Fu Doped nd ed by and co-doped Graphene on Copper metal substrate: Properties and molecular oxygen reactivity Lara Ferrighi, Cristiana Di Valentin Università di Milano-Bicocca, MILANO, Italy Abstract Electronic properties The electronic properties of G, Boron-doped G (BG), Nitrogendoped G (NG) and co-doped BNG on Cu(111) are investigated with DFT by means of: ● Substitutional chemical doping ● Metal doping ● Lattice parameter strain The O2 reactivity is investigated both on the metal supported G and BG and at the interface with the metal. Density of states of free-standing G (gray area), BG, NG and BNG. Computational details ● ● ● 4x4 supercell, 3% doping, 6% co-doping Quantum espresso package C09x vdw-DF2 functional L. Ferrighi, M. Trioni and C. Di Valentin J. Phys. Chem. C, 2015, 119, 6056 Density of states of Cu supported BG. L. Ferrighi and C. Di Valentin Surface Science, 2015, 634, 68 Adsorption Oxygen dissociation Table 1. Adsorption energies per C atom Eads (in eV), charge transfer per C atom δq (in e), and equilibrium distances heq (in Å) Additional adsorption energies ΔEads per dopant (in eV) and charge transfer difference Δδq (in e) for doped and co-doped graphene on Cu(111) with respect to pure G. vdw-DF2 C09x lattice 2.47 Å 2.52 Å strain 0% 2% Eads q heq Eads q heq -0.061 2x10-3 3.24 -0.065 6x10-3 3.13 Eads q heq Eads q heq BtG -0.55 0.45 2.46(B)/3.02(C) -0.79 0.56 2.52(B)/2.84(C) BhG -0.76 0.47 2.14(B)/2.98(C) -0.97 0.49 2.23(B)/2.78(C) NtG -0.14 -0.17 3.35(N)/3.32(C) -0.02 -0.22 3.25(N)/3.21(C) N hG -0.14 -0.17 3.36(N)/3.34(C) -0.02 -0.22 3.24(N)/3.21(C) BtNhG -0.04 0.01 3.21(B)/3.21(N) -0.06 0.04 3.02(B)/3.10(N) BhNtG -0.07 0.05 3.09(B)/3.19(N) -0.09 0.01 3.01(B)/3.10(N) G On top of BG +0.31 Lattice parameter strain effect Expanding G lattice: the adsorption is stronger the corrugation is damped +0.30 -0.43 On coated Cu Free Cu -2.76 -3.18 -2.12 -1.98 -1.51 At the interface Pure G/Cu interaction The G/Cu interaction is rather weak Cu is donating electrons to G (n-type doping) Doping effect BG adsorption is much stronger BG/Cu distance is shorter NG/Cu distance is longer BNG/Cu is similar to G/Cu +0.26 -0.71 +2.22 -1.36 -1.75 Conclusions The presence of G or BG damps Ediss of O2 on Cu(111) O2 prefers Cu rather than the Cu/G interface O2 dissociation at the Cu/BG interface is competitive close to the dopant CHECK OUT OUR WEBSITE at www.beyond-graphene.mater.unimib.it