GIXRF and XRR characterization of near surface layers D. Ingerle, G. Pepponi1, C. Streli, and P. Wobrauschek Atominstitut, Vienna University of Technology, Stadionallee 2, A-1020 Vienna, Austria 1Fondazione Bruno Kessler, Via Sommarive 18, I-38123 Povo, Trento, Italy Grazing Incidence X-Ray Fluorescence (GIXRF) analysis is a surface sensitive technique able to provide information about the elemental composition, concentration profile / thickness of near surface layers [1-7]. The technique is typically used for the characterisation of impurities or thin film structures in/on semiconductor surfaces. While elemental identification and qualitative evaluation of concentration is relatively straight forward a quantitative approach is only possible with a pre-knowledge about the sample structure. In fact quantitative analysis is typically carried out by fitting experimental data based on the simulation of the fluorescence intensity dependence on the incidence angle of the primary radiation. The physics behind the modelling of the fluorescence involves the calculation of the electric/magnetic field intensity along the depth of the sample and the calculation of the induced fluorescence. This model inherently includes the calculation of the reflected beam as well. Aim of the experiment was thus the simultaneous acquisition of the fluorescence signal and the reflected xray beam which is a measure of the X-Ray Reflectivity (XRR) of the surface. The advantage of this combined approach lies in the complementary information provided by these two techniques. GIXRF is clearly very sensitive to elemental gradients in the surface vicinity, whereas x-ray reflectivity samples the electronic density gradient, and having a much better signal to noise ratio can provide more precise information about film thickness. For the collection of XRR data a Mythen microstrip detector[8] was added to the GI-XRF setup already present at HASYLAB beamline L. This detector was developed for X-ray powder diffraction experiments and consists of 1280 strips each having a width of 50µm. Thus the reflected and diffracted beam can be recorded simultaneously over a large angular range without moving the detector. To test the setup and check the quality of the data obtained, a W/C Multilayer was used. Figure 1 shows a visual representation of X-ray intensities recorded by the Mythen detector. Each horizontal line contains a full readout of the 1280 channels, representing different diffraction angles, and the angle of incidence was varied for each line. Figure 1: Diffraction pattern of a multilayer, horizontal: diffraction angle, vertical: incident angle. The data show very low detector noise in the region where the primary beam was blocked by the sample and the high dynamic range of the system, ranging over more than 5 orders of magnitude. To create an evaluable representation equivalent to a conventional XRR spectrum, pixel along a virtual line corresponding to the theta-2theta condition were summed. The result of this computation is shown in Figure 2. 0 normalized reflectivity [a.u.] 10 measured reflectivity calculated reflectivity −1 10 −2 10 −3 10 −4 10 −5 10 0 5 10 15 20 25 grazing angle [mrad] 30 35 40 Figure 2: Extracted XRR spectrum and calculated data Measurements with the new setup show promising results and the Mythen detector seems to work very well. The data evaluation routine needs further work. References [1] D.K.G. de Boer, Glancing-incidence x-ray fluorescence of layered materials, Physical Review B 44 (1991) 498. [2] H. Schwenke, J. Knoth, L. Fabry, S. Pahlke, R. Scholz, L. Frey, Measurement of Shallow Arsenic Impurity Profiles in Semiconductor Silicon Using Time-of-Flight Secondary Ion Mass Spectrometry and Total Reflection X-Ray Fluorescence Spectrometry, Journal of The Electrochemical Society 144 (1997) 3979-3983. [3] K.N. Stoev, K. Sakurai, Review on grazing incidence X-ray spectrometry and reflectometry, Spectrochimica Acta Part B: Atomic Spectroscopy 54 (1999) 41-82. [4] P. Kregsamer, C. Streli, P. Wobrauschek, H. Gatterbauer, P. Pianetta, L. Palmetshofer, L.L. Brehm, Synchrotron radiation-excited glancing incidence xrf for depth profile and thin-film analysis of light elements, X-Ray Spectrometry 28 (1999) 292-296. [5] G. Pepponi, C. Streli, P. Wobrauschek, N. Zoeger, K. Luening, P. Pianetta, D. Giubertoni, M. Barozzi, M. Bersani, Nondestructive dose determination and depth profiling of arsenic ultrashallow junctions with total reflection X-ray fluorescence analysis compared to dynamic secondary ion mass spectrometry, Spectrochimica Acta Part B: Atomic Spectroscopy 59 (2004) 1243-1249. [6] P. Wobrauschek, Total reflection x-ray fluorescence analysis - a review, X-Ray Spectrometry 36 (2007) 289-300. [7] C. Streli, P. Wobrauschek, L. Fabry, S. Pahlke, F. Comin, R. Barrett, P. Pianetta, K. Lüning, B.Beckhoff, Total-Reflection X-Ray Fluorescence (TXRF) Wafer Analysis, in: B. Beckhoff, B. Kanngießer, N. Langhoff, R. Wedell, H. Wolff (Eds), Handbook of Practical X-Ray Fluorescence Analysis, Springer Verlag, Heidelberg, 2006, pp. 498 - 554. [8] B. Schmitt Ch. Brönnimann, E. F. Eikenberry, F. Gozzo, C. Hörmann, R. Horisberger and B. Patterson, Mythen detector system, Nuclear Instruments and Methods in Physics Research Section A, Volume 501, Issue 1, 21 March 2003, 267-272