AVS Newsletter
SPRING 2003 HIGHLIGHTS
AVS Launches MyAVS
MyAVS is your personal Internet access to the members-only area of the AVS website. Through MyAVS you
can update your membership options using the new AVS
Association Membership Management System (AMMS).
For details turn to page 5.
First Woman to Chair Governing Board
of the American Institute of Physics
Dr. Mildred S. Dresselhaus, in addition to her research accomplishments, awards, mentoring, and 35 years of teaching at MIT, will be the first woman appointed to chair the
Governing Board of the American Institute of Physics. To
learn more about Dr. Dresselhaus see page 6.
Thank You to AVS Voluntary Contributors
AVS would like to sincerely thank those of you who have
made voluntary contributions to the Society. Your donation
is greatly appreciated and will go a long way toward helping us remain healthy and vibrant. For additional information on how to make a contribution, please contact Angela
Klink, angela@avs.org.
Important Reminder About Your
AVS E-mail Address
Please log in to MyAVS on the AVS
homepage (www.avs.org) to verify or
update your e-mail address. Since many
important AVS announcements and requests are now distributed electronically (i.e., JVST Online access information, AVS Newsletter, AVS elections,
etc.), it is important that you have an
up-to-date e-mail address in your account so that you don’t miss out on any
AVS news.
INSIDE THIS ISSUE
President’s Report · · · · · · · · · · · · · · · · · · · · · · · 2
Corporate Membership Listing · · · · · · · · · · · 3
Remembering AVS Members · · · · · · · · · · · · · · 4
General Topics · · · · · · · · · · · · · · · · · · · · · · · · · · 5
First Announcements · · · · · · · · · · · · · · · · · · · · 7
AVS International Symposium· · · · · · · · · · · · · 9
Meetings Calendar · · · · · · · · · · · · · · · · · · · · · · 10
AVS Board Meetings · · · · · · · · · · · · · · · · · · · · · 10
Members in the News · · · · · · · · · · · · · · · · · · · · 11
AVS Newsletter
The AVS Newsletter is published quarterly by
AVS, 120 Wall St., 32nd Floor, New York, NY
10005-3993, 212-248-0200, fax 212-248-0245,
avsnyc@avs.org, www.avs.org, to provide timely
information to its membership.
Editor
John E. Crowell,
University of California, San Diego
Managing Editor
Della Miller, AVS West
Newsletter Article and Cover Contributions
Each issue we solicit article contributions as well
as images. Please send your contributions to
Della Miller, AVS West, 1265 El Camino Real,
Suite 109, Santa Clara, CA 95050, 408-246- 3600,
fax 408-246-7700, newsletter@avs.org. Deadlines
are the first of February, May, August, and November. Please provide a Web address when additional information is available on the Web.
PRESIDENT’S REPORT
By Dawn Bonnell, 2003 AVS President
I
t is a pleasure and a privilege to be able to
welcome you to AVS’ 50th year as your
President. The year, and indeed the decade, begins with a number of unique opportunities and
challenges. We find ourselves well positioned
to address both because of the excellent leadership of Rudy Ludeke in 2002. On his watch we
witnessed the institution of E-first publishing,
student chapters, web-based short course programs, and a corporate
membership category—in spite of fiscal pressures due to the state of
the economy. We owe a debt of gratitude to Rudy for his dedicated
service.
As AVS enters its sixth decade, it is timely to consider the impact
of our immediate opportunities and challenges, as well as our
longterm vision for the Society.
AVS National Staff
Opportunities: New Science, New Technology, New People
New York
Yvonne Towse, Administrative Director,
212-248-0640, yvonne@avs.org
Margaret Stringer, Short Courses,
212-248-0326, margaret@avs.org.
Keith Mitchell, Information Systems,
212-248-0329, keith@avs.org
Angela Klink, Membership/General Information,
212-248-0200, angela@avs.org
Peter Burke, Financial Assistant,
212-248-0641, peter@avs.org
Steve Barker, Electronic Services Assistant,
212-248-0328 steve@avs.org
AVS has a tradition of dynamic evolution that has allowed it to
maintain relevance to critical technologies. A recent example is the
immediate response to issues of homeland security, which AVS
covered in a topical conference in May 2002 and with special sessions in the International Symposia in 2002 and 2003. While other
technical societies were establishing committees, we were dealing
with issues! It is not yet clear how this topic relates to the mission of
AVS, but the timeliness of the discussion is evidence of our spirit of
involvement in emerging technologies and of social responsibility.
New Divisions
California
This same spirit has resulted in the continued establishment of new divisions on Magnetic Interfaces and Nanostructures (three years ago)
and on Biomaterial Interfaces (this year). Activities in these new divisions are exploiting the opportunity to make scientific impact in these
areas and to explore connections to these industry sectors. The new science and engineering is a natural evolution of ongoing activity, but we
need to devote new efforts to making the latter connections.
Della Miller, Marketing Communications Mgr.
Heather Korff, Office Assistant
New Technical Groups
Ricky Baldeo, Office Assistant,
212-248-0200, ricky@avs.org
Office Hours: 8:30 a.m.–5:00 p.m., EST.
(Voice mail available during non-business hours.)
1265 El Camino Real, Suite 109
Santa Clara, CA 95050
408-246-3600, della@avs.org
Office Hours: 8:30 a.m.–4:30 p.m., PST
(Voice mail available during non-business hours.)
North Carolina
Becky York, 919-361-2787, beck_york@avs.org
Estella Stansbury, 919-361-2342, estella@jvst.org
Nancy Schultheis, 919-361-2498, sss@jvst.org
JVST Editorial Office
10 Park Plaza, Suite 4A
Caller Box 13994
Research Triangle Park, NC 27709
Copyright © AVS 2003. All rights reserved.
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New technical groups have also been established, the most recent on
MEMS. At the beginning of this year the Board of Directors will address a proposal for a new group on the Technology of
Sustainability. While the field of MEMS evolves from many of our
traditional scientific areas, the field of Sustainability represents new
avenues of scientific endeavor. Both topics offer opportunities to
reach out to new industry sectors.
Student Chapters
The implementation of a procedure to create student chapters and
the outstanding success of the Florida chapter provide a model for
engaging the next generation of AVS participants. There is a vast
opportunity to expand this constituency, and I reiterate the call to all
university-based members to consider activating a chapter. You
need only talk with the faculty or students in these chapters to sense
the excitement engendered by their participation.
AVS Newsletter, Spring 2003
Challenges: It’s the Economy
AVS has not been isolated from the impact of
the state of the economy. In an environment of
corporate restructuring and layoffs, reduction
in federal and corporate research budgets, and
so forth, it is not surprising that revenues from
meeting and short course attendance and advertising are less than in previous years. In addition, the publication industry’s transition to
electronic media will not happen without
some hiccups (you will hear more about this
later in the year). In response, the staff, officers, Board of Directors, and committee chairs
have worked very hard to increase efficiency
in order to minimize negative impact to activities critical to the mission of AVS.
For example, a new database management
system has been developed and installed that
will improve membership services while significantly reducing annual costs (see page 5
for details). In addition the Board of Directors
will streamline its operational procedures,
eliminating unnecessary events, relying on
electronic communications for some actions,
and reducing travel. A new accountability procedure has been implemented to help all
groups, divisions, and committees meet their
budget goals. Our outreach activities toward
internationalization, liaising on federal policy,
and education will continue but at a reduced
rate.
Our goal is to manage this challenge strategically so that we emerge fiscally sound. I entreat all volunteers, conference speakers, short
course instructors, and committee members to
help us meet our goal. Combined, all of the
seemingly small contributions to cost savings
make a significant impact!
On a positive note, our alignment is with industries that are critical to the global economy
and tend to be in the high-growth sectors. I am
optimistic that we will be among the first to
feel the effects of an improved economy and
will be ready to pounce on new opportunities.
Celebrating 50 Years!
Planning is well under way for the International Symposium in Baltimore, Maryland.
Christie Marrian and Terry Michalske have
worked with the divisions to organize a program that emphasizes the exciting potential of
science and technology in the next 50 years
while acknowledging the contributions of the
past (see Call for Papers on page 9). The stimulating topics that arise from each of the divisions are a testament to our membership leading the charge. A number of commemorative
AVS Newsletter, Spring 2003
events will celebrate our accomplishments. It is going to be one of
the most technically exciting and fun meetings of the year! Mark
your calendars and plan to be in Baltimore on November 2–7, 2003.
The past accomplishments and the excitement of future directions will be documented in a special bound issue of JVST. Fred
Dylla and the History Committee have commissioned several articles from each of the divisions and technical groups that will overview the contributions of AVS membership to critical science and
technology areas. At the end of the year, the book will be distributed
to those who attend the International Symposium and will be available to all members through the AVS store at www.avs.org.
Planning the Future: The Sixth Decade
We begin the sixth decade in the midst of rapid changes in almost every sphere—the science and technologies that we explore, the manner in which we communicate, the way corporations do business,
the missions of federal organizations, etc. It is important to the continued vitality of AVS to anticipate the needs of the membership in
order to provide the services it requires. One of my goals for the year
is to formulate some mid-range and long-range goals that focus on
several key issues that affect our future. Later this year you will hear
about planning activities that address AVS in the electronic age, our
evolving industry constituency, and dynamic divisions.
The vitality of AVS is due, in large part, to the active contributions of volunteers and input of members. I look forward to your
comments and suggestions as we plan for the future, facing not only
the challenges, but also the opportunities.
CORPORATE MEMBERSHIP
LISTING
A
VS wishes to thank the following Corporate Members for their
support. Corporate Membership benefits include voting privileges, complimentary subscriptions, recognition, promotional opportunities, short course discounts, etc.
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A&N Corporation
IGC Polycold Systems, Inc.
Jobin Yvon, Inc.
VAT, Inc.
For more information on the benefits of becoming a Corporate
Member, please contact Angela Klink, 212-248-0200, membership@avs.org or visit www.avs.org.
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REMEMBERING AVS MEMBERS
J. Peter Hobson
George H. Bancroft
By P.A.Redhead
eorge Herbert Bancroft, 92, died on
February 20, 2003, at his home in
Morris, Connecticut. Dr. Bancroft, who
was born March 2, 1910, in Halifax, Nova
Scotia, Canada, received his bachelor’s
and master’s degrees from West Virginia
University and his Ph.D. in physics from
the University of Pennsylvania.
After teaching physics at Hobart College in Geneva, New York, he lived and
worked for 21 years in Rochester, New
York, gradually concentrating on research
in high vacuum technology and techniques. The company he was
with was eventually acquired by the Bendix Corporation (now
Honeywell) with whom he worked as Director of Research in
Bettendorf, Iowa, and Kansas City, Kansas, retiring in 1975. He and
his wife moved to their home on Byrnes Avenue in Litchfield in
1979. His wife of 49 years, Mercedes W. Bancroft, died in 1989, and
he moved in 1997 to the home of his daughter and son-in-law in
Morris.
Dr. Bancroft served as AVS President in 1965, as AVS Program
Chair from 1961–1963, and as Vacuum Technology Division Chair
from 1970–1971. He was a member and deacon of the First Congregational Church of Litchfield.
He is survived by his daughter and son-in-law, Susan and Philip
Bergan, of New York City and Morris, Connecticut, and by two
grandsons, David Bergan of New York City and Jeffrey Bergan of
San Francisco. He was predeceased by his son, Malcolm, of Ibiza,
Spain.
A memorial service will be held in late April. In lieu of flowers,
the family suggests that contributions be made to the Meetinghouse
Preservation Fund of the First Congregational Church of Litchfield
or to the Hospice at Home Program of the Visiting Nurse Services of
Connecticut, Inc., Torrington, Connecticut.
D
r. J. Peter Hobson died suddenly at home
on February17, 2003, at the age of 78. He
had served the AVS since the 1950s with great
distinction in many roles. He was largely responsible for forming the Surface Science Division and was its first chair from 1968–1970.
He was Future Symposia Sites Chair in
1967–1968, and a Director from 1979–1981.
He received several honors from the AVS. He
was made an Honorary Member of the AVS in
1983, won the Albert
Nerken Award in 1990,
and was made a Fellow of
the Society in 1993. For
the IUVSTA he was Administrator of the
Medard M. Welch Scholarship from 1980–1986.
Peter Hobson graduated from the University
of British Columbia in
Vancouver in 1954 and
obtained his Ph.D. from the University of California, Berkeley, in 1954. He worked for the
National Research Council (NRC) of Canada
from 1954 until his retirement in 1986. His major field of research was vacuum science and,
in particular, physical adsorption; his work on
the physical adsorption isotherms of He and N2
over 13 orders of magnitude in pressure will
remain his outstanding achievement.
He published more than 80 scientific papers
and was a co-author of the book The Physical
Basis of Ultrahigh Vacuum published in 1968
and republished as an AVS Classic of Vacuum
Science and Technology in 1993. After retirement from NRC, he established National Vacuum Technologies Inc., a consulting company
with which he was active until his death.
He will also be remembered by attendees at
AVS Symposia for his active participation, together with his wife, Isabel, in the annual AVS
Runs (they kept up their running habits until
two years ago).
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AVS Newsletter, Spring 2003
GENERAL TOPICS
Introducing MyAVS
Your Personal Access to the New
Members-Only Area of the AVS Website
Web www.avs.org
By Anne Testoni, AVS Membership Chair
T
he AVS is pleased to announce MyAVS,
your personal Internet access to the members-only website. MyAVS acts as the interface
to the Society’s new Association Membership
Management System (AMMS) and allows you
to select and update your AVS membership.
Through MyAVS you can:
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Update and expand your personal contact
information, including
m Multiple addresses for directing mailed
information
m Home, office, fax, cell, and other phone
numbers
m Multiple e-mail addresses and personal
websites
Select your preferred methods for
receiving AVS communications
m Don’t want electronic mail from us?
Only want certain types of messages?
Just select your preferences.
m Prefer to have an alternate e-mail address
for different communications? Just select
your preferences.
Change your chapter, division, and technical group selections
Search the membership database
(but please read and follow the AVS
privacy policy!)
Renew your membership and select
your journals, through secure online
credit card transactions
Simple and Easy to Use
If you have provided an active electronic
mail address to AVS, you should have
received your personal username (currently your AVS membership number)
and initial password. With this information, logging in to MyAVS is simple. On
the AVS homepage, www.avs.org, click
the link for MyAVS. The following
pop-up window displays:
AVS Newsletter, Spring 2003
Type in the username and password and click the log in icon. The
pop-up screen disappears and sends you to your personal MyAVS.
Each page provides an overview of the available features. You
can also provide feedback if you have problems or want to suggest
improvements or new features for MyAVS.
You can personalize your password in the Edit My Profile section
of MyAVS. Enter this section of the website by clicking on the icon.
When your personal information appears, select the Login tab. Type
in a new password, and then click the Save & Continue icon. To ensure a stable introduction of the AMMS, usernames cannot be
changed at this time. We expect that personalized usernames will be
available within the next few months—watch for announcements
by electronic mail and on the AVS website.
More Benefits Soon
This is just the beginning of new benefits and features that the AVS
will provide in the coming months. Visit the AVS website and
MyAVS frequently to check
for exciting changes and
innovations.
Questions? Comments?
Suggestions?
Use the feedback button to
send us your ideas or send an
e-mail to anne_testoni@
avs.org. Didn’t receive your
username and password?
Angela Klink will be happy
to assist you. Contact her at
212-248-0200, membership@
avs.org.
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2002 ISEF VTD Award Winners
T
he 53rd International Science and Engineering Fair was held in Louisville, Kentucky May 12–18, 2002. Its 1,259 finalists
were winners of affiliated fairs held in 45
states, the District of Columbia, American Samoa, U.S. Virgin Islands, and Puerto Rico, as
well as finalists from science fairs held in 37
other countries. Several million dollars in cash
and scholarships were awarded to Intel Category prize winners, and winners of special
awards from U.S. government, industry, universities, and organizations such as the AVS
Vacuum Technology Division (VTD).
This year’s VTD First Award winner was
the team of Erin Jennings, Mat Leonard, and
Zach Parvin from Garland High School, Garland, Texas. This team built and tested a
working model of a magnetoplasmadynamic
propulsion system using an argon plasma and
controlled its flow. The students clearly explained its physics and understood its underlying vacuum technique. Their supervisor
was Garland High School physics teacher
Richard Lines.
The Second Award winner was Rachel
Rosenberg of The South Carolina Governor’s
School for Math and Science, Hartsville,
South Carolina. Rachel conducted plasma experiments on NASA’s Inertial Electrostatic
Confinement chamber. In the chamber, highly
energized plasmas of hydrogen, deuterium,
and argon can be created and studied. Rachel
compared the output/input energy ratio of
deuterium to other gases. Her supervisor was
physics teacher Dr. Clyde Smith.
Each year, the VTD presents up to three
awards. Students and their advisors each receive a cash award and a vacuum textbook;
2002 ISEF VTD/AVS Award Winners (l to r) Professor John O’Hanlon, Erin Jennings, Mat Leonard, Rachel Rosenberg, and Zach Parvin
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their school’s science department receives a cash award for the enhancement of their science program. This year’s judges were
Douglas Baker of Teledyne Instruments and John O’Hanlon of the
University of Arizona. Next year’s fair will be held May 11–17,
2003, in Cleveland, Ohio.
MIT Professor Will Be the First Woman to Chair
Governing Board of the American Institute of Physics
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n the U.S., men are still more likely than
women to choose a career in science, but Dr.
Mildred S. Dresselhaus continues a career in
physics distinguished for research accomplishments and her commitment to mentoring young
scientists.
Now Professor Dresselhaus has been chosen
as the first woman to chair the governing board
of the American Institute of Physics (AIP).
For Dr. Dresselhaus, leading the AIP board
is another accomplishment in a long career that
includes winning the National Medal of Science, directing the Office of Science at the U.S. Department of Energy, and 35 years of
teaching and research at the Massachusetts Institute of Technology.
“AIP is important to me and to all physicists. I am very much
looking forward to this new opportunity to serve the physics community,” Dresselhaus says. “As I get into the job, I hopefully can
find areas where I can have special impact. My experiences all give
me some perspective that should help me in this new position.”
As an educator, Dr. Dresselhaus is known for mentoring dozens
of women—as well as men—down the difficult road to physics
Ph.Ds. She received her own Ph.D. in physics from the University
of Chicago in 1958. Since then, colleagues have recognized her
work with 17 honorary doctorates.
Professor Dresselhaus’s work in physics has produced key
breakthroughs in understanding carbon nanotubes—atom-thin
walls of carbon that promise unprecedented high-strength
materials.
The MIT professor also has extensive experience as a leader of
scientific societies. She has served as President of the American
Physical Society (APS), Treasurer of the National Academy of
Sciences (NAS), President of the American Association for the
Advancement of Science (AAAS), and on numerous advisory
committees and councils.
“I look forward to working with Millie to continue to increase the
effectiveness of AIP in serving its ten Member Societies and their
125,000 individual members,” said Marc H. Brodsky, Executive
Director and CEO of AIP. “She brings experience in society affairs,
having served in leadership positions in APS, AAAS, and other societies as well as high-level positions in government and academic
circles.”
Dresselhaus will succeed John A. Armstrong, who is stepping
down as Chair after five years. When he took the position in 1998,
Armstrong announced he would follow the recent tradition of AIP
Chairs to serve no longer than five years.
AVS Newsletter, Spring 2003
FIRST ANNOUNCEMENTS—
CONFERENCES/MEETINGS
Ultra Shallow Junctions (USJ 2003)
Exhibition
April 27–May 1, 2003
Chaminade Conference Center
Santa Cruz, California
An exhibition of products relevant to ion implantation, RTP processing, and USJ characterization will be featured. The technical
program will include scheduled visits to the exhibition, where
refreshments will be provided.
Web
http://www.avs.org/conferences/usj/overview.html
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ou are invited to participate in the Seventh
International Workshop on the Fabrication, Characterization, and Modeling of Ultra
Shallow Doping Profiles in Semiconductors
(USJ 2003). The first goal of the workshop is to
provide an international forum for a thorough
and broad-ranging discussion of the new ideas
in ultra-shallow junction formation and techniques for measurement and modeling of the
one- and two-dimensional aspects of ultra-shallow junctions, primarily in silicon devices.
The second goal is to establish a dialogue
between device designers; equipment manufacturers; and characterization, modeling,
and TCAD engineers, to review the current
and future needs for shallow junctions, manufacturing tool capabilities, as well as recent
advancements of the analytical characterization techniques.
The workshop consists of invited review
papers, contributed papers (in both oral and
poster formats), and focused topical discussions. The topics of this workshop are
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Process and New Ideas in USJ Fabrication
Sputter Depth Profiling
1-D and 2-D Dopant Characterization
Electron Holography and Novel Methods
Dopant Profiling at the Limit
Diffusion
Defects
We encourage the participation of device designers who are developing advanced technologies where doping control is critical.
This forum provides a review of techniques
that probe atomic composition and electrical
activation of ultra-shallow junctions. Additional discussions will review the status of
techniques for analysis of lattice damage profiles and analytical models that relate dopant
distributions to enhanced dopant diffusion
from the production of point defects.
AVS Newsletter, Spring 2003
For more information, please contact AVS West, 408-246-3600, fax
408-246-7700, della@avs.org, http://www.avs.org/conferences/
usj/overview.html.
NY-TECH TRANS 2003
Symposium for Vacuum and Coating Technology Transfer
May 19, 2003
Rochester Riverside Convention Center
Rochester, New York
Web www.unyvac.org
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his one-day symposium is being hosted by the AVS Upstate
New York Chapter (UNY-VAC) and is collocated with the
SPIE/APOMA’s OPTIFAB 2003 Conference. The following technical session talks are already scheduled:
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“What Every Engineer Should Know About Tech Transfer,”
Frederick A. Provorny, Harold R. Tyler Professor of Law and
Director of the Science and Technology Law Center, Albany
Law School.
“Bringing a Radical Innovation to the Precision Optics Market,” Paul Dumas, QED Technologies, Inc.
“Design of Phase-Controlled Coatings to Correct Skew-Ray
Depolarization in Projectors,” Alan E. Rosenbluth, Minhua
Lu, Kenneth Ho, Rama N. Singh, IBM T.J. Watson Research
Center
“High Performance Optical Thin Filters Get Tough,” Turan
Erdogan, Semrock, Inc.
“The Grating Electromechanical System (GEMS) Device:
From Micro-Ribbons to Imaging Systems,” Marek W. Kowarz
and John C. Brazas, Eastman Kodak Company
“Magnetic Material Deposition,” Dr. Santosh Kurnic, Rochester
Institute of Technology, Rochester, NY
“Infotonics Technology Center: Status and Capabilities,” William Hawkins and Donald Keck, Infotonics
In addition, three short courses are also planned, as follows: Understanding Optical Coatings, Introduction to Ion Beam Coating Deposition Techniques, and Helium Leak Detection.
For more information, please refer to www.unyvac.org.
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Surface Analysis 2003
June 3–6, 2003
University of Illinois
Urbana-Champaign, Illinois
Web http://cmm.mrl.uiuc.edu/SA03/index.html
T
he 25th Annual Symposium on Applied
Surface Analysis will provide a forum for
scientists in all disciplines to discuss advances
in surface analysis techniques and their application to thin films, semiconductors, composites,
ceramics, polymers, biomaterials, catalysts,
tribology, adhesion, and other material systems.
The symposium will consist of invited papers,
contributed papers, and posters, and an equipment exhibition. Invited talks will include
n Robert S. Averback, University of Illinois
at Urbana-Champaign, “Physics of
Ion/Solid Interaction”
n Sam Bader, Argonne National Laboratory
“The Quest for Magnetic Electronics”
n Charles (Drew) Evans, Evans Analytical
Group “SIMS/Industrial Applications of
Surface Analysis”
n Andrew G. Ewing and Sara G. Ostrowski,
Penn State University, “Static SIMS Imaging of Liposomes and Cells”
n Steve Granick, University of Illinois at
Urbana-Champaign, “In Situ Studies of
Buried Soft Interfaces”
n Joe Greene, University of Illinois at Urbana-Champaign, “Atomistics of Thin
Film Growth”*
n Luke Hanley, University of Illinois at
Chicago, “Surface Modification/
Biocompatible Materials”
n Paul Holloway, University of Florida,
“Ohmic Electrical Contacts to Compound
Semiconductors”
n Joseph W. Lyding, University of Illinois at
Urbana-Champaign, “Atomic Scale Fabrication and Characterization on Silicon
Surfaces”
n Theodore E. Madey, Rutgers University,
“Flexible Metal Surfaces—Nanoscale
Faceting Induced by Overlayers”*
n Ralph G. Nuzzo, University of Illinois at
Urbana-Champaign
n Jörg Patscheider, EMPA Surface and
Joining Technology, “Industrial Applications of Thin Films”
n Cedric J. Powell, National Institute of
Standards and Technology, “Applications
of NIST Databases for Surface Analysis
by AES and XPS”
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Ian Robinson, University of Illinois at Urbana-Champaign,
“Surface X-ray Diffraction”
Miquel Salmeron, Lawrence Berkeley National Laboratory,
“Scanning Probe Imaging and Spectroscopy: Tunneling,
Forces and Nanoscale Manipulation”
Brian Tonner, University of Central Florida, “Nanostructures,
X-ray Microscopy, Ultra-Thin Films, Surface Interface Physics”
Sven Tougaard, University of Southern Denmark, “Quantitative Analysis of Surface Nanostructures by XPS”
John H. Weaver, University of Illinois at Urbana-Champaign,
“Dynamics of High Temperature Etching of Silicon: Direct
Imaging with STM”*
Peter Williams, Arizona State University, “SIMS”
Jian-Min Zuo, University of Illinois at Urbana-Champaign,
“Quantitative Electron Microscopy Analysis of Early Stage
Thin Film Growth”
* AVS Distinguished Lecturer
For more information, please contact I. Petrov, Conference Chair,
217-333-8396, fax 217-244-2278, sa03@mrl.uiuc.edu,
http://cmm.mrl.uiuc.edu/SA03/index.html
Functional Coatings and Surface Engineering
Symposium
June 4–6, 2003
Universite de Montreal
Montreal, Canada
Web www.unyvac.org
T
his symposium will feature keynote lectures and invited presentations, original oral and poster presentations, awards for the
best student poster presentations (UNY-VAC and GCM prizes),
vendor exhibits of equipment and services, a workshop on new
characterization techniques, and visits to the facilities of the Thin
Film Research Center (GCM). The following topics will be covered
at a variety of technical sessions:
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Coatings for optics, photonics, optoelectronics, and imaging
Engineered tribological and protective coatings
Coatings and films for micro- and nanoelectronics
New processes and materials
Process control and monitoring
Advances in characterization methods
Partial List of Invited Speakers
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Claude Amra, Institut Fresnel
Mohamed Chaker, INRS
David Glocker, Isoflux, Inc.
Peter M. Martin, Pacific Northwest National Laboratory
Sjoerd Roorda, Université de Montréal
William Sproul, AVS Distinguished Lecturer, Advanced Energy
Brian Sullivan, Iridian Technologies
Arthur Yelon, École Polytechnique
For m ore inform ation, c all 514-340-4099 or e- mai l
lmartinu@mail.polymtl.ca, www.unyvac.org.
AVS Newsletter, Spring 2003
ALD 2003
August 4–6, 2003
DoubleTree Hotel
San Jose, California
Web http://www.avs.org/conferences/ald2003
T
he Atomic Layer Deposition Conference
(ALD 2003) will be a three-day meeting
dedicated to the science and technology of
atomic layer controlled deposition of thin
films. Atomic layer deposition (ALD) is used
to fabricate ultrathin and conformal thin film
structures for many semiconductor and thin
film device applications. A unique attribute of
ALD is that it uses sequential self-limiting surface reactions to achieve control of film
growth in the monolayer or submonolayer
thickness regime.
ALD is receiving attention for its potential
applications in advanced high dielectric constant (high-k) gate oxides, storage capacitor dielectrics, and copper diffusion barriers in advanced electronic devices. It is also of interest
in any advanced application that benefits from
control of film structure in the nanometer or
subnanometer scale.
Abstract Deadline: May 16, 2003
For abstract submission guidelines, please
visit http://www.avs.org/conferences/
ald2003.
For more information, please contact AVS
West, 408-246-3600, fax 408-246-7700,
dell a @ a v s.o rg , http:/ /www.avs.org/
conferences/ald2003.
development, isotopic measurements, and related techniques. Sessions will provide a forum for reporting new results and sharing
practical information about SIMS as well as providing an informal
atmosphere to encourage extended discussions.
Both oral and poster sessions are planned as well as topical symposia and workshops on a variety of topics. All participants are invited to submit an abstract of work to be presented at the conference. Your abstract should emphasize the originality of the work.
The work must be unpublished at the time of the conference.
For more information, please contact AVS, 408-246-3600, fax
408-246-7700, della@avs.org.
AVS 50TH INTERNATIONAL
SYMPOSIUM
Call for Papers
November 2–7, 2003
Baltimore Convention Center
Baltimore, Maryland
Web www.avs.org
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SIMS XIV
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September 14–19, 2003
Sheraton San Diego Hotel and Marina
San Diego, California
Web www.avsusergroups.org/simsxiv/
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T
he 14th International Conference on Secondary Ion Mass Spectrometry (SIMS
XIV) is the premier international forum on the
most recent developments in secondary ion
mass spectrometry (SIMS).
More than 400 attendees are expected for
the upcoming meeting. The conference will
cover all aspects of the technique, including
fundamentals, quantification, instrumentation,
organic and biological analysis, depth profiling, semiconductor characterization, metals,
geology, imaging, TOF SIMS, standards
AVS Newsletter, Spring 2003
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Advanced Surface Engineering
Applied Surface Analysis
Biomaterial Interfaces
Electrochemistry and Fluid-Solid Interfaces
Electronic Materials and Devices
Magnetic Interfaces and Nanostructures
Manufacturing Science and Technology
MicroElectroMechanical Systems (MEMS)
Nanometer Structures
Nanotubes
Organic Films and Devices
Photonic Materials and Devices
Plasma Science and Technology
Processing at the Nanoscale
Semiconductors
Surface Science
Technology and Sustainability
Thin Films
Vacuum Technology
Topical Conference Topics
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Contacts to Organic Materials
High-k Dielectrics and Devices
Homeland Security
Ion Beam Sputtering
Quantitative Surface Analysis
Abstract Deadlines
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Paper/Fax: April 28, 2003, 5:00 p.m. (EDT)
E-mail: May 5, 2003, 11:00 p.m. (EDT)
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MEETINGS CALENDAR
New entries are highlighted in color for easy
identification.
AUGUST 2003
4–6
Atomic Layer Deposition 2003, San Jose, CA, USA. AVS West, 1265 El
Camino Real, Ste. 109, Santa Clara, CA, USA, 408-246-3600, fax
408-246-7700, della@avs.org.
18–22
11th Canadian Semiconductor Technology Conference, Ottawa, Ontario, Canada. Frank Shepherd, Chair, Dept 5C13, Nortel Technologies,
P.O. Box 3511 Stn. C, Ottawa ON K1Y 4H7 Canada, 613-763-3285,
frsims@nortelnetworks.com.
APRIL 2003
28–5/2 ICMCTF 2003, San Diego, CA, USA. Mary
Gray, ICMCTF, 14001-C Saint Germain Dr.,
Ste. 136, Centerville, VA 20120, 703-266-3287,
fax 703-968-8877, icmctf@mindspring.com,
www.avs.org/ icmctf.
30–5/3 Joint AVS/SFB Symposium on Biomaterial
Interfaces, Reno, NV, USA. James J. Hickman,
Conference Chair, 420 Rhodes Research Center, Clemson University, Clemson, SC 29634.
864-656-7168, fax 864-656-4466,
hickman@clemson.edu.
MAY 2003
19
27–30
25–29
Upstate New York Chapter NY-TECH
TRANS 2003 Symposium, Rochester, NY,
USA. www.unyvac.org.
47th International Conference on Electron,
Ion, and Photon Beam Technology and
Nanofabrication (EIPBN 2003), Tampa, FL,
USA. Timothy R. Groves, Conference Chair,
Leica Microsystems, Goschwiszerstr. 25, Jena
07745, Germany, 011-49-3641-651938, fax
0 11 - 4 9 - 3 6 4 1 - 6 5 1 9 2 2 , t i m o t h y. g r o v e s
@leica-microsystems.com.
38th IUVSTA Electronic Processes and
Sensing Conference, Eilat, Israel. Sidney Cohen, Conference Chair, Perlman Bldg.,
Weizmann Institute of Science, Rehovot 76100,
Israel. Phone: 972-8-934 2703, sidney.cohen@
weizmann.ac.il.
JUNE 2003
3–6
4–6
23–27
21–25
14–19
14th International Conference on Secondary Ion Mass Spectrometry
(SIMS XIV), San Diego, CA, USA. AVS West, 1265 El Camino Real,
Ste. 109, Santa Clara, CA, USA, 408-246-3600, della@avs.org.
15–18
37th IUVSTA Workshop on the Plasma Deposition of Advanced Materials, Kerkrade, The Netherlands. John Caughman, Conference Chair,
Oak Ridge National Laboratory, P.O. Box 2009, MS 8071, Oak Ridge,
TN 37831-8071, 865-574-5131, caughmanjb@ornl.gov.
29–10/2 2003 North American Conference on Molecular Beam Epitaxy,
Keystone, CO, USA. Richard Mirin, Conference Chair, NIST, 325 Broadway, Boulder, CO, 80305, 303-497-7955, mirin@boulder.nist.gov.
OCTOBER 2003
5–10
Tenth European Conference on Applications of Surface and Interface Analysis (ECASIA 2003), Berlin, Germany. Dr. W.E.S. Unger,
Bundesanstalt fuer Materialforschung und-prufing (BAM), Unter den
Eichen 44-46, Berlin, 12200, Germany, 011-49-30-104-1823,
wolfgang.unger@bam.de, www.bam.de/ecasia03.htm.
NOVEMBER 2003
2
Sputtering Workshop, Baltimore, MD, USA. Bill Sproul, Advanced
Energy Industries, 1625 Sharp Point Drive, Ft. Collins CO, 80525,
970-407-6132, bill.sproul@aei.com.
3
Tenth Topical Conference on Quantitative Surface Analysis, Baltimore, MD, USA. Cedric J. Powell, NIST, 100 Bureau Drive, M/S 8370,
Gaithersburg, MD 20899-8370, 301-975-2534, cedric.powell@nist.gov.
2–7
AVS 50th International Symposium (Technical Programs, Topical
Conferences, Short Courses, and Equipment Exhibition), Baltimore,
MD, USA. AVS, 212-248-0200, avsnyc@avs.org, www.avs.org.
APRIL 2004
Surface Analysis 2003, 25th Annual Symposium on Applied Surface Analysis (AVS
Short Courses), Urbana, IL, USA. Ivan Petrov,
Chair, University of Illinois, 217-333-8396, fax
217-244-2278, petrov@uiuc.edu.
Symposium on Functional Coatings and
Surface Engineering, Montreal, Canada.
www.unyuvac.org.
39th IUVSTA Workshop on Ultrafast Surface Dynamics, Telluride, CO, USA. Xiaoyang
Zhu, University of Minnesota,
z h u @ c h e m , u m n . e d u , w w w. c h e m .
umn.edu/USD.
JULY 2003
7–11
SEPTEMBER 2003
International Vacuum Microelectronics
Conference 2003, Osaka, Japan. Mikio Takai,
O s a k a U n i v e r s i t y, 8 1 - 6 - 6 8 5 0 - 6 6 9 3 ,
takai@rcem.osaka-u.ac.jp.
12th International Conference on Scanning
Tunneling Microscopy, Eindhoven, The Netherlands. Paul M. Koenraad, p.m.koenraad@
tue.nl.
19–23
NOVEMBER 2004
15–19
AVS 51st International Symposium (Technical Programs, Topical
Conferences, Short Courses, and Equipment Exhibition), Anaheim,
CA, USA.
AVS BOARD MEETINGS
2003
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ICMCTF 2004, San Diego, CA, USA. Mary Gray, ICMCTF, 14001-C
Saint Germain Dr., Ste. 136, Centerville, VA 20120, 703-266-3287, fax
703-968-8877, icmctf@mindspring.com, www.avs.org/icmctf.
May 18, 2003—Minneapolis, Minnesota,
in conjunction with the Minnesota Chapter Symposium
November 2, 2003—Baltimore, Maryland,
in conjunction with the AVS International Symposium
December 7, 2003—New York, New York
AVS Newsletter, Spring 2003
MEMBERS IN THE NEWS
Professor Joe Greene Elected to the
National Academy of Engineering
T
he National Academy of Engineering
(NAE) announced that Professor Joe Greene
has been elected a member for “pioneering studies in the synthesis and characterization of
epitaxial and highly ordered polycrystalline materials.”
Joe Greene is the Director of the Frederick
Seitz Materials Research Laboratory and the
D.B. Willett Professor of Materials Science at
the University of Illinois and the Tage Erlander
Professor of Materials Physics at Linköping
University, Sweden. The focus of his research
has been the development of an atomic-level
understanding of adatom/surface interactions
during the dynamic process of vapor-phase
crystal growth to controllably manipulate
microchemistry, microstructure, and, hence,
physical properties. His work has involved film
growth by all forms of sputter deposition, solid
and gas-source MBE, UHV-CVD, MOCVD,
and ALE.
He is currently Editor-in-Chief of Thin
Solid Films and past Editor of CRC Critical
Reviews in Solid State and Materials Sciences.
He is active in the AVS where he has served on
the Trustees, as Chair of the Thin Film Division, twice as a member of the Board of Directors, as President of the Society in 1989, and is
currently Secretary. He has served on the Governing Board of the American Institute of
Physics, is currently Education Chair of the International Union of Vacuum Science and
Techniques, and is serving on the Executive
Committee of the APS Division of Materials
Physics. Some of his other major awards
include
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1998 David Adler Award in Materials Physics from the American Physical Society for “outstanding research and lecturing
on the physics and chemistry of thin films
Fellow of the APS (1998) for “original contributions to the experimental development, modeling, and understanding of Si,
Ge, and Si1-xGex atomic-layer epitaxy and gas-source molecular-beam epitaxy”
David Turnbull Award, MRS (1999), for “contributions to the
use of non-thermal methods in the growth of thin films and the
engineering of their phase, composition and microstructure;
and for excellence in teaching and writing”
2001 International Scientist of the Year for “contributions to
thin film science,” International Biographical Center, Cambridge, UK.
Elected to the European Academy of Science, 2002.
AVS John Thornton Award (1991) for
“outstanding research in thin films”
Tage Erlander Award (1991) from the
Swedish Natural Science Research Council for “contributions to the physics and
chemistry of thin films”
AVS Fellow (1993) for “outstanding research in thin film science with emphasis
on the use of ion/surface interactions and
photo-induced reactions to controllably alter film nucleation and growth kinetics”
AVS Newsletter, Spring 2003
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