Flyer-LV126
Revised 2014.06.03
LV-126 Camera
revolutionary advancement in LEEM/PEEM imaging
L OW - K V D IRECT D ETECTION D EVICE (DDD ® )
®
• Direct detection of low keV primary electrons—a revolutionary
advancement in LEEM/PEEM data quality.
• High signal-to-noise ratio (SNR) and a large field-of-veiw
delivers >6× the information content (34 lines/mm
resolution over 24 × 18 mm) compared to
micro-channel plates (MCP) + CCD (7 lines/mm
resolution over 40 × 40 mm).
• Extensible and open software to easily integrate
with custom workflows and maximize image
processing capabilities.
• “Movie mode” provides high-speed acquisition
of a continuous stream of frames.
• Innovative movie-processing software further
enhances data quality through drift correction,
per-particle motion correction, radiation
damage compensation, post-acquisition
exposure setting, etc.
• High performance for demanding applications,
while maintaining ease-of-use and flexibility to
maximize data collection efficiency.
• The ultimate camera for LEEM/PEEM.
• Ultra high performance imaging in an elegantly
designed, flexible, and easy-to-use camera
system.
focus on innovation
count on exceptional service
generate results
Comparison between the Direct Electron LV-126 (left) and traditional channel plates + CCD (right). The images show cropped images
of graphene layers on copper substrate, collected in PEEM mode. The bias voltage was selected so that the monolayer of graphene
appears bright while the bilayers appear dark. Courtesy of Rudolf Tromp (IBM).
Direct Electron LV-126
Channel plates + CCD
LV-126 Camera
more info
revolutionary advancement in LEEM/PEEM imaging
industry-leading resolution
large field-of-view
flexibility & ease-of-use
innovative movie processing
low initial & total cost
exceptional service & support
®
W HY D IRECT E LECTRON ?
U NRIVALED F EATURES
• Large field-of-view, high sensitivity, and
industry-leading resolution for low kV TEM.
• High-speed continuous streaming of raw
frames, with flexible frame rate and
exposure time.
• Integrated Faraday plate for automated
exposure measurement.
LEED 15 eV
• Integrated sensor protection cover.
Log & bg-subtracted
Top: Cropped image of graphene on SiC, imaged in LEEM mode
at 11.3 eV (detected at 15 keV). Bottom: A selected-area LEED
diffraction pattern for the cystal circled above. Courtesy of
Rudolf Tromp (IBM).
• Compact and compatible with nearly any
microscope (including custom instruments).
• Open software architecture—fully extensible
& easily integrated into custom workflows.
S PECIFICATIONS
Detection electron energy range
Optimized for 15 keV − 40 keV
Pixel array specifications
4096 × 3072 (12.6 MP) | 6.0 μm pixel pitch
Single-electron SNR
>10:1 (15 kV)
Continuous frame-rate
40 fps max, unbinned full-frame | 75 fps max, 2× binned full-frame
Sub-arrays at 1000+ fps, depending on size
Exposure rate
Consistent performance at a broad range of exposure rates (e.g., 5 − 250 e-/pixel/s)
Mounting position
Optional fully retractable design | compatible with most LEEM/PEEM instruments
Sensor protection
Integrated physical protection shutter | microscope blanking/shuttering | failsafe software
Computer system
Optional certified high-performance computer system with SSD RAID array for data streaming
Acquisition & processing software
Conventional acquisition: DE-IM (full-featured, user-friendly) | μManager (free, open-source)
In situ movie acquisition: DE-StreamPix (continuous streaming)
Automated acquisition: Leginon | SerialEM | others using the DE SDK
“Movie” processing: DE image processing software (free, open-source, Python-based)
contact | DIRECT ELECTRON, LP
Web:
E-Mail:
www. directelectron.com
info@directelectron.com
13240 Evening Creek Dr., 311
San Diego, CA 92128
BACKGROUND: Graphene on SiC (silicon carbide substrate) imaged in LEEM mode
with 6.3 eV electron energy (detected at 15 keV). Courtesy of Rudolf Tromp (IBM).
Phone:
Fax:
858.384.0291
858.366.4981
Copyright © 2014 Direct Electron, LP. All rights reserved.