III-NITRIDE BASED ULTRAVIOLET SURFACE ACOUSTIC WAVE SENSORS 1,3 Ciplys , A. D. 1 Sereika , 1 R.Rimeika , 2 Gaska , 3 Shur , R. M. gaska@s-et.com ; daumantas.ciplys@ff.vu.lt; 4 Yang , J. M. Asif shurm@rpi.edu 4 Khan 1Vilnius University, Physics Faculty, Dept. of Radiophysics, Vilnius, Lithuania 2Sensor Electronic Technology, Inc., Columbia, SC, USA 3Rensselaer Polytechnic Institute, Dept. of Electrical, Computer, and Systems Engineering, Troy, NY, USA 4University of South Carolina, Dept. of Electrical Engineering, Columbia, SC, USA Introduction Basic principles Schematics of the SAW-based UV sensor Due to a wide energy band gap, AlN, GaN, and their alloys are well suited for the fabrication of ultraviolet (UV) sensors, particularly, of visible-blind and solar-blind photodetectors. These materials possess strong piezoelectric properties making them attractive for surface acoustic wave (SAW) device applications. Amplitude condition for oscillations: amplifier gain must exceed the total insertion loss of the SAW delay line. ULTRAVIOLET RADIATION Transmission characteristic of the SAW delay line SAW DELAY LINE Input IDT Output IDT GaN layer Sapphire substrate Remote signal pickup is possible *J. D. Maines, E. G. S. Paige, A. F. Saunders, A. S. Young, Electron. Lett. 5, 678 (1969). AMPLIFIER Making use of the unique combination of wide energy gap and piezoelectric properties, we were the first to implement the GaNbased surface acoustic wave III-nitride-based SAW oscillator and to apply it for UV sensing. SAW oscillator frequency down-shift due to UV illumination of SAW propagation path Signal power (dBm) Frequency (MHz) Frequency shift is due to the change of SAW transducer parameters by UV off Bulk a-AlN transducer aperture W = 1 mm, number of transducer electrode pairs N = 100, -30 dielectric constant e = 10, K2 = 0.1 % -40 source and load resistances GaN on sapphire RL = Rs = 50 Ohm. off K2 is the electromechanical coupling constant. 196 197 198 199 200 201 202 203 204 2 f L V 2 m , where L is the distance between IDTs, V is the SAW velocity, is the phase shift introduced by the amplifier, cables and transducer circuitry. Illuminated: area between SAW transducers on 220.88 K2 = 0.1 % Phase condition: the phase shift around the loop must be UV light: from Xenon lamp 220.96 UV on Calculation parameters: Frequency (MHz) Any change in V or leads to the change in oscillator frequency f. 0 220.92 K2 = 0.5 % -20 -60 SAW oscillator frequency up-shift due to UV illumination of SAW transducers Illuminated: entire surface of the sample, including transducer area -10 f0 = 200 MHz -50 D. Ciplys, R. Rimeika, M. S. Shur, S. Rumyantsev, R. Gaska, A. Sereika, J. Yang, M. Asif Khan, Appl. Phys. Lett. 80, 2020 (2002) UV light: from mercury lamp through 330 nm filter Transmission (dB) RF SPECTRUM ANALYZER SAW For sensing purposes, it is very convenient to use the SAW delayline oscillator, which has been first demonstrated in 1969 [*] as temperature-sensitive device. Since then, various SAW sensors has been developed but not those for UV. 0 Illuminated by UV UV through nm nm filter L330 <= 365 -20 Dark Frequency shift is due to the change of SAW velocity by UV via screening the piezoelectric fields by photoconductivity -40 fUV f dark K2 1 L1 , 2 f dark 2 1 Rs Ve L -60 where L1 is the length of illuminated region, Rs is the sheet resistivity. -80 220.84 0 200 400 600 -100 800 221.28 Time (s) 221.30 221.32 221.34 221.36 Possibilities of solar-blind operation Frequency (MHz) D. Ciplys, R. Rimeika, A. Sereika, R. Gaska, M. S. Shur, J. W. Yang, and M. A. Khan, Electron. Lett. 37, 545 (2001). Separation by wavelength Rs Optical wavelength dependence of the frequency down-shift Predicted optical wavelength cut-off as function of AlGaN composition Differential SAW oscillator with improved thermal stability Schematics The SAW oscillator frequency is temperature dependent. The temperature drift can be minimized by using the differential scheme Amplifier 1 Mixer Spectrum analyzer SAW line 2 Amplifier 2 Output signsl (dBm) GaN on sapphire: -50 to -60 ppm/K H. H. Jeong et al , Physica Stat. Sol. (a) 188, 247 (2001) -20 -40 -60 -100 G. Bu, D. Ciplys, M. Shur, L. J. Schowalter, S. Schujman, R. Gaska , Electron. Lett. (accepted for publication in 2003) 21 22 23 Frequency (kHz) 380 24 4 Grown by MBE 250 1.08 eV for MBE-grown layers Layers grown by MOCVD U. Ozgur et al, Appl. Phys. Lett. 79, 4103 (2001) 0.0 0.2 0.4 0.6 0.8 1.0 400 E g 6.13 x 3.42(1 x) b x1 x (eV) SAW oscillator line widths measured under different illumination conditions We attribute the differences in the line widths to the different noise spectra of the artificial and natural UV sources. 2 365 nm 1 5 10 15 Optical power (W) 10 mm 1 mm 1.3 mm Xenon lamp These differences might serve for the development of solarblind UV sensors. Sun 8 Frequency Jump ( kHz ) x=0.238 M. J. Bergmann et al , Appl. Phys. Lett. 75, 67 (1999) 200 UV light spot spot between transducers 0.37 kHz / W 3 0 12 Solar radiation cut-off 300 Molar fraction of Al, x 0 UV-induced frequency down-shift vs. optical power –0.39 eV for MOCVD-grown layers x=0.36 Separation by line width Feb. 27, 2002 20 360 350 Optical power dependence of the frequency down-shift -80 Bulk AlN: -19 ppm/K 340 No frequency shift (with accuracy of 1 %) was observed at optical wavelengths above 400 nm Calculated using bowing parameter b: Optical wavelength (nm) Device #2 The temperature coefficients of frequency (TCF): Band gap width of GaN 3.4 eV 0.01 320 Output signal Differential SAW oscillator output 0 Visible blind operation Signal power (arb. units) SAW line 1 1 nm bandwidth monochromator 0.1 Frequency shift (kHz) UV light Frequency shift (a.u.) 1 Sensor cut-off wavelength (nm) Wavelength tuning: Dark 4 UV on L2, Spot Diameter 0.5mm UV on L1, Spot Diameter 0.5mm UV on L2, Spot Diameter 7.3mm UV on L1, Spot Diameter 7.3mm 0 -4 -10 -5 0 5 10 Frequency deviation (kHz) -8 -12 D. Ciplys, R. Rimeika, M.S. Shur, R. Gaska, A. Sereika, J.Yang, M. Asif Khan, Electron. Lett. 38, 134 (2002) 365 nm -16 -20 -24 0 5 10 15 20 Input UV Power ( W ) 25 30 Acknowledgments The work at RPI was supported by the National Science Foundation (program monitors Dr. U. Varshney and Dr. James Mink); under a subcontract from DARPA (Project Manager Dr. Edgar Martinez and monitored by John Blevins at AFRL, contract F33615-02-C-5417). The work at SET, Inc. was partially supported by the Office of Naval Research and monitored by Dr. Y.-S. Park. The work at SET, Inc. and USC was partially supported by NASA under contract NAG5-10322. Authors also acknowledge the support by NATO Expert Visit grant .PST.EV.977426. NATO Advanced Research Workshop UV Solid-State Light Emitters and Detectors June 17-21, 2003 Vilnius, Lithuania