Request for use of Hafnium Metal on the Innotec
Name
Phone Number
Email
Requester’s PI
Name of new chemical
Secondary new chemicals
Name of Vendor
URL of Vendor website
Vendor Address and Phone number
Reason for bringing material
List of Lab equipment to be used
Proposed Quantity
Form of the proposed chemical
Chemical need to mix it
: Abhijit Pethe
: 650-387-6435
: pethe@stanford.edu
: Prof. Krishna Saraswat
: Hafnium (Hf)
: None
: Process Materials, Inc.
: http://www.processmaterials.com
: 5625 Brisa Street, Suite A
Livermore CA 94550
925-245-9626
: We want to investigate the use of Hf to
make low resistivity contacts to devices.
HfO2 has been suggested as a alternative
high-k dielectric to be used in ultra short
channel MOS devices. We are interested
in developing a process technology to
combine both the advantages of Hf for
gate and contact applications.
: Innotec Evaporation System
General Wet Bench
RTAag Table-top RTA system
: 10g
: Solid starter source and evaporation
material pellets
: None