pn Junction (5/11/00) Page 1-2.1 1.2 - DEPLETION REGION OF A PN JUNCTION INTRODUCTION Objective • Characterize and model the pn junction Outline • Physical aspects of pn junctions • Mathematical models of the pn junction - Depletion capacitance - Breakdown characteristics ECE 4430 - Analog Integrated Circuits and Systems P.E. Allen pn Junction (5/11/00) Page 1-2.2 PHYSICAL ASPECTS OF THE PN JUNCTION Abrupt Junction Metallurgical Junction n-type semiconductor p-type semiconductor iD +vD Depletion region n-type semiconductor p-type semiconductor iD + v-D W -W1 0 W2 x Fig. 1.2-1 1. Doped atoms near the metallurgical junction lose their free carriers by diffusion. 2. As these fixed atoms lose their free carriers, they build up an electric field which opposes the diffusion mechanism. 3. Equilibrium conditions are reached when: Current due to diffusion = Current due to electric field ECE 4430 - Analog Integrated Circuits and Systems P.E. Allen pn Junction (5/11/00) Page 1-2.3 MATHEMATICAL CHARACTERIZATION OF THE PN JUNCTION Abrupt PN Junction Impurity concentration (cm-3) Cross section of an ideal pn junction: Apply a reverse bias, vD = -VR xd xp xn n-type semiconductor p-type semiconductor ND x 0 -NA Depletion charge concentration (cm-3) qND -W1 iD 0 +vD - W2 x -qNA Symbol of the pn junction: Electric Field (V/cm) iD x +v D - E0 iD Potential (V) +v D Fig. 1.2-1 V2 ψ0+ VR x V1 xd ECE 4430 - Analog Integrated Circuits and Systems Fig. 1.2-2 P.E. Allen pn Junction (5/11/00) Page 1-2.4 Summary of the PN Junction Characterization Barrier potentialkT NAND NAND ψo = ln = Vt ln 2 q ni ni2 Depletion region widthsW1 = 2εsi(ψo-vD)ND qND(NA+ND) W2 = 2εsi(ψo-vD)NA qND(NA+ND) W ∝ 1 N Depletion capacitanceCj = A εsiqNAND 2(NA+ND) Cj 1 ψo-vD = Cj0 vD 1- ψ o Cj0 Fig. 1.2-3 ECE 4430 - Analog Integrated Circuits and Systems 0 ψ0 vD P.E. Allen pn Junction (5/11/00) Page 1-2.5 Example 1 An abrupt pn junction in silicon has the doping densities of N A = 1015 atoms/cm3 and ND = 1016 atoms/cm3. calculate the junction built-in potential, the depletion-layer widths, the maximum field with 10V reverse bias and the depeletion capacitance with 10V reverse bias if Cj0 = 3pF. Solution At room temperature, kT/q = 26mV and the intrinsic concentration is ni = 1.5x1010 cm-3. Therefore, the junction built-in potential is 1015·1016 ψo = 0.026 ln = 0.637V 2.25x1026 The depletion width on the p-side is, 2·1.04x10-12·10.64 = 3.55x10-4 cm = 3.55µm 1.6x10-19·1015·1.1 The depletion width on the n-side is, W1 = 2·1.04x10-12·10.64 = 0.35x10-4 cm = 0.35µm 1.6x10-19·1016·11 The maximum field occurs for x = 0 and is qNA -1.6x10-19·1015·3.5x10-4 Εmax = - ε W 1 = = -5.38x104 V/cm 1.04x10-12 The depletion capacitance can be found as 3pF = 0.65pF Cj = 10 1 + 0.5 W2 = ECE 4430 - Analog Integrated Circuits and Systems P.E. Allen pn Junction (5/11/00) Page 1-2.6 Summary of the PN Junction Characterization - Continued Breakdown voltageεsi(NA+ND) 1 2 ∝ VR = 2qN E max N AND 2 where Emax is the maximum electric field before breakdown occurs (usually due to avalanche breakdown). Reverse leakage currentThe reverse current, IR, increases by a multiplication factor M as the reverse voltage increases and is IRA = MI R where M = ID (mA) 1 V R n 1 - B V 3 2 1 BV = VR -25 -20 -15 -10 5 -5 VD (V) -1 Breakdown -2 -3 ECE 4430 - Analog Integrated Circuits and Systems Fig. 1.2-4 P.E. Allen pn Junction (5/11/00) Page 1-2.7 Example 2 An abrupt pn junction has doping densities of NA = 5x1015 atoms/cm3 and ND = 1016 atoms/cm3. Calculate the breakdown voltage if Εcrit = 3x105 V/cm. Solution VR = εsi(NA+ND) 1.04x10-12·15x1015 2 = Emax = 88V 2qNAND 2·1.6x10-19·5x1015·1016 ECE 4430 - Analog Integrated Circuits and Systems P.E. Allen pn Junction (5/11/00) Page 1-2.8 Summary of PN Junction Characterization - Continued Graded junction: ND 0 -NA Above expressions become: Depletion region widths 2εsi(ψo-vD)ND m W 1 = qN (N +N ) D A D 2εsi(ψo-vD)NA m W2 = qND(NA+ND) x Fig. 1.2-5 1 m W ∝ N Depletion capacitanceCj0 1 εsiqNAND m = Cj = A2(N +N ) v D m A D ( φo-vD) m 1 ψo where 0.33 ≤m ≤ 0.5. ECE 4430 - Analog Integrated Circuits and Systems P.E. Allen