Lecture 8 OUTLINE • Metal-Semiconductor Contacts (cont’d) – Current flow in a Schottky diode – Schottky diode applications – Practical ohmic contacts Reading: Pierret 14.2-14.3; Hu 4.17-4.21 Current Flow FORWARD BIAS REVERSE BIAS • Current is determined by majority-carrier flow across the M-S junction: o Under forward bias, majoritycarrier diffusion from the semiconductor into the metal dominates o Under reverse bias, majoritycarrier diffusion from the metal into the semiconductor dominates R.F. Pierret, Semiconductor Fundamentals, Fig. 14.3 EE130/230A Fall 2013 Lecture 8, Slide 2 Thermionic Emission Theory • Electrons can cross the junction into the metal if 1 2 K.E. x mvx qVbi VA 2 2q Vbi VA vx vmin * mn R.F. Pierret, Semiconductor Fundamentals, Fig. 14.3 • Thus the current for electrons at a given velocity is: I s M , v x qAvx n(vx ) • So, the total current over the barrier is: v min I s M qA v n(v )dv x EE130/230A Fall 2013 Lecture 8, Slide 3 x x Schottky Diode I - V For a nondegenerate semiconductor, it can be shown that 4kTmn*2 E E / kT m* / 2 kT v 2 F c n x n v x e e 3 h We can then obtain 4qmn* k 2 2 F / kT qV / kT I S M AT e e 3 h mn* 2 F / kT qV / kT AJ S e , where J S 120 T e A/cm 2 m0 In the reverse direction, the electrons always see the same barrier FB, so I M S I S M VA 0 B A A Therefore EE130/230A Fall 2013 B I I S (e qVA / kT 1) where I S AJ S Lecture 8, Slide 4 Applications of Schottky Diodes • IS of a Schottky diode is 103 to 108 times larger than that of a pn junction diode, depending on FB . Schottky diodes are preferred rectifiers for low-voltage, high-current applications. Block Diagram of a Switching Power Supply EE130/230A Fall 2013 Lecture 8, Slide 5 Practical Ohmic Contact • In practice, most M-S contacts are rectifying • To achieve a contact which conducts easily in both directions, we dope the semiconductor very heavily W is so narrow that carriers can “tunnel” directly through the barrier EE130/230A Fall 2013 Lecture 8, Slide 6 Tunneling Current Density Band Diagram for VA0 Equilibrium Band Diagram W 2 sF Bn qN D qVbiFBn Ec, EFS EFM q(Vbi-VA) EFM Ec, EFS Ev tunneling probabilit y P e Ev H ( F Bn VA ) where H 4 s m / h 5.4 10 * n 9 J S M qPN D vthx qN D kT / 2m e * n EE130/230A Fall 2013 Lecture 8, Slide 7 ND * n m / mo cm 3/2 H ( F Bn V A ) / N D V 1 Example: Ohmic Contacts in CMOS EE130/230A Fall 2013 Lecture 8, Slide 8 Specific Contact Resistivity, rc • Unit: W-cm2 – rc is the resistance of a 1 cm2 contact • For a practical ohmic contact, rc e HF B / N D want small FB, large ND for small contact resistance Rcontact EE130/230A Fall 2013 rc Acontact Lecture 8, Slide 9 Approaches to Lowering FB • Image-force barrier lowering F q N a N = dopant concentration in surface region FBo F s 4 a = width of heavily doped surface region EF Ec metal n+ Si Very high active dopant concentration desired • FM engineering – Impurity segregation via silicidation A. Kinoshita et al. (Toshiba), 2004 Symp. VLSI Technology Digest, p. 168 – Dual ( low-FM / high-FM ) silicide technology • Band-gap reduction – strain A. Yagishita et al. (UC-Berkeley), 2003 SSDM Extended Abstracts, p. 708 C. Ozturk et al. (NCSU), – germanium incorporation M. 2002 IEDM Technical Digest, p. 375 EE130/230A Fall 2013 Lecture 8, Slide 10 Voltage Drop across an Ohmic Contact • Ideally, Rcontact is very small, so little voltage is dropped across the ohmic contact, i.e. VA 0 Volts equilibrium conditions prevail EE130/230A Fall 2013 Lecture 8, Slide 11 Summary • Charge is “stored” in a Schottky diode. – The applied bias VA modulates this charge and thus the voltage drop across the semiconductor depletion region The flow of majority carriers into the metal depends exponentially on VA I AJ S (e qVA / kT 1) mn* 2 F B / kT where J S 120 T e A/cm 2 m0 EE130/230A Fall 2013 Lecture 8, Slide 12 W 2 s (Vbi VA ) qN D Summary (cont’d) • In equilibrium the flow of carriers from M to S (IMS) equals the flow of carriers from S to M (ISM) • Under forward bias ISM increases exponentially and dominates • Under reverse bias ISM decreases exponentially so that IMS (which is independent of VA) dominates * qV m I I S e kT 1 where I S 120 AT 2 e F / kT m0 A B Since it is difficult to achieve small FB in practice, ohmic contacts are achieved with heavy doping, in practice. EF Ec Ec EF Ev EE130/230A Fall 2013 Lecture 8, Slide 13 Ev