Process Flow:
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Zirconia will be brought into the lab attached to a silicon wafer, attached with
thermally conductive carbon tape, transported in a single-wafer carrier.
Sample will be rinsed off with acetone, isopropanol, and distilled water at
wbgeneral. Solvents will be disposed in solvent collection container.
Sample will then be loaded into the research cube of the varian350D ion
implanter
Sample will be irradiated with either an argon beam, from the carrier gas, or a
hydrogen beam, from the arsine source which contains 85% hydrogen gas.
Sample will then be removed from the clean roon for testing.