AVS Newsletter SPRING 2003 HIGHLIGHTS AVS Launches MyAVS MyAVS is your personal Internet access to the members-only area of the AVS website. Through MyAVS you can update your membership options using the new AVS Association Membership Management System (AMMS). For details turn to page 5. First Woman to Chair Governing Board of the American Institute of Physics Dr. Mildred S. Dresselhaus, in addition to her research accomplishments, awards, mentoring, and 35 years of teaching at MIT, will be the first woman appointed to chair the Governing Board of the American Institute of Physics. To learn more about Dr. Dresselhaus see page 6. Thank You to AVS Voluntary Contributors AVS would like to sincerely thank those of you who have made voluntary contributions to the Society. Your donation is greatly appreciated and will go a long way toward helping us remain healthy and vibrant. For additional information on how to make a contribution, please contact Angela Klink, angela@avs.org. Important Reminder About Your AVS E-mail Address Please log in to MyAVS on the AVS homepage (www.avs.org) to verify or update your e-mail address. Since many important AVS announcements and requests are now distributed electronically (i.e., JVST Online access information, AVS Newsletter, AVS elections, etc.), it is important that you have an up-to-date e-mail address in your account so that you don’t miss out on any AVS news. INSIDE THIS ISSUE President’s Report · · · · · · · · · · · · · · · · · · · · · · · 2 Corporate Membership Listing · · · · · · · · · · · 3 Remembering AVS Members · · · · · · · · · · · · · · 4 General Topics · · · · · · · · · · · · · · · · · · · · · · · · · · 5 First Announcements · · · · · · · · · · · · · · · · · · · · 7 AVS International Symposium· · · · · · · · · · · · · 9 Meetings Calendar · · · · · · · · · · · · · · · · · · · · · · 10 AVS Board Meetings · · · · · · · · · · · · · · · · · · · · · 10 Members in the News · · · · · · · · · · · · · · · · · · · · 11 AVS Newsletter The AVS Newsletter is published quarterly by AVS, 120 Wall St., 32nd Floor, New York, NY 10005-3993, 212-248-0200, fax 212-248-0245, avsnyc@avs.org, www.avs.org, to provide timely information to its membership. Editor John E. Crowell, University of California, San Diego Managing Editor Della Miller, AVS West Newsletter Article and Cover Contributions Each issue we solicit article contributions as well as images. Please send your contributions to Della Miller, AVS West, 1265 El Camino Real, Suite 109, Santa Clara, CA 95050, 408-246- 3600, fax 408-246-7700, newsletter@avs.org. Deadlines are the first of February, May, August, and November. Please provide a Web address when additional information is available on the Web. PRESIDENT’S REPORT By Dawn Bonnell, 2003 AVS President I t is a pleasure and a privilege to be able to welcome you to AVS’ 50th year as your President. The year, and indeed the decade, begins with a number of unique opportunities and challenges. We find ourselves well positioned to address both because of the excellent leadership of Rudy Ludeke in 2002. On his watch we witnessed the institution of E-first publishing, student chapters, web-based short course programs, and a corporate membership category—in spite of fiscal pressures due to the state of the economy. We owe a debt of gratitude to Rudy for his dedicated service. As AVS enters its sixth decade, it is timely to consider the impact of our immediate opportunities and challenges, as well as our longterm vision for the Society. AVS National Staff Opportunities: New Science, New Technology, New People New York Yvonne Towse, Administrative Director, 212-248-0640, yvonne@avs.org Margaret Stringer, Short Courses, 212-248-0326, margaret@avs.org. Keith Mitchell, Information Systems, 212-248-0329, keith@avs.org Angela Klink, Membership/General Information, 212-248-0200, angela@avs.org Peter Burke, Financial Assistant, 212-248-0641, peter@avs.org Steve Barker, Electronic Services Assistant, 212-248-0328 steve@avs.org AVS has a tradition of dynamic evolution that has allowed it to maintain relevance to critical technologies. A recent example is the immediate response to issues of homeland security, which AVS covered in a topical conference in May 2002 and with special sessions in the International Symposia in 2002 and 2003. While other technical societies were establishing committees, we were dealing with issues! It is not yet clear how this topic relates to the mission of AVS, but the timeliness of the discussion is evidence of our spirit of involvement in emerging technologies and of social responsibility. New Divisions California This same spirit has resulted in the continued establishment of new divisions on Magnetic Interfaces and Nanostructures (three years ago) and on Biomaterial Interfaces (this year). Activities in these new divisions are exploiting the opportunity to make scientific impact in these areas and to explore connections to these industry sectors. The new science and engineering is a natural evolution of ongoing activity, but we need to devote new efforts to making the latter connections. Della Miller, Marketing Communications Mgr. Heather Korff, Office Assistant New Technical Groups Ricky Baldeo, Office Assistant, 212-248-0200, ricky@avs.org Office Hours: 8:30 a.m.–5:00 p.m., EST. (Voice mail available during non-business hours.) 1265 El Camino Real, Suite 109 Santa Clara, CA 95050 408-246-3600, della@avs.org Office Hours: 8:30 a.m.–4:30 p.m., PST (Voice mail available during non-business hours.) North Carolina Becky York, 919-361-2787, beck_york@avs.org Estella Stansbury, 919-361-2342, estella@jvst.org Nancy Schultheis, 919-361-2498, sss@jvst.org JVST Editorial Office 10 Park Plaza, Suite 4A Caller Box 13994 Research Triangle Park, NC 27709 Copyright © AVS 2003. All rights reserved. 2 New technical groups have also been established, the most recent on MEMS. At the beginning of this year the Board of Directors will address a proposal for a new group on the Technology of Sustainability. While the field of MEMS evolves from many of our traditional scientific areas, the field of Sustainability represents new avenues of scientific endeavor. Both topics offer opportunities to reach out to new industry sectors. Student Chapters The implementation of a procedure to create student chapters and the outstanding success of the Florida chapter provide a model for engaging the next generation of AVS participants. There is a vast opportunity to expand this constituency, and I reiterate the call to all university-based members to consider activating a chapter. You need only talk with the faculty or students in these chapters to sense the excitement engendered by their participation. AVS Newsletter, Spring 2003 Challenges: It’s the Economy AVS has not been isolated from the impact of the state of the economy. In an environment of corporate restructuring and layoffs, reduction in federal and corporate research budgets, and so forth, it is not surprising that revenues from meeting and short course attendance and advertising are less than in previous years. In addition, the publication industry’s transition to electronic media will not happen without some hiccups (you will hear more about this later in the year). In response, the staff, officers, Board of Directors, and committee chairs have worked very hard to increase efficiency in order to minimize negative impact to activities critical to the mission of AVS. For example, a new database management system has been developed and installed that will improve membership services while significantly reducing annual costs (see page 5 for details). In addition the Board of Directors will streamline its operational procedures, eliminating unnecessary events, relying on electronic communications for some actions, and reducing travel. A new accountability procedure has been implemented to help all groups, divisions, and committees meet their budget goals. Our outreach activities toward internationalization, liaising on federal policy, and education will continue but at a reduced rate. Our goal is to manage this challenge strategically so that we emerge fiscally sound. I entreat all volunteers, conference speakers, short course instructors, and committee members to help us meet our goal. Combined, all of the seemingly small contributions to cost savings make a significant impact! On a positive note, our alignment is with industries that are critical to the global economy and tend to be in the high-growth sectors. I am optimistic that we will be among the first to feel the effects of an improved economy and will be ready to pounce on new opportunities. Celebrating 50 Years! Planning is well under way for the International Symposium in Baltimore, Maryland. Christie Marrian and Terry Michalske have worked with the divisions to organize a program that emphasizes the exciting potential of science and technology in the next 50 years while acknowledging the contributions of the past (see Call for Papers on page 9). The stimulating topics that arise from each of the divisions are a testament to our membership leading the charge. A number of commemorative AVS Newsletter, Spring 2003 events will celebrate our accomplishments. It is going to be one of the most technically exciting and fun meetings of the year! Mark your calendars and plan to be in Baltimore on November 2–7, 2003. The past accomplishments and the excitement of future directions will be documented in a special bound issue of JVST. Fred Dylla and the History Committee have commissioned several articles from each of the divisions and technical groups that will overview the contributions of AVS membership to critical science and technology areas. At the end of the year, the book will be distributed to those who attend the International Symposium and will be available to all members through the AVS store at www.avs.org. Planning the Future: The Sixth Decade We begin the sixth decade in the midst of rapid changes in almost every sphere—the science and technologies that we explore, the manner in which we communicate, the way corporations do business, the missions of federal organizations, etc. It is important to the continued vitality of AVS to anticipate the needs of the membership in order to provide the services it requires. One of my goals for the year is to formulate some mid-range and long-range goals that focus on several key issues that affect our future. Later this year you will hear about planning activities that address AVS in the electronic age, our evolving industry constituency, and dynamic divisions. The vitality of AVS is due, in large part, to the active contributions of volunteers and input of members. I look forward to your comments and suggestions as we plan for the future, facing not only the challenges, but also the opportunities. CORPORATE MEMBERSHIP LISTING A VS wishes to thank the following Corporate Members for their support. Corporate Membership benefits include voting privileges, complimentary subscriptions, recognition, promotional opportunities, short course discounts, etc. n n n n A&N Corporation IGC Polycold Systems, Inc. Jobin Yvon, Inc. VAT, Inc. For more information on the benefits of becoming a Corporate Member, please contact Angela Klink, 212-248-0200, membership@avs.org or visit www.avs.org. 3 REMEMBERING AVS MEMBERS J. Peter Hobson George H. Bancroft By P.A.Redhead eorge Herbert Bancroft, 92, died on February 20, 2003, at his home in Morris, Connecticut. Dr. Bancroft, who was born March 2, 1910, in Halifax, Nova Scotia, Canada, received his bachelor’s and master’s degrees from West Virginia University and his Ph.D. in physics from the University of Pennsylvania. After teaching physics at Hobart College in Geneva, New York, he lived and worked for 21 years in Rochester, New York, gradually concentrating on research in high vacuum technology and techniques. The company he was with was eventually acquired by the Bendix Corporation (now Honeywell) with whom he worked as Director of Research in Bettendorf, Iowa, and Kansas City, Kansas, retiring in 1975. He and his wife moved to their home on Byrnes Avenue in Litchfield in 1979. His wife of 49 years, Mercedes W. Bancroft, died in 1989, and he moved in 1997 to the home of his daughter and son-in-law in Morris. Dr. Bancroft served as AVS President in 1965, as AVS Program Chair from 1961–1963, and as Vacuum Technology Division Chair from 1970–1971. He was a member and deacon of the First Congregational Church of Litchfield. He is survived by his daughter and son-in-law, Susan and Philip Bergan, of New York City and Morris, Connecticut, and by two grandsons, David Bergan of New York City and Jeffrey Bergan of San Francisco. He was predeceased by his son, Malcolm, of Ibiza, Spain. A memorial service will be held in late April. In lieu of flowers, the family suggests that contributions be made to the Meetinghouse Preservation Fund of the First Congregational Church of Litchfield or to the Hospice at Home Program of the Visiting Nurse Services of Connecticut, Inc., Torrington, Connecticut. D r. J. Peter Hobson died suddenly at home on February17, 2003, at the age of 78. He had served the AVS since the 1950s with great distinction in many roles. He was largely responsible for forming the Surface Science Division and was its first chair from 1968–1970. He was Future Symposia Sites Chair in 1967–1968, and a Director from 1979–1981. He received several honors from the AVS. He was made an Honorary Member of the AVS in 1983, won the Albert Nerken Award in 1990, and was made a Fellow of the Society in 1993. For the IUVSTA he was Administrator of the Medard M. Welch Scholarship from 1980–1986. Peter Hobson graduated from the University of British Columbia in Vancouver in 1954 and obtained his Ph.D. from the University of California, Berkeley, in 1954. He worked for the National Research Council (NRC) of Canada from 1954 until his retirement in 1986. His major field of research was vacuum science and, in particular, physical adsorption; his work on the physical adsorption isotherms of He and N2 over 13 orders of magnitude in pressure will remain his outstanding achievement. He published more than 80 scientific papers and was a co-author of the book The Physical Basis of Ultrahigh Vacuum published in 1968 and republished as an AVS Classic of Vacuum Science and Technology in 1993. After retirement from NRC, he established National Vacuum Technologies Inc., a consulting company with which he was active until his death. He will also be remembered by attendees at AVS Symposia for his active participation, together with his wife, Isabel, in the annual AVS Runs (they kept up their running habits until two years ago). 4 G AVS Newsletter, Spring 2003 GENERAL TOPICS Introducing MyAVS Your Personal Access to the New Members-Only Area of the AVS Website Web www.avs.org By Anne Testoni, AVS Membership Chair T he AVS is pleased to announce MyAVS, your personal Internet access to the members-only website. MyAVS acts as the interface to the Society’s new Association Membership Management System (AMMS) and allows you to select and update your AVS membership. Through MyAVS you can: n n n n n Update and expand your personal contact information, including m Multiple addresses for directing mailed information m Home, office, fax, cell, and other phone numbers m Multiple e-mail addresses and personal websites Select your preferred methods for receiving AVS communications m Don’t want electronic mail from us? Only want certain types of messages? Just select your preferences. m Prefer to have an alternate e-mail address for different communications? Just select your preferences. Change your chapter, division, and technical group selections Search the membership database (but please read and follow the AVS privacy policy!) Renew your membership and select your journals, through secure online credit card transactions Simple and Easy to Use If you have provided an active electronic mail address to AVS, you should have received your personal username (currently your AVS membership number) and initial password. With this information, logging in to MyAVS is simple. On the AVS homepage, www.avs.org, click the link for MyAVS. The following pop-up window displays: AVS Newsletter, Spring 2003 Type in the username and password and click the log in icon. The pop-up screen disappears and sends you to your personal MyAVS. Each page provides an overview of the available features. You can also provide feedback if you have problems or want to suggest improvements or new features for MyAVS. You can personalize your password in the Edit My Profile section of MyAVS. Enter this section of the website by clicking on the icon. When your personal information appears, select the Login tab. Type in a new password, and then click the Save & Continue icon. To ensure a stable introduction of the AMMS, usernames cannot be changed at this time. We expect that personalized usernames will be available within the next few months—watch for announcements by electronic mail and on the AVS website. More Benefits Soon This is just the beginning of new benefits and features that the AVS will provide in the coming months. Visit the AVS website and MyAVS frequently to check for exciting changes and innovations. Questions? Comments? Suggestions? Use the feedback button to send us your ideas or send an e-mail to anne_testoni@ avs.org. Didn’t receive your username and password? Angela Klink will be happy to assist you. Contact her at 212-248-0200, membership@ avs.org. 5 2002 ISEF VTD Award Winners T he 53rd International Science and Engineering Fair was held in Louisville, Kentucky May 12–18, 2002. Its 1,259 finalists were winners of affiliated fairs held in 45 states, the District of Columbia, American Samoa, U.S. Virgin Islands, and Puerto Rico, as well as finalists from science fairs held in 37 other countries. Several million dollars in cash and scholarships were awarded to Intel Category prize winners, and winners of special awards from U.S. government, industry, universities, and organizations such as the AVS Vacuum Technology Division (VTD). This year’s VTD First Award winner was the team of Erin Jennings, Mat Leonard, and Zach Parvin from Garland High School, Garland, Texas. This team built and tested a working model of a magnetoplasmadynamic propulsion system using an argon plasma and controlled its flow. The students clearly explained its physics and understood its underlying vacuum technique. Their supervisor was Garland High School physics teacher Richard Lines. The Second Award winner was Rachel Rosenberg of The South Carolina Governor’s School for Math and Science, Hartsville, South Carolina. Rachel conducted plasma experiments on NASA’s Inertial Electrostatic Confinement chamber. In the chamber, highly energized plasmas of hydrogen, deuterium, and argon can be created and studied. Rachel compared the output/input energy ratio of deuterium to other gases. Her supervisor was physics teacher Dr. Clyde Smith. Each year, the VTD presents up to three awards. Students and their advisors each receive a cash award and a vacuum textbook; 2002 ISEF VTD/AVS Award Winners (l to r) Professor John O’Hanlon, Erin Jennings, Mat Leonard, Rachel Rosenberg, and Zach Parvin 6 their school’s science department receives a cash award for the enhancement of their science program. This year’s judges were Douglas Baker of Teledyne Instruments and John O’Hanlon of the University of Arizona. Next year’s fair will be held May 11–17, 2003, in Cleveland, Ohio. MIT Professor Will Be the First Woman to Chair Governing Board of the American Institute of Physics I n the U.S., men are still more likely than women to choose a career in science, but Dr. Mildred S. Dresselhaus continues a career in physics distinguished for research accomplishments and her commitment to mentoring young scientists. Now Professor Dresselhaus has been chosen as the first woman to chair the governing board of the American Institute of Physics (AIP). For Dr. Dresselhaus, leading the AIP board is another accomplishment in a long career that includes winning the National Medal of Science, directing the Office of Science at the U.S. Department of Energy, and 35 years of teaching and research at the Massachusetts Institute of Technology. “AIP is important to me and to all physicists. I am very much looking forward to this new opportunity to serve the physics community,” Dresselhaus says. “As I get into the job, I hopefully can find areas where I can have special impact. My experiences all give me some perspective that should help me in this new position.” As an educator, Dr. Dresselhaus is known for mentoring dozens of women—as well as men—down the difficult road to physics Ph.Ds. She received her own Ph.D. in physics from the University of Chicago in 1958. Since then, colleagues have recognized her work with 17 honorary doctorates. Professor Dresselhaus’s work in physics has produced key breakthroughs in understanding carbon nanotubes—atom-thin walls of carbon that promise unprecedented high-strength materials. The MIT professor also has extensive experience as a leader of scientific societies. She has served as President of the American Physical Society (APS), Treasurer of the National Academy of Sciences (NAS), President of the American Association for the Advancement of Science (AAAS), and on numerous advisory committees and councils. “I look forward to working with Millie to continue to increase the effectiveness of AIP in serving its ten Member Societies and their 125,000 individual members,” said Marc H. Brodsky, Executive Director and CEO of AIP. “She brings experience in society affairs, having served in leadership positions in APS, AAAS, and other societies as well as high-level positions in government and academic circles.” Dresselhaus will succeed John A. Armstrong, who is stepping down as Chair after five years. When he took the position in 1998, Armstrong announced he would follow the recent tradition of AIP Chairs to serve no longer than five years. AVS Newsletter, Spring 2003 FIRST ANNOUNCEMENTS— CONFERENCES/MEETINGS Ultra Shallow Junctions (USJ 2003) Exhibition April 27–May 1, 2003 Chaminade Conference Center Santa Cruz, California An exhibition of products relevant to ion implantation, RTP processing, and USJ characterization will be featured. The technical program will include scheduled visits to the exhibition, where refreshments will be provided. Web http://www.avs.org/conferences/usj/overview.html Y ou are invited to participate in the Seventh International Workshop on the Fabrication, Characterization, and Modeling of Ultra Shallow Doping Profiles in Semiconductors (USJ 2003). The first goal of the workshop is to provide an international forum for a thorough and broad-ranging discussion of the new ideas in ultra-shallow junction formation and techniques for measurement and modeling of the one- and two-dimensional aspects of ultra-shallow junctions, primarily in silicon devices. The second goal is to establish a dialogue between device designers; equipment manufacturers; and characterization, modeling, and TCAD engineers, to review the current and future needs for shallow junctions, manufacturing tool capabilities, as well as recent advancements of the analytical characterization techniques. The workshop consists of invited review papers, contributed papers (in both oral and poster formats), and focused topical discussions. The topics of this workshop are n n n n n n n Process and New Ideas in USJ Fabrication Sputter Depth Profiling 1-D and 2-D Dopant Characterization Electron Holography and Novel Methods Dopant Profiling at the Limit Diffusion Defects We encourage the participation of device designers who are developing advanced technologies where doping control is critical. This forum provides a review of techniques that probe atomic composition and electrical activation of ultra-shallow junctions. Additional discussions will review the status of techniques for analysis of lattice damage profiles and analytical models that relate dopant distributions to enhanced dopant diffusion from the production of point defects. AVS Newsletter, Spring 2003 For more information, please contact AVS West, 408-246-3600, fax 408-246-7700, della@avs.org, http://www.avs.org/conferences/ usj/overview.html. NY-TECH TRANS 2003 Symposium for Vacuum and Coating Technology Transfer May 19, 2003 Rochester Riverside Convention Center Rochester, New York Web www.unyvac.org T his one-day symposium is being hosted by the AVS Upstate New York Chapter (UNY-VAC) and is collocated with the SPIE/APOMA’s OPTIFAB 2003 Conference. The following technical session talks are already scheduled: n n n n n n n “What Every Engineer Should Know About Tech Transfer,” Frederick A. Provorny, Harold R. Tyler Professor of Law and Director of the Science and Technology Law Center, Albany Law School. “Bringing a Radical Innovation to the Precision Optics Market,” Paul Dumas, QED Technologies, Inc. “Design of Phase-Controlled Coatings to Correct Skew-Ray Depolarization in Projectors,” Alan E. Rosenbluth, Minhua Lu, Kenneth Ho, Rama N. Singh, IBM T.J. Watson Research Center “High Performance Optical Thin Filters Get Tough,” Turan Erdogan, Semrock, Inc. “The Grating Electromechanical System (GEMS) Device: From Micro-Ribbons to Imaging Systems,” Marek W. Kowarz and John C. Brazas, Eastman Kodak Company “Magnetic Material Deposition,” Dr. Santosh Kurnic, Rochester Institute of Technology, Rochester, NY “Infotonics Technology Center: Status and Capabilities,” William Hawkins and Donald Keck, Infotonics In addition, three short courses are also planned, as follows: Understanding Optical Coatings, Introduction to Ion Beam Coating Deposition Techniques, and Helium Leak Detection. For more information, please refer to www.unyvac.org. 7 Surface Analysis 2003 June 3–6, 2003 University of Illinois Urbana-Champaign, Illinois Web http://cmm.mrl.uiuc.edu/SA03/index.html T he 25th Annual Symposium on Applied Surface Analysis will provide a forum for scientists in all disciplines to discuss advances in surface analysis techniques and their application to thin films, semiconductors, composites, ceramics, polymers, biomaterials, catalysts, tribology, adhesion, and other material systems. The symposium will consist of invited papers, contributed papers, and posters, and an equipment exhibition. Invited talks will include n Robert S. Averback, University of Illinois at Urbana-Champaign, “Physics of Ion/Solid Interaction” n Sam Bader, Argonne National Laboratory “The Quest for Magnetic Electronics” n Charles (Drew) Evans, Evans Analytical Group “SIMS/Industrial Applications of Surface Analysis” n Andrew G. Ewing and Sara G. Ostrowski, Penn State University, “Static SIMS Imaging of Liposomes and Cells” n Steve Granick, University of Illinois at Urbana-Champaign, “In Situ Studies of Buried Soft Interfaces” n Joe Greene, University of Illinois at Urbana-Champaign, “Atomistics of Thin Film Growth”* n Luke Hanley, University of Illinois at Chicago, “Surface Modification/ Biocompatible Materials” n Paul Holloway, University of Florida, “Ohmic Electrical Contacts to Compound Semiconductors” n Joseph W. Lyding, University of Illinois at Urbana-Champaign, “Atomic Scale Fabrication and Characterization on Silicon Surfaces” n Theodore E. Madey, Rutgers University, “Flexible Metal Surfaces—Nanoscale Faceting Induced by Overlayers”* n Ralph G. Nuzzo, University of Illinois at Urbana-Champaign n Jörg Patscheider, EMPA Surface and Joining Technology, “Industrial Applications of Thin Films” n Cedric J. Powell, National Institute of Standards and Technology, “Applications of NIST Databases for Surface Analysis by AES and XPS” 8 n n n n n n n Ian Robinson, University of Illinois at Urbana-Champaign, “Surface X-ray Diffraction” Miquel Salmeron, Lawrence Berkeley National Laboratory, “Scanning Probe Imaging and Spectroscopy: Tunneling, Forces and Nanoscale Manipulation” Brian Tonner, University of Central Florida, “Nanostructures, X-ray Microscopy, Ultra-Thin Films, Surface Interface Physics” Sven Tougaard, University of Southern Denmark, “Quantitative Analysis of Surface Nanostructures by XPS” John H. Weaver, University of Illinois at Urbana-Champaign, “Dynamics of High Temperature Etching of Silicon: Direct Imaging with STM”* Peter Williams, Arizona State University, “SIMS” Jian-Min Zuo, University of Illinois at Urbana-Champaign, “Quantitative Electron Microscopy Analysis of Early Stage Thin Film Growth” * AVS Distinguished Lecturer For more information, please contact I. Petrov, Conference Chair, 217-333-8396, fax 217-244-2278, sa03@mrl.uiuc.edu, http://cmm.mrl.uiuc.edu/SA03/index.html Functional Coatings and Surface Engineering Symposium June 4–6, 2003 Universite de Montreal Montreal, Canada Web www.unyvac.org T his symposium will feature keynote lectures and invited presentations, original oral and poster presentations, awards for the best student poster presentations (UNY-VAC and GCM prizes), vendor exhibits of equipment and services, a workshop on new characterization techniques, and visits to the facilities of the Thin Film Research Center (GCM). The following topics will be covered at a variety of technical sessions: n n n n n n Coatings for optics, photonics, optoelectronics, and imaging Engineered tribological and protective coatings Coatings and films for micro- and nanoelectronics New processes and materials Process control and monitoring Advances in characterization methods Partial List of Invited Speakers n n n n n n n n Claude Amra, Institut Fresnel Mohamed Chaker, INRS David Glocker, Isoflux, Inc. Peter M. Martin, Pacific Northwest National Laboratory Sjoerd Roorda, Université de Montréal William Sproul, AVS Distinguished Lecturer, Advanced Energy Brian Sullivan, Iridian Technologies Arthur Yelon, École Polytechnique For m ore inform ation, c all 514-340-4099 or e- mai l lmartinu@mail.polymtl.ca, www.unyvac.org. AVS Newsletter, Spring 2003 ALD 2003 August 4–6, 2003 DoubleTree Hotel San Jose, California Web http://www.avs.org/conferences/ald2003 T he Atomic Layer Deposition Conference (ALD 2003) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films. Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or submonolayer thickness regime. ALD is receiving attention for its potential applications in advanced high dielectric constant (high-k) gate oxides, storage capacitor dielectrics, and copper diffusion barriers in advanced electronic devices. It is also of interest in any advanced application that benefits from control of film structure in the nanometer or subnanometer scale. Abstract Deadline: May 16, 2003 For abstract submission guidelines, please visit http://www.avs.org/conferences/ ald2003. For more information, please contact AVS West, 408-246-3600, fax 408-246-7700, dell a @ a v s.o rg , http:/ /www.avs.org/ conferences/ald2003. development, isotopic measurements, and related techniques. Sessions will provide a forum for reporting new results and sharing practical information about SIMS as well as providing an informal atmosphere to encourage extended discussions. Both oral and poster sessions are planned as well as topical symposia and workshops on a variety of topics. All participants are invited to submit an abstract of work to be presented at the conference. Your abstract should emphasize the originality of the work. The work must be unpublished at the time of the conference. For more information, please contact AVS, 408-246-3600, fax 408-246-7700, della@avs.org. AVS 50TH INTERNATIONAL SYMPOSIUM Call for Papers November 2–7, 2003 Baltimore Convention Center Baltimore, Maryland Web www.avs.org n n n n n n n n n n n SIMS XIV n September 14–19, 2003 Sheraton San Diego Hotel and Marina San Diego, California Web www.avsusergroups.org/simsxiv/ n n n n n n T he 14th International Conference on Secondary Ion Mass Spectrometry (SIMS XIV) is the premier international forum on the most recent developments in secondary ion mass spectrometry (SIMS). More than 400 attendees are expected for the upcoming meeting. The conference will cover all aspects of the technique, including fundamentals, quantification, instrumentation, organic and biological analysis, depth profiling, semiconductor characterization, metals, geology, imaging, TOF SIMS, standards AVS Newsletter, Spring 2003 n Advanced Surface Engineering Applied Surface Analysis Biomaterial Interfaces Electrochemistry and Fluid-Solid Interfaces Electronic Materials and Devices Magnetic Interfaces and Nanostructures Manufacturing Science and Technology MicroElectroMechanical Systems (MEMS) Nanometer Structures Nanotubes Organic Films and Devices Photonic Materials and Devices Plasma Science and Technology Processing at the Nanoscale Semiconductors Surface Science Technology and Sustainability Thin Films Vacuum Technology Topical Conference Topics n n n n n Contacts to Organic Materials High-k Dielectrics and Devices Homeland Security Ion Beam Sputtering Quantitative Surface Analysis Abstract Deadlines n n Paper/Fax: April 28, 2003, 5:00 p.m. (EDT) E-mail: May 5, 2003, 11:00 p.m. (EDT) 9 MEETINGS CALENDAR New entries are highlighted in color for easy identification. AUGUST 2003 4–6 Atomic Layer Deposition 2003, San Jose, CA, USA. AVS West, 1265 El Camino Real, Ste. 109, Santa Clara, CA, USA, 408-246-3600, fax 408-246-7700, della@avs.org. 18–22 11th Canadian Semiconductor Technology Conference, Ottawa, Ontario, Canada. Frank Shepherd, Chair, Dept 5C13, Nortel Technologies, P.O. Box 3511 Stn. C, Ottawa ON K1Y 4H7 Canada, 613-763-3285, frsims@nortelnetworks.com. APRIL 2003 28–5/2 ICMCTF 2003, San Diego, CA, USA. Mary Gray, ICMCTF, 14001-C Saint Germain Dr., Ste. 136, Centerville, VA 20120, 703-266-3287, fax 703-968-8877, icmctf@mindspring.com, www.avs.org/ icmctf. 30–5/3 Joint AVS/SFB Symposium on Biomaterial Interfaces, Reno, NV, USA. James J. Hickman, Conference Chair, 420 Rhodes Research Center, Clemson University, Clemson, SC 29634. 864-656-7168, fax 864-656-4466, hickman@clemson.edu. MAY 2003 19 27–30 25–29 Upstate New York Chapter NY-TECH TRANS 2003 Symposium, Rochester, NY, USA. www.unyvac.org. 47th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2003), Tampa, FL, USA. Timothy R. Groves, Conference Chair, Leica Microsystems, Goschwiszerstr. 25, Jena 07745, Germany, 011-49-3641-651938, fax 0 11 - 4 9 - 3 6 4 1 - 6 5 1 9 2 2 , t i m o t h y. g r o v e s @leica-microsystems.com. 38th IUVSTA Electronic Processes and Sensing Conference, Eilat, Israel. Sidney Cohen, Conference Chair, Perlman Bldg., Weizmann Institute of Science, Rehovot 76100, Israel. Phone: 972-8-934 2703, sidney.cohen@ weizmann.ac.il. JUNE 2003 3–6 4–6 23–27 21–25 14–19 14th International Conference on Secondary Ion Mass Spectrometry (SIMS XIV), San Diego, CA, USA. AVS West, 1265 El Camino Real, Ste. 109, Santa Clara, CA, USA, 408-246-3600, della@avs.org. 15–18 37th IUVSTA Workshop on the Plasma Deposition of Advanced Materials, Kerkrade, The Netherlands. John Caughman, Conference Chair, Oak Ridge National Laboratory, P.O. Box 2009, MS 8071, Oak Ridge, TN 37831-8071, 865-574-5131, caughmanjb@ornl.gov. 29–10/2 2003 North American Conference on Molecular Beam Epitaxy, Keystone, CO, USA. Richard Mirin, Conference Chair, NIST, 325 Broadway, Boulder, CO, 80305, 303-497-7955, mirin@boulder.nist.gov. OCTOBER 2003 5–10 Tenth European Conference on Applications of Surface and Interface Analysis (ECASIA 2003), Berlin, Germany. Dr. W.E.S. Unger, Bundesanstalt fuer Materialforschung und-prufing (BAM), Unter den Eichen 44-46, Berlin, 12200, Germany, 011-49-30-104-1823, wolfgang.unger@bam.de, www.bam.de/ecasia03.htm. NOVEMBER 2003 2 Sputtering Workshop, Baltimore, MD, USA. Bill Sproul, Advanced Energy Industries, 1625 Sharp Point Drive, Ft. Collins CO, 80525, 970-407-6132, bill.sproul@aei.com. 3 Tenth Topical Conference on Quantitative Surface Analysis, Baltimore, MD, USA. Cedric J. Powell, NIST, 100 Bureau Drive, M/S 8370, Gaithersburg, MD 20899-8370, 301-975-2534, cedric.powell@nist.gov. 2–7 AVS 50th International Symposium (Technical Programs, Topical Conferences, Short Courses, and Equipment Exhibition), Baltimore, MD, USA. AVS, 212-248-0200, avsnyc@avs.org, www.avs.org. APRIL 2004 Surface Analysis 2003, 25th Annual Symposium on Applied Surface Analysis (AVS Short Courses), Urbana, IL, USA. Ivan Petrov, Chair, University of Illinois, 217-333-8396, fax 217-244-2278, petrov@uiuc.edu. Symposium on Functional Coatings and Surface Engineering, Montreal, Canada. www.unyuvac.org. 39th IUVSTA Workshop on Ultrafast Surface Dynamics, Telluride, CO, USA. Xiaoyang Zhu, University of Minnesota, z h u @ c h e m , u m n . e d u , w w w. c h e m . umn.edu/USD. JULY 2003 7–11 SEPTEMBER 2003 International Vacuum Microelectronics Conference 2003, Osaka, Japan. Mikio Takai, O s a k a U n i v e r s i t y, 8 1 - 6 - 6 8 5 0 - 6 6 9 3 , takai@rcem.osaka-u.ac.jp. 12th International Conference on Scanning Tunneling Microscopy, Eindhoven, The Netherlands. Paul M. Koenraad, p.m.koenraad@ tue.nl. 19–23 NOVEMBER 2004 15–19 AVS 51st International Symposium (Technical Programs, Topical Conferences, Short Courses, and Equipment Exhibition), Anaheim, CA, USA. AVS BOARD MEETINGS 2003 n n n 10 ICMCTF 2004, San Diego, CA, USA. Mary Gray, ICMCTF, 14001-C Saint Germain Dr., Ste. 136, Centerville, VA 20120, 703-266-3287, fax 703-968-8877, icmctf@mindspring.com, www.avs.org/icmctf. May 18, 2003—Minneapolis, Minnesota, in conjunction with the Minnesota Chapter Symposium November 2, 2003—Baltimore, Maryland, in conjunction with the AVS International Symposium December 7, 2003—New York, New York AVS Newsletter, Spring 2003 MEMBERS IN THE NEWS Professor Joe Greene Elected to the National Academy of Engineering T he National Academy of Engineering (NAE) announced that Professor Joe Greene has been elected a member for “pioneering studies in the synthesis and characterization of epitaxial and highly ordered polycrystalline materials.” Joe Greene is the Director of the Frederick Seitz Materials Research Laboratory and the D.B. Willett Professor of Materials Science at the University of Illinois and the Tage Erlander Professor of Materials Physics at Linköping University, Sweden. The focus of his research has been the development of an atomic-level understanding of adatom/surface interactions during the dynamic process of vapor-phase crystal growth to controllably manipulate microchemistry, microstructure, and, hence, physical properties. His work has involved film growth by all forms of sputter deposition, solid and gas-source MBE, UHV-CVD, MOCVD, and ALE. He is currently Editor-in-Chief of Thin Solid Films and past Editor of CRC Critical Reviews in Solid State and Materials Sciences. He is active in the AVS where he has served on the Trustees, as Chair of the Thin Film Division, twice as a member of the Board of Directors, as President of the Society in 1989, and is currently Secretary. He has served on the Governing Board of the American Institute of Physics, is currently Education Chair of the International Union of Vacuum Science and Techniques, and is serving on the Executive Committee of the APS Division of Materials Physics. Some of his other major awards include n n n n n n n n 1998 David Adler Award in Materials Physics from the American Physical Society for “outstanding research and lecturing on the physics and chemistry of thin films Fellow of the APS (1998) for “original contributions to the experimental development, modeling, and understanding of Si, Ge, and Si1-xGex atomic-layer epitaxy and gas-source molecular-beam epitaxy” David Turnbull Award, MRS (1999), for “contributions to the use of non-thermal methods in the growth of thin films and the engineering of their phase, composition and microstructure; and for excellence in teaching and writing” 2001 International Scientist of the Year for “contributions to thin film science,” International Biographical Center, Cambridge, UK. Elected to the European Academy of Science, 2002. AVS John Thornton Award (1991) for “outstanding research in thin films” Tage Erlander Award (1991) from the Swedish Natural Science Research Council for “contributions to the physics and chemistry of thin films” AVS Fellow (1993) for “outstanding research in thin film science with emphasis on the use of ion/surface interactions and photo-induced reactions to controllably alter film nucleation and growth kinetics” AVS Newsletter, Spring 2003 11