WB2 10:45 AM – 11:00 AM Equivalent circuit model of a Ge/Si avalanche photodiode Daoxin Dai1, Hui-Wen Chen1, John E. Bowers1, Yimin Kang2, Mike Morse2, Mario J. Paniccia2 1 University of California Santa Barbara, ECE Department, Santa Barbara, CA 93106, USA 2 Intel Corporation, 2200 Mission College Blvd, Santa Clara, CA 95054, USA dxdai@ece.ucsb.edu, bowers@ece.ucsb.edu. Abstract An equivalent circuit model for a separate-absorption-charge-multiplication Ge/Si avalanche photodiode is presented. The current dependence of the resonance frequency scales with square root of current, as expected. Introduction In fiber-optic communication systems, highly sensitive photodetectors are desirable to have long reach in ultra long-haul networks. Additionally, in access networks (like GPON-FTTH systems), low-cost highlysensitive photodetection is essential for short distances (several tens of kilometers) because the optical power is split multiple times before reaching the end users. Hence, avalanche photodetectors (APDs) with their internal gain are a natural choice for such high sensitivity applications. For APDs, the gain-bandwidth product (GBP) is one of the most important figures of merit. For traditional InP-based APD receivers, the GBP is usually about 100 GHz due to the large k value (~0.4-0.5) [1]. In contrast, silicon has a low k-value (<0.1), which makes it one of the most promising candidates for APDs that have both high gain and high bandwidth simultaneously. In order to make Si-APDs available in the infrared regime, a material with a high absorption coefficient in [2] [3-5] the infrared, like InGaAs or Ge is used for the absorption layer along with the Si multiplication layer. Ge is attractive since it is possible to develop an APD based on a complementary metal-oxide-semiconductor (CMOS)-compatible process. Although these APDs tend to have higher dark current because of threading dislocations due to the lattice mismatch between Ge and Si [3], it is possible to minimize their impact with careful processing and device design. In Ref. [3], Kang et al. reported CMOS-compatible Ge/Si APDs with a GBP as high as 340 GHz by using the structure of a separate-absorption-charge-multiplication (SACM). In this paper, we present an equivalent circuit model for this type of SACM Ge/Si APD operated close to breakdown. When the APD is operated close to breakdown, it is possible to have very high GBP due to [6] the space charge effect . The model includes carriertransit time effects and the effect of parasitics. Measurement of the photodetector impedance,S22, is widely used for the characterization and modeling of [7] high-frequency and high-speed devices . From the measured S22 and S21, one could extract the circuit component values for the various elements (R, C, L) in the equivalent circuit. We define the input light as port 1 and the photodetector current output as port 2. In this paper, we combine the measured S22 parameters and extract all the component values at different bias voltages simultaneously. The component values are estimated by fitting using a genetic algorithm, which is suitable for obtaining the optimal solutions for the problems that have multiple-parameters. Based on the extracted circuit model, we calculated the device 978-1-4244-4403-8/09/$25.00 ©2009 IEEE 13 frequency response, S21, which agrees well with the measurement results. Device structures and modeling Fig. 1 (a) shows the cross section of the present normal-incident illuminated Ge/Si SACM APD, which is the same as that in Ref. [3]. The structure consists of a Si multiplication layer, a silicon charge layer, and a Ge absorption layer. The thicknesses and the doping concentrations for all layers are shown in Fig. 1 (b). hv Si3N4 passivation Charge layer Ge absorption layer Si multiplication layer Si n+ -contact layer low-doped Si substrate (a) P-contact: p+ -Ge, 0.1µm, >1020cm-3 Absorption layer:i-Ge, 1µm, 5×1015 cm-3 Charge layer: p-Si, 0.1µm, 2×1017 cm-3 Multiplication layer: i-Si, 0.5µm, 5×1015 cm-3 N-contact: n+-Si, 1µm, >1020cm-3 (b) Fig. 1. (a) Schematic configuration of the Ge/Si SACM APD device; (b) the parameters for the layers. Fig. 2 shows the equivalent circuit of a SACM APD. In the circuit model. The RC input circuit is used to model the transit time of the absorber [8]. The avalanche gain is represented by the source current Iin=gIt (where g is a constant related with the gain of the APD). The part in the dashed rectangle in Fig. 2 represents the equivalent impedance of probe pads and cables. The Ge/Si APD is similar to the impact ionization avalanche transit-time (IMPATT) diode structure. Hence, we use a LC-circuit (LA and CA) for the [9, 11] avalanche region . Here the resistances (RA and Rl) are lossy elements in the avalanche region due to the finite reverse saturation current and field-dependent velocity [11]. Rl is for the leakage of the diode capacitor and RA is the series resistor of the inductor. From modeling of the avalanche process, the inductance is inversely proportional to the current density J0, which will be verified below. The resistance Rd connected to the LC circuit is for the resistance at the drift region. The pad and interconnection line Rs It Ct Rl RA Cp 0.5 Rp RL 0.5 -0.5 -0.5 -1 -1 0 1 -1 -1 0 1 1 (c) Vbias=–26.2V (b) Vbias=–26.0V 0.5 0.5 0 0 -0.5 -0.5 0 1 -1 -1 0 1 Fig. 3. The measured and fitted reflection coefficients of GeSi APD under -14dBm optical illumination (a) Vbias= –26.6V; (b) Vbias= –26.4V; (c) Vbias= –26.2V; (d) Vbias= –26.0V. The avalanche region Fig. 2. The equivalent circuit of the present SCAM APD. Table I Fitted device parameters. Vbias (V) Rd (Ω) R l (Ω) RA(Ω) CA (pF) LA (nH) In order to determine the parameters of the equivalent circuit, first we measured the microwave reflection parameter S22 by using an Agilent E8364A network analyzer. Then all the parameters for the elements included in the equivalent circuit were extracted by fitting the measured S22 with the geneticalgorithm (GA) optimization. In order to obtain more reasonable fitting parameters, here we combine the measured the S22 parameters at a series of inverse bias voltages (e.g., Vbias= –26.6, –26.4, –26.2 and – 26.0V) and extract all the parameters at each bias voltage. At different bias voltages, all the parasitic impedance (Rs ,Cp, Lp, Rp) should be the same while the other parameters will change as the gain changes. Fig. 3 (a)-(d) shows the measured (dotted curves) and fitted (solid curves) S22 parameters with an optical power of –14 dBm at different bias voltages Vbias= –26.6, -26.4, -26.2, and –26V, respectively. The corresponding currents are I=9.66, 8.06, 6.65, 5.36 mA. The diameter of the APD is D=80µm. The fitted results for the Rs, Cp, Lp, and Rp are: Rs =16.76Ω, Cp=0.193Ω, Lp=0.082 Ω, and Rp=6.65 Ω, independent of the bias voltage. The fitted parameters for all other bias-dependent elements are shown in Table I. For the avalanche region, the capacitance C changes very slightly while the inductance decreases as the bias voltage increases (which is due to the variation of current density as theoretically predicted). The products of LA×I are 29.74, 29.78, 29.33, and 29.18 for the case of Vbias= –26.6, -26.4, -26.2, and –26V, respectively. This product is almost constant as the bias voltage varies. This indicates that the inductance LA is almost inversely proportional to the current density, which is similar to the theoretical predicted relationship for an IMPATT diode in Ref. [9]. 978-1-4244-4403-8/09/$25.00 ©2009 IEEE (b) Vbias=–26.4V measured fitted 0 -1 -1 CA L A 1 (a) Vbias=–26.6V 0 1 Rd Iin=gIt Rt Lp 1 –26.6 32.27 557.8 21.06 0.21 3.08 –26.4 34.60 578.9 25.27 0.21 3.69 –26.2 37.33 584.4 30.33 0.21 4.41 –26.0 38.35 650.3 42.68 0.21 5.44 Having the equivalent circuit extracted, we calculate device frequency response. Here we show the results for Vbias= –26.6 and –26.0V as examples in Fig. 4(a) and (b), respectively. Here the parameters for the part of transit-time circuit are: g=150, Rt·Ct =26.0 Ω·pF and the quantum efficiency η is about 0.55 A/W. From this figure, one sees that the simulated curve (dashed) and measured data (circled) agree well with each other. And there is a peakenhancement at a certain frequency, which is similar to that reported in Ref. [10, 12, 13]. Such a peak enhancement is beneficial to increase the bandwidth, but a rise of 3 dB or less doesn’t cause too much eye closure in a digital system. For the present case, the 3dB bandwidth is about 11 GHz, and 9 GHz for Vbias=–26.6 and –26.0V, respectively. Conclusions We have presented the equivalent circuit for a SACM Ge/Si avalanche photodiode. A genetic algorithm has been used to extract the equivalent circuit model based on the measured S22 parameters. In this equivalent circuit, one of the most key elements is the inductance due to the finite buildup time of the avalanche current. It has been shown that this inductance is inversely proportional to the inject current, which is in agreement with the theoretical prediction. With these fitted parameters, we have also calculated the frequency response, which agrees well with the experimental one. 14 15 Response (dB) 10 measured fitted 2. 5 3. 0 -5 4. g=150; Rt·Ct =26.0Ω·pF; -10 -15 -1 10 5. 0 10 f (GHz) 1 10 6. (a) 15 Response (dB) 10 measured fitted 7. 5 8. 0 -5 g=150; Rt·Ct =26.0Ω·pF; 9. -10 -15 -1 10 10. 0 10 f (GHz) 1 10 (b) Fig. 4. The measured and fitted frequency responses when the illuminated optical power P=–14dBm for (a) Vbias= –26.6V; (b) Vbias= –26.0V. 11. 12. Acknowledgement This work was sponsored by the Defense Advanced Research Projects Agency (DARPA) under contract number HR0011-06-3-0009. We thank J. C. Campbell, A. Ramaswamy, H. Kroemer, A. Pauchard and M. Rodwell for useful discussions. 13. References 1. J. C. Campbell, et al. High-speed InP /InGaAsP /InGaAs avalanche photodiodes grown by 978-1-4244-4403-8/09/$25.00 ©2009 IEEE 15 chemical beam epitaxy. IEEE J. of Quan. Elec. 24(1988): 496. A. R. Hawkins, et al. High gain-bandwidthproduct silicon heterointerface photodetector. Appl. Phys. Lett. 70 (1996), 303. Yimin Kang, et al. Monolithic Ge/Si Avalanche Photodiodes with 340GHz Gain-Bandwidth Product. Nature Photon. 3(2009): 59. S. J. Koester, J. D. Schaub, G. 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