SiC Power Devices - Lessons Learned and Prospects After 10 Years of Commercial Availability Peter Friedrichs Infineon AG, Schottky-Str. 10, 91058 Erlangen, Germany, Peter.friedrichs@infineon.com Keywords: SiC, power semiconductors, Diodes, Transistors Abstract The contribution will comment on the role of silicon carbide based power semiconductor devices in industrial electronics with a focus on high power densities and improved efficiency. It will be sketched how the physical properties of SiC can be favorably used in order to minimize volumes of electronic components and/or reduce losses in power electronic systems. Specific device concepts for diodes and transistors with their pro’s and cons will be discussed. A special attention will be given to recent developments in order to further improve the outstanding reliability of SiC components. After a short outlook into the future if high voltage components a final discussion about upcoming application scenarios for modern SiC power devices will be given. semiconductor manufacturing lines are still in operation for 150mm silicon wafers this step will open up a huge potential for further reducing manufacturing costs of SiC devices. e on t s 3 ile 9 M 19 e on t s 7 ile 0 M 20 INTRODUCTION The interest of the power electronics community in modern SiC based power semiconductors is nearly 20 years after the first promising news about this technology stronger than ever. The driving force for the use of SiC in power electronics is the potential benefit to realize low loss and very fast unipolar diodes and switches with blocking voltages from 600 V up to several kV. Efficient solutions and high power densities are the most important benefits in applications. Among other wide band gap semiconductors which theoretically offer comparable features like SiC, silicon carbide has gained an outstanding status regarding base material quality and technological maturity. Nevertheless, one of the main hurdles for a fast market penetration was the SiC crystal size, quality and cost. In 1993 the SiC wafer size was just 1inch in diameter with more than 1000 so called micropipes per cm² (simply holes through the entire wafer). Thus, only very small chips with tiny current ratings could be fabricated by special technology equipment. Now, in 2011, the situation has clearly improved: 100mm wafers with a micropipe density well below 5/cm² are well established (Fig. 1) at substantially reduced area specific wafer costs. 150mm wafers were presented by Cree last year [1] with an outlook for commercial availability in 2012as a next step for reducing the gap to silicon. Since many power Fig.1 Reduction of Micropipes from > 1000/cm² @1“ (1993) to < 5/cm² @ 100mm (2007) commercially available Furthermore, an essential condition for an increased power density will be fulfilled by the availability of power electronic components allowing higher switching frequencies at high blocking voltages. But more important, mainly with respect to the ongoing discussion about greenhouse effects the aspect of energy saving by power electronics becomes a focus point for power electronics and here SiC is an ideal tool to offer efficient solutions by its ability to enable low loss systems. Regarding commercial products, fast SiC Schottky diodes in the voltage range between 300 V and 600 V were introduced on the market 2001 by Infineon (1200V in 2006) for the first time and later by Cree and STM (in 2009) [2]. Because of the virtually zero reverse charge storage of Schottky diodes these diodes are the nearly ideal partner for e.g. the Silicon CoolMOS™ switch in order to fully exploit the high frequency capability of this “pair” in the large growing market of power factor correction in high end power supplies. The higher costs of the new technology are (well) compensated by the reduced size of passive components [3]. This application was a first and important step in order to establish SiC devices power electronics CS MANTECH Conference, May 16th-19th, 2011, Palm Springs, California, USA 301 12 b community. Today, the achievable power ratings are shifted towards higher values and modules for motor drives e.g. are used in power electronics [4]. Also for these applications, the first use will be in combination with powerful silicon IGBT’s. Important key features for a successful use of SiC power semiconductors in industry are cost and reliability considerations. Thus, power devices made from Silicon Carbide should not only be considered on the pure electrical performance data, but on more aspects in order to capture all commercialization issues. How such considerations can be taken into account already while designing the device will be sketched on the example of recently released generations of modern Schottky Barrier diodes. For transistor devices a discussion of pro and con’s of competing concepts (mainly MOSFET and JFET) will be given. Finally the status of high voltage (>3kV) components made by SiC will be given, again connected to a critical view in the existing mission profiles and application opportunities. In the concluding part a few considerations will be made regarding the short and mid term use of SiC power devices. It will be shown how efficiency driven solutions in solar power e.g. are preferred entry markets and first drivers for this technology. Provided that life cycle approaches are taken into account also additional applications can be addressed which on a first glance do not justify higher cost for better efficiency. high reverse bias and thus, from local overstress and device failure. Finally, with respect to the peak power stress discussed above, the pn-parts in the structure will modulate the conductivity in surge mode (when VF exceeds the VBI of the pn-diodes) and thus, can limit the forward voltage drop at high current which will end up with a considerable lower peak power stress [6]. The most recent development of a third generation of SiC SBD’s was strongly connected to the use of advanced packaging technologies. On the one hand it is known that SiC has a very good thermal conductivity and thus, the resulting power losses should be easily removed, however, thermal simulations revealed a strong contribution of the commonly used backside solder process to the overall thermal impedance, acting simply spoken like a wall for the heat flow. New disruptive assembly flows are mandatory to handle this. In the newest generation of Infineon diodes this topic is addressed by avoiding solder layers at all [7]. This technology does not only offer a reduction of the Rth by a factor of 2, but in addition a further limitation of the internal peak temperatures as shown in Fig. 2 what is again beneficial for the long term stability of the device in its package. Conventional solder RECENT GENERATIONS OF SCHOTTKY BARRIER DIODES Driving forces for the current development of next generation SiC Schottky Barrier diodes are mainly improved cost performance ratios and the strategy to show an enhanced reliability compared to competing silicon or even GaN based technologies. Mainly in order to meet the second goal it is important to address the today limiting features regarding stability of the devices taking into account the very high power densities arising from the high current densities of the relatively small SiC chips. This is somehow in contradiction to the demands on reliability since in general it is well known that power densities (and mainly their peak values) should be limited for a high reliability (the resulting power density increases with the square of the current density). For addressing this challenge design improvements can be very beneficial. Examples for diodes are modern diodes with an in-built surge current handling capability by bipolar boosts [5]. In such diodes the active area of the diodes is no longer a pure Schottky contact (metal-n-type semiconductor barrier), but a grid of pnjunctions is introduced which will provide several added values to such a device. Firstly, the metal n-type semiconductor interface can be shielded from high electric field in reverse mode if the design is adapted accordingly. Secondly, stable avalanche conditions can be achieved at the pn-junctions of the device which is an additional reliability feature since it protects a Schottky Barrier diode from too 302 New assebmly 10ms puls Device area 1.95mm² Red : 32A pulse Blue : 42A pulse Fig. 2: Peak temperatures in the devices during pulse current stress, comparison of standard solder assembly and a new solderless solution The lower Rth allows for a higher current handling capability of a given chip-size and thus, also an economical benefit can be worked out by using this new technology. This new packaging technology enables current densities up to 700A/cm² in discrete packaging solutions. Due to the improved material quality also higher power ratings can be addressed successfully today. Examples are the 1200V/600A PrimePACK™ mixed silicon-SiC modules (silicon IGBT and SiC freewheeling diode) introduced by Infineon in 2008 [2] or the first commercial motor drive inverter using SiC devices released by Siemens in 2006 already [4]. CS MANTECH Conference, May 16th-19th, 2011, Palm Springs, California, USA SiC MOSFET Si MOSFET Vg>Vth ID The development of SiC-based switching devices is mainly directed to unipolar switching devices with a clear focus on 1200V blocking voltage. Further trends such as bipolar junction transistor structures, thyristors or GTO’s are under development in different laboratories world-wide (e.g.[8-11]). The following analysis will be concentrated to unipolar power transistors only. Compared to the diodes, the commercial release of SiC power switches is a much more complex issue. Besides technological challenges, the competition with silicon devices needs to be considered. For blocking voltages up to 800V, the silicon MOSFET dominates the market. In addition, the price level of silicon devices is clearly below that estimated for SiC. Due to the smaller chip size, SiC has a smaller input and Miller capacitance, but the crucial parameter for potential applications– the output capacitance is not much different compared to the recent CoolMOS devices [1]. With increasing blocking voltage, the competing Si device is the IGBT since MOSFETs with an Ubr>1000V are rare in silicon. Because the silicon IGBT is able to meet the requirements of the circuit designer today, the chance for SiC to replace the silicon switch quickly is rather low. The potential of SiC devices compared to IGBT’s can be found in hard switched applications with frequencies exceeding about 20kHz or in applications where the threshold voltage (VCEsat) of IGBT’s degrades the partial load efficiency like in modern solar power inverters. However, in general, a much higher price difference compared to the MOSFET considerations made regarding the competition of SiC with MOSFETs must be justified. Unipolar SiC power switching devices under development are predominantly MOSFET type devices and Junction Field Effect Transistors (JFET). Cree recently released first commercial power MOSFETs for 1200V [12]. In contrast to the diodes, these devices offer in addition to the superior dynamics at least theoretically also advantages regarding the static losses. Theoretically means in this sentence that such lower static losses will require quite large active areas and therefore, from a cost point of view, this feature will be difficult to utilize effectively. State of the art SiC MOSFET structures are designed with ultra short channels (e.g. 0.5µm) and thus, very high channel densities [13]. This approach helps to get low specific onresistances despite the poor channel characteristics. Even after using nitrous gases for the passivation of interface traps [14] and thereby improving the performance of SiC MOSFETs considerably, increasing the channel mobility remains the most severe challenge of the SiC MOSFET technology. Fig. 3 illustrates the effect by comparing the transfer and output characteristics of SiC MOSFETs with the target performance of modern silicon power MOSFETs. The poor interface quality in the channel region results in a shallow sub threshold slope. This is also reflected in the output characteristic where the on resistance changes continuously with varying gate voltage. Vg≈Vth Vg<Vth - Si-MOSFET SiC MOSFET VDS Fig. 3: Transfer characteristic (left) and forward conducting I-V behavior (right, output characteristic) of SiC MOSFETs compared to silicon power MOSFETs In JFET based devices the channel region is located in the bulk. JFETs are able to offer very low on-resistances as well and they do not have susceptive interfaces involved in the current flow path. The area specific on-resistance can be much lower compared to unipolar silicon based devices, the ratio is even more in favor of SiC if one considers higher operating temperatures because the temperature coefficient of the on-resistance of SiC FETs is smaller than that of silicon devices (see fig. 4). 0,4 600V CoolMOS NC-1200V JFET 600V LV-JFET 1200V LV-JFET 0,3 R on (O hm ) SIC SWITCHING DEVICES 0,2 0,1 0 0 50 100 150 200 250 300 Temperature (°C) Fig. 4 :Increase of the on-resistance with temperature for different device type like a silicon CoolMOSď››, a normally off SiC VJFET and two types of SiCED’s lateral-vertical channel VJFETs At the moment, the JFET structure is favored for being a first commercial SiC switch by Infineon, the pioneer in offering high performance SiC power semiconductors. Several tests in applications confirmed the outstanding performance [15, 16] of these VJFETs. The simplicity of the structure itself which has only pn-junctions as functional CS MANTECH Conference, May 16th-19th, 2011, Palm Springs, California, USA 303 12 b elements ensures an extremely high ruggedness as proven, for example, by an outstanding cosmic ray resistance [17] and superior avalanche ruggedness [18]. A change of mind is required and it seems to be mandatory to offer together with such a switch a driving concept, preferable based on existing components with slight adaptations. Such solutions are under investigation [19]. In any case, the option to realize a normally off switch using a normally on VJFET is well known as the cascode principle [20] or the recently favored direct driven JFET approach. This solution represents another generic combination of silicon and SiC where both materials are used effectively and with respect to their individual performance advantages (Silicon with an advanced and well developed MOS interface and SiC with ruggedness and high voltage capabilities). level between charge compensated silicon based solutions and the SiC transistors. Entering this huge market would have a dramatic impact on the overall success of WBG power devices; however, the precondition will be to meet the today’s severe cost targets for a given Ron of silicon devices. Additional performance advantages like internal body diode, lower capacitances and higher ruggedness are soft facts which help to promote this technology, however, they probably are not as important as the cost in this market. Finally for the higher blocking voltages, diodes as first commercial components are expected, delivering power ratings like today used in medium voltage inverters by paralleling in modules as already pointed out for the lower blocking voltages. Whether this potential can be fully utilized will be a challenge for the creative people working on the corresponding system architecture. HIGH VOLTAGE DEVICES ACKNOWLEDGEMENTS High voltage (Ubr>3kV) applications seem to be even more attractive for SiC since here the performance advantages compared to the established silicon devices are much higher. However, those applications are limited with respect to the market size and therefore not as attractive for semiconductor manufacturers like the huge 600V or 1200V segment. In addition, a lot of the performance advantages offered by high voltage SiC components like faster switching or higher blocking voltages per chip cannot be used today because of missing peripheral components. For high currents e.g. even today’s silicon IGBT’s are artificially slowed down in order to manage the high di/dt values. For very high blocking voltages per chip today the appropriate packaging technology is a severe challenge, stability of silicon gel as well as partial discharge in ceramics need to be addressed in order to utilize the full benefits of SiC commercially. Progress is made today mainly for high voltage diodes which again can act like their 1200/1700V counterparts as an enabler for improved IGBT performance in high power modules [21]. APPLICATION OUTLOOK AND SUMMARY In summary, the door is open for SiC based wide band gap devices to become important players in the field of power electronics, especially for future applications requiring a high power density and system efficiency. Mainly with respect to the ongoing discussion about greenhouse effects the aspect of energy saving by power electronics becomes more and more important and here WGB components are an ideal tool to offer efficient solutions by its ability to offer low loss systems. Full SiC solution (transistors) in modules probably will cover the range interesting for solar industry with several tens of kW. An interesting competition is expected at the 600V 304 The author would like to acknowledge the contribution to this work offered by the staff of SiCED and the SiC development group of Infineon Technologies as well as the support from Siemens, division Automation and Drives (now Siemens Industry, drive Technology and Industrial Automation). REFERENCES [1] J.W. Palmour, “SiC Power devices for energy efficiency”, presented at ECSCRM2010 in Oslo, to be published by TTP [2] internet presentations of Infineon and Cree and STM [3] R. 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