave Etching", U.S. Patent 6,077,787, June 20, 2000.
3. M. J. Ulczynski, D. K. Reinhard, and J. Asmussen, "Process for Depositing Adherent
Diamond Thin Films", U.S. Patent 5,897,924, April 27, 1999.
4. M. J. Ulczynski, D. K. Reinhard, and J. Asmussen, "Resonant Radiofrequency Wave Plasma
Generating Plasma with Improved Stage, U. S. Patent Number 5,736,818, April 7, 1998.
5. R. N. Chakraborty, M. J. Ferrecchia, P.D. Goldman, and D. K. Reinhard, "Method of
Synthetic Diamond Ablation with an Oxygen Plasma and Synthetic Diamonds Etched
Accordingly", U. S. Patent Number 5,711,698, January 27, 1998.
6. J. Asmussen and D.K. Reinhard, “Improved Plasma Reactor Apparatus and Method for
Treating a Substrate,” U.S. Patent No. 4,943,345, July 1990.
7. J. Asmussen, D.K. Reinhard, and M. Dahimene, “Improved Plasma Generating Apparatus
Using Magnets and Method,” U.S. Patent number 4,727,293, February 23, 1988.
8. T. Roppel, J. Asmussen, and D.K. Reinhard, “Dual Plasma Microwave Apparatus and
Method for Treating a Surface,” U.S. Patent Number 4,691,662, September 8, 1987
9. J. Asmussen and D.K. Reinhard, “Microwave or UHF Plasma Improved Apparatus,” U.S.
Patent Number 4,630,566, December 23, 1986.
10. J. Asmussen and D.K. Reinhard, “Method for treating a surface with a microwave UHF
plasma and improved apparatus,” U.S. Patent number 4,585,668, April 29, 1986.
Other Patents
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1. D. K. Reinhard, R. N. Chakraborty, J. Asmussen, and P. D. Goldman, “Improved Method for
Radiofrequency Wave Etching”, European Patent No. 0764968, November 28, 2001
(licensed to Lambda Tecnologies).
2. D. Reinhard, R. Chakraborty, and J. Asmussen, “Improved Method for Radiofrequency
Wave Etching”, Japanese Patent # 3375832, November 29, 2002,
C. Journal Papers
1. D.K. Reinhard, D.T. Tran, T. Schuelke, M.F. Becker, T.A. Grotjohn, J. Asmussen, “SiO2
antireflection layers for single-crystal diamond”, Diamond and Related Materials”, 25, 84,
(2012).
2. D.T. Tran, C. Fansler, T.A. Grotjohn, D.K. Reinhard, and J. Asmussen “Investigation of
mask selectivities and diamond etching using microwave plasma-assisted etching, Diamond
and Related Materials”, 19, 778, (2010)
3. K.W. Hemawan, T.A. Grotjohn, D.K. Reinhard, J. Asmussen , “Improved microwave plasma
cavity reactor for diamond synthesis at high-pressure and high power density”, Diamond and
Related Materials,19, 1446, (2010)
4. R. Ramamurti, M. Becker, T. Schuelke, T. A. Grotjohn, D. K. Reinhard and J. Asmussen,
“Deposition of thick boron-doped homoepitaxial single crystal diamond by microwave
plasma chemical vapor deposition”, Diamond and Related Materials, 18, 704, (2009)
5. J. Asmussen, T. A. Grotjohn, T. Schuelke, M. F. Becker, M. K. Yaran, D. J. King, S.
Wicklein, and D. K. Reinhard, “Multiplc substrate microwave plasma-assisted chemical
vapor deposition single crystal diamond synthesis”, Appled Physics Letters, 93, 031502,
2008
6. S. Zuo, M.K. Yaran, T.A. Grotjohn, D.K. Reinhard and J. Asmussen, “Investigation of
diamond deposition uniformity and quality for freestanding film and substrate applications”,
Diamond and Related Materials, 17, 300-305, 2008.
7. R. Ramamurti, M. Becker, T. Schuelke, T. Grotjohn, D. Reinhard, and J. Asmussen,
“Synthesis of boron-doped homoepitaxial single crystal diamond by microwave plasma
chemical vapor deposition,”, Diamond and Related Materials, 17, 1320 - 1323, 2008.
8. R. Ramamurti, M. Becker, T. Schuelke, T. Grotjohn, D. Reinhard, G. Swain and J.
Asmussen, “Boron doped diamond deposited by microwave plasma-assisted CVD at low and
high pressures”, Diamond and Related Materials, 17, 481-485, 2008.
9. D. King, M. K. Yaran, T. Schuelke, T. A. Grotjohn, D. K. Reinhard, J. Asmussen, “Scaling
the microwave plasma-assisted chemcial vapor diamond deposiiton process to 150-250 mm
substrates”, Diamond and Related Materials, 17, 520-524, 2008.
10. D.T. Tran, T.A. Grotjohn, D.K. Reinhard and J. Asmussen, “Microwave plasma-assisted
etching of diamond”, Diamond and Related Materials, 17, 717-721, 2008.
11. W.S. Huang, D.T. Tran, J. Asmussen, T.A. Grotjohn and D. Reinhard “Synthesis of thick,
uniform, smooth ultrananocrystalline diamond films by microwave plasma-assisted chemical
vapor deposition”, Diamond and Related Materials, 15, 341-344, (2006).
12. M. Parr and D.K. Reinhard, “Electrical properties of thin nanocrystalline diamond based
structures “, Diamond and Related Materials, 15, 207-211, (2006),.
13. B. Paosawatyanyoung, K. Honglertsakul, and D. K. Reinhard, “DLC-Film Schottky Barrier
Diodes”, Solid State Phenomena, 107, 75 – 80, (2005).
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14. M. M. Bataineh, S. Khatami, D. K. Reinhard, and J. Asmussen, “Modeling of Electrical and
Structural Properties of Thin Diamond Films”, International Journal of Modelling and
Simulation, 25, 162–170, (2005)
15. D. K. Reinhard. T. A. Grotjohn, M. Becker, M. K. Yaran, T. Schuelke, and J. Asmussen,
“Fabrication and Properties of Ultranano, Nano, and Microcrystalline Diamond Membranes
and Sheets”, Journal of Vacuum Science and Technology B, 2811-2817, (2004).
16. M. E. O’Neal, D. A. Landis, E. Rothwell, L. Kempel, and D. Reinhard, “Tracking Insects
with Harmonic Radar: a Case Study”, American Entomologist, 50, 212-218, (2004).
17. D. K. Reinhard and I. R. Kleindienst, "Diamond Films as Optical Coatings for Silicon", New
Diamond and Frontier Carbon Technology, 10, 13 - 23, (2000).
18. M. J. Ulcznski and D. K. Reinhard, "Diamond-Coated Glass Substrates", Diamond and
Related Materials, 7, 1639-1646, 1998.
19. M. M. Bataineh and D. K. Reinhard, "An Impedance Spectroscopy Investigation of
Polycrystalline Diamond from dc to 1 GHz", Diamond and Related Materials, 6, 1689-1696,
1997.
20. K. Y. Lee, E. D. Case, and D. K. Reinhard, "Microwave Joining and Repair of Ceramics and
Ceramic Composites", Ceramic Engineering and Science Proceedings, 18, 543-550, 1997.
21. G. S. Yang, M. Aslam, K. P. Kuo, D. K. Reinhard, and J. Asmussen, “Effect of Ultrahigh
Nucleation Density on Diamond Growth at Different Growth Rates and Temperatures”,
Journal of Vacuum Science and Technology, B, 13, 1030 - 1036, 1995.
22. C. J. Sun, T. A. Grotjohn, C. J. Huang, D. K. Reinhard, and C. C. W. Yu, “Forward Bias
Stress Effects on BJT Gain and Noise Characteristics”, IEEE Transactions on Electron
Devices, 41, 787-792, 1994.
23. V. Gopinath, G. T. Salbert, T. A. Grotjohn, and D. K. Reinhard, “Electron Cyclotron
Resonance Sputter Removal of SiO2 on Silicon Wafers”, Journal of Vacuum Science and
Technology B, 11, pp. 2067- 2070, 1993.
24. C. J. Huang, T. A. Grotjohn, C. J. Sun, D. K. Reinhard, and C. -C. Yu, “Temperature
Dependence of Hot Electron Degradation in Bipolar Transistors,” IEEE Transactions on
Electron Devices, 40, 1669-1674, 1993.
25. B. Huang, D. K. Reinhard, and J. Asmussen, “Electrical Properties of Undoped Large-Grain
and Small-Grain Diamond Films,” Diamond and Related Materials, 2, 812-815, 1993.
26. C. Jack Sun, D.K. Reinhard, T.A. Grotjohn, C.-J. Huang, and C.-C.W. Yu, “Hot Electron
Induced Degradation and Post-Stress Recovery of Bipolar Transistor Gain and Noise
Characteristics,” IEEE Transactions on Electron Devices, 39, pp. 2178- 2180, 1992
27. B.D. Musson, F.C. Sze, D.K. Reinhard, and J. Asmussen, “Anisotropic Etching of SubMicron Silicon Features in an 23 cm Diameter Microwave Multi-Cusp ECR Reactor,”
Journal of Vacuum Science and Technology B, 9, pp. 3521-3525, 1991.
28. C.A. Gamlen, E.D. Case, D.K. Reinhard, and B. Huang, “Adhesion of Polycrystalline
Diamond Thin Films on Single-Crystal Silicon Substrates,” Applied Physics Letters, 59, pp.
2529-2531, 1991.
29. B.R. Huang and D.K. Reinhard, “Electric Field-Dependent Conductivity of Polycrystalline
Diamond Thin Films,” Applied Physics Letters, 59, pp. 1494- 1496, 1991
30. J. Engemann, H. Keller, D.K. Reinhard, B. Huang, and J. Asmussen, “Dual-Side Contact
Formation on Isolated Diamond Films,” Applied Physics Letters, 57, pp. 2461-2463, 1990.
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31. F.C. Sze, D.K. Reinhard, B. Musson, and J. Asmussen, “Experimental Performance of a
Large-Diameter Multipolar Microwave Plasma Disk Reactor,” Journal of Vacuum Science
and Technology B, 8, pp. 1759-1762, 1990
32. J. Hopwood, D.K. Reinhard, and J. Asmussen, “Charged Particle Densities and Energy
Distribution in a Multipolar ECR Plasma Etching Source,” Journal of Vacuum Science and
Technology A, 8, pp. 3103-3112, 1990.
33. G. T. Salbert, D.K. Reinhard, and J. Asmussen, “Oxide Growth on Silicon Using a
Microwave Electron Cyclotron Resonance Oxygen Plasma,” Journal of Vacuum Science and
Technology A, 8, pp. 2919-2933, 1990.
34. J. Hopwood, R. Wagner, D.K. Reinhard, and J. Asmussen, “Electric Fields in a Microwave
Cavity Electron Cyclotron Resonant Plasma Source,” Journal of Vacuum Science and
Technology A, 8, pp. 2904-2908, 1990
35. J. Zhang, B. Huang, D.K. Reinhard, and J. Asmussen, “An Investigation of Electromagnetic
Field Patterns During Microwave Plasma Diamond Thin Film Deposition,” Journal of
Vacuum Science and Technology A, 8, pp. 2124-2128, 1990.
36. J. Hopwood, D.K. Reinhard, and J. Asmussen, “Experimental Conditions for Uniform
Anisotropic Etching of Silicon with a Microwave ECR Plasma,” J. Vac. Sci. Technology B,
6, pp. 1896-1899, 1988.
37. J. Hopwood, M. Dahimene, D.K. Reinhard, and J. Asmussen, “Plasma Etching with a
Microwave Cavity Plasma Disk Source,” Journal of Vacuum Science and Technology B, 6,
pp. 268-271, 1988.
38. 17. M. Alavi, D.K. Reinhard, and C.C. Yu, “Minority Carrier Injection in Pt-Si Schottky
Barrier Diodes at High Current Densities,” IEEE Transactions on Electron Devices, 34, pp.
1134-1140, 1987.
39. T. Roppel, D.K. Reinhard, and J. Asmussen, “Low Temperature Oxidation of Silicon Using a
Microwave Plasma Disk Source,” Journal of Vacuum Science and Technology B, 4, pp. 295298, 1986.
40. N. McGruer and D.K. Reinhard, “Substrate and Target Voltage Effects on Sputtered
Hydrogenated Amorphous Silicon,” Solar Energy Materials, 11, pp. 447-454, 1985.
41. F. Wang and D.K. Reinhard, “Hydrogenation Effects in Sputtered Polycrystalline Cadmium
Telluride,” Journal of Applied Physics, 55, pp. 3702-3705, 1984.
42. L. Xu, C.L. Foiles, and D.K. Reinhard, “Thermopower of Sputtered Amorphous Si(Ga)
Alloys,” Philosophical Magazine B, 49, pp. 249-258, 1984.
43. Xu Le, D.K. Reinhard, and M.G. Thompson: “RF Sputtered Gold-Amorphous Silicon
Schottky-Barrier Diodes,” IEEE Transactions on Electron Devices, 29, pp. 1004-1008, 1982.
44. Xu Le, C.L. Foiles, and D.K. Reinhard: “Thermopower of Amorphous Si(Al),” Journal of
Non-Crystalline Solids, 47, pp. 355-362, 1982.
45. D.K. Reinhard, D.A. Gift, G.I. Harris, and C.J. DeSostoa, “Limitations of Tissue
Differentiation by Spectral Measures of Backscattered Ultrasound,” Ultrasonic Imaging, 3,
pp. 108-112, 1981.
46. M.G. Thompson and D.K. Reinhard: “Modification of Amorphous Hydrogenated Silicon by
Co-Sputtered Aluminum,” Journal of Non-Crystalline Solids, 37, pp. 325-333, 1980.
47. N. McGruer and D.K. Reinhard: “Effect of Photogenerated Carriers on the Mean Delay Time
for Avalanche Breakdown in pn Junctions,” Solid State Electronics, 23, pp. 289-291, 1980.
48. D.K. Reinhard: “Amorphous Threshold Switch Response to Pulse Burst Wave- forms,”
Applied Physics Letters, 31, pp. 527-529, 1977.
5
49. D.K. Reinhard, D. Adler and F.O. Arntz: “Electron and Photon Induced Conductivity in
Chalcogenide Glasses,” Journal of Applied Physics, 47, pp. 1560-1573, 1976.
50. P.H. Bloch, G. Hendry, J.L. Hilton, W.M. Quam, D.K. Reinhard, and C. Wilson “Beam
Profiles Measured on a Neutron Generator Having an Effective Target 5.5 cm x 5.5 cm,”
Physics in Medicine and Biology, 21, pp. 450-452, 1976.
51. B. Webber, D.K. Reinhard: “A Method for Post-Mastectomy Chest Wall Dosimetry,”
Radiology, 110, pp. 463-466, 1974.
52. D.K. Reinhard, F.O. Arntz, D. Adler: “Field-Dependent Conductivity of Chalcogenide
Glasses,” Applied Physics Letters, 23, pp. 521-523, 1973.
53. D.K. Reinhard, F.O. Arntz, D. Adler: “Properties of Chalcogenide Glass-Silicon
Heterojunctions,” Applied Physics Letters, 23, pp. 186-188, 1973.
C. Conference Papers and Proceedings
1. D.K. Reinhard, D. T. Tran, T Schuelke, M. F. Becker, T. A. Grotjohn, and J. Asmussen,
“SiO2 Antireflection coatings for single crystal diamond”, Diamond 2011, GarmischPartenkirchen, Germany, September 4 -11, 2011.
2. J. Lu, Y. Gu, D. K. Reinhard, T. A. Grotjohn, and J. Asmussen, “Microwave plasma assisted
synthesis of single crystal diamond and high pressures and high power densites”, 38th
International Conference on Plasma Science, Chicago, Illlinois June 26-30, 2011.
3. J. Asmussen, J. Lu, G.Yajun, T. A. Grotjohn, D. K. Reinhard T. Schuelke, and Kagan Yaran,
“The experimental performance of microwave plasma-assisted reactors at high pressures and
high power densities”, Fall 2010 MRS Meeting, Boston, MA. Nov. 29- Dec. 2, 2010.
4. S. N. Demlow, T.A. Grotjohn, D.K. Reinhard, M. Becker, and J. Asmussen, “Determination
of boron concentration in doped diamond films”, Fall 2010 MRS Meeting, Boston, MA. Nov.
29- Dec. 2, 2010.
5. D. T. Tran, T.A. Grotjohn, D.K. Reinhard, and J.Asmussen, Polishing of polycrystalline
diamond films using microwave plasma-assisted etching,” Fall 2010 MRS Meeting, Boston,
MA. Nov. 29- Dec. 2, 2010.
6. T. A. Grotjohn, S. Nicley, D. T. Tran, D. K. Reinhard, M. Becker and J. Asmussen, “Single
crystal boron-doped diamond synthesis”, 2009 Materials Research Society Fall Meeting,
Nov. 30 – Dec 4, 2009, Boston, Massachusetts.
7. D. T. Tran, C. Fansler, T. A. Grotjohn, D. K. Reinhard and J. Asmussen, “Microwave Plasma
Assisted Etching of Single Crystal Diamond”, 20th European Conference on Diamond,
Diamond-like Materials, Carbon Nanotubes, and Nitrides, Sept. 6 – 10, 2009, Athens Greece.
8. K. W. Hemawan, T. A. Grotjohn, D. K. Reinhard, J. Asmussen, “Improved Microwave
Plasma Reactor for Diamond Synthesis at High Pressure and High Power Density,” Diamond
and Related Materials, Submitted, 2009.
9. K. W. Hemawan, J. Lu, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen, “High Pressure
Single Crystal Diamond Deposition with Nitrogen Addition,” International Conference on
New Diamond and Nano Carbons, Traverse City, MI, June 2009.
10. K. W. Hemawan, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen, “High Pressure
Microwave Plasma Assisted CVD Synthesis of Diamond,” International Conference on New
Diamond and Nano Carbons, Traverse City, MI, June 2009.
11. T. Schuelke, M. Yaran, D. King, M. Becker, K. W. Hemawan, D. Reinhard, T. Grotjohn, and
J. Asmussen, “Microwave Plasma-Assisted Chemical Vapor Deposition Homoepitaxial
6
Synthesis of Single Crystalline Diamond,” 52nd Society Vacuum Coaters, Santa Clara, CA,
May 2009.
12. D. T. Tran, C. Fansler, T. A. Grotjohn D. K. Reinhard and J. Asmussen, “Comparison
between ECR and non-ECR microwave plasma-assisted etching of nanocrystalline
diamond”, New Diamond and Nano Carbons Conference, June 07 – 11, 2009, Traverse City,
Michigan.
13. S. S. Nicley, D. T. Tran, C. Fansler, J. Liebich, C. Pieper, M. Becker, T. A. Grotjohn, D. K.
Reinhard and J. Asmussen, “Electrical characterization of boron doped diamond films”, New
Diamond and Nano Carbons Conference, June 07 – 11, 2009, Traverse City, Michigan.
14. R. Ramamurti, M. Becker, T. Schuelke, T. Grotjohn, D. Reinhard, and J. Asmussen,
“Deposition of thick boron-doped homoepticaxial single crystal diamond by microwave
plasma-assited CVD“, 19th European Conference on Diamond, Diamond-Like Materials,
Carbon Nanotubes, and Nitrides, Sept. 7-11, 2008, Sitges Spain.
15. C. Fansler, D. T. Tran, S. Wicklein, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen,
“Investigation of diamond etching characteristics for microwave plasma-assisted diamond
etching”, 19th European Conference on Diamond, Diamond-Like Materials, Carbon
Nanotubes, and Nitrides, Sept. 7-11, 2008, Sitges Spain.
16. D. T. Tran, C. Fansler, S. Wicklein, T. A. Grotjohn, D. K. Reinhard, J. Asmussen,
“Investigation of Etched Surface-Roughness and Etch Selectivity for Microwave PlasmaAssisted Diamond Etching”, 2nd International Conference on New Diamond and Nano
Carbon, May 26 –29, 2008, Taipei, Taiwan.
17. D. T. Tran, C. Fansler, T. A. Grotjohn, D. K. Reinhard, J. Asmussen, “Investigation of
Microwave Plasma Diamond Etching”, International Conference on Plasma Science, June 15
– 19, 2008, Karlsruhe, Germany.
18. D. T. Tran, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen, “Microwave Plasma-Etching
of Diamond”, 1st International Conference on New Diamond and Nano Carbons , May 2831, 2007, Osaka, Japan.
19. R. Ramamurti, M. Becker, T. Schuelke, T. Grotjohn, D. Reinhard, G. Swain, and J.
Asmussen, “Boron Doped diamond Deposited by Microwave Plasma-Assisted CVD at Low
and High Pressures”, 1st International Conference on New Diamond and Nano Carbons ,
May 28-31, 2007, Osaka, Japan.
20. D. Tran, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen, “Characterization of a Mic
rowave Plasma Etching Reactor”, IEEE Pulsed Power and Plasma Science Conference, June
17-22, 2007, Albuquerque, New Mexico.
21. D. T. Tran, C. Fansler, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen, “Microwave
Plasma-Etching of Diamond”, 18th European Conference on Diamond, Diamond-Like
Materials, Caron Nanotubes, and Nitrides, Septemb er 9 –14, 2007, Berlin, Germany.
22. R. Ramamurti, M. Becker, T. Schuelke, T. Grotjohn, D. Reinhard, and J. Asmussen
“Synthesis of Boron-Doped Homoepitaxial Single Crystal Diamond by Microwave Plasma
Chemical Vapor Deposition”, 18th European Conference on Diamond, Diamond-Like
Materials, Caron Nanotubes, and Nitrides, Septemb er 9 –14, 2007, Berlin, Germany.
23. M.K. Yaran, D. King, T. Schuelke, T. Grotjohn, D. Reinhard, and J. Asmussen,
“Homoepitaxial Single Crystal Diamond Grown by Microwave Plasma-Assisted Chemical
Vapor Deposition”, 18th European Conference on Diamond, Diamond-Like Materials, Caron
Nanotubes, and Nitrides, Septemb er 9 –14, 2007, Berlin, Germany.
24. S. Zuo, M. K. Yaran, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen, “Investigation of
7
Diamond Deposition Uniformity and Quality for Freestanding Film and Substrate
Applications”, 17th European Conference on Diamond, Diamond-Like Materials, Carbon
Nanotubes, and Nitrides, September 3 –8, 2006, Estoril, Portugal.
25. R. Ziervogel, M. F. Becker, T. Schuelke, J. Asmussen, T. A. Grotjohn, and D. K. Reinhard,
“Deposition Uniformity of Ultrananocrystalline Diamond on 150 and 200 mm wafer
substrates, 17th European Conference on Diamond, Diamond-Like Materials, Carbon
Nanotubes, and Nitrides, September 3 –8, 2006, Estoril, Portugal.
26. M. A. Perrin, T. A. Grotjohn, D. K. Reinhard, and J. Asmussen, “Evaluation of an End Feed
Microwave Cavity Plasma Source for Diamond Etching”, 33rd IEEE International
Conference on Plasma Science, June 4 –8, 2006, Traverse City, Michigan.
27. S. Zuo, t. Grotjohn, D. Reinhard, J. Asmussen and R. Ziervogel, “Deposition and Post
Processing of Polycrystalline Diamond for Freestanding Films and Substrates”, 33rd IEEE
International Conference on Plasma Science, June 4 –8, 2006, Traverse City, Michigan.
28. F. Matri, P. Miller, M. Becker, D. Tran, S. Zhou, J. Asmussen, T.A. Grotjohn, and D. K.
Reinhard, “Diamond Electron Stripping Foils for High Energy Ion Beams”, 33rd IEEE
International Conference on Plasma Science, June 4 –8, 2006, Traverse City, Michigan.
29. M. D. Parr and D. K. Reinhard, “Electrical Properties of Thin Nanocrystalline Diamond
Based Structures”, 8th Applied Diamond Conference NanoCarbon 2005, May 15-19, 2005,
Argonne, Illinois.
30. S. Zuo, T. Grotjohn, D. Reinhard, J. Asmussen and R. Ziervogel, “Deposition and PostProcessing of Polycrystalline Diamond for Freestanding Films and Substrates”, 8th Applied
Diamond Conference NanoCarbon 2005, May 15-19, 2005, Argonne, Illinois.
31. Synthesis of Large-Area, Thick, Uniform, Smooth Ultrananocrystalline Diamond Films by
Microwave Plasma-Assisted Chemical Vapor Deposition, 8th Applied Diamond Conference
NanoCarbon 2005, May 15-19, 2005, Argonne, Illinois.
32. R. A. Booth and D. K. Reinhard, “Polycrystalline Diamond Optical Resonators on Silicon”,
17th Annual Symposium, Center for Fundamental Materials Research, Materials for
Photonics and Information Technology, March 31, 2003, Michigan State University, East
Lansing, MI.
33. M.E. O'Neal, D. A. Landis, E. Rothwell, L. Kempel, D. Reinhard, B. Wilmhoff and A. Grant,
“Suitability of hand-held harmonic radar technology for mark and recapture studies in field
crops.” Annual Meeting of the Pacific Branch of the Entomological Society of America,
March, 2003.
34. D. K. Reinhard, M. Becker, R. A. Booth, T. P. Hoepfner, T. A. Grotjohn, and J. Asmussen,
“Fabrication and properties of ultra-nano, nano, and polycrystalline Diamond Membranes
and Sheets”, AVS 50th International Symposium, November 2-7, 2003.
35. R. A. Booth and D. K. Reinhard, “Polycrystalline Diamond Optical Resonators on Silicon”,
17th Annual Symposium, Center for Fundamental Materials Research, Materials for
Photonics and Information Technology, March 31, 2003, Michigan State University, East
Lansing, MI.
36. M. Bataineh, D. K. Reinhard, S. Khatami, and J. Asmussen, “Using IS Modeling to
Understand the Effect of Growth Conditions and Film Attributes on the AC Conduction in
CVD Diamond”, IEEE SoutheastCon 2002, April 5-7, 2002, Columbia, South Carolina.
37. R. A. Booth and D. K. Reinhard, "Diamond Thin Film Fabry Perot Optical Resonators",
Proceedings of the 6th Applied Diamond Conference/Second Frontier Carbon Technology
8
Joint Conference, T. Zeng, K. Miyoshi, M. Yoshikawa, M. Murakaw, Y. Kog, K. Kobasdih,
G.A.J. Amaratunga, Eds, pp. 180-185, NASA/CP-2001-210948, 2001.
38. V. Ayres, B. Wright, J. Asmussen, S. Song, S. Khatami, D. Reinhard, D. Tomanek, and D.
Roach, "Characteristics of the Growth and Emission Properties of Hybrid Carbon Films
Containing Carbon Nanotubes", Fullerenes 2000, Vol. 10: Chemistry and Physics of
Fullerenes and Carbon Nano Materials, Eds. P. V. Kamat, D.M. Guldi, and K.M. Kadish,
The Electrochemical Society, Inc., Pennington, NJ, pp. 236-245, (2000).
39. D. K. Reinhard, "Diamond Films as Optical Coatings for Semiconductors", Applied
Diamond / Frontiers in Carbon Technology Conference, Tsukuba, Japan, August 31 - Sept. 3,
1999, Proceedings, 122-127, 1999.
40. E. D. Case, J. G. Lee, M. A. Crimp, D. K. Reinhard and J. Malik, "Protective Coatings for
Infrared Materials", Ceramic Eng. And Sci. Proc., 20, 145-152, (1999).
41. M. J. Ulczynski and D. K. Reinhard, "Scatter Limited Optical Transmission of Diamond
Coated Glass", Applied Diamond Conference, August 3 -8, Edinburgh, Scotland, 1997.
42. M. Bataineh and D. K. Reinhard, "Impedance Spectroscopy Properties of Thin and ThickFilm Diamond", ", Applied Diamond Conference, August 3 -8, Edinburgh, Scotland, 1997.
43. B. Paosawatyanyong and D. K. Reinhard, "Frequency Performance of Diamond Schottky
Barrier Diodes", ", Applied Diamond Conference, August 3 -8, Edinburgh, Scotland, 1997.
44. M. J. Ulczynski, D. K. Reinhard, and J. Asmussen, “Optical Properties of Diamond Coated
Borosilicate Glass”, 5th International Conference on the New Diamond Science and
Technology, Tours, France, September 8 - 13, 1996
45. M. J. Ulczynski and D. K. Reinhard, “Microwave Plasma Sources for Low Temperature
Diamond Deposition”, Invited Paper, 23rd IEEE International Conference on Plasma
Science, Boston, MA, June 3 - 5, 1996.
46. R. N. Chakraborty, D. K. Reinhard and P. D. Goldman, “Etching of Diamond Wafers with
Electron Cyclotron Resonance Plasmas”, The Electrochemical Society Spring Meeting,
Reno, Nevada, May 21 - 26, 1995, Extended Abstracts, Vol. 95-1, pp. 396 - 397, The
Electrochemical Society, 1995.
47. D. K. Reinhard, M. Ulczynski, and R. N. Chakraborty, “Diamond Coatings on Integrated
Circuits”, Applications of Diamond Films and Related Materials: Third International
Conference, A. Feldman, Y. Tzeng, W. A. Yarbrough, M. Yoshikawa, and M. Murakawa,
editors, pp. 643 - 646, NIST Special Publication 885, Washington, 1995.
48. M. Ulczynski, D. K. Reinhard, M. Prystajko, and J. Asmussen, “Thin Film Diamond
Coatings on Glass”, Applications of Diamond Films and Related Materials: Third
International Conference, A. Feldman, Y. Tzeng, W. A. Yarbrough, M. Yoshikawa, and M.
Murakawa, editors, pp. 573 - 576, NIST Special Publication 885, Washington, 1995.
49. G - S Yang, M. Aslam, M. Ulczynski, and D. K. Reinhard, “Ultra-High Nucleation Density
for Diamond Film Growth at 470 and 900 C”, Advances in New Diamond Science and
Technology, Fourth International Conference on New Diamond Science and Technology S.
Saito, N. Fujimori, O. Fukanaga, M. Kamo, K. Kobashi, and M. Yoshikawa, editors, pp. 171
- 174, MYU, Tokyo, 1994.
50. M. J. Ulczynski, D. K. Reinhard, M. Prystajko, and J. Asmussen, “Low Temperature
Deposition of Thin Film Diamond”, Advances in New Diamond Science and Technology,
Fourth International Conference on New Diamond Science and Technology, S. Saito, N.
Fujimori, O. Fukanaga, M. Kamo, K. Kobashi, and M. Yoshikawa, editors, pp. 41 - 44,
MYU, Tokyo, 1994.
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51. W. H. Glime, E. D. Case, J. Mattavi, and D. K. Reinhard, “Deflection Behavior of PointLoaded CVD Diamond Thin Film Diaphragms”, Proceedings of the American Society for
Composites 8th Technical Conference on Composite Materials, Technomic Publications,
Lancaster, PA 921-930, 1993.
52. L. E. D. Flowers, E. D. Case, R. M. Brown, and D. K. Reinhard, “Burst Pressure of Diamond
Thin Film Diaphragms ad a Function of Film Diameter and Thickness”, Proceedings of the
American Society for Composites 8th Technical Conference on Composite Materials,
Technomic Publications, Lancaster, PA 911-920, 1993.
53. C. J. Sun, T.A. Grotjohn, C.-J. Huang, D.K. Reinhard, and C.-C. Yu, “BJT Forward Bias
Degradation Effects and Mechanisms: A Gain and Noise Study”, Proceedings of the IEEE
Bipolar Circuits and Technology Meeting, pp. 215-217, Minneapolis, Minnesota, October 45, 1993.
54. W. Glime, E. D. Case, and D. K. Reinhard, “Mechanical Properties Determination of
Polycrystalline Diamond Films,” 95th Annual Meeting of the American Ceramic Society,
Cincinnati, Ohio, April, 1993.
55. L. Flowers, E. D. Case, and D. K. Reinhard, “Burst Strength of Polycrystalline Diamond
Thin Films,” 95th Annual Meeting of the American Ceramic Society, Cincinnati, Ohio,
April, 1993.
56. M. Ulczynski, D. K. Reinhard, and J. Asmussen, “An Investigation of Low-pressure
Diamond Film Deposition in a Microwave Plasma Reactor,” 4th Annual Diamond
Technology Workshop, Madison, Wisconsin, March 24-26. 1993.
57. V. Gopinath, G.T. Salbert, T.A. Grotjohn, and D.K. Reinhard, “ECR Sputter Clearing and
Removal of Sio2 Layers on Silicon Wafers,” 39th American Vacuum Society National
Symposium, Chicago, November 9-13, 1992.
58. B.R. Huang, D.K. Reinhard, and J. Asmussen, “Electrical Properties of Undoped Large-grain
and Small-grain Diamond Films,” 3rd International Conference on the New Diamond
Science and Technology, Heidelberg, Germany, August 31-September 4, 1992.
59. C.-J. Huang, T.A. Grotjohn, D.K. Reinhard, C.J. Sun, and C.-C. Yu, “Simulation of Hot
Electron Induced Degradation in Silicon Bipolar Transistors,” IEEE Bipolar Circuits and
Technology Meeting, Minneapolis, Minnesota, October 5-6, 1992.
60. F.C. Sze, G. Alers, M. Ulczynski, D.K. Reinhard, B. Golding, and J. Asmussen, “Etching of
Silicon with Feature Sizes to 0.2 Microns Using a Multipolar ECR Plasma Reactor,” 39th
American Vacuum Society, National Symposium, Chicago, November 9-13, 1992.
61. C.J. Huang, C.J. Sun, T.A. Grotjohn, D.K. Reinhard, and C.C. W. Yu, “Temperature
Dependence and Post-Stress Recovery of Hot Electron Degradation Effects in Bipolar
Transistors,” IEEE Bipolar Circuits and Technology Meeting Proceedings, pp. 170-173,
Minneapolis, Minnesota, September 9-10, 1991.
62. B. Musson, F.C. Sze, D.K. Reinhard, and J. Asmussen, “Anisotropic Etching of Sub-Micron
Features in a 25-cm Diameter Microwave Multi-Cusp Plasma Reactor,” 35th International
Symposium on Electron, Ion, and Photon Beams, Seattle, Washington, May 1991.
63. F.C. Sze, B. Musson, D.K. Reinhard, and J. Asmussen, “Correlation of Plasma Properties
and Etching Performance in a 25-cm Diameter Multi-Cusp ECR Plasma Reactor,”
International Conference on Plasma Science, Williamsburg, Virginia, June 1991.
64. C.A. Gamlen, E.D. Case, and D.K. Reinhard, “Characterization of Diamond Thin Films on
Single Crystalline Silicon,” Annual Meeting of the American Ceramics Society, Cincinnati,
Ohio, May 1991.
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65. J. Asmussen, D.K. Reinhard, and T.A. Grotjohn, “Measured Characteristics and Properties of
Multipolar ECR Plasmas,” Washington Materials Forum, Washington, DC., February 28March 29. 1, 1991.
66. C. Gamlen, E.D. Case, K. Meyers, N. Maguire, D.K. Reinhard, and B. Huang,
“Characterization of Diamond Thin Films on Silicon Wafers,” American Society for
Composites 5th Technical Conference, East Lansing, MI, June 11-14, 1990.
67. F.C. Sze, D.K. Reinhard, B. Musson, J. Asmussen, and M. Dahimene, “Experimental
Performances of a Large Diameter Multipolar Microwave Plasma Disk Reactor,” 34th
International Symposium on Electron, Ion, and Photon Beams, San Antonio, TX, May 29June 1, 1990.
68. J. Zhang, B. Huang, D.K. Reinhard, and J. Asmussen, “An Investigation of the Effects of
Electromagnetic Field Patterns on Microwave Plasma Diamond Thin Film Deposition,” 36th
National Symposium of the American Vacuum Society, Boston, MA, October 23-27, 1989.
69. G.T. Salbert, D.K. Reinhard, and J. Asmussen, “Oxide Growth on Silicon Using a
Microwave Electron Cyclotron Resonance Oxygen Plasma,” 36th National Symposium of
the American Vacuum Society, Boston, MA, October 23-27, 1989.
70. J. Hopwood, R. Wagner, D.K. Reinhard, and J. Asmussen, “Electric Fields in a Multipolar
Cavity Electron Cyclotron Resonant Microwave Plasma Source”, 36th National Symposium
of the American Vacuum Society, Boston, MA, October 23- 27, 1989.
71. J. Hopwood, D.K. Reinhard, and J. Asmussen, “Performance of Multipolar Electron
Cyclotron Resonant Microwave Cavity Plasma Source,” 24th Microwave Power Symposium,
International Microwave Power Institute, Stanford, Connecticut, August 20-23, 1989.
72. J. Hopwood, R. Wagner, D.K. Reinhard, and J. Asmussen, “Characterization of a Multipolar
Electron Cyclotron Resonance Microwave Plasma Source,” Sixteenth IEEE International
Conference in Plasma Science, Buffalo, NY, May 22-24, 1989.
73. G.T. Salbert, D.K. Reinhard, and J. Asmussen, “Downstream Oxidation of Silicon Using an
ECR Microwave Plasma Disk Reactor,” Sixteenth IEEE International Conference on Plasma
Science, Buffalo, NY, May 22-24, 1989.
74. J. Hopwood, D.K. Reinhard, and J. Asmussen, “Experimental Conditions for Uniform
Anisotropic Etching of Silicon with a Microwave ECR Plasma System,” 32nd International
Symposium on Electron, Ion and Photon Beams, Ft. Lauderdale, Florida, May 31-June 3,
1988.
75. G.T. Salbert, J. Hopwood, J. Asmussen, and D.K. Reinhard, “Microwave Plasma Oxidation
and Etching for Integrated Circuit Processing,” Invited Paper 23rd Microwave Power
Symposium, International Microwave Power Institute, Ottawa Canada, August 29-31, 1988.
76. J.Asmussen, J. Hopwood, D.K. Reinhard, and L. Mahoney, “Microwave Plasma Applicator
Design Principles for Low and High Pressure Applications,” Invited Paper, 23rd Microwave
Power Symposium, International Microwave Power Institute, Ottawa Canada, August 29-31,
1988.
77. J. Asmussen and D.K. Reinhard, “Applications and Characteristics of Low Pressure,
Microwave ECR Ion and Plasma Sources,” International Conference on ECR Ion Sources,
National Superconducting Cyclotron Laboratory, East Lansing, Michigan, November 16-18,
1987.
78. J. Hopwood, J. Asmussen, and D.K. Reinhard, “Anisotropic Silicon Etching with a
Microwave Cavity, ECR Plasma Source,” International Conference on ECR Ion Sources,
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National Superconducting Cyclotron Laboratory, East Lansing, Michigan, November 16-18,
1987.
79. J. Hopwood, M. Dahimene, D.K. Reinhard and J. Asmussen, “Plasma Etching with a
Microwave Cavity Plasma Disk Source,” Proceedings of the 31st International Symposium
on Electron, Ion, and Photon Beams, Woodland Hills, California, May 26-29, 1987.
80. M. Dahimene, L. Mahoney, J. Hopwood, G. Salbert, D. Reinhard and J. Asmussen,
“Comparison of Experimental Measurements and Theoretical Modeling of Low Pressure
Microwave Discharges,” 14th IEEE International Conference on Plasma Science, Arlington,
Virginia, June 1-3, 1987.
81. T. Roppel, D.K. Reinhard, G.A. Salbert, and J. Asmussen, “Properties of Silicon Oxide Films
Grown in a Microwave Oxygen Plasma,” IEEE International Electron Devices Meeting
Technical Digest, pp. 205-208, Los Angeles, California, December 7-10, 1986.
82. T. Roppel, D.K. Reinhard, and J. Asmussen, “Low Temperature Native Oxidation of Silicon
Using a Microwave Plasma Disk Source,” Proceedings of the 29th International Symposium
on Electron, Ion, and Photon Beams, pp. 295-298, Portland, Oregon, May 28-31, 1985.
83. M.G. Thompson and D.K. Reinhard: “Co-sputtered Doped Amorphous Silicon as a
Photovoltaic Material,” Proceedings of the 14th IEEE Photovoltaic Specialists Conference,
pp. 1218-1220, San Diego, California, January 7-10, 1980.
84. G.I. Harris, D.K. Reinhard, D. Gift, and C.J. DeSostoa: “Measurement Variability Affecting
in vivo Ultrasonic Tissue Signature Differentiation,” Fourth International Symposium on
Ultrasonic Imaging and Tissue Characterization, Gaithersburg, Maryland, June 18-20, 1979.
85. D. Gift, D.K. Reinhard and G.I. Harris: “A Pattern Recognition Approach to Ultrasonic
Tissue Signature Differentiation of Liver and Spleen,” Winter Meeting of the American
Association of Physicists in Medicine, Chicago, Illinois, November, 1978.
86. D.K. Reinhard, P. Chimento and G.I. Harris, “Use of a Reconstruction Technique to Increase
the Dynamic Range of a Phased Array,” Annual Meeting of the Radiological Society of
North America, Chicago, Illinois, December 1-2, 1977.
87. D.K. Reinhard: “Quantitative Parameters of Ultrasound Signals: Implications for Tissue
Signature Analysis,” invited paper, Creative Concepts in Academic Radiology Conference,
Vail, Colorado, December 16-19, 1977.
88. P.H. Bloch, J.L. Hilton, W.M. Quam, D.K. Reinhard and C. Wilson, “Beam Profiles
Measured on a Neutron Generator Having an Effective Target 5.5 cm x 5.5 cm,” American
Association of Physicists in Medicine Annual Meeting, San Antonio, Texas, August 3-7,
1975. Abstract in Medical Physics, 2, pp. 152, 1975.
89. D.K. Reinhard: “Correction of Electron Beam Isodoses for Curved Surfaces,” American
Association of Physicists in Medicine 16th Annual Meeting, Kansas City, Missouri, July 29August 1, 1974, Abstract in Medical Physics, 1, pp. 96, April, 1974.
90. D. Adler, F.O. Arntz, L.P. Flora, B.P. Mathur, D.K. Reinhard: “Non-Ohmic and Switching
Effects in Amorphous Chalcogenide Films and Chalcogenide Silicon Heterojunctions,” in
Amorphous and Liquid Semiconductors, J. Stuke and W. Brenig, eds., (Taylor and Francis,
London, 1974), pp. 859-866, Proceedings of the 5th International Conference on Amorphous
and Liquid Semiconductors, Garmisch-Partenkirchen, West Germany, September 3-8, 1973.
91. D.K. Reinhard, D. Adler, F.O. Arntz: “Photoconductivity and Electron Bombardment
Induced Conductivity Studies of Multicomponent Chalcogenide Films,” in Amorphous and
Liquid Semiconductors, J. Stuke and W. Brenig, eds., (Taylor and Francis, London, 1974),
12
pp. 745-752, Proceedings of the 5th International Conference on Amorphous and Liquid
Semiconductors, Garmisch-Partenkirchen, West Germany, September 3-8, 1973.
92. D.K. Reinhard: “Post-Mastectomy Chest Wall Irradiation with 60Co,” American Association
of Physicists in Medicine Winter Meeting, Chicago, November 30- December 1, 1972.
Abstract in AAPM Quarterly Bulletin, 6, No. 4, pp. 188, 1972.
93. . D.K. Reinhard and F.O. Arntz: “Thermoabsorption of GaAs,” American Physical Society
March Meeting, Philadelphia, March 24-27, 1969. Abstract in the Bulletin of the American
Physical Society, Series II, Vol. 14, No. 3, pp. 416, 1969.
Doctoral Students
1. Mark Thompson, "Properties of intrinsic and co-sputtered hydrogenated amorphous silicon
films and Schottky photovoltaic devices", 1980, currently Professor, Electrical and Computer
Engineering, Kettering University.
2. Nicol McGruer, "The effect of substrate bias on sputtered hydrogenated amorphous silicon",
1983, currently Associate Professor, Electrical and Computer Engineering, Northeastern
University.
3. Thaddeus Roppel, "Anodic oxidation of silicon in a microwave plasma disk reactor", 1986,
currently Associate Professor, Electrical and Computer Engineering, Auburn University.
4. Mohsen Alavi, "Minority carrier injection in Schottky barrier diodes", 1986, current with the
Technology and Manufacturing Group, Intel Corp.
5. Geoffrey Salbert, “Anodic growth and cathodic removal of silicon dioxide layers utilizing an
electron cyclotron resonant microwave plasma disk reactor”, 1992, currently with Network
Concepts, Inc.
6. Bohr-ran Huang, “Electrical properties and physical characteristics of polycrystalline
diamond films deposited in a microwave plasma disk reactor”, 1992, Professor, Department
of Electronic Engineering, National Yunlin University of Science and Technology, Taiwan.
7. Chih-Chieh Jack Sun, “A noise study of bipolar junction transistor reliability”, 1993,
currently with Helicomm Inc.
8. Rabindra Chakraborty, “Post-depositional processing of diamond films using electron
cyclotron resonant plasmas”, 1995, currently with Hilti Inc.
9. Mohannad Bataineh, “High frequency electrical properties of polycrystalline diamond films”,
1997, currently Assistant Professor, Electrical and Computer Engineering, University of
West Floriday. (deceased)
10. Michael Ulczynski, “Low temperature deposition of transparent diamond films with a
microwave cavity plasma reactor”, 1998, currently with Ford Motor Company.
11. Boonchoat Paosawatyanyoung, “Frequency dependent response of diamond Schottky barrier
diodes to large and small electrical signals”, 1998, currently with the Physics Department,
Chulalongkorn University, Bangkoc, Thailand.
12. Roger Booth, “Polycrystalline Diamond Thin-Film Fabry Perot Optical Resonators on
Silicon”, 2003, currenty with IBM Corporation.
13