part A
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 1
Application of Advanced TEM-techniques
Semiconductors Industry
October 2005
Uwe Mühle
Infineon Technology SC300 GmbH & Co OHG
Physical Failure Analysis
With respect to Infineon DD PFA
Especially TEM- and Preparation Team
Copyright © Infineon Technologies 2005. All rights reserved.
Application of Advanced TEM-techniques in Semiconductors Industry
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 2
Copyright © Infineon Technologies 2005. All rights reserved.
Application of Advanced TEM-techniques in Semiconductors Industry
Reduction of Structural Sizes in Semiconductors Industry
100.00
1 k
10.00
1.00
4 k
16 k
64 k
256 k
1 M
4 M
16 M
64 M
256 M
1 G
0.10
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 3
0.01
1965 1970 1975 1980 1985 1990 1995 2000 2005 2010
Year
Following: www.icknowledge.com
Copyright © Infineon Technologies 2005. All rights reserved.
Application of Advanced TEM-techniques in Semiconductors Industry
Overview Array of a DRAM Memory
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 4
256M = 2.56*10 8
Copyright © Infineon Technologies 2005. All rights reserved.
Application of Advanced TEM-techniques in Semiconductors Industry
Logic Structures in Combination with DRAM-array
Several (until 9) metallisation layers, copper substitutes aluminum
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 5
Copyright © Infineon Technologies 2005. All rights reserved.
Application of Advanced TEM-techniques in Semiconductors Industry
Substrate Surface with
Transistors and Connections
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 6
Copyright © Infineon Technologies 2005. All rights reserved.
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 7
Application of Advanced TEM-techniques in Semiconductors Industry
Demonstration of size reduction
Same magnification applied to different ground rules
Copyright © Infineon Technologies 2005. All rights reserved.
Application of Advanced TEM-techniques in Semiconductors Industry
Comparison to Classical
Material Sciences
Subgrainstructures in deformed steel (U. Martin et al)
Two Transistors in a DRAM-array
(110nm – technology)
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 8
Copyright © Infineon Technologies 2005. All rights reserved.
Application of Advanced TEM-techniques in Semiconductors Industry
Materials Analysis in Semiconductor Industry
Inline - Investigations
• in clean room
• part of production or
• extraordinary
• Continue of process
• special requirements to analytical tool
Accompanying
Investigations
• in laboratory
• wafer leaves the line or
• wafer/die after complete or partial production
Failure Analysis
• in laboratory
• die doesn‘t fit specufications
• intensive electrical characterisation before physical investigations
Application of TEM
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 9
In all cases the requested time to result is short, determining the method!
Copyright © Infineon Technologies 2005. All rights reserved.
Dr. Uwe Muehle
Principal
Infineon Technologies
Dresden, PFA
Page 10
Application of Advanced TEM-techniques in Semiconductors Industry
Accompanying Investigations
-
The results of unit processes and process blocks have to be checked visually.
periodic Tool control
Construction analysis
extraordinary Technological experiments
Etablishment of new processes
These investigations are ususlly provided at a cross section (destroyment of wafer). In special (rising number) cases TEM-observations or other expansive methods (AES, SIMS,...) are requested.
Copyright © Infineon Technologies 2005. All rights reserved.
